TW200620454A - Plasma processing apparatus and impedance control method - Google Patents
Plasma processing apparatus and impedance control methodInfo
- Publication number
- TW200620454A TW200620454A TW094118229A TW94118229A TW200620454A TW 200620454 A TW200620454 A TW 200620454A TW 094118229 A TW094118229 A TW 094118229A TW 94118229 A TW94118229 A TW 94118229A TW 200620454 A TW200620454 A TW 200620454A
- Authority
- TW
- Taiwan
- Prior art keywords
- electrode
- plasma processing
- processing apparatus
- variable capacitor
- plasma
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004165074 | 2004-06-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200620454A true TW200620454A (en) | 2006-06-16 |
TWI374491B TWI374491B (ko) | 2012-10-11 |
Family
ID=35577442
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094118229A TW200620454A (en) | 2004-06-02 | 2005-06-02 | Plasma processing apparatus and impedance control method |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR100710923B1 (ko) |
CN (1) | CN100435273C (ko) |
TW (1) | TW200620454A (ko) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI549182B (zh) * | 2013-02-12 | 2016-09-11 | Hitachi High Tech Corp | Plasma processing device |
TWI570769B (ko) * | 2014-10-22 | 2017-02-11 | ||
US10418254B2 (en) | 2017-08-23 | 2019-09-17 | Hitachi High-Technologies Corporation | Etching method and etching apparatus |
US11217454B2 (en) | 2019-04-22 | 2022-01-04 | Hitachi High-Tech Corporation | Plasma processing method and etching apparatus |
US11875978B2 (en) | 2020-06-16 | 2024-01-16 | Hitachi High-Tech Corporation | Plasma processing apparatus and plasma processing method |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4882824B2 (ja) | 2007-03-27 | 2012-02-22 | 東京エレクトロン株式会社 | プラズマ処理装置、プラズマ処理方法及び記憶媒体 |
CN100595886C (zh) * | 2008-09-26 | 2010-03-24 | 中国科学院微电子研究所 | 一种消除反应离子刻蚀自偏压的方法及系统 |
JP5666888B2 (ja) * | 2010-11-25 | 2015-02-12 | 東京エレクトロン株式会社 | プラズマ処理装置及び処理システム |
GB201609119D0 (en) * | 2016-05-24 | 2016-07-06 | Spts Technologies Ltd | A method of cleaning a plasma processing module |
KR101813497B1 (ko) | 2016-06-24 | 2018-01-02 | (주)제이하라 | 플라즈마 발생장치 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5874704A (en) * | 1995-06-30 | 1999-02-23 | Lam Research Corporation | Low inductance large area coil for an inductively coupled plasma source |
KR100234912B1 (ko) * | 1997-01-23 | 1999-12-15 | 윤종용 | 직류 전압을 제어하기 위한 hdp cvd 설비의 세정 장치 및 방법 |
KR20000027767A (ko) * | 1998-10-29 | 2000-05-15 | 김영환 | 플라즈마 장치 |
US6349670B1 (en) * | 1998-11-30 | 2002-02-26 | Alps Electric Co., Ltd. | Plasma treatment equipment |
JP4230029B2 (ja) * | 1998-12-02 | 2009-02-25 | 東京エレクトロン株式会社 | プラズマ処理装置およびエッチング方法 |
US6857387B1 (en) * | 2000-05-03 | 2005-02-22 | Applied Materials, Inc. | Multiple frequency plasma chamber with grounding capacitor at cathode |
JP4514911B2 (ja) * | 2000-07-19 | 2010-07-28 | 東京エレクトロン株式会社 | プラズマ処理装置 |
KR100396214B1 (ko) * | 2001-06-19 | 2003-09-02 | 주성엔지니어링(주) | 초단파 병렬 공명 안테나를 구비하는 플라즈마 공정장치 |
JP4370789B2 (ja) | 2002-07-12 | 2009-11-25 | 東京エレクトロン株式会社 | プラズマ処理装置及び可変インピーダンス手段の校正方法 |
-
2005
- 2005-06-01 KR KR1020050046812A patent/KR100710923B1/ko active IP Right Grant
- 2005-06-02 CN CNB2005100735526A patent/CN100435273C/zh not_active Expired - Fee Related
- 2005-06-02 TW TW094118229A patent/TW200620454A/zh not_active IP Right Cessation
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI549182B (zh) * | 2013-02-12 | 2016-09-11 | Hitachi High Tech Corp | Plasma processing device |
US10332760B2 (en) | 2013-02-12 | 2019-06-25 | Hitachi High-Technologies Corporation | Method for controlling plasma processing apparatus |
TWI570769B (ko) * | 2014-10-22 | 2017-02-11 | ||
US10418254B2 (en) | 2017-08-23 | 2019-09-17 | Hitachi High-Technologies Corporation | Etching method and etching apparatus |
US11217454B2 (en) | 2019-04-22 | 2022-01-04 | Hitachi High-Tech Corporation | Plasma processing method and etching apparatus |
US11875978B2 (en) | 2020-06-16 | 2024-01-16 | Hitachi High-Tech Corporation | Plasma processing apparatus and plasma processing method |
Also Published As
Publication number | Publication date |
---|---|
TWI374491B (ko) | 2012-10-11 |
KR100710923B1 (ko) | 2007-04-23 |
CN1705079A (zh) | 2005-12-07 |
KR20060046381A (ko) | 2006-05-17 |
CN100435273C (zh) | 2008-11-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |