TW200525004A - Adhesive films and method for manufacturing adhesive film - Google Patents

Adhesive films and method for manufacturing adhesive film Download PDF

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Publication number
TW200525004A
TW200525004A TW093139608A TW93139608A TW200525004A TW 200525004 A TW200525004 A TW 200525004A TW 093139608 A TW093139608 A TW 093139608A TW 93139608 A TW93139608 A TW 93139608A TW 200525004 A TW200525004 A TW 200525004A
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TW
Taiwan
Prior art keywords
resin layer
resin
film
layer
conductive particles
Prior art date
Application number
TW093139608A
Other languages
Chinese (zh)
Other versions
TWI265188B (en
Inventor
Noriaki Kudo
Yasushi Akutsu
Hidetsugu Namiki
Original Assignee
Sony Chemicals Corp
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Publication date
Application filed by Sony Chemicals Corp filed Critical Sony Chemicals Corp
Publication of TW200525004A publication Critical patent/TW200525004A/en
Application granted granted Critical
Publication of TWI265188B publication Critical patent/TWI265188B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L24/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • H05K3/323Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/10Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
    • C09J2301/16Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the structure of the carrier layer
    • C09J2301/162Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the structure of the carrier layer the carrier being a laminate constituted by plastic layers only
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    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/41Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the carrier layer
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    • H05K2203/11Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1189Pressing leads, bumps or a die through an insulating layer

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)
  • Wire Bonding (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

An adhesive film (4) is provided, having a first resin layer (10), a second resin layer (20) formed on the front surface of the first resin layer (10), and a third resin layer (15) formed on the rear surface of the first resin layer (10), in which the lowest viscosity in the temperature range lower than the bonding temperature of the first resin layer (10) is higher than the lowest viscosity in the temperature range lower than the bonding temperature of the second and third resin layers (20, 25). When first and second bodies (40, 50) to be bonded are hot pressed while sandwiching the adhesive film (4), the second resin layer (20) flows out toward the outside of the body (50). However, since the first resin layer (10) containing conductive particles (12) does not flow out but stays between the first and second bodies (40, 50), the number of conductive particles (12) sandwiched between first and second connection terminals (42, 52) increases.

Description

200525004 九、發明說明: 【發明所屬之技術領域】 本發明係關於粘著劑,特別是關於含有導電性粒子之 /钻著劑。 【先前技術】 以往’半導體晶片及配線板般之電氣零件彼此間的連 接’係廣泛採用異向導電性粘著劑(acf)。 ACF,係在含有熱固性樹脂之結合劑中分散有導電性粒 子而構成之異向導電性粘著劑,其成形為膜狀,若在電氣 零件彼此間挾持ACF並實施加熱緊壓,則acf因加熱而軟 化,經由緊壓則電氣零件之連接端子會推開軟化後的ACF, 而使導電性粒子夾在相對向的連接端子間。 ACF具有結合劑之熱固性樹脂,若在連接端子挾持導 電性粒子的狀態下持續加熱緊壓,則熱固性樹脂會聚合而 使ACF硬化,藉由導電性粒子使電氣零件彼此形成電氣連 接’且電氣零件彼此被硬化後的ACF固定住。 例如’就算連接端子之高度不齊而在應連接之連接端 子間產生間隙,由於導電性粒子會充填於該間隙,故藉由 導電性粒子可使連接端子彼此形成電氣連接。 9 然而,當透過粘著膜進行加熱緊壓時,由於導電性粒 子會和軟化後的結合劑一起流至被粘著體的外側,造成待 連接的連接端子間之導電性粒子量變少,而可能無法藉由 導電性粒子來使連接端子彼此形成連接。 若加大ACF中導電性粒子的密度,雖可提昇連接端子 200525004 之連接可靠性,但當電氣零件之配線成為高細密化時,由 於互相鄰接的連接端子間之間隔變小,可能不應連接之連 接端子也被導電性粒子形成電氣連接,而使電氣零件產生 短路。如此般,使用習知的acf難以獲得高連接可靠性之 電氣裝置。 曰本特開平6-283225號公報 θ本特開平7_230840號公報 曰本特開平8-14821 1號公報 曰本特開平9-312176號公報 曰本特開平10-273629號公報 曰本特開平1 1-87415號公報 曰本特開2000-1785 1 1號公報 〔專利文獻1〕 〔專利文獻2〕 〔專利文獻3〕 〔專利文獻4〕 〔專利文獻5〕 〔專利文獻6〕 〔專利文獻7〕 【發明内容】 本發明係為了解決上述習知技術之問題點而構成者, 八的係提供一可製造出高可靠性的電氣裝置之粘著膜。 士匕為了解決上述課題,本發明之粘著膜,係具備··第一 树月曰層、配置於第一樹脂層上之第二樹脂層、配置於第一 樹脂層之第二樹脂層相反側之第三樹脂層,該第一樹脂層 -有邑、彖ϋ結合劑、及分散於結合劑中之導電性粒子,該 絕:性結合劑具有第一熱固性樹脂、及第一硬化劑(經由加 :會與第-熱固性樹脂反應而使第一熱固性樹脂硬化),該 弟一樹脂層具有絕緣性第二熱固性樹脂、及第二硬化劑(經 由加熱會與第二熱固性樹脂反應而使第二熱固性樹脂硬 化),該第三樹脂層具有絕緣性第三熱固性樹脂、及第三硬 200525004 化劑(經由加熱會與第三熱固性樹脂反應而使第三熱固性樹 脂硬化),將該粘著膜配置於第一被粘著體(具有第一端子) 與第二被枯著體(具有第二端子)之間進行加熱緊壓,而使第 一〜第三樹脂層昇溫至既定的連接溫度以上,則在第一、第 二連接端子間挾持導電性粒子之狀態下,第一〜第三熱固性 樹脂會分別與第一〜第三硬化劑反應而硬化,而將第一、第 一被枯著體予以連接; 該第一樹脂層,在低於連接溫度的溫度範圍之最低粘 度為1000〜1000000Pa· s以下,該第二樹脂層,在低於連接 溫度的溫度範圍之最低粘度比該第一樹脂層為低,該第二 樹脂層之膜厚,係大於第一、第三樹脂層之膜厚。 本毛月之枯著膜中,该第二樹脂層,在低於連接溫度 的溫度範圍之最低粘度為第一樹脂層之1/10以下。 本lx明之粘著膜中,該第一樹脂層之膜厚,係導電性 粒子的平均粒徑之1/2倍〜2倍。 本發明之粘著膜中,該第一樹脂層之導電性粒子密 度,比第二樹脂層為大。 本發明之钻著膜中,該第二樹脂層之膜厚,係比密合 連接於第二樹脂層側之被粘著體(選自第-、第二被粘著體) 之連接端子膜厚為大。 本發明之枯著膜中,該第三樹脂層,在低於連接溫度 的溫度範圍之最低社# 取低枯度比第一樹脂層為低。 本發明之粘荖蹬& _ _ 言膜中,该第三樹脂層,在低於連接溫度 的溫度範圍之最低+ &站度為第一樹脂層之1 / i 0以下。 200525004 該第三樹脂層的膜厚比第一樹脂 本發明之粘著膜中 層為薄。 本發明之粘著膜夕制1 ^ 、之I以方法,係用來製造至少單面貼 附有剝離膜之粘著膜, 、 其具有積層體,該積層體具備:第 一剝離膜、配置於楚 a-... 咕 於第—剝離臈表面之第一樹脂層、配置於 苐一樹脂層表面之第-抖# & ^ 弟一樹知層、及配置於第二樹脂層表面 '到離膜$第—樹脂層,在低於連接溫度的溫度範 圍之最低#度比第二樹脂層為高; 士匕將該積層體之第_剝離膜從第一樹脂層剝離而使第_ 、曰曰表面路出’在露出的第一樹脂層表面塗布液狀粘著 d並使其乾燥’藉此形成第三樹脂層並製造出粘著膜。 ^本^明之钻著膜之製造方法中,該積層體之製作,係 ,第厂剝離膜表面塗布液狀粘著劑並使其乾燥而形成第_ 月曰層纟第-樹脂層表面塗布液狀枯著劑並使其乾燥而 形成第二樹脂層後,在該第二樹脂層表面貼附該第二剝離 本發明之點著膜之製造方法中,該積層體之製作,係 在第一、第二剝離膜表面分別塗布液狀粘著劑並使其乾燥 而形成第—、第二樹脂層後,使第一樹脂層表面與第二樹 脂層表面互相密合。 圖7示思顯不出粘度變化與溫度的關係,其係針對將 具有熱固性樹脂與硬化劑之樹脂層加熱且從起始溫度&昇 μ至没疋連接溫度L的情形,縱軸代表粘度,橫軸代表溫 200525004 t若藉由加熱使樹脂層由室溫(起始溫度τ〇)開始昇溫,樹 月曰層中之樹脂成分會軟化,而使樹浐芦 當樹脂層昇溫時,由於合同時 :θ ’;又開始下降。 性樹脂之聚合反應成分的軟化_ 例而決定之溫度Tl之最低值後,因 ^及配口比 上昇。 延仃鬈5而使粘度開始 一就算樹脂層中含有導電性粒子,由於樹脂 尚於室溫的溫度下達成最低粘度,若在第=’又 體間挟持枯著膜並實施加熱,當達到::二二⑽ -、第二樹脂層形成最低枯度。…的溫度時第 出,:低枯度附近雖會朝被枯著體的外側流 出 層的最㈣度比第二樹脂層為高故不會流 弟^脂層中的導電性粒子將留在被㈣體間,而使 苐一連接端子所挾持之導電性粒子數目變多。 類ur曰層之最低粘度’可藉由改變熱固性樹脂的種 類、硬化劑種類、熱固性樹脂與硬化劑的配合量 比其他樹脂層為高。 支成 被4為:::粒子’只要使用在導電層表面以絕緣被膜 復者’就异苐二樹脂層中含有導電性粒子,由於導電性 粒子的導電層不致直接接觸連接 間之短路。 料+,&以±連接端子 :緣被膜-般為絕緣性樹脂所構成,當導電性粒子被 々夹在弟一、第二連接端子間時容易破裂,如此導電層會鱼 弟-、第二連接端子形成直接接觸,而藉由導電性粒子使 200525004 第、第一連接端子形成電氣連接。 第一樹脂層的膜厚,由於會決定本發明的粘著膜4中 之導電性粒子數,故要求具有高的膜厚精度,但不管是第 二樹脂層形成於第二剝離膜上的情形,或第二樹脂層直接 形成於第-樹脂層表面的情形,由於第—樹脂層均形成於 剝離膜表面,故能形成膜厚精度良好的第一樹脂層。200525004 IX. Description of the invention: [Technical field to which the invention belongs] The present invention relates to an adhesive, and particularly to a drilling agent containing conductive particles. [Prior art] In the past, "connection of electrical components such as semiconductor wafers and wiring boards to each other" has widely used an anisotropic conductive adhesive (acf). ACF is an anisotropic conductive adhesive formed by dispersing conductive particles in a binder containing a thermosetting resin. It is formed into a film shape. If ACF is held between electrical parts and heated and pressed, the acf is caused by It is softened by heating. By pressing, the softened ACF will be pushed away by the connection terminals of the electrical parts, and the conductive particles will be sandwiched between the opposite connection terminals. ACF is a thermosetting resin with a binding agent. If the connection terminals are continuously heated and pressed while the conductive particles are held, the thermosetting resin will polymerize and harden the ACF. The conductive particles will electrically connect the electrical parts to each other and the electrical parts. The hardened ACF is fixed to each other. For example, 'Even if the heights of the connection terminals are not uniform, a gap is created between the connection terminals to be connected. Since the conductive particles fill the gap, the conductive terminals can be electrically connected by the conductive particles. 9 However, when heating and pressing through the adhesive film, the conductive particles will flow to the outside of the adherend together with the softened bonding agent, resulting in less conductive particles between the connection terminals to be connected, and The connection terminals may not be connected to each other by the conductive particles. If the density of the conductive particles in the ACF is increased, the connection reliability of the connection terminal 200525004 can be improved. However, when the wiring of electrical parts becomes denser, the distance between adjacent connection terminals may become smaller, and the connection may not be connected. The connection terminals are also electrically connected by the conductive particles, and short circuit occurs in the electrical components. As such, it is difficult to obtain electrical devices with high connection reliability using the conventional acf. Japanese Patent Publication No. 6-283225 θ Japanese Patent Publication No. 7_230840 Japanese Patent Publication No. 8-14821 Japanese Patent Publication No. 9-312176 Japanese Patent Publication No. 10-273629 Japanese Patent Publication No. 1 1 -87415 JP 2000-1785 1 [Patent Document 1] [Patent Document 2] [Patent Document 3] [Patent Document 4] [Patent Document 5] [Patent Document 6] [Patent Document 7] SUMMARY OF THE INVENTION The present invention is designed to solve the problems of the conventional techniques described above. The eighth system provides an adhesive film capable of manufacturing a highly reliable electrical device. In order to solve the above-mentioned problem, the adhesive film of the present invention is provided with a first resin layer, a second resin layer disposed on the first resin layer, and a second resin layer disposed on the first resin layer. A third resin layer on the side, the first resin layer has a bonding agent, a fluorene bonding agent, and conductive particles dispersed in the bonding agent, and the insulating bonding agent has a first thermosetting resin and a first curing agent ( By adding: it will react with the first thermosetting resin to harden the first thermosetting resin), the first resin layer has an insulating second thermosetting resin, and a second hardener (by heating it will react with the second thermosetting resin to make the first Two thermosetting resins are hardened), the third resin layer has an insulating third thermosetting resin, and a third hard 200525004 agent (the third thermosetting resin is hardened by reacting with the third thermosetting resin through heating), and the adhesive film is It is placed between the first adherend (having the first terminal) and the second dead body (having the second terminal) and heat-pressed to heat the first to third resin layers to a predetermined connection temperature or more. In a state in which conductive particles are held between the first and second connection terminals, the first to third thermosetting resins react with the first to third hardeners to harden, respectively, and the first and first dead bodies are cured. Be connected; the minimum viscosity of the first resin layer in a temperature range lower than the connection temperature is 1000 to 1000000 Pa · s or lower, and the minimum viscosity of the second resin layer in the temperature range lower than the connection temperature is lower than the first resin The layer is low, and the film thickness of the second resin layer is larger than that of the first and third resin layers. In the dead film of the present month, the lowest viscosity of the second resin layer in the temperature range lower than the connection temperature is 1/10 or less of that of the first resin layer. In the present adhesive film, the film thickness of the first resin layer is 1/2 to 2 times the average particle diameter of the conductive particles. In the adhesive film of the present invention, the density of the conductive particles of the first resin layer is greater than that of the second resin layer. In the drilling film of the present invention, the film thickness of the second resin layer is greater than the connection terminal film of the adherend (selected from the first and second adherends) closely connected to the second resin layer side. Thick is big. In the dead film of the present invention, the third resin layer has a lower dryness than the first resin layer at the lowest temperature in the temperature range lower than the connection temperature. In the adhesive film of the present invention, the third resin layer has the lowest + temperature in the temperature range below the connection temperature, and the degree of the third resin layer is less than 1 / i 0 of the first resin layer. 200525004 The film thickness of the third resin layer is thinner than the middle layer of the adhesive film of the present invention. The adhesive film of the present invention is manufactured by a method I, which is used to produce an adhesive film with a release film attached to at least one side, and it has a laminate, the laminate having: a first release film, a configuration Yu Chu a -... Gu Yudi—Peel the first resin layer on the surface of the first resin layer, and place the first-trembling on the surface of the first resin layer. ^ Di Yishuzhi layer, and the second resin layer surface The first resin layer of the release film is higher than the second resin layer in the lowest temperature range below the connection temperature; the second layer of the laminate is peeled from the first resin layer to make the first and second layers On the surface, "the surface of the exposed first resin layer is coated with a liquid adhesive d and dried," thereby forming a third resin layer and producing an adhesive film. ^ 本 ^ In the production method of the drilled film of Ming, the production of the laminated body is that the surface of the first film is coated with a liquid adhesive and dried to form a coating solution for the resin layer surface. After forming a second resin layer after drying it like a drying agent, the second resin layer is adhered to the surface of the second resin layer. In the method for manufacturing the spot film of the present invention, the laminated body is produced in the first step. After the surface of the second release film is coated with a liquid adhesive and dried to form the first and second resin layers, the surface of the first resin layer and the surface of the second resin layer are brought into close contact with each other. Figure 7 shows the relationship between viscosity change and temperature, which is for the case of heating a resin layer with a thermosetting resin and a hardener and increasing from the initial temperature & μ to the connection temperature L. The vertical axis represents the viscosity The horizontal axis represents temperature 200525004 t. If the resin layer is heated from room temperature (starting temperature τ0) by heating, the resin component in the tree month layer will soften, and when the resin layer heats up, At the same time: θ '; began to decline again. After the minimum value of the temperature Tl, which is determined by the softening of the polymerization reaction component of the resin, is increased by ^ and the proportion of the mixture. Extend 仃 鬈 5 to make the viscosity start. Even if the resin layer contains conductive particles, since the resin has reached the minimum viscosity at room temperature, if the dry film is held and heated at the third position, when: : Two, two ⑽-, the second resin layer forms the lowest dryness. The temperature at the first time is: Although the maximum degree of the layer flowing out near the withered body near the low dryness level is higher than that of the second resin layer, the conductive particles in the lipid layer will not flow. Between the bodies, the number of conductive particles held by one connection terminal increases. The minimum viscosity of the ur-like layer can be changed by the type of the thermosetting resin, the type of the hardener, and the blending amount of the thermosetting resin and the hardener to be higher than that of other resin layers. The branching layer 4 is: :: particles, as long as they are used on the surface of the conductive layer as an insulating coating, the resin layer contains conductive particles. Since the conductive layer of the conductive particles does not directly contact the short circuit between the connections. ++ & is composed of ± connection terminals: edge coating-generally made of insulating resin. When conductive particles are sandwiched between the first and second connection terminals, it is easy to break, so the conductive layer will The two connection terminals make direct contact, and the 200525004 first and first connection terminals are electrically connected by conductive particles. Since the film thickness of the first resin layer determines the number of conductive particles in the adhesive film 4 of the present invention, it is required to have high film thickness accuracy, but regardless of whether the second resin layer is formed on the second release film Or, when the second resin layer is directly formed on the surface of the first resin layer, since the first resin layer is formed on the surface of the release film, the first resin layer with good film thickness accuracy can be formed.

