MX2009006843A - Composicion sensible a radiacion electromagnetica o termica. - Google Patents

Composicion sensible a radiacion electromagnetica o termica.

Info

Publication number
MX2009006843A
MX2009006843A MX2009006843A MX2009006843A MX2009006843A MX 2009006843 A MX2009006843 A MX 2009006843A MX 2009006843 A MX2009006843 A MX 2009006843A MX 2009006843 A MX2009006843 A MX 2009006843A MX 2009006843 A MX2009006843 A MX 2009006843A
Authority
MX
Mexico
Prior art keywords
electromagnetic radiation
sensitive composition
compositions
thermally sensitive
preparation
Prior art date
Application number
MX2009006843A
Other languages
English (en)
Inventor
Jonathan Campbell
Adolf Kaeser
Original Assignee
Ciba Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding Inc filed Critical Ciba Holding Inc
Publication of MX2009006843A publication Critical patent/MX2009006843A/es

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • B41M5/323—Organic colour formers, e.g. leuco dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
    • B41M3/14—Security printing
    • B41M3/142—Security printing using chemical colour-formers or chemical reactions, e.g. leuco-dye/acid, photochromes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/63—Additives non-macromolecular organic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/07—Aldehydes; Ketones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer
    • Y10S430/119—Hydroxyl or carbonyl group containing as sole functional groups
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)

Abstract

La presente invención proporciona composiciones de revestimiento que comprenden (i) a) un compuesto que contienen grupo carbonilo libre y b) un nucleófilo o (ii) un compuesto que contiene un grupo carbonilo libre, este compuesto se sustituye con uno o más grupos nucleofílicos. La presente invención también proporciona un proceso para la preparación de estas composiciones, sustratos revestidos con estas composiciones y un proceso para su preparación, un proceso para preparar sustratos marcados utilizando estas composiciones y sustratos marcados que se obtienen por este último proceso.
MX2009006843A 2007-01-09 2007-12-21 Composicion sensible a radiacion electromagnetica o termica. MX2009006843A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07100263 2007-01-09
PCT/EP2007/064408 WO2008083912A1 (en) 2007-01-09 2007-12-21 Electromagnetic radiation or thermally sensitive composition

Publications (1)

Publication Number Publication Date
MX2009006843A true MX2009006843A (es) 2009-07-07

Family

ID=38988009

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2009006843A MX2009006843A (es) 2007-01-09 2007-12-21 Composicion sensible a radiacion electromagnetica o termica.

Country Status (12)

