WO2005068573A1 - Adhesive film and method for producing the same - Google Patents

Adhesive film and method for producing the same Download PDF

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Publication number
WO2005068573A1
WO2005068573A1 PCT/JP2004/019527 JP2004019527W WO2005068573A1 WO 2005068573 A1 WO2005068573 A1 WO 2005068573A1 JP 2004019527 W JP2004019527 W JP 2004019527W WO 2005068573 A1 WO2005068573 A1 WO 2005068573A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin layer
resin
adhesive film
adhesive
temperature
Prior art date
Application number
PCT/JP2004/019527
Other languages
French (fr)
Japanese (ja)
Inventor
Noriaki Kudo
Yasushi Akutsu
Hidetsugu Namiki
Original Assignee
Sony Chemicals Corp.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Chemicals Corp. filed Critical Sony Chemicals Corp.
Priority to KR1020067014078A priority Critical patent/KR101151133B1/en
Publication of WO2005068573A1 publication Critical patent/WO2005068573A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L24/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • HELECTRICITY
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    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • H05K3/323Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/10Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
    • C09J2301/16Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the structure of the carrier layer
    • C09J2301/162Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the structure of the carrier layer the carrier being a laminate constituted by plastic layers only
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    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/41Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the carrier layer
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    • H05K2203/1189Pressing leads, bumps or a die through an insulating layer

Definitions

  • Adhesive film method of manufacturing adhesive film
  • the present invention relates to the field of adhesives, and particularly to an adhesive containing conductive particles.
  • ACF anisotropic conductive adhesive film
  • the ACF is formed by forming an anisotropic conductive adhesive in which conductive particles are dispersed in a binder having a thermosetting resin into a film shape, and sandwiches the ACF between electric components. When heated and pressed, the ACF is softened by heating, and the connection terminal of the electric component pushes away the softened ACF due to the pressing, and the conductive particles are sandwiched between the connection terminals facing each other.
  • ACF has a thermosetting resin as a binder. If the connection terminals are further heated and pressed with the conductive particles sandwiched therebetween, the thermosetting resin is polymerized and the ACF is cured. Electrical components are electrically connected to each other by the conductive particles, and the electrical components are fixed with the cured ACF.
  • connection terminals are electrically connected.
  • connection reliability of the connection terminal is improved.
  • the wiring of the electric component is made finer, the connection between the adjacent connection terminals may be increased. Due to the small spacing, the connection terminals that should not be connected may be electrically connected by the conductive particles and short-circuit the electric components. Thus, the connection signal using the conventional ACF is Reliable, it was difficult to obtain an electrical device.
  • Patent Document 1 JP-A-6-283225
  • Patent Document 2 JP-A-7-230840
  • Patent Document 3 JP-A-8-148211
  • Patent Document 4 JP-A-9-312176
  • Patent Document 5 JP-A-10-273629
  • Patent Document 6 JP-A-11 87415
  • Patent Document 7 JP-A-2000-178511
  • the present invention has been made to solve the above-mentioned disadvantages of the conventional technology, and an object thereof is to provide an adhesive film capable of manufacturing a highly reliable electric device. Means for solving the problem
  • the present invention provides a first resin layer, a second resin layer disposed on the first resin layer, and a first resin layer.
  • a third resin layer disposed on a surface opposite to the second resin layer, wherein the first resin layer has an insulating binder and a conductive resin dispersed in the binder.
  • the insulating binder reacts with the first thermosetting resin by heating and the first thermosetting resin to cure the first thermosetting resin.
  • a first curing agent wherein the second resin layer reacts with the insulating second thermosetting resin by heating and the second thermosetting resin to form the second thermosetting resin;
  • a second curing agent for curing the curable resin wherein the third resin layer reacts with the third thermosetting resin by heating and the third thermosetting resin, Third thermosetting resin And a third curing agent that cures the first and second attachment terminals having a first connection terminal and a second attachment terminal having a second connection terminal.
  • An adhesive film configured such that the first, second, and third thermosetting resins react with the first, second, and third curing agents, respectively, and are cured to connect the first, second adherends.
  • the first resin layer is The minimum viscosity in a temperature range lower than the continuation temperature is set to be lOOOPa's or more and lOOOOOOPa's or less
  • the second resin layer has a minimum viscosity in a temperature range lower than the connection temperature that is equal to the first viscosity.
  • the viscosity of the resin layer is lower than the minimum viscosity in a temperature range lower than the connection temperature
  • the film thickness of the second resin layer is larger than the film thickness of the first and third resin layers. This is the adhesive film that was obtained.
  • the present invention is an adhesive film, wherein the second resin layer has a minimum viscosity in a temperature range lower than the connection temperature, which is lower than the connection temperature of the first resin layer. Adhesive film with a minimum viscosity of less than lZio in the range.