藉由使用本發明之枯著膜,由於加熱緊麼步驟中導電 絲子不致流出而能留在第―、第:連接端子間,故第一、 第二連接端子間所挾持之導電性粒子數目變多。又,互相 鄰接之連接端子間,由於充填有導電性粒子密度小之第二 樹脂層’故被枯著體的連接端子彼此間不易發生短路。I 此,藉由使用本發明之枯著臈,可製得高連接可靠性之電 氣裝置。 【實施方式】 以下說明本發明的枯著膜製造過程之一例。將絕緣性 的第一熱固性樹脂、與第一硬化劑 Μ (糟由加熱使第一熱固性 樹脂聚合)分散於有機溶劑中,· Τ I作出結合劑溶液,再將導 電性粒子分散於結合劑溶液中 J合,夜中而製作出液狀的第一粘著 劑。 另外’將絕緣性之第二、第三熱固性樹脂分別與第二、 第二硬化劑一起分散於有機溶劑中,製作出液狀而不含導 電性粒子之第二、第三粘著劑。 圖1(a)之符號31代表第一剝 E ^ 冽離膜。第一剝離膜31呈細 長狀,其單面事先施以表面處 在邊表面處理後之剝離 200525004 面上,塗布第一粘著劑(其乾燥膜厚為導電性粒子平均粒徑 之1/2倍〜2倍),而如圖1(a)所示般形成在結合劑11(具有 熱固性樹脂與硬化劑)中分散有導電性粒子12之第一樹脂 層1 0。 以乾燥膜厚大於第一樹脂層1〇、且大於 接端子高度的方式,將第二粘著劑塗布於第一樹脂層⑺表 並使”乾燥,使第二粘著劑中多出的有機溶劑蒸發,而 形成不含導電性粒子之第二樹脂層2〇(圖丨邙))。 …、後將細長的第二剝離膜32貼合於第二樹脂層2〇 、而製侍細長的積層體3(圖1(c))。具有熱固性樹脂與 魏劑之第,樹脂層2〇,其在低於連接溫度的溫度範圍: 二:度係、比第一樹脂層為低。最低粘度較低的樹脂層, :至溫下其粘度低故粘著性高。 ::,就算第一、第二剝離膜31、32係使用相同者, 弟::曰層1。對第一剝離臈31的枯著力, 月日層20對第二剝離 乐一树 籬肢u 、 的姑者力弱,當對第一、第二剝 脂層!。剝3離2施:第 '離 仁第一剝離膜3 ?目# 離(圖1(d))。 、、…、法從第二樹脂層20剝 然後,以乾燥膜厚小 第三枯著劑塗布於第_樹以丨仏層1G膜厚的方式,將 導電性粒子之第三樹 m展,而不含 1(e)) 〇 曰 如此製得細長的粘著膜4(圖 二、:而’猎由表面處理 準備出第三剝離臈33,其釗離 200525004 面與弟二樹脂層25表面間之枯著力,係比第二剝離膜Μ 的剝離面與第二樹脂層2〇表面間的枯著力弱,將該剝離膜 33貼合於第三樹脂層25表面,而製得兩面分別貼合有剝離 膜32、33之枯著膜4(圖_。將該㈣膜*捲繞成捲筒狀, 而製得附剝離膜32、33之粘著膜4捲筒。 #其次說明使用該枯著膜4來連接具有連接端子的被枯 者體之v驟。圖3之符说4〇、圖4之符號分別代表第一 被枯著體之電路基板、第二被枯著體之半導體元件。 —電,基板40具有玻璃基板41、及形成於玻璃基板μ 面之第連接端子42,第-連接端子42係由玻璃基板 Γ上之導電臈經圖案化*構成,在該圖案化步驟,係用該 電臈來形成使第一連接端子42彼此連接之狹窄配線膜。 半導體元件50具有元件本體51、及配置於元件本體 51 面之第二連接端子52,第二連接端子52呈突塊狀, 人凡件本體51之未圖示的内部電路形成電氣連接。 為了在電路基板4〇上連接半導體元件5g,係將附剝離 «32、33枯著膜4從枯著膜4之滾筒捲出。如上述般,第 ,剥離膜33之剥離面與第三樹脂層25表面間之粘著力, ,比第二剝離膜32的剥離面與第二樹脂層2G表面間的枯 著力弱,右將第二、第三剝離膜32、33靜電吸附,並對第 二、第三剝離膜32、33施加剝開力’則第三剝離膜33會 ^第三樹脂層25剝離,而使第三樹脂層25之與第一樹月曰旨 :1〇相反側之面露出,但第二剝離膜32並不會從 脂層20剝離。 12 200525004 將剝去第三剝離膜33後之粘著膜4切斷成既定長度, 將該切斷片之第三樹脂層25的外露表面,密合於電路基板 4〇之第一連接端子42配置側之面,而使第三樹脂層25的 表面粘著於第一連接端子42的表面(圖5(a))。 a有熱固性樹脂與硬化劑之第三樹脂層,其在低於 連接溫度的溫度範圍之最低粘度,係比第一樹脂層1〇為 低,而最低粘度低的樹脂層其粘著性較高,當將電路基板 4〇與第二剝離膜32靜電吸附並施加剝開力時,第二剝離膜 32會從粘著膜4剝離,而粘著膜4則留在電路基板* 5(b)) 〇 將半導體元件50之第二連接端子52配置側的面朝向 電路基板40之钻著膜4貼附面,以第-、第二連接端子42、 52相對向的方式進行定位後,將半導體元件4〇放在㈣膜 4上’並用未圖示的緊壓器具緊壓半導體元件5〇(圖$⑼。 將供裝載電路基板40之裝載台、與供緊壓半導體元件 5 〇之緊壓ϋ具預先昇溫至既定溫度後,將半導體元件$ 〇朝 電路基板4G緊壓,則因熱傳導而使半導體元件5Q、電路基 板40、枯著膜4均從加熱開始溫度(室溫)起昇溫,第一〜第 三樹脂層10、20、25粘度開始下降,在昇溫至設定連接溫 度的期間到達最低粘度。 、第二樹脂層20採用的熱固性樹脂,由於其在低於連接 皿度的脈度範圍之最低粘度為1〇〇ρ& · $以下(1⑼〇泊以 下)’故第二樹脂層20在昇溫至連接溫度的期間會向半導體 兀件50之外側流出,但第一樹脂層1〇採用之熱固性樹脂, 13 200525004 由於在低於連接溫度的溫度範圍之最低粘度為 1000〜3〇〇OPa . s(10000〜30000泊),故第一樹脂層1〇不會向 半導體元件50的外側流出,而使第一樹脂層1〇中的導電 性粒子12留在半導體元件5〇與電路基板4〇之間。 因此,藉由半導體元件5〇之緊壓而使第二連接端子Μ 推開枯著膜4時,第二連接端子52的前端會將導電性粒子 12(留在+導體元件50#電路基板4〇之間者)推向電路基板 40側。By using the dead film of the present invention, since the conductive filaments do not flow out during the heating tight step, they can remain between the first and second connection terminals, so the number of conductive particles held between the first and second connection terminals increasing. In addition, since the connection terminals adjacent to each other are filled with the second resin layer having a low density of conductive particles, the connection terminals of the dead bodies are unlikely to be short-circuited. I Therefore, by using the dry bump of the present invention, an electric device with high connection reliability can be manufactured. [Embodiment] Hereinafter, an example of the manufacturing process of the dry film of this invention is demonstrated. Disperse the insulating first thermosetting resin and the first hardener M (the first thermosetting resin is polymerized by heating) in an organic solvent, and make a binder solution, and then disperse the conductive particles in the binder solution. The middle J is mixed, and the liquid first adhesive is produced at night. In addition, the second and third thermosetting resins which are insulating are dispersed in an organic solvent together with the second and second hardeners, respectively, and second and third adhesives are produced in a liquid state without containing conductive particles. The symbol 31 in Fig. 1 (a) represents the first peeling film. The first peeling film 31 is slender, and one side of the first peeling film is applied in advance on the side of the surface after peeling 200525004. The first adhesive is applied (the thickness of the dry film is 1/2 of the average particle diameter of the conductive particles). 1 to 2 times), and a first resin layer 10 in which conductive particles 12 are dispersed in a binder 11 (having a thermosetting resin and a hardener) is formed as shown in FIG. 1 (a). The second adhesive is applied to the surface of the first resin layer in a manner such that the dry film thickness is greater than the first resin layer 10 and greater than the height of the terminal, and "dried" to make the extra organic in the second adhesive The solvent evaporates to form a second resin layer 20 (Fig. 邙) containing no conductive particles.... Then, the elongated second peeling film 32 is adhered to the second resin layer 20 to produce an elongated Laminated body 3 (Figure 1 (c)). It has the first thermosetting resin and Wei agent, the resin layer 20, which is in a temperature range lower than the connection temperature: two: degree, lower than the first resin layer. The lowest viscosity The lower resin layer: its viscosity is low at high temperature, so it has high adhesion. ::: Even if the first and second release films 31 and 32 are the same, brother :: Layer 1. For the first release 臈31 with a weak force, the moon and the sun layer 20 has a weak force on the second peeling of the Leyi hedgerow u, when it is on the first and the second degreasing layer! Peeling 3 away from 2 The peeling film 3 mesh # is separated (Fig. 1 (d)). Then, it is peeled from the second resin layer 20, and then the third desiccant is coated with a dry film thickness and a third desiccant on the first layer of the 1G film. Thick Way, the third tree of the conductive particles is expanded without containing 1 (e). 〇 In this way, a slender adhesive film 4 is prepared in this way (Fig. 2 ,: "The third peeling is prepared by surface treatment. 33 The absorbing force between the surface of 200525004 and the second resin layer 25 is weaker than the absorbing force between the release surface of the second release film M and the surface of the second resin layer 20, and the release film 33 is bonded together. On the surface of the third resin layer 25, a dead film 4 with a release film 32 and 33 bonded on both sides is prepared (Fig. _). The roll film * is wound into a roll shape to obtain a release film 32, 33 的 胶膜 4 卷卷 #Secondly, it is explained that the dead film 4 is used to connect the body of the victim with connection terminals. The symbol in FIG. 3 and the symbol in FIG. 4 represent the first victim. The circuit board that is attached to the body and the second semiconductor element that is dead.-The substrate 40 includes a glass substrate 41 and a first connection terminal 42 formed on the μ surface of the glass substrate. The first connection terminal 42 is formed on the glass substrate Γ. The conductive pads are formed by patterning *. In this patterning step, the thin pads are used to form a narrow connection connecting the first connection terminals 42 to each other. The semiconductor element 50 has an element body 51 and a second connection terminal 52 disposed on the surface of the element body 51. The second connection terminal 52 is in the shape of a bump, and an internal circuit (not shown) of the ordinary body 51 forms an electrical connection. In order to connect the semiconductor element 5g to the circuit substrate 40, the dead film 4 with peeling «32, 33 is rolled out from the drum of the dead film 4. As described above, the peeling surface of the peeling film 33 and the third The adhesive force between the surfaces of the resin layer 25 is weaker than the dry force between the peeling surface of the second release film 32 and the surface of the second resin layer 2G. The second and third release films 32 and 33 are electrostatically adsorbed to the right, and When the second and third peeling films 32 and 33 apply a peeling force, the third peeling film 33 will peel off the third resin layer 25, and the third resin layer 25 will be opposite to the first tree month: 10 The surface is exposed, but the second release film 32 is not peeled from the fat layer 20. 12 200525004 Cut the adhesive film 4 after the third peeling film 33 is peeled to a predetermined length, and arrange the exposed surface of the third resin layer 25 of the cut piece to the first connection terminal 42 of the circuit board 40. Side surface so that the surface of the third resin layer 25 is adhered to the surface of the first connection terminal 42 (FIG. 5 (a)). a The third resin layer having a thermosetting resin and a hardener has a lowest viscosity in a temperature range lower than the connection temperature, which is lower than that of the first resin layer 10, and a resin layer with a lowest lowest viscosity has higher adhesion. When the circuit substrate 40 and the second peeling film 32 are electrostatically adsorbed and a peeling force is applied, the second peeling film 32 is peeled from the adhesive film 4 and the adhesive film 4 remains on the circuit substrate * 5 (b) ) 〇Position the side of the second connection terminal 52 of the semiconductor element 50 toward the drilling film 4 attachment surface of the circuit board 40, and position the first and second connection terminals 42 and 52 so as to face each other. The element 40 is placed on the film 4 and the semiconductor element 50 is pressed with a not-shown pressing device (Fig. ⑼). The mounting stage on which the circuit board 40 is mounted and the semiconductor element 50 are pressed. After the fixture is heated to a predetermined temperature in advance, and the semiconductor element $ 0 is pressed against the circuit substrate 4G, the semiconductor element 5Q, the circuit substrate 40, and the dead film 4 are all heated from the heating start temperature (room temperature) due to heat conduction. The viscosity of the first to third resin layers 10, 20, and 25 begins to decrease. The temperature reaches the minimum viscosity during the set connection temperature. The minimum viscosity of the thermosetting resin used in the second resin layer 20 is below 100 ° and the range of the pulse range below the connection degree is 100 ρ & Below) 'Therefore, the second resin layer 20 will flow out to the outside of the semiconductor element 50 during the temperature rise to the connection temperature, but the thermosetting resin used in the first resin layer 10, 13 200525004 is in a temperature range lower than the connection temperature. The minimum viscosity is 1000 to 300 OPa. S (10,000 to 30,000 poises), so the first resin layer 10 does not flow out of the semiconductor element 50, and the conductive particles 12 in the first resin layer 10 remain. Between the semiconductor element 50 and the circuit board 40. Therefore, when the second connection terminal M is pushed away from the dead film 4 by the pressing of the semiconductor element 50, the tip of the second connection terminal 52 will be conductive. The particles 12 (the ones left between the + conductor element 50 # and the circuit board 40) are pushed toward the circuit board 40 side.