Country Link
US (1) US8178277B2 (es)
EP (1) EP2099615B1 (es)
JP (1) JP2010515780A (es)
KR (1) KR20090101196A (es)
CN (1) CN101636277A (es)
AU (1) AU2007343233A1 (es)
BR (1) BRPI0720673A2 (es)
CA (1) CA2674582A1 (es)
MX (1) MX2009006843A (es)
TW (1) TW200902652A (es)
WO (1) WO2008083912A1 (es)
ZA (1) ZA200904097B (es)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2331156T3 (es) 2005-07-25 2009-12-22 Basf Se Revestimientos de base acuosa y transparentes para el marcado de sustratos.
CA2680371A1 (en) 2007-03-15 2008-09-18 Basf Se Heat-sensitive coating compositions based on resorcinyl triazine derivatives
CN101801676B (zh) 2007-07-18 2012-10-03 巴斯夫欧洲公司 激光敏感涂料制剂
ATE527327T1 (de) * 2007-07-18 2011-10-15 Datalase Ltd Beschichtungszusammensetzungen
ES2377852T3 (es) * 2007-08-22 2012-04-02 Datalase Ltd Composición de revestimiento sensible al láser
US8900414B2 (en) * 2007-11-07 2014-12-02 Datalase, Ltd. Fiber products
CN102197076A (zh) 2008-10-23 2011-09-21 巴斯夫欧洲公司 吸热添加剂
WO2010049282A1 (en) 2008-10-27 2010-05-06 Basf Se Coating composition for marking substrates
US20120045624A1 (en) 2008-10-27 2012-02-23 Basf Se Aqueous laser-sensitive composition for marking substrates
MX354358B (es) 2011-05-25 2018-02-28 Tetra Laval Holdings & Finance Absorbedores mejorados del infrarrojo proximo.
JP5996649B2 (ja) 2011-08-12 2016-09-21 テトラ・ラヴァル・ホールディングス・アンド・ファイナンス・ソシエテ・アノニムＴｅｔｒａ Ｌａｖａｌ Ｈｏｌｄｉｎｇｓ ＆ Ｆｉｎａｎｃｅ Ｓ．Ａ． 新規なマーキング化合物
MX2013014739A (es) 2011-08-12 2014-02-11 Tetra Laval Holdings & Finance Nueva formulacion de tinta.
DE102015005672A1 (de) 2015-05-04 2016-11-10 Giesecke & Devrient Gmbh Sicherheitsmerkmal und Verfahren zu dessen Herstellung
DE102016002120A1 (de) 2016-02-24 2017-08-24 Giesecke & Devrient Gmbh Sicherheitsmerkmal und Verfahren zu dessen Herstellung
DE102016004424A1 (de) 2016-04-12 2017-10-12 Giesecke+Devrient Currency Technology Gmbh Laserung einer Beschichtung mit Effektpigmenten
DE102016006931A1 (de) 2016-06-06 2017-12-07 Giesecke+Devrient Currency Technology Gmbh Sicherheitsmerkmal und Verfahren zu dessen Herstellung
DE102016006929A1 (de) 2016-06-06 2017-12-07 Giesecke+Devrient Currency Technology Gmbh Sicherheitsmerkmal und Verfahren zu dessen Herstellung
KR20220049005A (ko) * 2019-08-16 2022-04-20 9 미터스 바이오파마, 인코포레이티드 라라조타이드 제형

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
US3161770A (en) 1962-03-20 1964-12-15 Dietzgen Co Eugene Thermographic reproduction paper and method of using
JPS6122988A (ja) 1984-07-11 1986-01-31 Ricoh Co Ltd 光情報記録媒体
JPS63172689A (ja) 1987-01-12 1988-07-16 Mitsubishi Electric Corp 感熱記録方法
JP2751089B2 (ja) * 1992-11-30 1998-05-18 大日本インキ化学工業株式会社 レーザーマーキング方法及び印刷インキ
DE4407905A1 (de) 1994-03-09 1995-09-14 Agfa Gevaert Ag Transparentes wärmeempfindliches Aufzeichnungsmaterial
JPH09156228A (ja) 1995-12-06 1997-06-17 Ricoh Co Ltd 感熱記録材料
US6210472B1 (en) 1999-04-08 2001-04-03 Marconi Data Systems Inc. Transparent coating for laser marking
GB2374561B (en) 2001-02-28 2003-03-12 Sherwood Technology Ltd Laser coding
EP1924444A2 (en) 2005-09-15 2008-05-28 Ciba Holding Inc. Coating compositions for marking substrates
WO2007088104A1 (en) * 2006-01-31 2007-08-09 Ciba Holding Inc. Coating composition for marking substrates

Also Published As

Publication number Publication date
KR20090101196A (ko) 2009-09-24
JP2010515780A (ja) 2010-05-13
WO2008083912A1 (en) 2008-07-17
ZA200904097B (en) 2010-08-25
US8178277B2 (en) 2012-05-15
CA2674582A1 (en) 2008-07-17
BRPI0720673A2 (pt) 2014-01-28
US20100104825A1 (en) 2010-04-29
EP2099615B1 (en) 2017-08-02
EP2099615A1 (en) 2009-09-16
CN101636277A (zh) 2010-01-27
TW200902652A (en) 2009-01-16
AU2007343233A1 (en) 2008-07-17

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