TW200735190A - Thin film transistor substrate and display device - Google Patents
Thin film transistor substrate and display deviceInfo
- Publication number
- TW200735190A TW200735190A TW095144423A TW95144423A TW200735190A TW 200735190 A TW200735190 A TW 200735190A TW 095144423 A TW095144423 A TW 095144423A TW 95144423 A TW95144423 A TW 95144423A TW 200735190 A TW200735190 A TW 200735190A
- Authority
- TW
- Taiwan
- Prior art keywords
- thin film
- film transistor
- transistor substrate
- wiring
- source
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 5
- 239000010409 thin film Substances 0.000 title abstract 5
- 229910000838 Al alloy Inorganic materials 0.000 abstract 3
- 239000010408 film Substances 0.000 abstract 3
- 239000002356 single layer Substances 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/45—Ohmic electrodes
- H01L29/456—Ohmic electrodes on silicon
- H01L29/458—Ohmic electrodes on silicon for thin film silicon, e.g. source or drain electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/4908—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET for thin film semiconductor, e.g. gate of TFT
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
- G02F1/136295—Materials; Compositions; Manufacture processes
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005349378A JP4117002B2 (ja) | 2005-12-02 | 2005-12-02 | 薄膜トランジスタ基板および表示デバイス |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200735190A true TW200735190A (en) | 2007-09-16 |
Family
ID=38092323
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095144423A TW200735190A (en) | 2005-12-02 | 2006-11-30 | Thin film transistor substrate and display device |
Country Status (6)
Country | Link |
---|---|
US (1) | US7952123B2 (zh) |
JP (1) | JP4117002B2 (zh) |
KR (1) | KR100983196B1 (zh) |
CN (1) | CN101253447B (zh) |
TW (1) | TW200735190A (zh) |
WO (1) | WO2007063991A1 (zh) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009010053A (ja) * | 2007-06-26 | 2009-01-15 | Kobe Steel Ltd | 表示装置およびスパッタリングターゲット |
JP2009076536A (ja) * | 2007-09-19 | 2009-04-09 | Mitsubishi Electric Corp | Al合金膜、電子デバイス及び電気光学表示装置用アクティブマトリックス基板 |
JP4611417B2 (ja) | 2007-12-26 | 2011-01-12 | 株式会社神戸製鋼所 | 反射電極、表示デバイス、および表示デバイスの製造方法 |
JP4469913B2 (ja) * | 2008-01-16 | 2010-06-02 | 株式会社神戸製鋼所 | 薄膜トランジスタ基板および表示デバイス |
US20110008640A1 (en) * | 2008-03-31 | 2011-01-13 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd.) | Display device, process for producing the display device, and sputtering target |
JP2009282504A (ja) * | 2008-03-31 | 2009-12-03 | Kobe Steel Ltd | 表示デバイス |
KR20100127290A (ko) * | 2008-04-23 | 2010-12-03 | 가부시키가이샤 고베 세이코쇼 | 표시 장치용 Al 합금막, 표시 장치 및 스퍼터링 타깃 |
JP2009282514A (ja) * | 2008-04-24 | 2009-12-03 | Kobe Steel Ltd | 表示装置用Al合金膜、表示装置およびスパッタリングターゲット |
JP5357515B2 (ja) * | 2008-11-05 | 2013-12-04 | 株式会社神戸製鋼所 | 表示装置用Al合金膜、表示装置およびスパッタリングターゲット |
JP5368806B2 (ja) * | 2009-01-13 | 2013-12-18 | 株式会社神戸製鋼所 | 表示装置用Al合金膜および表示装置 |
US20110198602A1 (en) * | 2008-11-05 | 2011-08-18 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Aluminum alloy film for display device, display device, and sputtering target |
JP2010134458A (ja) * | 2008-11-05 | 2010-06-17 | Kobe Steel Ltd | 表示装置用Al合金膜、表示装置およびスパッタリングターゲット |