由於第三樹脂層25的膜厚比第一樹脂層1〇薄,當導 電性粒子12被推向電路基板4〇側時,導電性粒子12會突 破第三樹脂層25而緊壓於第_連接端子42,而呈導電二粒 子12被夾在第一、第二連接端子42、52間的狀態。 由於第二樹脂層20的膜厚比半導體元件50的連接 子52回度厚上數//111(〇_5#111〜未達1〇#爪),就算第二樹 層20被推向半導體疋件5〇的外側,所殘留的第二樹脂 2〇仍會充填於第二連接端子52間,而使第二樹脂層汕Since the film thickness of the third resin layer 25 is thinner than that of the first resin layer 10, when the conductive particles 12 are pushed to the circuit board 40 side, the conductive particles 12 will break through the third resin layer 25 and be tightly pressed at the _ The connection terminal 42 is in a state where the conductive two particles 12 are sandwiched between the first and second connection terminals 42 and 52. Since the film thickness of the second resin layer 20 is thicker than the connector 52 of the semiconductor element 50, the number is // 111 (〇_5 # 111〜 未到 1〇 # 爪), even if the second tree layer 20 is pushed toward the semiconductor On the outside of the piece 50, the remaining second resin 20 will still be filled between the second connection terminals 52, so that the second resin layer

