TWI570769B - - Google Patents

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Publication number
TWI570769B
TWI570769B TW103145593A TW103145593A TWI570769B TW I570769 B TWI570769 B TW I570769B TW 103145593 A TW103145593 A TW 103145593A TW 103145593 A TW103145593 A TW 103145593A TW I570769 B TWI570769 B TW I570769B
Authority
TW
Taiwan
Application number
TW103145593A
Other languages
Chinese (zh)
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TW201616547A (zh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Publication of TW201616547A publication Critical patent/TW201616547A/zh
Application granted granted Critical
Publication of TWI570769B publication Critical patent/TWI570769B/zh

Links

TW103145593A 2014-10-22 2014-12-25 自動頻率調諧阻抗匹配的匹配頻率的獲取方法和裝置 TW201616547A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410568232.7A CN105591629B (zh) 2014-10-22 2014-10-22 自动频率调谐阻抗匹配的匹配频率的获取方法和装置

Publications (2)

Publication Number Publication Date
TW201616547A TW201616547A (zh) 2016-05-01
TWI570769B true TWI570769B (ko) 2017-02-11

Family

ID=55930935

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103145593A TW201616547A (zh) 2014-10-22 2014-12-25 自動頻率調諧阻抗匹配的匹配頻率的獲取方法和裝置

Country Status (2)

Country Link
CN (1) CN105591629B (ko)
TW (1) TW201616547A (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106287866B (zh) * 2016-08-04 2018-11-23 广东美的厨房电器制造有限公司 半导体微波炉的控制方法、装置及半导体微波炉
KR102126937B1 (ko) * 2018-12-03 2020-06-25 주식회사 뉴파워 프라즈마 역방향 전력 저감 방법 및 이를 이용한 플라즈마 전력 장치
CN109613334B (zh) * 2018-12-04 2022-02-25 上海司南卫星导航技术股份有限公司 一种频率估计装置、终端以及计算机可读介质
CN111293022B (zh) * 2018-12-07 2023-01-24 中微半导体设备(上海)股份有限公司 脉冲射频等离子体的阻抗匹配方法和装置
US11158488B2 (en) 2019-06-26 2021-10-26 Mks Instruments, Inc. High speed synchronization of plasma source/bias power delivery
CN112272031A (zh) * 2020-08-26 2021-01-26 华南理工大学 一种天线阻抗自动匹配方法和系统
CN114188204B (zh) * 2020-09-14 2023-10-31 中微半导体设备(上海)股份有限公司 一种等离子体处理方法、射频发生器以及装置
CN113065237B (zh) * 2021-03-19 2022-11-08 四川英杰电气股份有限公司 一种自动设置调频边界的方法和射频电源
JP2023183584A (ja) * 2022-06-16 2023-12-28 東京エレクトロン株式会社 高周波電源、プラズマ処理装置、及び整合方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200620454A (en) * 2004-06-02 2006-06-16 Tokyo Electron Ltd Plasma processing apparatus and impedance control method
TW201340790A (zh) * 2011-11-10 2013-10-01 Tokyo Electron Ltd 基板處理裝置
TW201417138A (zh) * 2012-10-16 2014-05-01 Advanced Micro Fab Equip Inc 等離子處理裝置的等離子處理方法
US20140197731A1 (en) * 2013-01-11 2014-07-17 John C. Valcore, JR. Tuning A Parameter Associated With Plasma Impedance
TW201435957A (zh) * 2013-01-17 2014-09-16 Advanced Micro Fab Equip Inc 一種等離子處理裝置的等離子處理方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7839223B2 (en) * 2008-03-23 2010-11-23 Advanced Energy Industries, Inc. Method and apparatus for advanced frequency tuning

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200620454A (en) * 2004-06-02 2006-06-16 Tokyo Electron Ltd Plasma processing apparatus and impedance control method
TW201340790A (zh) * 2011-11-10 2013-10-01 Tokyo Electron Ltd 基板處理裝置
TW201417138A (zh) * 2012-10-16 2014-05-01 Advanced Micro Fab Equip Inc 等離子處理裝置的等離子處理方法
US20140197731A1 (en) * 2013-01-11 2014-07-17 John C. Valcore, JR. Tuning A Parameter Associated With Plasma Impedance
TW201435957A (zh) * 2013-01-17 2014-09-16 Advanced Micro Fab Equip Inc 一種等離子處理裝置的等離子處理方法

Also Published As

Publication number Publication date
CN105591629A (zh) 2016-05-18
TW201616547A (zh) 2016-05-01
CN105591629B (zh) 2018-01-26

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