TW200739256A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
TW200739256A
TW200739256A TW096107685A TW96107685A TW200739256A TW 200739256 A TW200739256 A TW 200739256A TW 096107685 A TW096107685 A TW 096107685A TW 96107685 A TW96107685 A TW 96107685A TW 200739256 A TW200739256 A TW 200739256A
Authority
TW
Taiwan
Prior art keywords
resin composition
photosensitive resin
oled
lifetime
insulator
Prior art date
Application number
TW096107685A
Other languages
Chinese (zh)
Other versions
TWI425310B (en
Inventor
Tae-Hoon Yeo
Hyoc-Min Youn
Ho-Jin Lee
Joo-Pyo Yun
Ki-Hyuk Koo
Ui Cheol Jeong
Dong Myung Kim
Sang Gak Choi
Hong Dae Shin
Dong Hyuk Lee
Byung Uk Kim
Sung Tak Kim
Su Youn Choi
Dong Ho Cho
Dae Jung Jeong
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of TW200739256A publication Critical patent/TW200739256A/en
Application granted granted Critical
Publication of TWI425310B publication Critical patent/TWI425310B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B01F23/43—Mixing liquids with liquids; Emulsifying using driven stirrers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B01F23/41—Emulsifying
    • B01F23/414—Emulsifying characterised by the internal structure of the emulsion
    • B01F23/4145—Emulsions of oils, e.g. fuel, and water
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F27/00—Mixers with rotary stirring devices in fixed receptacles; Kneaders
    • B01F27/05—Stirrers
    • B01F27/11—Stirrers characterised by the configuration of the stirrers
    • B01F27/114—Helically shaped stirrers, i.e. stirrers comprising a helically shaped band or helically shaped band sections
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F27/00—Mixers with rotary stirring devices in fixed receptacles; Kneaders
    • B01F27/05—Stirrers
    • B01F27/11—Stirrers characterised by the configuration of the stirrers
    • B01F27/117—Stirrers provided with conical-shaped elements, e.g. funnel-shaped
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F27/00—Mixers with rotary stirring devices in fixed receptacles; Kneaders
    • B01F27/05—Stirrers
    • B01F27/11—Stirrers characterised by the configuration of the stirrers
    • B01F27/19—Stirrers with two or more mixing elements mounted in sequence on the same axis
    • B01F27/191—Stirrers with two or more mixing elements mounted in sequence on the same axis with similar elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/55—Baffles; Flow breakers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
    • B01F2101/505—Mixing fuel and water or other fluids to obtain liquid fuel emulsions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B01F23/41—Emulsifying
    • B01F23/413—Homogenising a raw emulsion or making monodisperse or fine emulsions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

To provide a photosensitive resin composition excellent in various performances such as sensitivity and insulation, capable of increasing reliability and lifetime in a subsequent step because of particularly excellent heat resistance, capable of simultaneously forming two forms of patterns of an insulator and a separator with one photosensitive resin composition so that process time can be shortened, and suitable for application to the production process of PM-OLED, AM-OLED, AM-LCD or a PDP substrate by enhancing numerical aperture on a panel. The photosensitive resin composition comprises (a) a polyhydroxystyrene resin, (b) a 1,2-quinonediazide compound, (c) a photoacid generator, (d) a melamine crosslinking agent and (e) a solvent.
TW096107685A 2006-03-08 2007-03-06 Photosensitive resin composition TWI425310B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060021843A KR101351311B1 (en) 2006-03-08 2006-03-08 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
TW200739256A true TW200739256A (en) 2007-10-16
TWI425310B TWI425310B (en) 2014-02-01

Family

ID=38586822

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096107685A TWI425310B (en) 2006-03-08 2007-03-06 Photosensitive resin composition

Country Status (4)

Country Link
JP (1) JP5026111B2 (en)
KR (1) KR101351311B1 (en)
CN (1) CN101034260B (en)
TW (1) TWI425310B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI796541B (en) * 2018-12-31 2023-03-21 南韓商東進世美肯股份有限公司 Positive photosensitive resin composition, method for forming a pattern of a display device using this and a display device comprising a cured product thereof