合於第二連接端子52側面、及元件本體5丨之第二連接 子52間之露出部分。 再進一步加熱時,隨著第一〜第三熱固性樹脂之聚合反 ,的進展’第-〜第三樹脂層1G、2G、25之枯著轉為上昇, 當昇溫至設定之連接溫度時,因第—〜第三熱固性樹脂的聚 合而使粘著膜4硬化,#由硬化的粘著臈4而將半導體元 件50固定於電路基板4〇上。 圖5(d)之符號i代表在電路基板4〇上固定有半導體元 14 200525004 件5〇之電氣裝置。該電氣裝置,不僅藉由硬化的粘著膜4 而使電路基板40與半導體元件5〇形成機械連接,而藉由 第一、第二連接端子42、52間所挾持導電性粒子12 成電氣連接。 / 如上述般’使用本發明之枯著膜4來進行加熱緊壓步 驟時,,電性粒子12不致朝半導體元件5()外側流出,故 第-、第二連接端+ 42、52間所挾持之導電性粒子12數 目變多,而使導通可靠性提高。 又:相鄰接之連接端子52間,由於填充有不含導電性 粒子之第二樹脂層2〇’故同_被枯著體之連接端子Μ間不 會產生短路。如此般,使用本發明之枯著冑4彳製得高可 靠性之電氣裝置1。 门 以上,雖是針對在第一樹脂層10上形成第二枯著劑 It心作说明’但本發明並不限於此。以下說明本發明之 著膜製造例之其他例。The exposed portion between the side of the second connection terminal 52 and the second connector 52 of the component body 5 丨. During further heating, as the polymerization of the first to third thermosetting resins progresses, the dryness of the first to third resin layers 1G, 2G, and 25 will rise. When the temperature rises to the set connection temperature, The first to third thermosetting resins are polymerized to harden the adhesive film 4, and the semiconductor element 50 is fixed to the circuit board 40 by the cured adhesive sheet 4. The symbol i in FIG. 5 (d) represents an electrical device in which semiconductor elements 14 200525004 are fixed to the circuit board 40. In this electrical device, not only the circuit board 40 and the semiconductor element 50 are mechanically connected by the hardened adhesive film 4, but also the conductive particles 12 are held electrically between the first and second connection terminals 42, 52. . / As described above, when using the dry film 4 of the present invention for the heating and compacting step, the electrical particles 12 do not flow out of the semiconductor element 5 (), so the first and second connection ends + 42, 52 The number of held conductive particles 12 increases, which improves the conduction reliability. In addition, since the connection terminals 52 adjacent to each other are filled with the second resin layer 20 'containing no conductive particles, there is no short circuit between the connection terminals M and the dead body. In this manner, the electrical apparatus 1 with high reliability is manufactured using the dry layer 4 of the present invention. Although the above description is directed to the formation of the second bulking agent It on the first resin layer 10, the present invention is not limited to this. Hereinafter, other examples of the production example of the film of the present invention will be described.

^ =先,依上述步驟,製作第一、第二粘著劑,並將 等粘者劑分別塗布於細長的第一、第二剝離膜3丨、之 離面後使其乾燥,如圖i⑷所示般在第一剝離膜表面 成第-樹脂層10’如圖6⑷所示般在第二剝離膜32表面 成弟,一樹脂層2 0。 然後’以第一、第二樹脂層10、20形成面相對向的狀 態’使各剝離膜31'32之長方向端部通過二個緊壓棍間, 邊以緊壓輥(昇溫至既定溫度)緊壓剝離膜31、32之第一、 第二樹脂層1G、2G形成面之相反側面’邊使剝離膜31、32 15 200525004 長方向行進,當剥離膜3 j 第二樹脂層1〇 ^ 、、緊壓輥間,這時第一、 、20會以彼此密合的狀 ,層u)、20會貼合成圖6(b)所示:=故弟 攸该積層體3剝離第一剝離 、二 ^ ^ 傻 依和上述圖 ”相同的步驟來形成第三樹脂層25,即製彳曰槿1 與圖1⑷所示枯著膜4相同、整 P製… 32粘著膜4。 登體形狀呈細長之附剝離膜 ❿ 2 5戶^上用所針對的情形,係、改變第一〜第三樹脂層1 0、2 〇、 吏用之熱固性樹脂與硬化劑的種類,來使第— 1 〇之最低粘度比第-、篦二槲 ,^ ^ 第一第二树月曰層20、25的最低粘度為高, 但本t明並不限於此。 第:樹脂層的枯度,能以樹脂以外的材料來作調整, ,如改變第-樹脂層所添加之填料種類、平均粒徑、配合 里或改交第祕脂層所添加之導電性粒子種類、平均粒 徑、配合量,即可使第一樹脂層10的最低枯度比其他樹脂 層為向。 〔實施例〕 _ <實施例1 > 在粒徑4.0 # m之笨並鳥糞胺樹脂粒子表面,依序積層 膜厚0_08//m之鎳層、膜厚〇 〇4vm之金層,如此製得導 電性粒子在該導電性粒子12表面形成膜厚〇 之絕緣性樹脂膜(由丙烯酸酯/苯乙烯/二乙烯苯之共聚物樹 脂所構成),而製得附絕緣被膜之導電性粒子1 2。 將第一熱固性樹脂(商品名「艾比寇特 1007」,日本環 16 200525004 氧樹脂(股)製)80重量%、與咪唑系硬化劑(商品名 「2E4MZ」、四國化成工業(股)製)2〇重量%所組成之結合 別’溶解於曱苯/醋酸乙酯等量(重量比例)混合而成之混合 >谷劑中’製作出結合劑含量3〇重量%之結合劑溶液,將該 附絕緣被膜之導電性粒子12分散在該結合劑溶液中而形成 既定的粒子密度,如此製作出含有附絕緣被膜之導電性粒 子1 2之液狀第一粘著劑。 將該第一粘著劑塗布於剝離膜後使其乾燥而形成膜, 使用該膜,使用粘度測定裝置(哈克公司製之流變儀 _ RS150),測定以每分鐘1〇〇c的昇溫速度加熱至連接溫度 (moc)期間的粘度,求取第一樹脂層1〇之最低粘度(在低 於連接溫度的溫度範圍之最低粘度),結果其值為2000pa· s。又,該膜之每單位體積的附絕緣被膜之導電性粒子U 密度為約300萬個/mm3。 竹乐一热回性樹脂(商品名「艾比寇特4〇〇7p」,日本 環氧樹脂(股)製)8〇重量%、…系硬化劑(商品名 /MZ」、四國化成工業(股)製)2〇重量%所組成之結合劑, :解於與第-枯著劑相同的混合溶劑中,製作出結合劑含 =重量%但不含導電性粒子之第二枯著劍。將該第二枯 :Μ乾耜膜化後,依與第一粘著劑同樣的條件求取第二、 弟三樹脂層20、25之最低粘度,其值為85Pa. s。一 使用第-、第二枯著劑依上述圖丨⑷ 的步驟形成第-、第二樹脂層1。,後,使用第二著: (與第2黏著劑相同者)形成第三樹脂,如此Μ出實 17 200525004 施例1之附剝離膜之粘著膜4。又,第一〜第三粘著劑之塗 布係使用輥塗。 各樹脂層10、20、25之最低粘度、膜厚、附絕緣被膜 之導電性粒子的密度、附絕緣被膜之導電性粒子的粒徑均 記載於下述表1。又,導電性粒子的密度,係指每lmm3樹 脂層所含之導電性粒子個數。 〔表1〕粘著膜之構成、評價試驗結果(實施例) 評價試驗結果 最低粘度 膜厚 導電性粒子 導電性 導通可 絕緣可 (Pa-s) (//m) 粒子密度 粒徑 粒子數 靠性 靠性 (萬個 (㈣) /mm3) 實 第三樹脂層 85 4 0 一 12 〇 〇 施 第一樹脂層 2000 5 300 4.22-4.62 例1 第二樹脂層 85 15 0 — 實 第三樹脂層 85 4 0 — 15 〇 〇 施 第一樹脂層 3000 5 300 4.22-4.62 例2 第二樹脂層 85 15 0 一 實 第三樹脂層 85 4 0 8 〇 〇 施 第一樹脂層 1000 5 300 4.22-4.62 例3 第二樹脂層 85 15 0 _ 實 第三樹脂層 85 4 0 一 18 〇 〇 施 第一樹脂層 2700 5 600 4.22-4.62 例4 第二樹脂層 85 15 0 一 實 第三樹脂層 85 4 0 一 8 〇 〇 施 第一樹脂層 1400 5 60 4.22-4.62 例5 第二樹脂層 85 15 0 一 實 第三樹脂層 85 4 0 - 19 〇 〇^ = First, according to the above steps, prepare the first and second adhesives, and apply the equal adhesive to the elongated first and second peeling films 3, respectively, and then dry them, as shown in Figure i⑷ A first-resin layer 10 'is formed on the surface of the first release film as shown in FIG. 6 (a), and a resin layer 20 is formed on the surface of the second release film 32 as shown in FIG. Then, in a state where the first and second resin layers 10 and 20 are formed facing each other, the long-side end of each release film 31'32 passes between the two pressing rollers, while pressing the rollers (heating to a predetermined temperature) ) While pressing the opposite sides of the first and second resin layers 1G and 2G forming surfaces of the release films 31 and 32, the release films 31 and 32 15 200525004 travel in the long direction. When the release film 3 j second resin layer 1 0 ^ Press the space between the rollers. At this time, the first, 20, and 20 will be in close contact with each other, and the layers u) and 20 will be combined as shown in Fig. 6 (b): = Therefore, the laminated body 3 peels off the first peel, Two ^^ The same steps as in the above figure are used to form the third resin layer 25, that is to say, the hibiscus 1 is the same as the dry film 4 shown in FIG. 1 and is made of P ... 32 adhesive film 4. The shape of the body It is a slender attached release film 附 2 5 households, the situation is targeted, the first to third resin layers 10, 2 0, the type of thermosetting resin and hardener used to make the first -1 The minimum viscosity of 〇 is higher than the minimum viscosity of the first and second tree layers 20 and 25, but the present invention is not limited to this. The degree can be adjusted with materials other than resin, such as changing the type of filler added to the first resin layer, the average particle size, the type of conductive particles added in the blending or the second lipid layer, the average particle size, The blending amount can make the minimum dryness of the first resin layer 10 more than that of other resin layers. [Examples] _ < Example 1 > On the surface of stupid guanamine resin particles having a particle diameter of 4.0 # m, A nickel layer having a film thickness of 0_08 // m and a gold layer having a film thickness of 4,000 vm were sequentially laminated in this order, so that conductive particles were formed on the surface of the conductive particles 12 to form an insulating resin film with a thickness of 0 (from acrylate / benzene Made of ethylene / divinylbenzene copolymer resin) to produce conductive particles with an insulating coating 1 2. The first thermosetting resin (trade name "Abikot 1007", Japan Ring 16 200525004 oxygen resin (stock )) 80% by weight, combined with 20% by weight of imidazole-based hardener (trade name "2E4MZ", manufactured by Shikoku Chemical Industry Co., Ltd.), dissolved in toluene / ethyl acetate equivalent (weight Proportion) Blended > Cereals' Made Out A binder solution having a binder content of 30% by weight disperses the conductive particles 12 with an insulating film in the binder solution to form a predetermined particle density. Thus, conductive particles 12 with an insulating film are produced. Liquid first adhesive. This first adhesive was applied to a release film and dried to form a film. Using this film, a temperature measurement device (Rheometer _ RS150, manufactured by Hack Corporation) was used to measure the temperature rise at 100 c per minute. The viscosity during the heating up to the connection temperature (moc), and the lowest viscosity of the first resin layer 10 (the lowest viscosity in a temperature range lower than the connection temperature) was obtained, and the value was 2000 pa · s. In addition, the density of the conductive particles U per unit volume of the film with an insulating coating is about 3 million particles / mm3. Takeraku Ichikaku Thermoplastic Resin (trade name "Abikot 4.07p", manufactured by Japan Epoxy Resin Co., Ltd.) 80% by weight, ... series hardener (trade name / MZ), Shikoku Chemical Industry (Made by the company) 20% by weight of the binding agent: dissolved in the same mixed solvent as the first-withdraw agent to make a second agent with = wt% but without conductive particles of the second withered sword . S。 After drying the second dry: M film, determine the minimum viscosity of the second and third resin layers 20, 25 under the same conditions as the first adhesive, the value is 85Pa. S. First, the first and second resin layers 1 are formed using the first and second desiccants according to the steps in the above-mentioned figures. Then, a second resin is used (the same as the second adhesive) to form a third resin, so as to obtain 17 200525004 The adhesive film 4 with a release film of Example 1. The first to third adhesives are applied by rollers. The minimum viscosity, the film thickness, the density of the conductive particles with an insulating coating, and the particle diameters of the conductive particles with an insulating coating of each resin layer 10, 20, and 25 are described in Table 1 below. The density of conductive particles refers to the number of conductive particles per 1 mm3 of the resin layer. [Table 1] Adhesive film structure and evaluation test results (Examples) Evaluation test results Minimum viscosity Film thickness Conductive particles Conductivity Conductivity Conductive insulation (Pa-s) (// m) Particle density Particle size Reliability (thousands (/) / mm3) Real third resin layer 85 4 0-1 2 00 Apply the first resin layer 2000 5 300 4.22-4.62 Example 1 Second resin layer 85 15 0 — Real third resin layer 85 4 0 — 15 〇Apply the first resin layer 3000 5 300 4.22-4.62 Example 2 Second resin layer 85 15 0 A third resin layer 85 4 0 8 〇Apply the first resin layer 1000 5 300 4.22-4.62 Example 3 The second resin layer 85 15 0 _ solid third resin layer 85 4 0-18 1 0 Apply the first resin layer 2700 5 600 4.22-4.62 Example 4 The second resin layer 85 15 0 1 solid third resin layer 85 4 0 1 8 00 1st resin layer 1400 5 60 4.22-4.62 Example 5 2nd resin layer 85 15 0 3rd resin layer 85 4 0-19 〇

