TW200745001A - Fluorine-containing adamantane derivative, fluorine-containing adamantane derivative having polymerizable group, resin composition containing the same, and antireflection film - Google Patents

Fluorine-containing adamantane derivative, fluorine-containing adamantane derivative having polymerizable group, resin composition containing the same, and antireflection film

Info

Publication number
TW200745001A
TW200745001A TW096114446A TW96114446A TW200745001A TW 200745001 A TW200745001 A TW 200745001A TW 096114446 A TW096114446 A TW 096114446A TW 96114446 A TW96114446 A TW 96114446A TW 200745001 A TW200745001 A TW 200745001A
Authority
TW
Taiwan
Prior art keywords
fluorine
adamantane derivative
polymerizable group
containing adamantane
resin composition
Prior art date
Application number
TW096114446A
Other languages
English (en)
Inventor
Yasunari Okada
Hideki Yamane
Hajime Ito
Nobuaki Matsumoto
Original Assignee
Idemitsu Kosan Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Kosan Co filed Critical Idemitsu Kosan Co
Publication of TW200745001A publication Critical patent/TW200745001A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C33/00—Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C33/05—Alcohols containing rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C31/00—Saturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C31/34—Halogenated alcohols
    • C07C31/44—Halogenated alcohols containing saturated rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/65—Halogen-containing esters of unsaturated acids
    • C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D301/00—Preparation of oxiranes
    • C07D301/02—Synthesis of the oxirane ring
    • C07D301/24—Synthesis of the oxirane ring by splitting off HAL—Y from compounds containing the radical HAL—C—C—OY
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D305/00—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms
    • C07D305/02—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings
    • C07D305/04—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D305/06—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/104—Esters of polyhydric alcohols or polyhydric phenols of tetraalcohols, e.g. pentaerythritol tetra(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74—Adamantanes
TW096114446A 2006-04-28 2007-04-24 Fluorine-containing adamantane derivative, fluorine-containing adamantane derivative having polymerizable group, resin composition containing the same, and antireflection film TW200745001A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006125441 2006-04-28

Publications (1)

Publication Number Publication Date
TW200745001A true TW200745001A (en) 2007-12-16

Family

ID=38655355

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096114446A TW200745001A (en) 2006-04-28 2007-04-24 Fluorine-containing adamantane derivative, fluorine-containing adamantane derivative having polymerizable group, resin composition containing the same, and antireflection film

Country Status (7)

Country Link
US (1) US20090099326A1 (zh)
EP (1) EP2014639A1 (zh)
JP (1) JPWO2007125829A1 (zh)
KR (1) KR20090005338A (zh)
CN (1) CN101432258A (zh)
TW (1) TW200745001A (zh)
WO (1) WO2007125829A1 (zh)

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JP4979915B2 (ja) * 2005-09-09 2012-07-18 東京応化工業株式会社 高分子化合物、ネガ型レジスト組成物およびレジストパターン形成方法
JP5134233B2 (ja) * 2006-11-29 2013-01-30 出光興産株式会社 アダマンタン誘導体、その製造方法及びアダマンタン誘導体を含む樹脂組成物
JP5085263B2 (ja) * 2007-10-04 2012-11-28 株式会社ダイセル フォトレジスト用高分子化合物及びフォトレジスト組成物
JP2009256306A (ja) * 2008-03-18 2009-11-05 Daicel Chem Ind Ltd 重合性不飽和基を有するアダマンタン誘導体とその製造法
US8300329B2 (en) 2008-03-31 2012-10-30 Konica Minolta Opto, Inc. Optical element assembly and method of manufacturing optical unit
JP5302403B2 (ja) * 2009-07-16 2013-10-02 パナソニック株式会社 複合光学素子およびその製造方法、ならびに当該複合光学素子を備えた撮像装置および光学式記録再生装置
JP5674403B2 (ja) * 2010-09-29 2015-02-25 株式会社ネオス 耐指紋性向上剤、これを用いた活性エネルギー線硬化型ハードコート剤、これらを用いて得られる硬化膜および硬化膜を有する物品
KR101768929B1 (ko) * 2010-09-30 2017-08-17 디아이씨 가부시끼가이샤 함불소 중합성 수지, 그것을 사용한 활성 에너지선 경화형 조성물 및 그 경화물
WO2013109748A1 (en) * 2012-01-19 2013-07-25 Brewer Science Inc. Nonpolymeric antireflection compositions containing adamantyl groups
JP5889655B2 (ja) * 2012-01-31 2016-03-22 大阪有機化学工業株式会社 ハードコートフィルム及びその製造に用いる樹脂組成物
JP6112334B2 (ja) * 2012-03-30 2017-04-12 Dic株式会社 フッ素原子含有重合性樹脂、それを用いた活性エネルギー線硬化性組成物、その硬化物及び物品。
US10670964B2 (en) * 2017-11-21 2020-06-02 International Business Machines Corporation Ruggedized solder mask material

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5178722A (en) * 1990-04-30 1993-01-12 Toyo Bossan Kabushiki Kaisha Method of producing a flexible metal and resin film laminate with holes
JP2881969B2 (ja) 1990-06-05 1999-04-12 富士通株式会社 放射線感光レジストとパターン形成方法
JP2774229B2 (ja) 1993-04-27 1998-07-09 帝人化成株式会社 光学用成形品
JP3331121B2 (ja) 1996-05-17 2002-10-07 カネボウ株式会社 ポリエステル重合体およびその成形体
EP0915077B1 (en) * 1997-05-23 2004-11-17 Daicel Chemical Industries, Ltd. Polymerizable adamantane derivatives and process for producing the same
IT1312344B1 (it) 1999-06-03 2002-04-15 Ausimont Spa Composizioni per film a basso indice di rifrazione.
JP4646389B2 (ja) * 2000-12-04 2011-03-09 ダイセル化学工業株式会社 第３級アルコールエステルの製造方法
JP2002182046A (ja) 2000-12-14 2002-06-26 Nippon Telegr & Teleph Corp <Ntt> 光導波路素子
JP2004029542A (ja) * 2002-06-27 2004-01-29 Fuji Photo Film Co Ltd ポジ型レジスト組成物
JP4233314B2 (ja) * 2002-11-29 2009-03-04 東京応化工業株式会社 レジスト組成物および溶解制御剤
JP2004212619A (ja) 2002-12-27 2004-07-29 Nakajima Kogyo Kk 反射防止フィルム、その製造方法及び基体
EP1637526B1 (en) * 2003-06-20 2011-11-09 Tokuyama Corporation Curable polycyclic compounds and process for the production thereof
JP2007086731A (ja) * 2005-08-24 2007-04-05 Asahi Glass Co Ltd レジスト保護膜用組成物
US7649065B2 (en) * 2005-10-28 2010-01-19 Asahi Glass Company, Limited Fluoroadamantane derivative, fluorine-containing polymer and production method
JP2007254451A (ja) * 2006-02-22 2007-10-04 Asahi Glass Co Ltd 新規な重合性のフルオロアダマンタン誘導体

Also Published As

Publication number Publication date
JPWO2007125829A1 (ja) 2009-09-10
US20090099326A1 (en) 2009-04-16
EP2014639A1 (en) 2009-01-14
WO2007125829A1 (ja) 2007-11-08
KR20090005338A (ko) 2009-01-13
CN101432258A (zh) 2009-05-13

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