TW200611783A - Polishing pad - Google Patents
Polishing padInfo
- Publication number
- TW200611783A TW200611783A TW094125626A TW94125626A TW200611783A TW 200611783 A TW200611783 A TW 200611783A TW 094125626 A TW094125626 A TW 094125626A TW 94125626 A TW94125626 A TW 94125626A TW 200611783 A TW200611783 A TW 200611783A
- Authority
- TW
- Taiwan
- Prior art keywords
- range
- polishing pad
- pad body
- pad
- rate
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title abstract 4
- 230000006835 compression Effects 0.000 abstract 4
- 238000007906 compression Methods 0.000 abstract 4
- 238000011084 recovery Methods 0.000 abstract 2
- 239000006260 foam Substances 0.000 abstract 1
- 229920003002 synthetic resin Polymers 0.000 abstract 1
- 239000000057 synthetic resin Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24628—Nonplanar uniform thickness material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24628—Nonplanar uniform thickness material
- Y10T428/24669—Aligned or parallel nonplanarities
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004299838A JP2006110665A (ja) | 2004-10-14 | 2004-10-14 | 研磨パッド |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200611783A true TW200611783A (en) | 2006-04-16 |
Family
ID=36148166
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094125626A TW200611783A (en) | 2004-10-14 | 2005-07-28 | Polishing pad |
Country Status (7)
Country | Link |
---|---|
US (1) | US20060229000A1 (zh) |
EP (1) | EP1800800A4 (zh) |
JP (1) | JP2006110665A (zh) |
KR (1) | KR100804344B1 (zh) |
CN (1) | CN1905991A (zh) |
TW (1) | TW200611783A (zh) |
WO (1) | WO2006040864A1 (zh) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005007520A (ja) * | 2003-06-19 | 2005-01-13 | Nihon Micro Coating Co Ltd | 研磨パッド及びその製造方法並びに研磨方法 |
JP5288715B2 (ja) * | 2007-03-14 | 2013-09-11 | 東洋ゴム工業株式会社 | 研磨パッド |
JP2008290197A (ja) * | 2007-05-25 | 2008-12-04 | Nihon Micro Coating Co Ltd | 研磨パッド及び方法 |
JP5078527B2 (ja) * | 2007-09-28 | 2012-11-21 | 富士紡ホールディングス株式会社 | 研磨布 |
CN107199502A (zh) * | 2008-04-23 | 2017-09-26 | 日立化成株式会社 | 研磨剂、研磨剂组件及使用该研磨剂的基板研磨方法 |
JP2010118424A (ja) * | 2008-11-12 | 2010-05-27 | Disco Abrasive Syst Ltd | 薄板状ワークの搬送装置 |
JP5404107B2 (ja) * | 2009-03-10 | 2014-01-29 | キヤノン株式会社 | 研磨工具 |
JP5276502B2 (ja) * | 2009-04-03 | 2013-08-28 | 東洋ゴム工業株式会社 | 研磨パッド及びその製造方法 |
TWI410299B (zh) | 2009-08-24 | 2013-10-01 | Bestac Advanced Material Co Ltd | 研磨墊與其應用及其製造方法 |
CN102029571B (zh) * | 2009-09-24 | 2015-07-29 | 贝达先进材料股份有限公司 | 研磨垫与其应用和其制造方法 |
JP5528169B2 (ja) | 2010-03-26 | 2014-06-25 | 東洋ゴム工業株式会社 | 研磨パッドおよびその製造方法、ならびに半導体デバイスの製造方法 |
WO2012056512A1 (ja) | 2010-10-26 | 2012-05-03 | 東洋ゴム工業株式会社 | 研磨パッド及びその製造方法 |
KR101491530B1 (ko) | 2010-10-26 | 2015-02-09 | 도요 고무 고교 가부시키가이샤 | 연마 패드 및 그 제조 방법 |
KR101532990B1 (ko) * | 2011-09-22 | 2015-07-01 | 도요 고무 고교 가부시키가이샤 | 연마 패드 |
KR101267982B1 (ko) * | 2011-12-13 | 2013-05-27 | 삼성코닝정밀소재 주식회사 | 반도체 기판의 연마방법 및 반도체 기판의 연마장치 |
WO2013129426A1 (ja) * | 2012-02-27 | 2013-09-06 | 東レ株式会社 | 研磨パッド |