18 200525004 施 例6 第一樹脂層 2900 5 720 4.22-4.62 第二樹脂層 85 15 0 — 實 施 例7 第三樹脂層 85 4 0 — 22 〇 〇 第一樹脂層 300000 5 300 4.22-4.62 第二樹脂層 85 15 0 — 實 施 例8 第三樹脂層 300 4 0 — 7 〇 〇 第一樹脂層 3000 5 300 4.22-4.62 第二樹脂層 300 15 0 — 實 第三樹脂層 300 4 0 — 21 〇 〇 施 第一樹脂層 300000 5 300 4.22-4.62 例9 第二樹脂層 300 15 0 —18 200525004 Example 6 First resin layer 2900 5 720 4.22-4.62 Second resin layer 85 15 0 — Example 7 Third resin layer 85 4 0 — 22 〇 First resin layer 300,000 5 300 4.22-4.62 Second resin Layer 85 15 0 — Example 8 Third resin layer 300 4 0 — 7 〇 First resin layer 3000 5 300 4.22-4.62 Second resin layer 300 15 0 — Actual third resin layer 300 4 0 — 21 〇〇 First resin layer 300000 5 300 4.22-4.62 Example 9 Second resin layer 300 15 0 —

〔表2〕粘著膜之構成、評價試驗結果(比較例) 評價試驗結果 最低粘度 膜厚 導電性粒子 導電性 導通可 絕緣可 (Pa-s) (^m) 粒子密度 粒徑 粒子數 靠性 靠性 (萬個 (//m) /mm3) 比 第三樹脂層 85 4 0 — 12 〇 X 較 第一樹脂層 2000 10 300 4.22-4.62 例1 第二樹脂層 85 10 0 一 比 第三樹脂層 85 10 0 一 4 X 〇 較 第一樹脂層 2000 5 300 4.22-4.62 例2 第二樹脂層 85 10 0 — 比 第三樹脂層 85 15 0 - 5 X 〇 較 第一樹脂層 2000 5 300 4.22-4.62 例3 第二樹脂層 85 5 0 一 比 第三樹脂層 300 4 0 — 1 X 〇 較 第一樹脂層 150 5 300 4.22-4.62 例4 第二樹脂層 300 15 0 -[Table 2] Adhesive film composition and evaluation test results (comparative example) Evaluation test results Lowest viscosity Film thickness Conductive particles Conductivity Conductivity Conductive insulation (Pa-s) (^ m) Particle density Particle size Reliability Reliability (10,000 pieces (// m) / mm3) Compared with the third resin layer 85 4 0 — 12 〇X Compared with the first resin layer 2000 10 300 4.22-4.62 Example 1 The second resin layer 85 10 0 compared with the third resin Layer 85 10 0-4 X 〇 compared to the first resin layer 2000 5 300 4.22-4.62 Example 2 second resin layer 85 10 0 — than the third resin layer 85 15 0-5 X 〇 compared to the first resin layer 2000 5 300 4.22 -4.62 Example 3 The second resin layer 85 5 0 is one third than the third resin layer 300 4 0 — 1 X 〇 compared with the first resin layer 150 5 300 4.22-4.62 Example 4 The second resin layer 300 15 0-

19 200525004 比 較 例5 第三樹脂層 300 4 0 1 X 〇 第一樹脂層 150 5 600 4.22-4.62 第二樹脂層 300 15 0 比 第三樹脂層 85 4 0 一 η X 較 第一樹脂層 30 5 300 4.22-4.62 丄 〇 例6 第二樹脂層 85 15 0 又,由於附絕緣膜之導電性粒子的粒徑在4 22〜4 62 # m的範圍,其平均粒徑亦在範圍。 <實施例2> 所採用的第一粘著劑,係由熱固性樹脂(商品名「艾比 寇特4007P」,日本環氧樹脂(股)製)8〇重量%、與咪唑系硬 化劑(商品名「2MZ」、四國化成工業(股)製)2〇重量%所組 成二且最低粘度高於實施例丨的第一粘著劑者,除此外係 與實施例1同樣的條件製作出實施例2的粘著膜4。 <實施例3 > 所採用的第一粘著劑 係由熱固性樹脂(商品名「艾比 寇特4007」,日本環氧樹脂(股)製)8()重量%、與㈣系硬19 200525004 Comparative Example 5 Third resin layer 300 4 0 1 X 〇 First resin layer 150 5 600 4.22-4.62 Second resin layer 300 15 0 Compared with third resin layer 85 4 0-η X Compared with first resin layer 30 5 300 4.22-4.62 Example 6 Second resin layer 85 15 0 In addition, since the particle diameter of the conductive particles with an insulating film is in the range of 4 22 to 4 62 # m, the average particle diameter is also in the range. < Example 2 > The first adhesive used was 80% by weight of a thermosetting resin (trade name "Abikot 4007P", manufactured by Japan Epoxy Resin Co., Ltd.) and an imidazole-based hardener ( The product with the brand name "2MZ" and Shikoku Chemical Industry Co., Ltd. 20% by weight and having the lowest viscosity higher than the first adhesive of Example 丨 was produced under the same conditions as Example 1 The adhesive film 4 of Example 2. < Example 3 > The first adhesive used was made of a thermosetting resin (trade name "Abikot 4007", manufactured by Japan Epoxy Resin Co., Ltd.) 8 (% by weight), and hardened with fluorene.

化劑(商品名「2E4MZ」、四國化成工業(股)製)2〇重量%所 組成、且最㈣度低於實施们的第_枯著劑者,除此外 係與實施例1同樣的條件製作出實施例3的粘著膜4。 &lt;實施例4&gt; 除將分散於第一樹脂層中之 日層Τ之附絕緣被膜之導電性粒子 數增多以外,係與實施例丨同 J徠的條件製作出實施例4的 粘著膜4。 20 200525004 〈實施例5&gt; 除將分散於第一樹脂層中之 Y之附絕緣被膜之導電性粒子 數減少以外,係與實施例丨同揭 J樣的條件製作出實施例5的 赤占著膜4。 &lt;實施例6&gt; 附絕緣被膜之導電性粒子 係與實施例4同樣的條件A chemical agent (brand name "2E4MZ", Shikoku Chemical Industry Co., Ltd.) of 20% by weight, and the lowest degree of __depleting agent is the same as in Example 1, except that The adhesive film 4 of Example 3 was prepared under the conditions. &lt; Example 4 &gt; An adhesive film of Example 4 was produced under the same conditions as those of Example 丨 except that the number of conductive particles of the insulating layer with an insulating film dispersed in the first resin layer T was increased. 4. 20 200525004 <Example 5> Except that the number of conductive particles of the insulating coating with Y dispersed in the first resin layer was reduced, the same conditions as those of Example 丨 were used to make the sample of Example 5. Film 4. &lt; Example 6 &gt; Conductive particles with insulation film The same conditions as in Example 4

除將分散於第一樹脂層中之 數增多成比實施例4更多以外, 製作出實施例6的粘著膜4。 &lt;實施例7〉 於弟-枯著劑中添加絕緣性填料之二氧化石夕粒子(平 粒徑〇·5ρ),而形成含該填料4Q重量%之第—樹脂層κ 除此外係與實施例1同樣的條件製作出實施例7的枯心 4 〇 &amp;貫施例8&gt; 所採用的第二、第三粘著劑,焱山也η 係由熱固性樹脂(商占An adhesive film 4 of Example 6 was produced except that the number of particles dispersed in the first resin layer was increased to be larger than that of Example 4. &lt; Example 7> An insulating filler of silica dioxide particles (flat particle diameter of 0.5ρ) was added to the diluent to form a first resin layer κ containing 4Q% by weight of the filler. In the same conditions as in Example 1, the dry heart 4 of Example 7 was produced. 0 & Example 8 &gt; The second and third adhesives used, Sheshan also η is made of thermosetting resin (commercially

艾比寇特1007」,日本環氧樹脂(股)製)8〇重量%、盛 唾系硬化劑(商品名「2ΜΖ」、四國化成工業(股)製)2&quot; %所組成、且最低粘度高於實施例2的第二、第三粘聋 者’除此外係與實施例2同樣的條件製作出實施二^ 著膜4。 〈貫施例9&gt; 「―㈣用的第二、第三枯著劑’係由熱固性樹脂(商品名 二比寇特4007Ρ」,日本環氧樹脂(股)製)8〇重量%、與 唑系硬化劑(商品名「2ΜΖ」、四國化成工業(股)製陶量 21 200525004 %所組成、且最低枯度向於實施例7 » ^ ’ 的弟二^、第一 者,除此外係與貫施例7同樣的條件製 著膜4。 1作出實施例 粘著劑 8的钻 以外 膜0 &lt;比較例1〉除第-樹脂層膜厚為10&quot;m、第二樹脂層膜厚為 ,係以與實施例!同樣的條件製作出比較例i 10 /z m 的粘著 以外 膜0 除第二樹脂層膜厚㈣、第三樹脂層臈厚為心] ’係以與實施例1同樣的條件製“比較例2的則"Abikot 1007", 80% by weight of Japan's epoxy resin (stock), saliva-based hardener (trade name "2MZ", Shikoku Chemical Industry (stock)) 2 &quot;% and the lowest The second and third deaf people with higher viscosities than in Example 2 were prepared under the same conditions as in Example 2 except that the second implant film 4 was produced. <Example 9> "" Second and Third Bulking Agents "are made of a thermosetting resin (trade name: Bicote 4007P), manufactured by Japan Epoxy Resin Co., Ltd.) 80% by weight, and azole Series hardener (commercial name "2ΜZ", Shikoku Chemical Industry Co., Ltd. made of ceramics 21 200525004%, and the lowest dryness is the same as the second one in Example 7 »^ ', the first one, except for the other The film 4 was formed under the same conditions as in Example 7. 1 The film of the adhesive of Example 8 was prepared. 0 &lt; Comparative Example 1> Except for the first-resin layer film thickness of 10 &quot; m and the second resin layer film thickness. In order to make an adhesive film of Comparative Example i 10 / zm under the same conditions as in Example! 0 except that the thickness of the second resin layer and the thickness of the third resin layer are at the center] 'It is the same as in Example 1 The same condition system "comparative example 2

&lt;比較例3&gt; 除第二樹脂層膜 以外,係以與實施例 膜0 厚為5/zm、第三樹脂層膜厚為 1同樣的條件製作出比較例3的粘著 &lt;比較例4&gt; 除將第'钻著劑改為實施例1所使用之第二枯著劑以 外,係以與實施例8同樣的條件製作出比較例4的枯著膜。 &lt;比較例5&gt; 矛、將刀政於第一樹脂層之附絕緣被膜的導電性粒子數 增多成比比較例4 p夕μ . 夕外’係以與比較例4同樣的條件製 作出比較例5的粘著膜。 &lt;比較例6&gt; 、认第粘著劑中除去硬化劑以外,係以與實施例1 22 200525004 同樣的條件製作出比較例6的粘著膜。 該等實施例2〜9、比較例1〜6之粘著膜4中各樹脂層 20、25之最低粘度、膜厚、附絕緣被膜之導電性 的密度、附絕緣被膜之導電性粒子的粒徑,係記載於上述 表1、表2中。&lt; Comparative Example 3 &gt; An adhesive of Comparative Example 3 was produced under the same conditions as in Example film 0 with a thickness of 5 / zm and a third resin layer with a thickness of 1 except for the second resin layer film. &lt; Comparative example 4 &gt; A dry film of Comparative Example 4 was produced under the same conditions as in Example 8 except that the first drilling agent was changed to the second dry agent used in Example 1. &lt; Comparative Example 5 &gt; The number of conductive particles of the spear and the insulating film with an insulating coating on the first resin layer was increased in proportion to Comparative Example 4 p. μ. The outside conditions were made under the same conditions as in Comparative Example 4 The adhesive film of Example 5. &lt; Comparative Example 6 &gt; An adhesive film of Comparative Example 6 was prepared under the same conditions as in Example 1 22 200525004 except that the hardener was removed from the second adhesive. Minimum viscosity, film thickness, conductive density with insulation coating, and particle size of conductive particles with insulation coating of the resin layers 20 and 25 in the adhesive films 4 of Examples 2 to 9 and Comparative Examples 1 to 6 The diameters are described in Tables 1 and 2 above.

又,各樹脂層之最低粘度,並非樹脂層構成材料(例女 熱固性樹脂)單獨的粘度,而是測定製得的樹脂層粘度,合 如不僅含熱固性樹脂而添加有硬化劑時,係測定硬=劑缚 加狀態之樹脂層枯度’又當添加有導電性粒子及填料時| 係測定導電性粒子及填料添加狀態之樹脂層粘度。 使用上述實施例i~9、比較例i〜6之粘著膜4,以連描 溫度190t、緊壓負荷1960kPa、加熱緊壓時間1〇秒的傾 件將半導體元件50與電路基板4〇予以連接,而製得實摊 例1〜9、比較例1〜6之電氣裝置i。In addition, the minimum viscosity of each resin layer is not the viscosity of the resin layer constituting material (such as a thermosetting resin), but the viscosity of the resin layer obtained. If the hardener is not only contained in the thermosetting resin, the hardness is measured. = Dryness of the resin layer in the state of additive binding 'and when conductive particles and fillers are added | It is the measurement of the viscosity of the resin layer in the state where the conductive particles and fillers are added. Using the adhesive film 4 of the above examples i-9 and comparative examples i-6, the semiconductor element 50 and the circuit board 40 were applied with tilting pieces having a continuous drawing temperature of 190 t, a compression load of 1960 kPa, and a heating compression time of 10 seconds. The electrical devices i of Examples 1 to 9 and Comparative Examples 1 to 6 were obtained by connection.

一在此採用的半導體元件50,係在寬h8mm、長2〇mm、 门〇.4mm之半導體疋件5〇單面,以4〇咖的間隔形成有金 突塊=接端子52)者,該金突塊之接合面積為45//mx3〇# m、咼15//m。所採用的電路基板40,係在玻璃基板41上 形成膜厚0.7/zm的氧化銦膜構成的連接端子42者。 比較例1〜6之電氣裝置1,進行以下 針對實施例1〜9、 的評價試驗。 〔導電性粒子數〕 ^彳文電路基板40側,用光學顯微鏡(倍率340倍)觀察各 電氣波置1之2GG個部位之突塊,計算突塊所補捉的導電 23 200525004 性粒子12數。200個部位的突塊中, 最少的部位之數目記載於表1、表2中。〃粒子捕捉數 〔導通可靠性〕 對各電氣裝置1,使用懕Λ 4^ 制夕* 「 用壓力1尚4驗器(特比耶斯佩克(股) 製之商品名「EHS_411 ) 」J涮疋相對向之第一、第二連接 化子42、52間之導通電阻。軎墓 4阻&quot;導通電时则以下時評價A semiconductor element 50 used here is a semiconductor element 50 on one side with a width of 8 mm, a length of 20 mm, and a gate of 0.4 mm, with gold bumps formed at intervals of 40 cm = terminals 52). The bonding area of the gold bump is 45 // mx30 # m, 咼 15 // m. The circuit board 40 used was a connection terminal 42 formed on a glass substrate 41 with an indium oxide film having a thickness of 0.7 / zm. The electrical devices 1 of Comparative Examples 1 to 6 were subjected to the following evaluation tests for Examples 1 to 9. [Number of conductive particles] ^ Observe the 40 side of the printed circuit board, observe the bumps at 2GG locations where each electrical wave is set with an optical microscope (340 times magnification), and calculate the number of conductive particles captured by the bumps 23 200525004 12 . Tables 1 and 2 show the number of the smallest parts of the 200-site protrusions.数 Number of particle traps [Continuity reliability] For each electrical device 1, use 懕 Λ 4 ^ system evening * "Pressure 1 and 4 testers (trade name" EHS_411 "made by Terbijspek)) J涮 疋 On-resistance between the opposite first and second linkers 42, 52. Tomb 4 resistance &quot; Evaluation when conducting

X 為〇」,當導通電阻超過30 Ω時評價為 〔絕緣可靠性〕"X is 0", when the on-resistance exceeds 30 Ω, it is evaluated as [insulation reliability]

對各電氣裝置1,測定同一益 被枯者體之相鄰接的連接端 ^ 52間之絕緣電阻。當絕緣電阻在ΐχΐ〇8Ω以上時評價為 「0」,當絕緣電阻未達1&gt;&lt;1〇^時評價為「χ」。 將沒些評價結果記載於表丨。從表丨可看出,第一樹脂 =最㈣度纟觸〜3(K)_Pa. s、且第二樹脂層膜厚比 第一、第三樹脂層為大之實施例丨〜9的電氣裝置ι,其導電 性粒子被突塊捕捉數較多,而在導通可靠性、絕緣可靠性 上均獲得良好的評價結果。For each electrical device 1, measure the insulation resistance between adjacent connection terminals ^ 52 of the same victim body. It was evaluated as "0" when the insulation resistance was ΐχΐ〇8Ω or more, and was evaluated as "χ" when the insulation resistance was less than 1 &gt; &lt; 1 ^. The evaluation results are shown in Table 丨. It can be seen from Table 丨 that in the case of the first and third resin layers, the first resin = the maximum contact thickness of ~ 3 (K) _Pa.s, and the film thickness of the second resin layer is larger than that of the first and third resin layers. In the device ι, the number of conductive particles captured by the bumps is large, and good evaluation results are obtained in both the conduction reliability and the insulation reliability.