  • the present invention is an adhesive film, wherein the film thickness of the first resin layer is 1Z2 times or more and 2 times or less the average particle size of the conductive particles.
  • the present invention is an adhesive film, wherein the conductive resin density of the first resin layer is higher than the conductive particle density of the second resin layer.
  • the present invention is an adhesive film, wherein the film thickness of the second resin layer is one of the first and second adherends which is in close contact with the second resin layer side.
  • This is an adhesive film having a thickness larger than the thickness of the connection terminal of the body.
  • the present invention is an adhesive film, wherein the minimum viscosity of the third resin layer in a temperature range lower than the connection temperature is lower than the connection temperature of the first resin layer! This is an adhesive film whose viscosity is lower than the minimum viscosity in.
  • the present invention is an adhesive film, wherein the third resin layer has a lowest viscosity in a temperature range lower than the connection temperature, lower than the connection temperature of the first resin layer.
  • the present invention is an adhesive film, wherein the film thickness of the third resin layer is smaller than the film thickness of the first resin layer.
  • the present invention is a method for producing an adhesive film for producing an adhesive film in which a release film is adhered on at least one surface, comprising: a first release film; and a first release film disposed on a surface of the first release film.
  • the minimum viscosity in a temperature range lower than the connection temperature of the first resin layer is the second resin.
  • the present invention is a method for producing an adhesive film, wherein the laminate is produced by applying a liquid adhesive on the surface of the first release film and drying to form the first resin layer. After applying a liquid adhesive to the surface of the first resin layer and drying to form the second resin layer, the second release film is attached to the surface of the second resin layer. This is a method for producing an adhesive film.
  • the present invention is a method for producing an adhesive film, wherein the production of the laminate is such that a liquid adhesive is applied to the surfaces of the first and second release films, respectively, and dried, and the first and second
  • This is a method for producing an adhesive film in which after forming a resin layer, the surface of the first resin layer and the surface of the second resin layer are brought into close contact with each other.
  • FIG. 7 shows a case where the resin layer having the thermosetting resin and the curing agent is heated and set from the starting temperature T.
  • FIG. 7 is a graph, in which the vertical axis represents viscosity and the horizontal axis represents temperature.
  • the viscosity starts to rise.
  • the viscosity of the resin layer becomes minimum at a temperature higher than room temperature.
  • the first and second resin layers reach the minimum viscosity at a certain temperature above room temperature.
  • the second resin layer flows out toward the outside of the adherend in the vicinity of the minimum viscosity, but the first resin layer has a minimum viscosity higher than that of the second resin layer.
  • the conductive particles in the first resin layer remain between the adherends, and the conductive particles sandwiched between the first and second connection terminals. The number of children increases.
  • the minimum viscosity of the first resin layer can be changed by changing the type of the thermosetting resin, the type of the curing agent, and the blending amount of the thermosetting resin and the curing agent. It can be higher than the layer.
  • the conductive layer of the conductive particles is directly connected even if the second resin layer contains the conductive particles. Since the terminals are not touched, a short circuit between the connection terminals can be prevented.
  • the insulating coating is generally composed of an insulating resin, and is easily broken when the conductive particles are sandwiched between the first and second connection terminals.
  • the first and second connection terminals are in direct contact with the terminals, and are electrically connected by the conductive particles.
  • the thickness of the first resin layer determines the number of conductive particles of the adhesive film 4 of the present invention, high film thickness accuracy is required. Regardless of whether the first resin layer is formed on the release film surface or the second resin layer is formed directly on the surface of the first resin layer, the first resin layer is formed on the release film surface anyway. This resin layer can be formed with high film thickness accuracy.
  • the conductive particles do not flow out in the step of heating and pressing and remain between the first and second connection terminals, so that they are sandwiched between the first and second connection terminals.
  • the number of conductive particles increases.
  • the conductive particles are filled with the second resin layer between the connection terminals adjacent to each other, the connection terminals of the same adherend are not easily short-circuited. Therefore, by using the adhesive film of the present invention, an electric device having high connection reliability can be obtained.
  • FIGS. 1 (a) to 1 (e) are cross-sectional views illustrating the first half of a first example of the method for producing an adhesive film with a release film of the present invention.
  • FIG. 2 (f) is a cross-sectional view for explaining the latter half of the first example of the method for producing an adhesive film with a release film of the present invention.
  • FIG. 3 is a cross-sectional view illustrating an example of a first adherend used in the present invention.
  • FIG. 4 is a cross-sectional view illustrating an example of a second adherend used in the present invention.
  • FIG. 5 (a)-(d) is a cross-sectional view illustrating a step of manufacturing an electric device using the adhesive film of the present invention.
  • FIGS. 6 (a) and 6 (b) are cross-sectional views illustrating a second example of the method for producing an adhesive film with a release film according to the present invention.
  • FIG. 7 is a graph showing the relationship between viscosity and temperature when a resin layer is heated.
  • reference numeral 1 indicates an electric device
  • reference numeral 3 indicates a laminate
  • reference numeral 4 indicates an adhesive film
  • reference numeral 10 indicates a first resin layer
  • reference numeral 11 indicates a binder
  • reference numeral 12 denotes conductive particles
  • reference numeral 20 denotes a second resin layer
  • reference numeral 25 denotes a third resin layer
  • reference numeral 31 denotes a first release film
  • reference numeral 32 denotes a second release layer.
  • Reference numeral 40 denotes a first adherend (circuit board)
  • reference numeral 42 denotes a first connection terminal
  • reference numeral 50 denotes a second adherend (semiconductor element)
  • reference numeral 52 denotes a release film. Indicates a second connection terminal.
  • An insulating first thermosetting resin and a first curing agent for polymerizing the first thermosetting resin by heating are dispersed in an organic solvent, and a binder solution is prepared.
  • the conductive particles are dispersed in the mixture to prepare a liquid first adhesive.
  • the insulating second and third thermosetting resins are separately dispersed in an organic solvent together with the second and third curing agents to form a liquid, A second and a third adhesive containing no conductive particles are prepared.
  • the reference numeral 31 in FIG. 1 (a) indicates the first release film!
  • the first release film 31 is elongate, and one surface thereof is preliminarily subjected to a surface treatment, and the dried film thickness on the surface-treated release surface is 1Z2, which is the average particle size of the conductive particles.
  • the first adhesive was applied so as to be twice or more and twice or less, and the conductive particles 12 were dispersed in a binder 11 having a thermosetting resin and a curing agent as shown in FIG.
  • the first resin layer 10 is formed.
  • the second adhesive is applied to the first resin layer 10 such that the film thickness after drying is larger than the first resin layer 10 and larger than the height of a second connection terminal described later. Resin layer applied to 10 surfaces and dried Then, excess organic solvent is evaporated from the second adhesive to form a second resin layer 20 containing no conductive particles (FIG. 1 (b)).
  • the second resin layer 20 has a thermosetting resin and a curing agent such that the minimum viscosity in a temperature range lower than the connection temperature is lower than the minimum viscosity of the first resin layer.
  • a resin layer having a low minimum viscosity has a low viscosity even at room temperature, and has a high adhesiveness.
  • the adhesive force of the first resin layer 10 to the first release film 31 is the second. Since the adhesive strength of the resin layer 20 to the second release film 32 is weaker, when the force for peeling off the first and second release films 31 and 32 relatively is reduced, the first The release film 31 peels off from the first resin layer 10, but the second release film 32 remains without peeling from the second resin layer 20 (FIG. L (d)).
  • the above-mentioned third adhesive is applied to the surface of the first resin layer 10 so that the film thickness after drying is smaller than the film thickness of the first resin layer 10. After drying, a third resin layer 25 containing no conductive particles is formed, and an elongated adhesive film 4 is obtained (FIG. 1 (e)).
  • the adhesive force between the release surface and the surface of the third resin layer 25 due to the surface treatment increases the adhesion between the release surface of the second release film 32 and the surface of the second resin layer 20.
  • a third release film 33 weakened by force is prepared, and this release film 33 is attached to the surface of the third resin layer 25, whereby an adhesive film 4 having release films 32, 33 attached on both sides is obtained. (Fig. 2 (f)).
  • the adhesive film 4 is wound into a roll, a roll of the adhesive film 4 with the release films 32 and 33 is obtained.
  • Reference numeral 40 in FIG. 3 and reference numeral 50 in FIG. 4 indicate a circuit board and a semiconductor element as first and second adherends, respectively.
  • the circuit board 40 has a glass substrate 41 and a first connection terminal 42 formed on one surface of the glass substrate 41, and the first connection terminal 42 is formed on the glass substrate 41.
  • a conductive film is formed by patterning, and in the patterning process, a first conductive film is formed from the same conductive film.
  • a narrow wiring film for connecting the connection terminals 42 is formed.
  • the semiconductor element 50 has an element main body 51 and a second connection terminal 52 arranged on one surface of the element main body 51.
  • the second connection terminal 52 has a bump shape, 51 are electrically connected to the internal circuit (not shown).
  • the adhesive film 4 with the peeling films 32 and 33 is also unwound with the roll force of the adhesive film 4.
  • the adhesive force between the release surface of the third release film 33 and the surface of the third resin layer 25 is determined by the adhesive force between the release surface of the second release film 32 and the surface of the second resin layer 20.
  • the adhesive force between the second and third release films 32 and 33 is electrostatically attracted, and the force to peel off the second and third resin films 32 and 33 relatively Is applied, the third release film 33 is peeled off from the third resin layer 25, and the surface of the third resin layer 25 opposite to the first resin layer 10 is exposed.
  • the film 32 remains without peeling from the second resin layer 20.
  • the adhesive film 4 from which the third release film 33 has been peeled off is cut into a predetermined length, and the exposed surface of the third resin layer 25 of the cut piece is placed on the first surface of the circuit board 40 described above.
  • the surface of the third resin layer 25 is adhered to the surface on the side where the connection terminal 42 is disposed, the surface of the third resin layer 25 is adhered to the surface of the first connection terminal 42 (FIG. 5A).
  • the third resin layer 25 contains a thermosetting resin and a curing agent such that the lowest viscosity in a temperature range lower than the connection temperature is lower than that of the first resin layer 10. Since the resin layer has low adhesiveness and high adhesiveness, the circuit board 40 and the second release film 32 are electrostatically attracted to each other, and when a force for relatively peeling off is applied, the second release film 32 is formed. The adhesive film 4 is peeled off, and the adhesive film 4 remains on the circuit board 40 (FIG. 5B).
  • the surface of the semiconductor element 50 on which the second connection terminal 52 is disposed faces the surface of the circuit board 40 to which the adhesive film 4 is attached, and the first and second connection terminals 42,
  • the semiconductor elements 50 are positioned so that they face each other, the semiconductor element 50 is placed on the adhesive film 4, and the semiconductor element 50 is pressed by a pressing device (not shown) (FIG. 5 (c)).
  • the mounting table on which the circuit board 40 is mounted and the pressing device that presses the semiconductor element 50 have been heated to a predetermined temperature in advance, and when the semiconductor element 50 is pressed against the circuit board 40, the heat transfer
  • the semiconductor element 50, the circuit board 40, and the adhesive film 4 are heated to the starting temperature (room temperature).
  • the viscosity of the first, second and third resin layers 10, 20, 25 starts to decrease and reaches the minimum viscosity before the temperature rises to the set connection temperature.
  • the second resin layer 20 has a minimum viscosity of less than lOOPa's in a temperature range lower than the connection temperature.
  • the first resin layer 10 is made of a thermosetting resin whose minimum viscosity in a temperature range lower than the connection temperature is as high as lOOOPa • s or more and 3000Pa's or less (lOOOOpoise or more and 30000poise or less). Since the first resin layer 10 does not flow toward the outside of the semiconductor element 50, the conductive particles 12 in the first resin layer 10 remain between the semiconductor element 50 and the circuit board 40. .
  • the tip of the second connection terminal 52 becomes conductive between the semiconductor element 50 and the circuit board 40.
  • the particles 12 are pressed against the circuit board 40.
  • the thickness of the third resin layer 25 is smaller than that of the first resin layer 10, when the conductive particles 12 are pressed against the circuit board 40, the conductive particles 12 The third resin layer 25 is pierced and pressed against the first connection terminal 42, so that the conductive particles 12 are sandwiched between the first and second connection terminals 42 and 52.
  • the thickness of the second resin layer 20 is larger than the height of the connection terminal 52 of the semiconductor element 50 by a number of zm (0.5 ⁇ m or more and less than 10 m). Even if the layer 20 is pushed out of the semiconductor element 50, the remaining second resin layer 20 fills the space between the second connection terminals 52, and the side surface of the second connection terminal 52 and the side of the element body 51. The second resin layer 20 is in close contact with a portion exposed between the second connection terminals 52.
  • the viscosity of the first, second and third resin layers 10, 20, and 25 starts to increase due to the progress of the polymerization reaction of the first and third thermosetting resins.
  • the adhesive film 4 is cured by the polymerization of the first to third thermosetting resins, and the semiconductor element 50 is bonded to the circuit board 40 by the cured adhesive film 4. Fixed.
  • Reference numeral 1 in FIG. 5D indicates an electric device in which the semiconductor element 50 is fixed to the circuit board 40. Is shown.
  • This electric device 1 is not only a circuit board 40 and a semiconductor element 50 mechanically connected by a cured adhesive film 4 but also conductive particles 12 sandwiched between first and second connection terminals 42 and 52. Are also electrically connected.
  • the conductive particles 12 do not flow out of the semiconductor element 50 in the step of heating and pressing, and the conductive particles 12 between the first and second connection terminals 42, 52 Since the number of the conductive particles 12 sandwiched between the metal layers increases, the conduction reliability increases.
  • connection terminals 52 adjacent to each other are filled with the second resin layer 20 containing no conductive particles, so that there is no short circuit between the connection terminals 52 of the same adherend.
  • the use of the adhesive film 4 of the present invention makes it possible to manufacture a highly reliable electric device 1.
  • first and second adhesives are produced, and these adhesives are separately applied to the stripped surfaces of the elongated first and second stripped films 31 and 32, and dried.