KR101156428B1 (ko) * | 2009-06-01 | 2012-06-18 | 삼성모바일디스플레이주식회사 | 유기 발광 소자 |
KR101600887B1 (ko) * | 2009-07-06 | 2016-03-09 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판 및 이의 제조 방법 |
CN103972246B (zh) * | 2009-07-27 | 2017-05-31 | 株式会社神户制钢所 | 布线结构以及具备布线结构的显示装置 |
JP5235011B2 (ja) * | 2009-11-16 | 2013-07-10 | 株式会社神戸製鋼所 | 有機elディスプレイ用の反射アノード電極 |
JP5179604B2 (ja) * | 2010-02-16 | 2013-04-10 | 株式会社神戸製鋼所 | 表示装置用Al合金膜 |
KR101641620B1 (ko) * | 2010-08-11 | 2016-07-22 | 삼성디스플레이 주식회사 | 박막 트랜지스터 및 그를 포함하는 박막 트랜지스터 표시판 |
JP2012069808A (ja) * | 2010-09-24 | 2012-04-05 | Casio Comput Co Ltd | 薄膜トランジスタ基板の製造方法 |
KR101824537B1 (ko) * | 2010-10-01 | 2018-03-15 | 삼성디스플레이 주식회사 | 박막 트랜지스터 및 이를 포함하는 유기 발광 디스플레이 |
JP2013084907A (ja) | 2011-09-28 | 2013-05-09 | Kobe Steel Ltd | 表示装置用配線構造 |
US20130115779A1 (en) * | 2011-11-09 | 2013-05-09 | Intermolecular, Inc. | Conical Sleeves For Reactors |
KR20160105490A (ko) * | 2014-02-07 | 2016-09-06 | 가부시키가이샤 고베 세이코쇼 | 플랫 패널 디스플레이용 배선막 |
CN106771726B (zh) * | 2016-12-02 | 2019-10-22 | 深圳市华星光电技术有限公司 | 测试组件及其监控显示面板电性特性的方法、显示面板 |
JP7127685B2 (ja) * | 2018-08-08 | 2022-08-30 | 株式会社ニコン | トランジスタの製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2813234B2 (ja) | 1990-05-16 | 1998-10-22 | 日本電信電話株式会社 | 配線構造 |
JP3195837B2 (ja) | 1992-12-15 | 2001-08-06 | 松下電器産業株式会社 | 液晶表示装置およびその製造方法 |
JP2733006B2 (ja) | 1993-07-27 | 1998-03-30 | 株式会社神戸製鋼所 | 半導体用電極及びその製造方法並びに半導体用電極膜形成用スパッタリングターゲット |
EP1553205B1 (en) * | 1995-10-12 | 2017-01-25 | Kabushiki Kaisha Toshiba | Sputter target for forming thin film interconnector and thin film interconnector line |
KR100323297B1 (ko) | 1998-05-15 | 2002-02-04 | 구마모토 마사히로 | 투명도전막 |
JP2001350159A (ja) | 2000-06-06 | 2001-12-21 | Hitachi Ltd | 液晶表示装置及びその製造方法 |
US6459464B1 (en) * | 2000-08-14 | 2002-10-01 | Kabushiki Kaisha Advanced Display | Liquid crystal display device with reduced weighting trace defects |
JP2002299630A (ja) * | 2001-03-30 | 2002-10-11 | Matsushita Electric Ind Co Ltd | MoW/AlまたはAl合金/MoWの積層薄膜を用いた薄膜トランジスタおよび薄膜トランジスタアレイとその製造方法 |
JP2002368202A (ja) * | 2001-06-07 | 2002-12-20 | Canon Inc | 半導体装置、撮像装置、放射線検出装置及び放射線検出システム |
JP4783525B2 (ja) * | 2001-08-31 | 2011-09-28 | 株式会社アルバック | 薄膜アルミニウム合金及び薄膜アルミニウム合金形成用スパッタリングターゲット |
JP3940385B2 (ja) | 2002-12-19 | 2007-07-04 | 株式会社神戸製鋼所 | 表示デバイスおよびその製法 |
-
2005
- 2005-12-02 JP JP2005349378A patent/JP4117002B2/ja not_active Expired - Fee Related
-
2006
- 2006-11-30 TW TW095144423A patent/TW200735190A/zh unknown
- 2006-12-01 WO PCT/JP2006/324106 patent/WO2007063991A1/ja active Application Filing
- 2006-12-01 US US12/090,883 patent/US7952123B2/en not_active Expired - Fee Related
- 2006-12-01 CN CN2006800313832A patent/CN101253447B/zh not_active Expired - Fee Related
- 2006-12-01 KR KR1020087013036A patent/KR100983196B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2007157917A (ja) | 2007-06-21 |
KR20080063869A (ko) | 2008-07-07 |
US7952123B2 (en) | 2011-05-31 |
KR100983196B1 (ko) | 2010-09-20 |
US20090134393A1 (en) | 2009-05-28 |
JP4117002B2 (ja) | 2008-07-09 |
CN101253447A (zh) | 2008-08-27 |
CN101253447B (zh) | 2012-02-29 |
WO2007063991A1 (ja) | 2007-06-07 |
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