相對於此,第一、第二樹脂層的膜厚相同之比較例i, 雖導通可靠性優異,但絕緣可靠性差;又第三樹脂層膜厚 與第二樹脂層相同、或較多之比較例2、3,導通可靠性變 差。因此’第一樹脂層的膜厚低於第二樹脂層的膜厚時, 電氣裝置之導通可靠性高,第三樹脂層的膜厚低於第二樹 脂層的膜厚時,電氣裝置之絕緣可靠性高。 又’從比較例4可看出,當第一樹脂層的最低粘度為 較小之150Pa · s、第二、第三樹脂層之最低粘度大於第一 24 200525004 樹脂層時,導通可靠性低,就算像比較例5般將導電性粒 子的密度提高,仍無法改善導通可靠性。 根據比較例4、5的結果可知,為獲得高導通可靠性之 電氣裝置,第一樹脂層的最低粘度必須比第二、第三樹脂 層的最低粘度大,且其值必須大於l〇〇〇pa · s。又,使用不 含硬化劑之第一粘著劑來形成第一樹脂層之比較例6,其導 通可靠性之評價結果不佳。 當第一樹脂層與第二樹脂層、第一樹脂層與第三樹脂 層、即相鄰接之樹脂層的最低粘度差異較大時,加熱緊壓鲁 時樹脂層彼此難以相混,硬化後的粘著膜無法形成連續的 硬化物。因此可推知,在比較例6之硬化後之粘著膜,其 將電氣零件彼此拉近的應力很小,而造成導通可靠性降低。 相對於此,像上述實施例丨〜9中在第一樹脂層添加硬 化劑(使熱固性樹脂硬化)的情形,於導電性粒子周圍,第一 粘著劑在加熱時會產生硬化收縮。亦即可推知,電氣零件 之連接端子所挾持之導電性粒子周圍會產生硬化收縮,而 發生使電氣零件彼此拉近的應力,故就算相鄰接之樹脂層· 的最低粘度差異大,仍能獲得高導通可靠性。 以上所說明者’雖是針對在第二、第三樹脂層20、25 中不含導電性粒子的情形,但本發明並不限於此,只要其 導電f生粒子拴度小於第一樹脂層i 〇的導電性粒子密度,第 一、第三樹脂層Μ、25中當然也能含有導電性粒子。 又’當第-樹脂層10的膜厚薄化至導電性粒子 .均粒徑之1/2倍〜2倍時,導電性粒子12的一部分會從第一 25 200525004 樹脂層1 0表面突出,而嵌入第二、第三樹脂層20、25中, 但只要第二、第三樹脂層20、25中不含導電性粒子,即可 使第二、第三樹脂層2〇、25的導電性粒子密度比第一樹脂 層10來得小。 第一、第二被粘著體並不限於電路基板4〇、半導體元 件50,就被粘著體而言,也能採用在樹脂膜上形成配線膜 之軟性配線板、電阻元件、液晶顯示元件等各種元件。 第一〜第三熱固性樹脂的種類沒有特別的限定,可採用 襄氧祕J3曰、二聚氰胺樹脂、丙烯酸g旨樹脂、盼樹脂、尿素 擊 樹脂等等。 第一〜第三硬化劑的種類沒有特別的限定,可依第一〜 第二熱固性樹脂的種類來選擇。例如,當熱固性樹脂使用 環氧樹脂時,可採用咪唑系硬化劑、聚胺系硬化劑、酸酐、 異氰酸酯系硬化劑、有機酸、三級胺等等。考慮到粘著膜 之保存性時,硬化劑較佳為使用潛伏型硬化劑,其在室溫 下不致使熱固性樹脂硬化,但經由加熱即可促進硬化反 應。潛伏型硬化劑可採用:將上述硬化劑膠囊化而成者,馨 或封端異氰酸酯。 、上…河很隹弟一樹脂層10添加填料的情 形’但本發明並不限於此,也能在第二、第三樹脂層2〇、 25中添加填料,只要改變第二、第三樹脂層20、25所使用 ::㈣類、平均粒徑、配合量,即可使第二、第三樹脂 …之最低粘度比第-樹脂層1〇的最低粘度為低。 弟一〜第三樹脂層所添加之填料,較佳為使用絕緣性 26 200525004 ==料的種類沒有特別的限ι除二氧切以外,也能 u 十 虱化鎂、虱化辞等的無機填 科’或树脂粒子等的有機填料 機具#等#。填料之平均粒徑,只 要在導電性粒子之平均粒徑 曰 、平乂狂两1 // m以下),即可 :連接端子間之導通可靠性。χ,各樹脂層中,除 :,也能添加老化防止劑、著色劑、錢偶合劑等的添 加劑。In contrast, Comparative Example i, in which the film thicknesses of the first and second resin layers were the same, had excellent conduction reliability but poor insulation reliability; and the third resin layer had the same film thickness or more than the second resin layer. For examples 2 and 3, the conduction reliability is deteriorated. Therefore, when the film thickness of the first resin layer is lower than the film thickness of the second resin layer, the electrical device has high conduction reliability, and when the film thickness of the third resin layer is lower than the film thickness of the second resin layer, the electrical device is insulated. High reliability. It can also be seen from Comparative Example 4 that when the minimum viscosity of the first resin layer is 150 Pa · s, and the minimum viscosity of the second and third resin layers is greater than the first 24 200525004 resin layer, the conduction reliability is low. Even if the density of the conductive particles is increased like in Comparative Example 5, the conduction reliability cannot be improved. From the results of Comparative Examples 4 and 5, it is known that in order to obtain an electrical device with high conduction reliability, the minimum viscosity of the first resin layer must be greater than the minimum viscosity of the second and third resin layers, and its value must be greater than 100. pa · s. In Comparative Example 6 in which the first resin layer was formed by using the first adhesive without a hardener, the evaluation result of the conduction reliability was not good. When the difference between the minimum viscosity of the first resin layer and the second resin layer, the first resin layer and the third resin layer, that is, the adjacent resin layers is large, the resin layers are difficult to mix with each other when heated and compacted. The adhesive film cannot form a continuous hardened product. Therefore, it can be inferred that, in the cured film of Comparative Example 6, the stress with which the electrical parts were brought closer to each other was small, resulting in a decrease in the reliability of the conduction. On the other hand, as in the case of the above-mentioned Examples 1 to 9, when a hardener is added to the first resin layer (to harden the thermosetting resin), the first adhesive will harden and shrink when heated around the conductive particles. In other words, it can be inferred that the conductive particles held by the connection terminals of the electrical parts will harden and shrink around, and the stress that brings the electrical parts close to each other will occur. Therefore, even if the minimum viscosity difference between adjacent resin layers is large, it can still Obtain high conduction reliability. The above description is directed to the case where the second and third resin layers 20 and 25 do not contain conductive particles, but the present invention is not limited to this, as long as the degree of bond of the conductive particles is smaller than that of the first resin layer i It is a matter of course that the conductive particle density of 0 can also contain conductive particles in the first and third resin layers M and 25. Also, when the film thickness of the first resin layer 10 is reduced to conductive particles. When the average particle diameter is 1/2 to 2 times, a part of the conductive particles 12 protrudes from the surface of the first 25 200525004 resin layer 10, and Embedded in the second and third resin layers 20 and 25, but as long as the second and third resin layers 20 and 25 do not contain conductive particles, the conductive particles of the second and third resin layers 20 and 25 can be made. The density is smaller than that of the first resin layer 10. The first and second adherends are not limited to the circuit board 40 and the semiconductor element 50. As for the adherend, a flexible wiring board, a resistance element, and a liquid crystal display element in which a wiring film is formed on a resin film can also be used. And other components. The types of the first to third thermosetting resins are not particularly limited, and may include, for example, Oxygen J3, melamine resin, acrylic resin, acrylic resin, urea resin, and the like. The types of the first to third hardeners are not particularly limited, and can be selected according to the types of the first to second thermosetting resins. For example, when an epoxy resin is used for the thermosetting resin, an imidazole-based hardener, a polyamine-based hardener, an acid anhydride, an isocyanate-based hardener, an organic acid, a tertiary amine, and the like can be used. In consideration of the storage stability of the adhesive film, it is preferable to use a latent type hardener, which does not harden the thermosetting resin at room temperature, but promotes the hardening reaction by heating. As the latent hardener, the above-mentioned hardener can be encapsulated, or a blocked isocyanate. , ... The case where a filler is added to the first resin layer 10 ', but the present invention is not limited to this, and fillers can be added to the second and third resin layers 20 and 25, as long as the second and third resins are changed. Layers 20 and 25 are used: ㈣, average particle size, and blending amount, so that the lowest viscosity of the second and third resins is lower than the lowest viscosity of the first resin layer 10. The filler added to the first to third resin layers is preferably an insulating material. 26 200525004 == There is no particular limitation on the type of material. In addition to dioxin, it can also be used for inorganic substances such as magnesium, lice, etc. Organic fillers such as filling materials or resin particles # 等 #. The average particle diameter of the filler is only required if the average particle diameter of the conductive particles is less than or equal to 1 / m), and it is: the reliability of the conduction between the connection terminals. χ, in addition to: in each resin layer, additives such as an anti-aging agent, a colorant, and a coin coupler can also be added.

、電丨生粒子,除上述般將樹脂粒子表面以導電層被 楚外’也旎採用鎳粒子、銀粉般之金屬粒子,或碳粒子 也恥使用2種以上的導電性粒子混合物。 52又:、依據本發明,由於導電性粒子不易流入連接端· &gt;、算使用不具絕緣被覆之導電性粒子仍能獲得高 接可靠性之電氣裝置1。 ’ 一 Ζ上所說明者,係針對將第三樹脂層25直接形成於第 一樹月:層10表面的情形,但本發明並不限於此,也能將第For electro-generated particles, the surface of resin particles is covered with a conductive layer as described above. Nickel particles, silver powder-like metal particles, or carbon particles are also used. A mixture of two or more conductive particles is also used. 52: According to the present invention, since the conductive particles do not easily flow into the connection terminal, &gt; the electrical device 1 with high connection reliability can be obtained even by using conductive particles without an insulating coating. The description above is directed to the case where the third resin layer 25 is directly formed on the surface of the first tree moon: layer 10, but the present invention is not limited to this, and the first

〇月曰層25形成於其他剝離膜上後,再將第三樹脂層 與第一樹脂層1〇貼合。 θ二上所w兒明者’係針對在第一樹脂層1〇表面先形成膜 旱第樹月曰層1〇厚的樹脂層(第二樹脂層的情形,但 本&amp;月並不限於此,也能在第一樹脂層10表面先形成膜厚 $ 層10 _之樹脂層(第三樹脂層25)後,從第一樹 脂層1 0剝第一剝齙 /離膜31,再在第一樹脂層10之露出表面, 形成膜厚比第—糾# a — 弟秘月曰層10厚的樹脂層(第二樹脂層20)。 第〜第二剝離臈31〜33,較佳為使用將樹脂膜表面(剝 27 200525004 離膜)施以表面處理而成者 名榭浐瞪本品π &gt; , 万、表面處理的方法,例如可 在树知胰表面形成粘著性 … 乂低之其他樹脂膜。 弟一〜第三粘著劑之塗 形也能使用浸塗法、到刀冷、,’並不限於採用輥塗的情 ,....aB , y 土法、膠版印刷等各種方法。 5兄,係針對在粘著膜4兩面分別貼附剝離 膜之附剝離膜的枯著劑情 刀別貼附剝綠 口 仁本發明亚不限於此,例如 ,、要在乐一剝離朕2 1之第-抖 弟—祕月曰層20配置面之相反側面 施以表面處理來形成剝離面, 就τ不貼附剝離膜即將粘著 膜4予以捲繞,仍不致造 # ,不致&amp;成昂二樹脂層25與第二剝離膜32 《柏者。 【圖式簡單說明] 圖1(a)〜(e)係說明本發 七月之附剝離馭之粘著膜的繫 方法第一例前半部之截面圖。 、° 圖2(f)係說明本發明 十知π又I付剥離朕之粘著膜的製造方 第一例後半部之截面圖。 ' 圖3係說明本發明採用的第-被粘著體的一例之截面After the layer 25 is formed on another release film, the third resin layer and the first resin layer 10 are bonded together. θ 二 上 所 明明 'is for the first resin layer 10 to form a film on the surface of the first layer of the first layer of the resin layer 10 thick resin layer (the case of the second resin layer, but this & month is not limited to In this way, it is also possible to form a resin layer (third resin layer 25) with a film thickness of $ 10 on the surface of the first resin layer 10, peel the first peeling / release film 31 from the first resin layer 10, and then The exposed surface of the first resin layer 10 forms a resin layer (second resin layer 20) having a film thickness greater than that of the first-correction layer # a—the second resin layer 20. The first to second peeling layers 31 to 33, preferably Using the surface treatment of the resin film surface (peeling 27 200525004 release film), the name of the product 浐 &gt;, surface treatment methods, such as the formation of adhesion on the surface of the tree pancreas ... 乂 Low Other resin films. The coating of the first to third adhesives can also use the dip coating method, until the knife is cold, and is not limited to the case of roller coating, ... aB, y soil method, offset printing Various methods, such as 5 brothers, are aimed at the adhesive film 4 on each side of the adhesive film with a peeling film with a peeling agent attached to the peeling film, please do not attach green kernels. The present invention is not limited to this For example, if you want to apply a surface treatment to the opposite side of the first-shake-mystery-mythical layer 20 of Leyi Peeling 21 to form the peeling surface, roll up the adhesive film 4 without attaching the peeling film. Winding, still does not make #, will not cause &amp; Cheng two resin layer 25 and the second peeling film 32 "Bai Zhe. [Simplified illustration of the figure] Figure 1 (a) ~ (e) illustrates the attached peel in July Sectional view of the first half of the first example of the method of the adhesive film of the control method. Fig. 2 (f) is a cross-section of the second half of the first example of the adhesive film of the present invention, which is made of π and I. Fig. 'Fig. 3 is a cross-section illustrating an example of a first adherend used in the present invention

圖4係說明本發明採用的第 一被枯著體的一例之截面 圖5⑷〜(dH系說明使用本發明之粘著膜來製造電 置的步驟之截面圖。 1 圖6(a)、(b)係說明本發明之附剝離膜之粘著獏的製造 方法第二例之戴面圖。 ^ 圖7係喊不將樹脂層加熱時粘度與溫度之關係。 200525004 【主要元件符號說明】 1…電氣裝置 3…積層體 4…粘著膜 10···第一樹脂層 11···結合劑 12···導電性粒子 20···第二樹月旨層 25···第三樹月旨層 3卜··第一剝離膜 32···第二剝離膜 40···第一被粘著體(電路基板) 42…第一連接端子 50···第二被粘著體(半導體元件) 52···第二連接端子 29Fig. 4 is a cross-sectional view illustrating an example of the first to-be-deposited body used in the present invention. Figs. 5 (a) to (dH) are cross-sectional views illustrating the steps for manufacturing an electrical device using the adhesive film of the present invention. 1 Fig. 6 (a), ( b) It is a wearing view illustrating the second example of the method for manufacturing the adhesive sheet with a release film of the present invention. ^ Figure 7 is the relationship between viscosity and temperature when the resin layer is not heated. 200525004 [Explanation of Symbols of Main Components] 1 ... Electrical device 3 ... Laminate 4 ... Adhesive film 10 ... First resin layer 11 ... Binder 12 ... Conductive particles 20 ... Second tree moon purpose layer 25 ... Third tree The purpose layer 3: the first release film 32 ... the second release film 40 ... the first adherend (circuit board) 42 ... the first connection terminal 50 ... the second adherend ( Semiconductor element) 52 ... Second connection terminal 29

Claims (1)

200525004 十、申請專利範圍: 1、 一種枯者膜’係具備:第一樹脂層、配置於第一樹 脂層上之第二樹脂層、配置於第一樹脂層之第二樹脂層相 反側之第三樹脂層,該第一樹脂層具有絕緣性結合劑、及 分散於結合劑中之導電性粒子,該絕緣性結合劑具有第一 熱固性樹脂、及第一硬化劑(經由加熱會與第一熱固性樹脂 反應而使第一熱固性樹脂硬化),該第二樹脂層具有絕緣性 第一熱固性樹脂、及第一硬化劑(經由加熱會與第二熱固性 樹脂反應而使第二熱固性樹脂硬化),該第三樹脂層具有絕 緣性第二熱固性樹脂、及第三硬化劑(經由加熱會與第三熱 固性樹脂反應而使第三熱固性樹脂硬化),將該枯著膜配置 於第一被粘著體(具有第一端子)與第二被粘著體(具有第二 端子)之間進行加熱緊壓,而使第一〜第三樹脂層昇溫至既Z 的連接溫度以λ ’則在第-、第二連接端子間挾持導電性 粒子之狀態下,第一〜第三熱固性樹脂會分別與第一〜第三 硬化劑反應而硬化,而將第一、第二被粘著體予以連接厂 該第-樹脂層,在低於連接溫度的溫度範圍之最低枯 度為1000〜lOOOOOOPa · s以下,今笛—似ntl &amp; ’ 卜肩第一樹脂層,在低於連接 溫度的溫度範圍之最低粘度比該第 Ζ罘树月曰層為低,該第二 樹脂層之膜厚’係大於第一、第三樹脂層之膜厚。- 2、 如申請專利範圍第i項之枯著膜,其中該第二樹脂 二二於下連接溫度的溫度範圍之最低枯度為第-樹脂層 3、 如申請專利範圍第丨或第2 貝之枯者膜,其中該第 30 200525004 -樹脂層之膜厚,係導電性 4、 如申請專利範圍第 -樹脂層之導電性粒子密 、:㈣膜,其中該第 5、 如击 比第—樹脂層為大。 如申㉖專利範圍第1或第 二樹脂層之膜厚,係比密合 第,:㈣,其中該第 體(選自第一、第—被钻、弟—树月曰層側之被粘著 被枯者體)之連接端子膜厚為大。 如申請專利範圍第1或第2項之粘著腔㈠ 三樹脂層’在低於連接溫度的溫度範圍之最低Μ 第 樹脂層為低。 最低粘度比第一 7、如申請專利範圍 層,在低於連接溫度的 之1 /10以下。200525004 10. Scope of patent application: 1. A dry film is provided with a first resin layer, a second resin layer disposed on the first resin layer, and a second resin layer disposed on the opposite side of the second resin layer of the first resin layer. Three resin layers. The first resin layer has an insulating bonding agent and conductive particles dispersed in the bonding agent. The insulating bonding agent has a first thermosetting resin and a first curing agent (which is connected to the first thermosetting resin by heating). The resin reacts to harden the first thermosetting resin), the second resin layer has an insulating first thermosetting resin, and a first curing agent (the second thermosetting resin is hardened by reacting with the second thermosetting resin through heating). The three resin layer has an insulating second thermosetting resin and a third curing agent (the third thermosetting resin is hardened by reacting with the third thermosetting resin through heating), and the dead film is disposed on the first adherend (having The first terminal) and the second adherend (having the second terminal) are heated and pressed, so that the first to third resin layers are heated up to a connection temperature of Z to λ ' In a state where conductive particles are held between the first and second connection terminals, the first to third thermosetting resins react with the first to third hardeners to harden, respectively, and the first and second adherends are cured. The first resin layer of the first resin layer in the connection temperature range below the connection temperature is 1000 ~ 1000OOPa · s, which is the first resin layer like ntl &amp; The lowest viscosity in the temperature range is lower than that of the Zth tree, and the film thickness of the second resin layer is greater than the film thickness of the first and third resin layers. -2. If the dead film of item i of the patent application scope, wherein the lowest dryness of the temperature range of the second resin 22 and the lower connection temperature is the-resin layer 3, such as the patent application scope 丨 or 2 The film of the dead, where the 30th 200525004-the thickness of the resin layer is conductive 4, such as the scope of the patent application-the conductive particles of the resin layer are dense, the film is thin, where the 5th, such as the hit ratio is- The resin layer is large. For example, the film thickness of the first or second resin layer in the patent application range is closer than that of the close contact: ㈣, where the first body (selected from the first, the second—the drilled, and the younger—the tree side of the layer is stuck) The thickness of the connection terminal of the victim) is large. For example, the adhesive cavity of the first or second item of the patent application ㈠ The three resin layers' are at the lowest Μ resin layer at a temperature range lower than the connection temperature. The lowest viscosity ratio is the first 7. If the layer is in the range of patent application, it is below 1/10 of the connection temperature. 第6項之粘著膜,其中該第三樹脂 溫度範圍之最低粘度為第一樹脂層 申請專利範圍第1或第2項之枯著膜 τ 第三樹脂層的膜厚比第-樹脂層為薄 右^、—種枯著膜之製造方法,係用來製造至少單面期 有剝離膜之粘著膜,苴呈古The adhesive film of item 6, wherein the lowest viscosity of the third resin temperature range is the dry film of the first or second patent application range of the first resin layer. The film thickness ratio of the third resin layer is- Thin right ^, a method of manufacturing a dry film, which is used to produce an adhesive film with a peeling film at least on one side, which is ancient ^ .....有積層體,該積層體具備··第 剥離Μ、配置於第一釗雜 _ ’ 、表面之第一樹脂層、配置於 广曰層表面之第二樹脂層、及配置於第二樹脂層表面 /離膜„亥第-樹脂層,在低於連接溫度的溫度範 之取低粘度比第二樹脂層為高; 將該積層體之第-剝離膜從第—樹脂層剝離而使第 ::脂層表面露出,纟露出的第一樹脂層表面塗布液狀枯 —並使其乾燥’藉此形成第三樹脂層並製造出粘著膜。 0如申呀專利範圍第9項之粘著膜之製造方法, 31 200525004 中該積層體之製作,係在第— 並使其乾燥而形成第一樹脂層 狀枯著劑並使其乾燥而形成第 層表面貼附該第二剝離膜。 剝離膜表面塗布液狀粘著劑 ,在弟一樹脂層表面塗布液 二樹脂層後,在該第二樹脂 、如甲請專利範圍第9項之 中該積層體之製作,係在第一、第 “方法,其 液狀㈣劑並使其乾^形成第離職面分別塗布 -樹脂層表面與第二樹脂層表面互相密第:樹脂層後,使第^ ..... there is a laminate, the laminate is provided with a first peeling M, a first resin layer disposed on the surface, a first resin layer disposed on the surface, a second resin layer disposed on the surface of the layer, and a configuration On the surface of the second resin layer / release film, the helium-resin layer has a lower viscosity than the second resin layer at a temperature range lower than the connection temperature; the first-release film of the laminate is peeled from the first resin layer And the surface of the first :: lipid layer is exposed, and the exposed surface of the first resin layer is coated with dry liquid—and dried ', thereby forming a third resin layer and producing an adhesive film. The method for manufacturing an adhesive film according to the item, 31 200525004. The production of the laminated body is at the first stage, and is dried to form a first resin layer desiccant, and dried to form a first layer, and the second surface is adhered to the second stage. Release film. The surface of the release film is coated with a liquid adhesive, and the second resin layer is coated on the surface of the first resin layer. First, the "method", in which the liquid tincture is allowed to dry and form a first ion The work surface is coated separately-the surface of the resin layer and the surface of the second resin layer are closely adhered to each other. 十一、囷式: 如次頁。Eleven, style: as the next page. 3232
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JP5196703B2 (en) 2013-05-15
JP2005200521A (en) 2005-07-28

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