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101347284B1 (en) * 2007-09-28 2014-01-07 삼성전자주식회사 Photoacid generator and chemically amplified resist composition comprising the same
JP5317463B2 (en) * 2007-11-19 2013-10-16 旭化成イーマテリアルズ株式会社 Positive photosensitive resin composition
KR101596911B1 (en) * 2009-01-22 2016-02-23 주식회사 동진쎄미켐 Photoresist composition
KR101882217B1 (en) * 2011-10-18 2018-07-26 주식회사 동진쎄미켐 Polyimide photosensitive resin composition for organic light emitting diodes
KR20180055340A (en) * 2016-11-17 2018-05-25 주식회사 동진쎄미켐 High resolution positive photosensitive resin composition
CN115873175B (en) * 2021-09-28 2023-09-12 上海新阳半导体材料股份有限公司 Bottom anti-reflection coating for DUV lithography and preparation method and application thereof

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US4689371A (en) * 1986-07-07 1987-08-25 Celanese Corporation Process for the preparation of poly (vinylphenol) from poly (acetoxystyrene)
DE3817012A1 (en) * 1988-05-19 1989-11-30 Basf Ag POSITIVE AND NEGATIVE WORKING RADIATION-SENSITIVE MIXTURES AND METHOD FOR THE PRODUCTION OF RELIEF PATTERNS
JP2583600B2 (en) * 1989-02-20 1997-02-19 東京応化工業株式会社 Negative electron beam resist composition
DE4112974A1 (en) * 1991-04-20 1992-10-22 Hoechst Ag NEGATIVE WORKING RADIATION-SENSITIVE MIXTURE AND RADIATION-SENSITIVE RECORDING MATERIAL THEREFOR
JPH0635183A (en) * 1992-07-20 1994-02-10 Sumitomo Chem Co Ltd Positive type resist composition and production of color filter using the same
JP3852867B2 (en) * 1996-11-22 2006-12-06 東京応化工業株式会社 Photosensitive resin composition and pattern forming method using the same
JPH11119428A (en) * 1997-10-15 1999-04-30 Mitsubishi Chemical Corp Photosensitive composition and photosensitive planographic printing plate
JP4221788B2 (en) * 1997-11-17 2009-02-12 住友化学株式会社 Method for forming resist pattern with excellent heat resistance and positive resist composition used therefor
JP3963624B2 (en) * 1999-12-22 2007-08-22 富士フイルム株式会社 Positive photoresist composition for deep ultraviolet exposure
JP2003116149A (en) * 2001-07-31 2003-04-18 Sony Corp Display device and method for correcting beam] landing pattern
JP3965976B2 (en) * 2001-11-20 2007-08-29 日本ゼオン株式会社 Radiation sensitive resin composition, resin pattern forming method, resin pattern and use thereof
JP3812655B2 (en) * 2002-01-28 2006-08-23 Ｊｓｒ株式会社 Positive photosensitive insulating resin composition and cured product thereof
JP4000903B2 (en) * 2002-05-16 2007-10-31 住友化学株式会社 Radiation sensitive resin composition
JP4101670B2 (en) * 2003-01-31 2008-06-18 東京応化工業株式会社 Positive photoresist composition for LCD production and method for forming resist pattern
JP4156400B2 (en) * 2003-02-24 2008-09-24 東京応化工業株式会社 Positive photoresist composition and method for forming resist pattern
JP4401196B2 (en) * 2003-03-10 2010-01-20 富士フイルム株式会社 Dye-containing curable composition, color filter and method for producing the same
US20040242798A1 (en) * 2003-05-08 2004-12-02 Sounik James R. Photoresist compositions and processes for preparing the same
JP4232527B2 (en) * 2003-05-09 2009-03-04 Ｊｓｒ株式会社 Method for forming protrusion for vertical alignment type liquid crystal display element and spacer for vertical alignment type liquid crystal display element
JP4595412B2 (en) * 2003-07-09 2010-12-08 東レ株式会社 Photosensitive resin precursor composition
JP4119340B2 (en) * 2003-09-30 2008-07-16 東京応化工業株式会社 Photosensitive resin composition and pattern forming method using the same
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI796541B (en) * 2018-12-31 2023-03-21 南韓商東進世美肯股份有限公司 Positive photosensitive resin composition, method for forming a pattern of a display device using this and a display device comprising a cured product thereof

Also Published As

Publication number Publication date
JP5026111B2 (en) 2012-09-12
CN101034260A (en) 2007-09-12
TWI425310B (en) 2014-02-01
JP2007241287A (en) 2007-09-20
CN101034260B (en) 2012-07-18
KR20070091987A (en) 2007-09-12
KR101351311B1 (en) 2014-01-14

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