  • a first resin layer 10 is formed on the surface of the first release film 31, and as shown in FIG. 6 (a), the second resin film 10 is formed on the surface of the second release film 32.
  • Each of the resin layers 20 is formed.
  • the longitudinal ends of the release films 31 and 32 are placed between two pressing rolls. While pressing the surfaces of the release films 31, 32 opposite to the surfaces on which the first and second resin layers 10, 20 are formed with a pressing roll heated to a predetermined temperature.
  • the first and second resin layers 10 and 20 are heated and pressed in a state where they are in close contact with each other when the release films 31 and 32 pass between the pressing rolls. Then, the first and second resin layers 10 and 20 are bonded to each other to obtain a laminate 3 as shown in FIG. 6 (b).
  • the first release film 31 is peeled from the laminate 3, and the third resin layer 25 is formed in the same process as shown in Figs. 1 (c) and 1 (e), An adhesive film 4 with a release film 32 having a structure similar to that of the adhesive film 4 shown in FIG. 1 (e) and having an elongated overall shape is obtained.
  • the minimum viscosity of the first resin layer 10 is reduced by changing the types of the thermosetting resin and the curing agent used for the first to third resin layers 10, 20, and 25. The case where the viscosity is higher than the minimum viscosity of the second and third resin layers 20 and 25 has been described, but the present invention is not limited to this.
  • the viscosity of the first resin layer can be adjusted with a material other than the resin.
  • the type of filler added to the first resin layer, the average particle size, the amount of the filler, and The minimum viscosity of the first resin layer 10 can be made higher than the other resin layers by changing the type, average particle size, and amount of the conductive particles added to the first resin layer. .
  • Conductive particles 12 are manufactured by sequentially laminating a 0.08 ⁇ m-thick nickel layer and a 0.04 m-thick gold layer on the surface of benzoguanamine resin particles with a particle size of 4.0 ⁇ m. Further, on the surface of the conductive particles 12, an insulating resin film made of an acrylic Z-styrene / divinylbenzene copolymer resin and having a film thickness of 0.1 111 to 0.5 / zm is formed. Thus, conductive particles 12 having an insulating film were obtained.
  • the first thermosetting resin (trade name "Epicoat 1007", manufactured by Japan Epoxy Resin Co., Ltd.) 80% by weight, and an imidazole-based curing agent (trade name "2E4MZ", Shikoku Chemical Industry Co., Ltd.)
  • a 20% by weight binder was dissolved in a mixed solvent of equal amounts (weight ratio) of toluene and ethyl acetate to prepare a binder solution containing 30% by weight of a binder.
  • the conductive particles 12 with the insulating coating thus obtained were dispersed so as to have a desired particle density, thereby producing a liquid first adhesive containing the conductive particles 12 with the insulating coating.
  • the first adhesive is applied to a release film and dried to form a film, and the film is used to measure the viscosity of the film at 10 ° C / min with a viscometer (Rheometer RS 150 manufactured by Noke Corporation).
  • the viscosity at the time of heating to the connection temperature (180 ° C) at the heating rate of was measured, and the viscosity that was lower than the connection temperature and became the lowest in the temperature range was determined as the minimum viscosity of the first resin layer 10. Its value was 2000 Pa's.
  • the density of the conductive particles 12 with an insulating coating per unit volume of the film was measured to be about 3 million Zmm 3 .
  • a second thermosetting resin (trade name "Epicoat 4007P", manufactured by Japan Epoxy Resin Co., Ltd.) 80% by weight, and an imidazole-based curing agent (trade name "2MZ", Shikoku Chemical Industry Co., Ltd.) 20% by weight of a binder was dispersed in the same mixed solvent as the first adhesive, to prepare a second adhesive containing 30% by weight of a binder and no conductive particles.
  • the second adhesive was dried to form a film, and the minimum viscosity of the second and third resin layers 20 and 25 described below was determined under the same conditions as for the first adhesive. was s
  • the first and second resin layers 10 and 20 are formed in the steps shown in FIGS. 1 (a)-(e) and 2 (f) described above.
  • the third resin layer 25 was formed by using the same third adhesive as the second adhesive to produce the adhesive film 4 with the release film of Example 1. Note that a roll coater was used for applying the first to third adhesives.
  • Table 1 below shows the minimum viscosity, the film thickness, the density of the conductive particles with the insulating coating, and the particle size of the conductive particles with the insulating coating of each of the resin layers 10, 20, and 25.
  • the density of the conductive particles is the number of conductive particles contained per lmm 3 of the resin layer.
  • Table 2 Composition of adhesive film and evaluation test results (comparative example)
  • the average particle size is 4.22 m or more and 4.62 m or less. In range.
