TW200745265A - Composition for forming silica coating and silica coating - Google Patents
Composition for forming silica coating and silica coatingInfo
- Publication number
- TW200745265A TW200745265A TW096109989A TW96109989A TW200745265A TW 200745265 A TW200745265 A TW 200745265A TW 096109989 A TW096109989 A TW 096109989A TW 96109989 A TW96109989 A TW 96109989A TW 200745265 A TW200745265 A TW 200745265A
- Authority
- TW
- Taiwan
- Prior art keywords
- silica coating
- composition
- forming
- disclosed
- compound
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
Abstract
Disclosed is a composition for forming a silica coating which enables to form a silica coating by being applied over a substrate and then heated thereon at a low temperature. Also disclosed is a silica coating obtained by using such a composition. Specifically disclosed is a composition for forming a silica coating, which contains a siloxane polymer (A) and a compound (B) which causes a dehydration or dealcoholization reaction by the action of heat. A silicon compound having an isocyanate group is preferable as the compound (B) which causes a dehydration or dealcoholization reaction by the action of heat.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006083733A JP2007254678A (en) | 2006-03-24 | 2006-03-24 | Composition for forming silica-based film and silica-based film |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200745265A true TW200745265A (en) | 2007-12-16 |
TWI358427B TWI358427B (en) | 2012-02-21 |
Family
ID=38541187
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096109989A TW200745265A (en) | 2006-03-24 | 2007-03-22 | Composition for forming silica coating and silica coating |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2007254678A (en) |
TW (1) | TW200745265A (en) |
WO (1) | WO2007111270A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5991846B2 (en) * | 2012-04-24 | 2016-09-14 | 東京応化工業株式会社 | Film-forming composition, diffusing agent composition, method for producing film-forming composition, and method for producing diffusing agent composition |
JP6013150B2 (en) * | 2012-11-22 | 2016-10-25 | メルクパフォーマンスマテリアルズマニュファクチャリング合同会社 | Method for producing positive photosensitive siloxane composition |
JP2015052101A (en) * | 2013-08-06 | 2015-03-19 | 東京応化工業株式会社 | Material for film formation |
JP6533443B2 (en) * | 2014-10-03 | 2019-06-19 | 東京応化工業株式会社 | Semiconductor substrate manufacturing method |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58216194A (en) * | 1982-06-10 | 1983-12-15 | Matsumoto Seiyaku Kogyo Kk | Silicate composition |
JPH0762122B2 (en) * | 1986-09-09 | 1995-07-05 | 松本製薬工業株式会社 | Heat resistant insulation coating composition |
JPH0715084B2 (en) * | 1986-10-27 | 1995-02-22 | 松本製薬工業株式会社 | Surface treatment method |
JPH0499029A (en) * | 1990-08-07 | 1992-03-31 | Nec Corp | Forming method for insulating film |
JP3702842B2 (en) * | 2001-12-04 | 2005-10-05 | 日立化成工業株式会社 | Composition for forming silica-based film, silica-based film, method for producing silica-based film, and electronic component |
JPWO2003087228A1 (en) * | 2002-04-12 | 2005-08-18 | Azエレクトロニックマテリアルズ株式会社 | Silicon-containing copolymer composition, solvent-soluble crosslinked silicon-containing copolymer, and cured products thereof |
-
2006
- 2006-03-24 JP JP2006083733A patent/JP2007254678A/en active Pending
-
2007
- 2007-03-22 TW TW096109989A patent/TW200745265A/en unknown
- 2007-03-23 WO PCT/JP2007/056090 patent/WO2007111270A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JP2007254678A (en) | 2007-10-04 |
TWI358427B (en) | 2012-02-21 |
WO2007111270A1 (en) | 2007-10-04 |
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