TW200641555A - Exposure table and exposure device - Google Patents

Exposure table and exposure device

Info

Publication number
TW200641555A
TW200641555A TW095107540A TW95107540A TW200641555A TW 200641555 A TW200641555 A TW 200641555A TW 095107540 A TW095107540 A TW 095107540A TW 95107540 A TW95107540 A TW 95107540A TW 200641555 A TW200641555 A TW 200641555A
Authority
TW
Taiwan
Prior art keywords
substrate
suction holes
suction
exposure
mount plate
Prior art date
Application number
TW095107540A
Other languages
English (en)
Other versions
TWI414895B (zh
Inventor
Masaru Ise
Shinichiro Mizuguchi
Original Assignee
Orc Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Mfg Co Ltd filed Critical Orc Mfg Co Ltd
Publication of TW200641555A publication Critical patent/TW200641555A/zh
Application granted granted Critical
Publication of TWI414895B publication Critical patent/TWI414895B/zh

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW95107540A 2005-03-28 2006-03-07 Exposure desk and exposure device TWI414895B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005090361A JP2006276084A (ja) 2005-03-28 2005-03-28 露光テーブルおよび露光装置

Publications (2)

Publication Number Publication Date
TW200641555A true TW200641555A (en) 2006-12-01
TWI414895B TWI414895B (zh) 2013-11-11

Family

ID=37030278

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95107540A TWI414895B (zh) 2005-03-28 2006-03-07 Exposure desk and exposure device

Country Status (3)

Country Link
JP (1) JP2006276084A (zh)
CN (1) CN100487585C (zh)
TW (1) TWI414895B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI410192B (zh) * 2008-02-04 2013-09-21 Chime Ball Technology Co Ltd 印刷電路板雙面曝光架構及雙面曝光方法
TWI427426B (zh) * 2007-05-29 2014-02-21 Orc Mfg Co Ltd Drawing device

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009157247A (ja) * 2007-12-27 2009-07-16 Orc Mfg Co Ltd 露光装置
CN101916049B (zh) * 2010-08-02 2012-04-25 友达光电股份有限公司 工作台
CN104898379B (zh) * 2015-06-10 2017-11-21 兰州大学 一种激光直写机特殊样品套刻的样品台
JP6663252B2 (ja) * 2016-03-01 2020-03-11 株式会社アドテックエンジニアリング プリント基板用露光装置
CN106154769A (zh) * 2016-08-25 2016-11-23 中国电子科技集团公司第十研究所 薄膜电路带孔瓷片光刻真空夹具
CN106527062B (zh) * 2017-01-11 2018-11-27 惠科股份有限公司 一种曝光机及其图像偏移防治方法和系统
CN107949175B (zh) * 2018-01-03 2024-05-03 环维电子(上海)有限公司 电路板固定机构、移转系统、表面贴装生产线及方法
CN110323170B (zh) * 2018-03-30 2022-06-03 上海微电子装备（集团）股份有限公司 吸附装置和调节物料平面度的方法
JP7239388B2 (ja) * 2019-05-09 2023-03-14 株式会社アドテックエンジニアリング 直描式露光装置
JP6789368B2 (ja) * 2019-12-25 2020-11-25 株式会社アドテックエンジニアリング プリント基板用露光装置
CN115623690A (zh) * 2022-07-20 2023-01-17 上海美维电子有限公司 印刷线路板自动曝光固定方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2565673Y2 (ja) * 1990-10-02 1998-03-18 日東電工株式会社 ウエハの保持装置
JP2895982B2 (ja) * 1991-04-27 1999-05-31 株式会社半導体エネルギー研究所 フィルム状部品用吸着ヘッド
JPH05235151A (ja) * 1992-02-20 1993-09-10 Canon Inc 基板保持盤
JPH0745692A (ja) * 1993-07-26 1995-02-14 Nikon Corp 基板の吸着保持装置
JP2664641B2 (ja) * 1994-11-29 1997-10-15 シーケーディ株式会社 真空チャックの吸着プレート
JPH08314149A (ja) * 1995-05-16 1996-11-29 Orc Mfg Co Ltd 精密片面露光装置および露光方法
JPH1092728A (ja) * 1996-09-11 1998-04-10 Canon Inc 基板保持装置およびこれを用いた露光装置
JPH1167882A (ja) * 1997-08-22 1999-03-09 Nikon Corp 基板吸着装置及び基板吸着方法
JP2000012663A (ja) * 1998-06-17 2000-01-14 Nikon Corp 基板保持方法及び装置、及びそれを備えた露光装置
JP2002217276A (ja) * 2001-01-17 2002-08-02 Ushio Inc ステージ装置
JP2002317810A (ja) * 2001-04-20 2002-10-31 Howa Mach Ltd プリント基板材の吸着構造
JP4288694B2 (ja) * 2001-12-20 2009-07-01 株式会社ニコン 基板保持装置、露光装置及びデバイス製造方法
JP2004006485A (ja) * 2002-05-31 2004-01-08 Toshiba Ceramics Co Ltd 真空吸着ステージ
JP2004087833A (ja) * 2002-08-27 2004-03-18 Nikon Corp 基板保持装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI427426B (zh) * 2007-05-29 2014-02-21 Orc Mfg Co Ltd Drawing device
TWI410192B (zh) * 2008-02-04 2013-09-21 Chime Ball Technology Co Ltd 印刷電路板雙面曝光架構及雙面曝光方法

Also Published As

Publication number Publication date
CN100487585C (zh) 2009-05-13
TWI414895B (zh) 2013-11-11
CN1841202A (zh) 2006-10-04
JP2006276084A (ja) 2006-10-12

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees