TW200745265A - Composition for forming silica coating and silica coating - Google Patents

Composition for forming silica coating and silica coating

Info

Publication number
TW200745265A
TW200745265A TW096109989A TW96109989A TW200745265A TW 200745265 A TW200745265 A TW 200745265A TW 096109989 A TW096109989 A TW 096109989A TW 96109989 A TW96109989 A TW 96109989A TW 200745265 A TW200745265 A TW 200745265A
Authority
TW
Taiwan
Prior art keywords
silica coating
composition
forming
disclosed
compound
Prior art date
Application number
TW096109989A
Other languages
English (en)
Chinese (zh)
Other versions
TWI358427B (ja
Inventor
Kiyoshi Ishikawa
Toshiyuki Ogata
Hideo Hada
Shogo Matsumaru
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200745265A publication Critical patent/TW200745265A/zh
Application granted granted Critical
Publication of TWI358427B publication Critical patent/TWI358427B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
TW096109989A 2006-03-24 2007-03-22 Composition for forming silica coating and silica coating TW200745265A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006083733A JP2007254678A (ja) 2006-03-24 2006-03-24 シリカ系被膜形成用組成物およびシリカ系被膜

Publications (2)

Publication Number Publication Date
TW200745265A true TW200745265A (en) 2007-12-16
TWI358427B TWI358427B (ja) 2012-02-21

Family

ID=38541187

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096109989A TW200745265A (en) 2006-03-24 2007-03-22 Composition for forming silica coating and silica coating

Country Status (3)

Country Link
JP (1) JP2007254678A (ja)
TW (1) TW200745265A (ja)
WO (1) WO2007111270A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5991846B2 (ja) * 2012-04-24 2016-09-14 東京応化工業株式会社 膜形成用組成物、拡散剤組成物、膜形成用組成物の製造方法、及び拡散剤組成物の製造方法
JP6013150B2 (ja) * 2012-11-22 2016-10-25 メルクパフォーマンスマテリアルズマニュファクチャリング合同会社 ポジ型感光性シロキサン組成物の製造方法
JP2015052101A (ja) * 2013-08-06 2015-03-19 東京応化工業株式会社 膜形成用材料
JP6533443B2 (ja) * 2014-10-03 2019-06-19 東京応化工業株式会社 半導体基板の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58216194A (ja) * 1982-06-10 1983-12-15 Matsumoto Seiyaku Kogyo Kk シリケ−ト組成物
JPH0762122B2 (ja) * 1986-09-09 1995-07-05 松本製薬工業株式会社 耐熱絶縁塗料組成物
JPH0715084B2 (ja) * 1986-10-27 1995-02-22 松本製薬工業株式会社 表面処理方法
JPH0499029A (ja) * 1990-08-07 1992-03-31 Nec Corp 絶縁膜の形成方法
JP3702842B2 (ja) * 2001-12-04 2005-10-05 日立化成工業株式会社 シリカ系被膜形成用組成物、シリカ系被膜、シリカ系被膜の製造方法及び電子部品
JPWO2003087228A1 (ja) * 2002-04-12 2005-08-18 Ａｚエレクトロニックマテリアルズ株式会社 ケイ素含有共重合ポリマー組成物、溶剤可溶性架橋ケイ素含有共重合ポリマー及びこれらの硬化物

Also Published As

Publication number Publication date
JP2007254678A (ja) 2007-10-04
TWI358427B (ja) 2012-02-21
WO2007111270A1 (ja) 2007-10-04

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