  • thermosetting resin (trade name “Epicoat 4007P”, manufactured by Japan Epoxy Resin Co., Ltd.) and 20% by weight of imidazole-based curing agent (trade name “2MZ”, manufactured by Shikoku Chemical Industry Co., Ltd.)
  • the adhesive film 4 of Example 2 was produced under the same conditions as in Example 1 except that an adhesive having a minimum viscosity higher than the first adhesive of Example 1 was used as the first adhesive. .
  • thermosetting resin trade name "Epicoat 4007", manufactured by Japan Epoxy Resin Co., Ltd.
  • imidazole-based curing agent trade name "2E4MZ”, manufactured by Shikoku Chemicals Co., Ltd.
  • An adhesive film 4 of Example 4 was produced under the same conditions as in Example 1 except that the number of conductive particles with an insulating film dispersed in the first resin layer was increased.
  • An adhesive film 4 of Example 5 was produced under the same conditions as in Example 1 except that the number of conductive particles with an insulating film dispersed in the first resin layer was reduced.
  • An adhesive film 4 of Example 6 was produced under the same conditions as in Example 4 except that the number of conductive particles with an insulating film dispersed in the first resin layer was increased compared to Example 4.
  • Example 7 To the first adhesive is added silicon dioxide particles (average particle diameter 0.5 m) as an insulating filler to form a first resin layer 10 containing 40% by weight of the filler.
  • An adhesive film 4 of Example 7 was produced under the same conditions as in Example 1 except for the above.
  • Example 8 was performed under the same conditions as in Example 2 except that an adhesive having a minimum viscosity higher than the second and third adhesives of Example 2 was used as the second and third adhesives.
  • the adhesive film 4 was produced.
  • Example 9 was carried out under the same conditions as in Example 7 except that an adhesive having the lowest viscosity higher than the second and third adhesives of Example 7 was used as the second and third adhesives.
  • the adhesive film 4 was produced.
  • Comparative Example 1 An adhesive film of Comparative Example 1 was produced under the same conditions as in Example 1 except that the thickness of the first resin layer was 10 m and the thickness of the second resin layer was 10 m.
  • An adhesive film of Comparative Example 2 was produced under the same conditions as in Example 1 except that the thickness of the second resin layer was 10 m and the thickness of the third resin layer was 10 m.
  • An adhesive film of Comparative Example 3 was produced under the same conditions as in Example 1 except that the thickness of the second resin layer was 5 ⁇ m and the thickness of the third resin layer was 15 m.
  • An adhesive film of Comparative Example 4 was produced under the same conditions as in Example 8, except that the first adhesive was changed to the second adhesive used in Example 1.
  • Comparative Example 5 An adhesive film of Comparative Example 5 was produced under the same conditions as in Comparative Example 4, except that the number of conductive particles with an insulating coating dispersed in the first resin layer was increased from that of Comparative Example 4.
  • An adhesive film of Comparative Example 6 was produced under the same conditions as in Example 1 except that the first adhesive resin curing agent was omitted.
  • the minimum viscosity of each resin layer was determined by measuring the viscosity of the completed resin layer, not by measuring the viscosity of the constituent material of the resin layer (for example, thermosetting resin) alone. Therefore, for example, when a hardening agent that is not only a thermosetting resin is added, the viscosity of the resin layer with the hardening agent added is measured, and when the conductive particles and the filler are further added, Measured the viscosity of the resin layer with the conductive particles (filament) added thereto.
  • the semiconductor element 50 and the circuit board 40 were connected at a connection temperature of 190 ° C., a pressing load of 1960 kPa, and a heating and pressing time of 10 seconds. Were connected to obtain an electric device 1 of Example 1-19 and Comparative Example 1-6.
  • a gold bump having a bump bonding area of 45 m ⁇ 30 m and a height of 15 m is formed on one surface of the semiconductor element 50 having a width of 1.8 mm, a length of 20 mm, and a height of 0.4 mm.
  • a connection terminal 52) formed at intervals of 40 m was used, and a circuit substrate 40 in which a connection terminal 42 made of a 0.7 m-thick indium oxide film was formed on a glass substrate 41 was used.
  • each electric device 1 was also observed by using an optical microscope (magnification: 340 times) on the circuit board 40, and the number of the conductive particles 12 captured by the bumps was counted.
  • Tables 1 and 2 show the number of locations where the number of conductive particles supplemented is the smallest among the 200 bumps.
  • Insulation resistance is " ⁇ " the case of more than 1 ⁇ 10 8 ⁇ , was evaluated in the case of less than 1 10 8 0 as "".
  • Comparative Example 1 in which the thicknesses of the first and second resin layers were the same, the conduction reliability was excellent, but the insulation reliability was low.
  • Comparative Examples 2 and 3 in which the thickness of the resin layer was equal to or larger than that of the second resin layer, the conduction reliability was low. Therefore, when the thickness of the first resin layer is smaller than the thickness of the second resin layer, the conduction of the electric device is prevented. It can be seen that the reliability is increased and the insulation reliability of the electric device is increased when the thickness of the third resin layer is smaller than the second resin layer.
  • the minimum viscosity of the first resin layer is as small as 150 Pa's.
  • the minimum viscosity of the second and third resin layers is smaller than that of the first resin layer.
  • the viscosity of the first resin layer is set to be lower than the minimum viscosity of the second and third resin layers. It is also found that the value needs to be larger than 100 OPa's.
  • Comparative Example 6 in which the first resin layer was formed using the first adhesive containing no curing agent, the evaluation result of the conduction reliability was poor.
  • the conductive resin particles around the conductive particles are The first adhesive cures and shrinks when heated.
  • the curing shrinkage occurs around the conductive particles sandwiched between the connection terminals of the electric component, a stress that attracts the electric components is generated, so that the difference in minimum viscosity between the resin layers adjacent to each other is reduced. Even if it is large, it is assumed that the conduction reliability has increased.
  • the present invention is not limited to this. If the density of the conductive particles is lower than the density of the conductive particles, the second and third resin layers 20 and 25 may contain conductive particles.
  • the surface force of the first resin layer 10 is also reduced. Part of conductive particles 12 protrude
  • the second and third resin layers 20 and 25 may sink into the second and third resin layers 20 and 25, however, unless the second and third resin layers 20 and 25 contain conductive particles.
  • the conductive particle density of the resin layers 20 and 25 can be smaller than the conductive particle density of the first resin layer 10.
  • the first and second adherends are not limited to the circuit board 40 and the semiconductor element 50.
  • the adherend include a flexible wiring board in which a wiring film is formed on a resin film, and a resistor.
  • Various elements such as an element and a liquid crystal display element can be used.
  • the types of the first to third thermosetting resins are not particularly limited, and various types such as epoxy resins, melamine resins, acrylic resins, phenol resins, and urea resins can be used.
  • the type of the first to third curing agents is not particularly limited, and various types can be used according to the types of the first to third thermosetting resins.
  • an epoxy resin is used as the thermosetting resin
  • an imidazole-based curing agent a polyamine-based curing agent, an acid anhydride, an isocyanate-based curing agent, an organic acid, a tertiary amine, or the like can be used.
  • a latent curing agent which does not cure the thermosetting resin at room temperature but accelerates the curing reaction by heating.
  • the latent curing agent those obtained by encapsulating the above-mentioned hardener and block isocyanate can be used.
  • the filler is added only to the first resin layer 10 has been described above.
  • the present invention is not limited to this, and the second and third resin layers 20 and 25 may be provided with a filler. It is also possible to add them, and by changing the type, average particle diameter and blending amount of the filler used for the second and third resin layers 20 and 30, the minimum of the second and third resin layers 20 and 25 can be added.
  • the viscosity can be made lower than the minimum viscosity of the first resin layer 10.
  • the filler to be added to the first to third resin layers it is preferable to use an insulating one.
  • the type of the filler is not particularly limited.
  • inorganic fillers such as talc, titanium oxide, calcium carbonate, magnesium oxide, oxidized zinc, etc.
  • organic fillers such as resin particles, etc. Can be used.
  • the average particle size of the filler is equal to or less than the average particle size of the conductive particles, and more preferably 1 ⁇ m or less, the conduction reliability between the connection terminals increases.
  • additives such as an antioxidant, a coloring agent, and a silane coupling agent can be added to each resin layer.
  • conductive particles such as nickel particles, silver powder, and carbon particles may be used. Can be done. Also, a mixture of two or more types of conductive particles can be used.
  • connection terminals 52 since the conductive particles are unlikely to flow between the connection terminals 52, it is possible to obtain the electric device 1 having no insulating coating and having high connection reliability even if conductive particles are used. I can do it.
  • the present invention is not limited to this. After forming the second resin layer on another release film, the third resin layer 25 and the first resin layer 10 can be bonded together.
  • the first to third release films 31 to 33 it is preferable to use a resin film whose surface (release surface) is surface-treated.
  • a surface treatment method for example, there is a method of forming another resin film having low adhesiveness on the surface of the resin film.
  • the method of applying the first to third adhesives is not limited to the case of using a roll coater, and various methods such as a dip coating method, a knife coater method, and offset printing can be used.
  • the present invention is not limited to this.
  • the surface of the second release film 21 opposite to the surface on which the second resin layer 20 is disposed is subjected to surface treatment to form a release surface, the third release film 21 Even if the adhesive film 4 is wound up without sticking, the third resin layer 25 does not adhere to the second release film 32.

