TW200708066A - Method and apparatus for obtaining the data of tracing points and the method and apparatus for tracing - Google Patents
Method and apparatus for obtaining the data of tracing points and the method and apparatus for tracingInfo
- Publication number
- TW200708066A TW200708066A TW095111174A TW95111174A TW200708066A TW 200708066 A TW200708066 A TW 200708066A TW 095111174 A TW095111174 A TW 095111174A TW 95111174 A TW95111174 A TW 95111174A TW 200708066 A TW200708066 A TW 200708066A
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure
- data
- board
- points
- tracing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005103787 | 2005-03-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200708066A true TW200708066A (en) | 2007-02-16 |
Family
ID=37073309
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095111174A TW200708066A (en) | 2005-03-31 | 2006-03-30 | Method and apparatus for obtaining the data of tracing points and the method and apparatus for tracing |
Country Status (5)
Country | Link |
---|---|
US (1) | US20090115981A1 (zh) |
KR (1) | KR101261353B1 (zh) |
CN (1) | CN101171826A (zh) |
TW (1) | TW200708066A (zh) |
WO (1) | WO2006106746A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101692265B1 (ko) * | 2009-12-08 | 2017-01-04 | 삼성전자 주식회사 | 마스크리스 노광 장치와 이를 이용한 패턴 보정 방법 |
KR101698141B1 (ko) * | 2009-12-08 | 2017-01-19 | 삼성전자 주식회사 | 마스크리스 노광장치 및 그 제어방법 |
JP5813555B2 (ja) * | 2012-03-30 | 2015-11-17 | 株式会社アドテックエンジニアリング | 露光描画装置及び露光描画方法 |
US9395631B2 (en) * | 2014-04-01 | 2016-07-19 | Applied Materials, Inc. | Multi-beam pattern generators employing yaw correction when writing upon large substrates, and associated methods |
WO2017104717A1 (ja) * | 2015-12-17 | 2017-06-22 | 株式会社ニコン | パターン描画装置 |
US10719018B2 (en) * | 2018-07-10 | 2020-07-21 | Applied Materials, Inc. | Dynamic imaging system |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003234968A (ja) * | 1992-04-09 | 2003-08-22 | Olympus Optical Co Ltd | 画像処理装置及び撮像装置 |
US6205259B1 (en) * | 1992-04-09 | 2001-03-20 | Olympus Optical Co., Ltd. | Image processing apparatus |
JPH0991416A (ja) * | 1995-09-26 | 1997-04-04 | Dainippon Screen Mfg Co Ltd | 画像の傾き補正装置および画像の傾き補正方法 |
JP2000122303A (ja) * | 1998-10-20 | 2000-04-28 | Asahi Optical Co Ltd | 描画装置 |
JP4113418B2 (ja) * | 2002-11-15 | 2008-07-09 | 富士フイルム株式会社 | 露光装置 |
JP4315694B2 (ja) * | 2003-01-31 | 2009-08-19 | 富士フイルム株式会社 | 描画ヘッドユニット、描画装置及び描画方法 |
EP1482373A1 (en) * | 2003-05-30 | 2004-12-01 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE10325183B4 (de) * | 2003-06-04 | 2013-01-31 | Robert Bosch Gmbh | Verfahren und Vorrichtung zur Durchführung eines Verfahrens zur Ermittlung des Beladungszustands eines in einem Abgasbereich einer Brennkraftmaschine angeordneten Bauteils |
JP2005031274A (ja) * | 2003-07-10 | 2005-02-03 | Fuji Photo Film Co Ltd | 画像記録装置及び画像記録方法 |
EP1494077A3 (en) * | 2003-07-02 | 2006-12-27 | Fuji Photo Film Co., Ltd. | Image forming apparatus and image forming method |
-
2006
- 2006-03-29 CN CNA2006800155665A patent/CN101171826A/zh active Pending
- 2006-03-29 WO PCT/JP2006/306493 patent/WO2006106746A1/ja active Application Filing
- 2006-03-29 US US11/910,253 patent/US20090115981A1/en not_active Abandoned
- 2006-03-29 KR KR1020077023471A patent/KR101261353B1/ko not_active IP Right Cessation
- 2006-03-30 TW TW095111174A patent/TW200708066A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR20070116100A (ko) | 2007-12-06 |
WO2006106746A1 (ja) | 2006-10-12 |
CN101171826A (zh) | 2008-04-30 |
KR101261353B1 (ko) | 2013-05-09 |
US20090115981A1 (en) | 2009-05-07 |
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