TW200711752A - Droplet discharge method, electro-optical device, and electronic device - Google Patents

Droplet discharge method, electro-optical device, and electronic device

Info

Publication number
TW200711752A
TW200711752A TW095122210A TW95122210A TW200711752A TW 200711752 A TW200711752 A TW 200711752A TW 095122210 A TW095122210 A TW 095122210A TW 95122210 A TW95122210 A TW 95122210A TW 200711752 A TW200711752 A TW 200711752A
Authority
TW
Taiwan
Prior art keywords
functional liquid
droplet discharge
prescribed portions
electro
discharge method
Prior art date
Application number
TW095122210A
Other languages
English (en)
Other versions
TWI302115B (en
Inventor
Nobuaki Nagae
Kazumi Aruga
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of TW200711752A publication Critical patent/TW200711752A/zh
Application granted granted Critical
Publication of TWI302115B publication Critical patent/TWI302115B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/06—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying two different liquids or other fluent materials, or the same liquid or other fluent material twice, to the same side of the work
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Optical Filters (AREA)
  • Ink Jet (AREA)
TW095122210A 2005-06-24 2006-06-21 Droplet discharge method, electro-optical device, and electronic device TWI302115B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005184456 2005-06-24
JP2006101642A JP4935152B2 (ja) 2005-06-24 2006-04-03 液滴吐出方法

Publications (2)

Publication Number Publication Date
TW200711752A true TW200711752A (en) 2007-04-01
TWI302115B TWI302115B (en) 2008-10-21

Family

ID=37566814

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095122210A TWI302115B (en) 2005-06-24 2006-06-21 Droplet discharge method, electro-optical device, and electronic device

Country Status (4)

Country Link
US (1) US7655270B2 (zh)
JP (1) JP4935152B2 (zh)
KR (1) KR100732028B1 (zh)
TW (1) TWI302115B (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008242058A (ja) * 2007-03-27 2008-10-09 Toray Ind Inc カラーフィルタ製造方法
JP2009169217A (ja) * 2008-01-18 2009-07-30 Seiko Epson Corp カラーフィルターの製造方法、カラーフィルター、画像表示装置、および、電子機器
JP5098788B2 (ja) * 2008-05-07 2012-12-12 セイコーエプソン株式会社 液滴吐出方法、液滴吐出装置、及びデバイス製造方法
KR101037037B1 (ko) 2008-05-29 2011-05-25 파나소닉 주식회사 유기 ｅｌ 디스플레이 및 그 제조 방법
JP5707019B2 (ja) * 2008-08-26 2015-04-22 セイコーエプソン株式会社 電気光学装置および電子機器
JP2010082581A (ja) * 2008-10-01 2010-04-15 Ulvac Japan Ltd 微粒子塗布方法
JP5126185B2 (ja) * 2009-08-26 2013-01-23 カシオ計算機株式会社 塗布装置
KR101174878B1 (ko) * 2010-02-16 2012-08-17 삼성디스플레이 주식회사 인쇄 방법 및 인쇄 장치
JP2017042708A (ja) * 2015-08-26 2017-03-02 セイコーエプソン株式会社 液滴吐出方法、プログラム、有機ｅｌ装置の製造方法、カラーフィルターの形成方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001010067A (ja) 1999-06-29 2001-01-16 Canon Inc 液体噴射記録ヘッドの吐出ノズル加工方法および液体噴射記録ヘッドの製造方法
JP3697131B2 (ja) 2000-02-21 2005-09-21 キヤノン株式会社 カラーフィルタの製造方法、製造装置、カラーフィルタを備えた表示装置の製造方法及び該表示装置を備えた装置の製造方法
JP2002221616A (ja) * 2000-11-21 2002-08-09 Seiko Epson Corp カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置、インクジェットヘッドの制御装置、材料の吐出方法及び材料の吐出装置、並びに電子機器
JP3781987B2 (ja) 2001-07-10 2006-06-07 セイコーエプソン株式会社 フィルタの製造方法
JP2003232912A (ja) 2002-02-07 2003-08-22 Matsushita Electric Ind Co Ltd 画像表示素子の製造装置及びその製造方法
JP2004209409A (ja) 2003-01-06 2004-07-29 Seiko Epson Corp 基板の製造方法、液滴吐出装置、有機エレクトロルミネッセンス表示装置、および、電子機器
JP4023344B2 (ja) 2003-03-10 2007-12-19 セイコーエプソン株式会社 描画装置、電気光学装置の製造方法、電気光学装置、および電子機器
JP4742487B2 (ja) 2003-05-09 2011-08-10 セイコーエプソン株式会社 膜パターン形成方法
JP2004361491A (ja) * 2003-06-02 2004-12-24 Seiko Epson Corp カラーフィルタ基板の製造方法、エレクトロルミネッセンス基板の製造方法、電気光学装置及びその製造方法、並びに電子機器及びその製造方法
JP4363094B2 (ja) * 2003-06-27 2009-11-11 セイコーエプソン株式会社 液滴吐出装置の液滴吐出方法および液滴吐出装置、並びにカラーフィルタ表示装置の製造方法、エレクトロルミネッサンス表示装置の製造方法、プラズマ表示装置の製造方法
JP2005022115A (ja) * 2003-06-30 2005-01-27 Fuji Xerox Co Ltd 印字装置、印字ヘッドキャリッジ速度制御方法及び該方法を実行するためのプログラム
JP4748955B2 (ja) * 2003-06-30 2011-08-17 株式会社半導体エネルギー研究所 パターンの作製方法
JP4214876B2 (ja) * 2003-09-29 2009-01-28 セイコーエプソン株式会社 カラーフィルタ基板、カラーフィルタ基板の製造方法、カラーフィルタ基板の製造装置、液晶装置、並びに液晶装置の製造方法
JP2006326541A (ja) * 2005-05-30 2006-12-07 Seiko Epson Corp 液滴吐出方法、ヘッドユニット、液滴吐出装置、電気光学装置及び電子機器
JP4345716B2 (ja) * 2005-06-10 2009-10-14 セイコーエプソン株式会社 液滴吐出方法

Also Published As

Publication number Publication date
US20060290764A1 (en) 2006-12-28
TWI302115B (en) 2008-10-21
KR20060135516A (ko) 2006-12-29
JP2007029946A (ja) 2007-02-08
KR100732028B1 (ko) 2007-06-27
US7655270B2 (en) 2010-02-02
JP4935152B2 (ja) 2012-05-23

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees