TW200722920A - Polymer, radiation-sensitive resin composition and spacer for liquid crystal display element - Google Patents

Polymer, radiation-sensitive resin composition and spacer for liquid crystal display element

Info

Publication number
TW200722920A
TW200722920A TW095128002A TW95128002A TW200722920A TW 200722920 A TW200722920 A TW 200722920A TW 095128002 A TW095128002 A TW 095128002A TW 95128002 A TW95128002 A TW 95128002A TW 200722920 A TW200722920 A TW 200722920A
Authority
TW
Taiwan
Prior art keywords
radiation
polymer
resin composition
sensitive resin
spacer
Prior art date
Application number
TW095128002A
Other languages
English (en)
Chinese (zh)
Inventor
Daigo Ichinohe
Isamu Yonekura
Hiroshi Shiho
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200722920A publication Critical patent/TW200722920A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
TW095128002A 2005-08-26 2006-07-31 Polymer, radiation-sensitive resin composition and spacer for liquid crystal display element TW200722920A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005246595A JP2007056221A (ja) 2005-08-26 2005-08-26 重合体、感放射線性樹脂組成物および液晶表示素子用スペーサー

Publications (1)

Publication Number Publication Date
TW200722920A true TW200722920A (en) 2007-06-16

Family

ID=37919979

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095128002A TW200722920A (en) 2005-08-26 2006-07-31 Polymer, radiation-sensitive resin composition and spacer for liquid crystal display element

Country Status (4)

Country Link
JP (1) JP2007056221A (ja)
KR (1) KR100838001B1 (ja)
CN (1) CN101130577B (ja)
TW (1) TW200722920A (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4862998B2 (ja) * 2005-07-27 2012-01-25 Ｊｓｒ株式会社 側鎖不飽和重合体、感放射線性樹脂組成物および液晶表示素子用スペーサー
JP4888640B2 (ja) * 2006-03-14 2012-02-29 Ｊｓｒ株式会社 感放射線性樹脂組成物および液晶表示素子用スペーサー
WO2008059670A1 (fr) 2006-11-15 2008-05-22 Taiyo Ink Mfg. Co., Ltd. Composition de résine photodurcissable/thermodurcissable, object durci et plaque de câblage imprimée
JP5132160B2 (ja) * 2007-02-02 2013-01-30 富士フイルム株式会社 硬化性組成物、カラーフィルタ、カラーフィルタの製造方法、及びグラフトポリマー
JP2008298859A (ja) * 2007-05-29 2008-12-11 Asahi Glass Co Ltd 感光性組成物、それを用いた隔壁、隔壁の製造方法、カラーフィルタの製造方法、有機ｅｌ表示素子の製造方法および有機ｔｆｔアレイの製造方法
CN101681097A (zh) 2007-05-29 2010-03-24 旭硝子株式会社 感光性组合物、间隔壁、黑色矩阵
JP5829932B2 (ja) * 2012-01-31 2015-12-09 大阪有機化学工業株式会社 ハードコートフィルム及びその製造に用いる樹脂組成物
KR20240001251A (ko) * 2021-06-07 2024-01-03 후지필름 가부시키가이샤 경화성 수지 조성물, 하드 코트 필름 및 하드 코트 필름의 제조 방법

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02182712A (ja) * 1989-01-10 1990-07-17 Nok Corp 新規イソシアネート基含有アクリル共重合体の製造法ならびにその組成物
JP3446274B2 (ja) * 1993-12-21 2003-09-16 三菱化学株式会社 分離剤の製造方法
DE4447550C2 (de) * 1994-09-22 1997-09-18 Dainippon Ink & Chemicals Wäßrige Polymeremulsionen
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
JP2000105456A (ja) * 1998-07-31 2000-04-11 Dainippon Printing Co Ltd 感光性樹脂組成物及びカラ―フィルタ―
KR100481601B1 (ko) * 1999-09-21 2005-04-08 주식회사 하이닉스반도체 광산 발생제와 함께 광염기 발생제를 포함하는 포토레지스트 조성물
JP4524944B2 (ja) * 2001-03-28 2010-08-18 Ｊｓｒ株式会社 感放射線性樹脂組成物、その層間絶縁膜およびマイクロレンズの形成への使用、ならびに層間絶縁膜およびマイクロレンズ
JP2002296775A (ja) * 2001-03-30 2002-10-09 Dainippon Printing Co Ltd 感光性樹脂組成物、カラーフィルター、及び、液晶パネル
KR100592418B1 (ko) * 2002-03-02 2006-06-22 주식회사 삼양이엠에스 액정표시소자 컬럼 스페이서용 레지스트 조성물
JP4244680B2 (ja) * 2003-03-31 2009-03-25 日立化成工業株式会社 感光性アルカリ可溶型組成物
JP2005010763A (ja) * 2003-05-23 2005-01-13 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
KR100673296B1 (ko) * 2003-12-18 2007-01-24 주식회사 코오롱 액정 표시 소자의 칼럼 스페이서용 감광성 수지 조성물
US7579066B2 (en) * 2004-11-04 2009-08-25 Showa Denko K.K. Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth) acrylate polymer and its use
CN101128756B (zh) * 2005-02-22 2011-08-10 日本化药株式会社 使用纤维素衍生物的相位差膜
JP2008000029A (ja) * 2006-06-20 2008-01-10 Yanmar Co Ltd コンバイン

Also Published As

Publication number Publication date
CN101130577B (zh) 2010-08-25
KR100838001B1 (ko) 2008-06-13
CN101130577A (zh) 2008-02-27
KR20070024423A (ko) 2007-03-02
JP2007056221A (ja) 2007-03-08

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