TW200741934A - Wafer-shaped measuring apparatus and method for manufacturing the same - Google Patents

Wafer-shaped measuring apparatus and method for manufacturing the same

Info

Publication number
TW200741934A
TW200741934A TW096109151A TW96109151A TW200741934A TW 200741934 A TW200741934 A TW 200741934A TW 096109151 A TW096109151 A TW 096109151A TW 96109151 A TW96109151 A TW 96109151A TW 200741934 A TW200741934 A TW 200741934A
Authority
TW
Taiwan
Prior art keywords
bonding layer
measuring apparatus
temperature measuring
manufacturing
wafer
Prior art date
Application number
TW096109151A
Other languages
English (en)
Other versions
TWI331785B (zh
Inventor
Kenji Matsuda
Tomohide Minami
Yoshiki Yamanishi
Muneo Harada
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200741934A publication Critical patent/TW200741934A/zh
Application granted granted Critical
Publication of TWI331785B publication Critical patent/TWI331785B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K1/00—Details of thermometers not specially adapted for particular types of thermometer
    • G01K1/16—Special arrangements for conducting heat from the object to the sensitive element
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
    • G01K7/01—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using semiconducting elements having PN junctions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805—Shape
    • H01L2224/4809—Loop shape
    • H01L2224/48091—Arched
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732—Location after the connecting process
    • H01L2224/73251—Location after the connecting process on different surfaces
    • H01L2224/73265—Layer and wire connectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319—Arrangement of the layer connectors prior to mounting
    • H01L2224/83192—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92—Specific sequence of method steps
    • H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
    • H01L2224/9222—Sequential connecting processes
    • H01L2224/92242—Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92247—Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181—Encapsulation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Measuring Temperature Or Quantity Of Heat (AREA)
TW096109151A 2006-03-16 2007-03-16 Wafer-shaped measuring apparatus and method for manufacturing the same TW200741934A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006073052 2006-03-16

Publications (2)

Publication Number Publication Date
TW200741934A true TW200741934A (en) 2007-11-01
TWI331785B TWI331785B (zh) 2010-10-11

Family

ID=38609155

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096109151A TW200741934A (en) 2006-03-16 2007-03-16 Wafer-shaped measuring apparatus and method for manufacturing the same

Country Status (4)

Country Link
US (1) US20090085031A1 (zh)
JP (1) JP4896963B2 (zh)
TW (1) TW200741934A (zh)
WO (1) WO2007119359A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111742203A (zh) * 2018-03-15 2020-10-02 贺利氏先进传感器技术有限公司 温度传感器元件

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE602007002805D1 (de) * 2006-04-20 2009-11-26 Nxp Bv Verfahren und vorrichtung zur bestimmung der temperatur eines halbleitersubstrats
JP2010519768A (ja) * 2007-02-23 2010-06-03 ケーエルエー−テンカー・コーポレーション プロセス条件測定デバイス
JP5476114B2 (ja) * 2009-12-18 2014-04-23 東京エレクトロン株式会社 温度測定用装置
JP5314664B2 (ja) * 2010-12-24 2013-10-16 東京エレクトロン株式会社 物理量計測装置及び物理量計測方法
CN104105960B (zh) * 2011-12-23 2018-01-12 赛诺菲-安万特德国有限公司 用于药剂的包装物的传感器装置
WO2014136484A1 (ja) * 2013-03-07 2014-09-12 住友ベークライト株式会社 装置、接着剤用組成物、接着シート
CN103258772B (zh) * 2013-05-02 2016-02-10 苏州日月新半导体有限公司 打线工艺的加热座及加热装置
JP6094392B2 (ja) * 2013-06-11 2017-03-15 株式会社デンソー 半導体装置
NL2016982A (en) 2015-07-16 2017-01-19 Asml Netherlands Bv An Inspection Substrate and an Inspection Method
KR102119757B1 (ko) * 2018-08-22 2020-06-08 한국표준과학연구원 다층 저항-열전식 온도측정 웨이퍼 센서 및 그 제조 방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1018844B (zh) * 1990-06-02 1992-10-28 中国科学院兰州化学物理研究所 防锈干膜润滑剂
US5141334A (en) * 1991-09-24 1992-08-25 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Sub-kelvin resistance thermometer
JP2839418B2 (ja) * 1992-10-29 1998-12-16 京セラ株式会社 温度センサ
JPH09166501A (ja) * 1995-12-13 1997-06-24 Oki Electric Ind Co Ltd 温度測定装置及び温度測定方法
JPH109963A (ja) * 1996-06-19 1998-01-16 Yamari Sangyo Kk 測温抵抗体素子によるシリコンウェハー等の温度計測構造
US6744346B1 (en) * 1998-02-27 2004-06-01 Micron Technology, Inc. Electronic device workpieces, methods of semiconductor processing and methods of sensing temperature of an electronic device workpiece
JP2001289715A (ja) * 2000-04-05 2001-10-19 Yamari Sangyo Kk 測温基板
JP2002202204A (ja) * 2000-12-28 2002-07-19 Sensarray Japan Corp 温度計測用球状半導体デバイス
JP4486289B2 (ja) * 2001-03-30 2010-06-23 株式会社デンソー フローセンサ及びその製造方法
US6919730B2 (en) * 2002-03-18 2005-07-19 Honeywell International, Inc. Carbon nanotube sensor
US6870270B2 (en) * 2002-12-28 2005-03-22 Intel Corporation Method and structure for interfacing electronic devices
JP2005340291A (ja) * 2004-05-24 2005-12-08 Komatsu Ltd 基板熱状態測定装置及び基板熱状態分析制御方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111742203A (zh) * 2018-03-15 2020-10-02 贺利氏先进传感器技术有限公司 温度传感器元件
TWI729361B (zh) * 2018-03-15 2021-06-01 德商賀利氏先進傳感器技術有限公司 溫度感測器元件及其輸送系統和生產方法
CN111742203B (zh) * 2018-03-15 2023-03-10 贺利氏先进传感器技术有限公司 温度传感器元件

Also Published As

Publication number Publication date
JP4896963B2 (ja) 2012-03-14
TWI331785B (zh) 2010-10-11
US20090085031A1 (en) 2009-04-02
WO2007119359A1 (ja) 2007-10-25
JPWO2007119359A1 (ja) 2009-08-27

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees