TW200711027A - Substrate processing system and substrate processing method - Google Patents
Substrate processing system and substrate processing methodInfo
- Publication number
- TW200711027A TW200711027A TW095120073A TW95120073A TW200711027A TW 200711027 A TW200711027 A TW 200711027A TW 095120073 A TW095120073 A TW 095120073A TW 95120073 A TW95120073 A TW 95120073A TW 200711027 A TW200711027 A TW 200711027A
- Authority
- TW
- Taiwan
- Prior art keywords
- transportation
- substrate
- substrate processing
- processing system
- module
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Automation & Control Theory (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Multi-Process Working Machines And Systems (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005166939A JP4716362B2 (ja) | 2005-06-07 | 2005-06-07 | 基板処理システム及び基板処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200711027A true TW200711027A (en) | 2007-03-16 |
TWI305943B TWI305943B (en) | 2009-02-01 |
Family
ID=37494719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095120073A TWI305943B (en) | 2005-06-07 | 2006-06-06 | Substrate processing system and substrate processing method |
Country Status (5)
Country | Link |
---|---|
US (2) | US7645713B2 (zh) |
JP (1) | JP4716362B2 (zh) |
KR (1) | KR101092065B1 (zh) |
CN (1) | CN1877451B (zh) |
TW (1) | TWI305943B (zh) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4999415B2 (ja) * | 2006-09-29 | 2012-08-15 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法並びに基板処理装置の用力供給装置及び基板処理装置の用力供給方法 |
TW200919117A (en) * | 2007-08-28 | 2009-05-01 | Tokyo Electron Ltd | Coating-developing apparatus, coating-developing method and storage medium |
JP5458633B2 (ja) * | 2008-06-20 | 2014-04-02 | 株式会社Ihi | 処理設備及び搬送制御方法 |
JP4954162B2 (ja) * | 2008-08-29 | 2012-06-13 | 東京エレクトロン株式会社 | 処理システム |
JP5469015B2 (ja) * | 2009-09-30 | 2014-04-09 | 東京エレクトロン株式会社 | 基板処理装置および基板搬送方法 |
JP5713081B2 (ja) * | 2010-07-09 | 2015-05-07 | 東京エレクトロン株式会社 | 塗布、現像装置 |
JP2012080077A (ja) * | 2010-09-06 | 2012-04-19 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
JP5566265B2 (ja) * | 2010-11-09 | 2014-08-06 | 東京エレクトロン株式会社 | 基板処理装置、プログラム、コンピュータ記憶媒体及び基板の搬送方法 |
US9196551B2 (en) * | 2011-08-26 | 2015-11-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Automatically adjusting baking process for low-k dielectric material |
JP5459279B2 (ja) * | 2011-09-02 | 2014-04-02 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
JP6105982B2 (ja) * | 2012-09-21 | 2017-03-29 | 株式会社Screenホールディングス | スケジュール作成装置、基板処理装置、スケジュール作成プログラム、スケジュール作成方法、および基板処理方法 |
JP6003859B2 (ja) * | 2013-09-18 | 2016-10-05 | 東京エレクトロン株式会社 | 塗布、現像装置、塗布、現像方法及び記憶媒体 |
US10354902B2 (en) * | 2015-12-08 | 2019-07-16 | Murata Machinery, Ltd. | Conveyance system |
JP7302358B2 (ja) * | 2019-01-28 | 2023-07-04 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10112487A (ja) * | 1996-10-07 | 1998-04-28 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2001093791A (ja) * | 1999-09-20 | 2001-04-06 | Hitachi Ltd | 真空処理装置の運転方法及びウエハの処理方法 |
JP2002110496A (ja) * | 2000-09-27 | 2002-04-12 | Hitachi Kokusai Electric Inc | 半導体製造装置 |
JP3862596B2 (ja) * | 2002-05-01 | 2006-12-27 | 東京エレクトロン株式会社 | 基板処理方法 |
JP4342147B2 (ja) * | 2002-05-01 | 2009-10-14 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP4087328B2 (ja) | 2002-11-28 | 2008-05-21 | 東京エレクトロン株式会社 | 塗布、現像装置及び塗布、現像装置の運転方法 |
JP4302575B2 (ja) * | 2003-05-30 | 2009-07-29 | 東京エレクトロン株式会社 | 基板搬送装置および真空処理装置 |
JP4202220B2 (ja) * | 2003-09-22 | 2008-12-24 | 大日本スクリーン製造株式会社 | 検査装置、基板処理装置および基板処理方法 |
-
2005
- 2005-06-07 JP JP2005166939A patent/JP4716362B2/ja not_active Expired - Fee Related
-
2006
- 2006-05-19 US US11/436,810 patent/US7645713B2/en not_active Expired - Fee Related
- 2006-06-05 KR KR1020060050415A patent/KR101092065B1/ko active IP Right Grant
- 2006-06-06 TW TW095120073A patent/TWI305943B/zh active
- 2006-06-07 CN CN200610091623XA patent/CN1877451B/zh active Active
-
2009
- 2009-11-18 US US12/621,252 patent/US7880859B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US7645713B2 (en) | 2010-01-12 |
CN1877451A (zh) | 2006-12-13 |
KR20060127795A (ko) | 2006-12-13 |
US7880859B2 (en) | 2011-02-01 |
CN1877451B (zh) | 2011-05-25 |
TWI305943B (en) | 2009-02-01 |
JP2006344658A (ja) | 2006-12-21 |
KR101092065B1 (ko) | 2011-12-12 |
US20100063623A1 (en) | 2010-03-11 |
US20060276046A1 (en) | 2006-12-07 |
JP4716362B2 (ja) | 2011-07-06 |
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