US9156125B2 (en) * | 2012-04-11 | 2015-10-13 | Cabot Microelectronics Corporation | Polishing pad with light-stable light-transmitting region |
WO2016123505A1 (en) * | 2015-01-30 | 2016-08-04 | Applied Materials, Inc. | Multi-layered nano-fibrous cmp pads |
KR102463863B1 (ko) * | 2015-07-20 | 2022-11-04 | 삼성전자주식회사 | 연마용 조성물 및 이를 이용한 반도체 장치의 제조 방법 |
JP2018524193A (ja) * | 2015-07-30 | 2018-08-30 | ジェイエイチ ローデス カンパニー, インコーポレイテッド | ポリマーラップ加工材料、ポリマーラップ加工材料を含む媒体およびシステム、およびそれらを形成し使用する方法 |
JP2018029142A (ja) * | 2016-08-18 | 2018-02-22 | 株式会社クラレ | 研磨パッド及びそれを用いた研磨方法 |
CN111818835A (zh) * | 2018-03-13 | 2020-10-23 | 3M创新有限公司 | 地板刷毛刷组件 |
JP7264775B2 (ja) * | 2019-09-03 | 2023-04-25 | エヌ・ティ・ティ・アドバンステクノロジ株式会社 | 光コネクタ研磨用パッド |
KR102309564B1 (ko) * | 2020-02-25 | 2021-10-07 | 주식회사 세한텍 | 유리 시트 연마 휠 및 그 제조 방법 |
CN112338820B (zh) * | 2020-10-27 | 2021-10-29 | 湖北鼎汇微电子材料有限公司 | 一种抛光垫及其制备方法、应用 |
CN112720282B (zh) * | 2020-12-31 | 2022-04-08 | 湖北鼎汇微电子材料有限公司 | 一种抛光垫 |
CN112809550B (zh) * | 2020-12-31 | 2022-04-22 | 湖北鼎汇微电子材料有限公司 | 一种抛光垫 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5514245A (en) * | 1992-01-27 | 1996-05-07 | Micron Technology, Inc. | Method for chemical planarization (CMP) of a semiconductor wafer to provide a planar surface free of microscratches |
JP2000263423A (ja) * | 1999-03-16 | 2000-09-26 | Toray Ind Inc | 研磨パッドおよび研磨装置 |
JP2001198795A (ja) * | 2000-01-12 | 2001-07-24 | Mitsubishi Materials Corp | 研磨装置 |
JP4591980B2 (ja) * | 2000-02-22 | 2010-12-01 | 東洋ゴム工業株式会社 | 研磨パッド及びその製造方法 |
US6641471B1 (en) * | 2000-09-19 | 2003-11-04 | Rodel Holdings, Inc | Polishing pad having an advantageous micro-texture and methods relating thereto |
CN100379522C (zh) * | 2000-12-01 | 2008-04-09 | 东洋橡膠工业株式会社 | 研磨垫及其制造方法和研磨垫用缓冲层 |
JP2002343749A (ja) * | 2001-05-11 | 2002-11-29 | Ntn Corp | ポリッシング定盤および研磨品製造方法 |
JP2004025407A (ja) * | 2002-06-27 | 2004-01-29 | Jsr Corp | 化学機械研磨用研磨パッド |
US7579071B2 (en) * | 2002-09-17 | 2009-08-25 | Korea Polyol Co., Ltd. | Polishing pad containing embedded liquid microelements and method of manufacturing the same |
US6848977B1 (en) * | 2003-08-29 | 2005-02-01 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Polishing pad for electrochemical mechanical polishing |
-
2004
- 2004-10-14 JP JP2004299838A patent/JP2006110665A/ja active Pending
-
2005
- 2005-07-13 CN CNA2005800015970A patent/CN1905991A/zh active Pending
- 2005-07-13 EP EP05765668A patent/EP1800800A4/en not_active Withdrawn
- 2005-07-13 KR KR1020067005259A patent/KR100804344B1/ko not_active IP Right Cessation
- 2005-07-13 WO PCT/JP2005/012903 patent/WO2006040864A1/ja active Application Filing
- 2005-07-28 TW TW094125626A patent/TW200611783A/zh unknown
-
2006
- 2006-06-05 US US11/447,425 patent/US20060229000A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2006110665A (ja) | 2006-04-27 |
EP1800800A1 (en) | 2007-06-27 |
KR20060080201A (ko) | 2006-07-07 |
US20060229000A1 (en) | 2006-10-12 |
WO2006040864A1 (ja) | 2006-04-20 |
EP1800800A4 (en) | 2010-10-20 |
KR100804344B1 (ko) | 2008-02-15 |
CN1905991A (zh) | 2007-01-31 |
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