TW200537120A - Curable liquid resin composition and method for producing multilayer body using same - Google Patents

Curable liquid resin composition and method for producing multilayer body using same

Info

Publication number
TW200537120A
TW200537120A TW094108640A TW94108640A TW200537120A TW 200537120 A TW200537120 A TW 200537120A TW 094108640 A TW094108640 A TW 094108640A TW 94108640 A TW94108640 A TW 94108640A TW 200537120 A TW200537120 A TW 200537120A
Authority
TW
Taiwan
Prior art keywords
resin composition
liquid resin
volatile solvent
curable liquid
same
Prior art date
Application number
TW094108640A
Other languages
English (en)
Chinese (zh)
Other versions
TWI348557B (cs
Inventor
Hiroomi Shimomura
Mitsunobu Doimoto
Yasunobu Suzuki
Tetsuya Yamamura
Takayoshi Tanabe
Hideaki Takase
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005022474A external-priority patent/JP2006161014A/ja
Priority claimed from JP2005022382A external-priority patent/JP2006161013A/ja
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200537120A publication Critical patent/TW200537120A/zh
Application granted granted Critical
Publication of TWI348557B publication Critical patent/TWI348557B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW094108640A 2004-03-22 2005-03-21 Curable liquid resin composition and method for producing multilayer body using same TW200537120A (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2004082193 2004-03-22
JP2004130071 2004-04-26
JP2004331274 2004-11-15
JP2004331182 2004-11-15
JP2005022474A JP2006161014A (ja) 2004-03-22 2005-01-31 積層体の製造方法
JP2005022382A JP2006161013A (ja) 2004-03-22 2005-01-31 液状硬化性樹脂組成物、硬化膜及び積層体

Publications (2)

Publication Number Publication Date
TW200537120A true TW200537120A (en) 2005-11-16
TWI348557B TWI348557B (cs) 2011-09-11

Family

ID=34993662

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094108640A TW200537120A (en) 2004-03-22 2005-03-21 Curable liquid resin composition and method for producing multilayer body using same

Country Status (4)

Country Link
KR (1) KR100896125B1 (cs)
CN (1) CN1922267B (cs)
TW (1) TW200537120A (cs)
WO (1) WO2005090472A1 (cs)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005090473A1 (ja) * 2004-03-18 2005-09-29 Jsr Corporation 積層体の製造方法
JP2006161021A (ja) * 2004-11-15 2006-06-22 Jsr Corp 液状硬化性樹脂組成物、硬化膜及び積層体
ZA200804595B (en) 2005-12-09 2009-08-26 Dow Global Technologies Inc Processes of controlling molecular weight distribution in ethylene/alpha-olefin compositions
JP4904885B2 (ja) * 2006-03-30 2012-03-28 Ｊｓｒ株式会社 硬化性樹脂組成物、硬化膜、反射防止膜積層体及び硬化膜の製造方法
EP2034526B1 (en) 2006-06-02 2019-12-25 Hitachi Chemical Company, Ltd. Package for mounting optical semiconductor element and optical semiconductor device employing the same
EP2259247B1 (en) * 2008-03-28 2019-05-22 Terumo Corporation Three-dimensional model of body tissue and method of producing the same
CN102476490B (zh) * 2010-11-23 2015-04-08 远东新世纪股份有限公司 延长透明抗静电膜的抗静电能力的方法及透明抗静电膜
JP5973573B2 (ja) * 2012-07-24 2016-08-23 Ykk株式会社 スライドファスナー用ファスナーエレメント
EP3127960B1 (en) * 2014-03-31 2019-02-27 AGC Inc. Laminate obtained from a fluorinated resin composition
CN115322216B (zh) * 2022-05-09 2024-03-12 山西大学 一种用于制备有机-无机杂化钛矿太阳能电池的锂盐溶剂

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6160067A (en) * 1995-10-03 2000-12-12 Dsm N.V. Reactive silica particles, process for manufacturing the same, use of the same
JP4078704B2 (ja) * 1998-02-12 2008-04-23 Ｊｓｒ株式会社 反射防止膜
KR100307449B1 (ko) * 1999-01-13 2001-12-28 김순택 음극선관용 기능성 필름
JP4271839B2 (ja) 1999-09-28 2009-06-03 富士フイルム株式会社 反射防止膜、偏光板、及びそれを用いた画像表示装置
JP4419267B2 (ja) * 2000-04-11 2010-02-24 Ｊｓｒ株式会社 高屈折率膜用硬化性組成物、高屈折率膜、および反射防止用積層体
JP2004317734A (ja) * 2003-04-15 2004-11-11 Fuji Photo Film Co Ltd 反射防止膜、その製造方法、反射防止フィルムおよび画像表示装置

Also Published As

Publication number Publication date
TWI348557B (cs) 2011-09-11
KR100896125B1 (ko) 2009-05-07
CN1922267B (zh) 2012-03-28
WO2005090472A1 (ja) 2005-09-29
KR20070003962A (ko) 2007-01-05
CN1922267A (zh) 2007-02-28

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