Abstract

An adhesive film (4) having a first resin layer (10), a second resin layer (20) formed on the front surface of the first resin layer (10), and a third resin layer (15) formed on the rear surface of the first resin layer (10), wherein the lowest viscosity in the temperature range lower than the bonding temperature of the first resin layer (10) is higher than the lowest viscosity in the temperature range lower than the bonding temperature of the second and third resin layers (20, 25). When first and second bodies (40, 50) to be bonded are hot pressed while sandwiching the adhesive film (4), the second resin layer (20) flows out toward the outside of the body (50). However, since the first resin layer (10) containing conductive particles (12) does not flow out but stays between the first and second bodies (40, 50), the number of conductive particles (12) sandwiched between first and second connection terminals (42, 52) increases.

Description

明 細 書  Specification
接着フィルム、接着フィルムの製造方法  Adhesive film, method of manufacturing adhesive film
技術分野  Technical field
[0001] 本発明は接着剤の分野に関し、特に導電性粒子を含有する接着剤に関する。  The present invention relates to the field of adhesives, and particularly to an adhesive containing conductive particles.
背景技術  Background art
[0002] 従来より、半導体チップや配線板のような電気部品同士の接続には、異方導電性 接着フィルム (ACF)が広く用いられて 、る。  [0002] Conventionally, an anisotropic conductive adhesive film (ACF) has been widely used for connecting electrical components such as semiconductor chips and wiring boards.
[0003] ACFは熱硬化性榭脂を有するバインダー中に導電性粒子が分散された異方導電 性接着剤が、フィルム状に成形されて構成されており、電気部品同士で ACFを挟み こみ、加熱押圧すると、 ACFが加熱により軟化し、押圧によって電気部品の接続端 子が軟ィ匕した ACFを押し退け、導電性粒子が互いに対向する接続端子で挟みこま れた状態になる。  [0003] The ACF is formed by forming an anisotropic conductive adhesive in which conductive particles are dispersed in a binder having a thermosetting resin into a film shape, and sandwiches the ACF between electric components. When heated and pressed, the ACF is softened by heating, and the connection terminal of the electric component pushes away the softened ACF due to the pressing, and the conductive particles are sandwiched between the connection terminals facing each other.
[0004] ACFはバインダーとして熱硬化性榭脂を有しており、接続端子が導電性粒子を挟 みこんだ状態で更に加熱押圧を続けると、熱硬化性榭脂が重合して ACFが硬化し、 導電性粒子によって電気部品同士が電気的に接続されると共に、電気部品同士が 硬化した ACFで固定される。  [0004] ACF has a thermosetting resin as a binder. If the connection terminals are further heated and pressed with the conductive particles sandwiched therebetween, the thermosetting resin is polymerized and the ACF is cured. Electrical components are electrically connected to each other by the conductive particles, and the electrical components are fixed with the cured ACF.
[0005] 例えば、接続端子の高さにばらつきがあり、接続すべき接続端子の間に隙間が生 じることがあっても、その隙間に導電性粒子が充填されるので、導電性粒子によって 接続端子同士が電気的に接続される。  [0005] For example, even if the height of the connection terminals varies and a gap may occur between the connection terminals to be connected, the gap is filled with the conductive particles. The connection terminals are electrically connected.
[0006] し力しながら、接着フィルムを介して加熱押圧するときに、軟ィ匕したノインダ一と共 に導電性粒子が被着体の外側に流れ出すので、接続すべき接続端子の間の導電 性粒子の量が少なくなり、接続端子同士が導電性粒子によって接続されないことが ある。  [0006] When pressing with heat through the adhesive film while pressing, the conductive particles flow out of the adherend together with the softened solder, so that the conductive property between the connection terminals to be connected is increased. In some cases, the amount of the conductive particles is reduced and the connection terminals are not connected by the conductive particles.
[0007] ACFに添加する導電性粒子の密度を大きくすれば、接続端子の接続信頼性は向 上するが、電気部品の配線が高細密化された場合には、互いに隣接する接続端子 間の間隔が狭いので、接続すべきでない接続端子が導電性粒子によって電気的に 接続され、電気部品が短絡することがある。このように、従来の ACFを用いて接続信 頼性の高 、電気装置を得ることは困難であった。 [0007] If the density of the conductive particles added to the ACF is increased, the connection reliability of the connection terminal is improved. However, if the wiring of the electric component is made finer, the connection between the adjacent connection terminals may be increased. Due to the small spacing, the connection terminals that should not be connected may be electrically connected by the conductive particles and short-circuit the electric components. Thus, the connection signal using the conventional ACF is Reliable, it was difficult to obtain an electrical device.
特許文献 1:特開平 6 - 283225号公報  Patent Document 1: JP-A-6-283225
特許文献 2:特開平 7-230840号公報  Patent Document 2: JP-A-7-230840
特許文献 3:特開平 8— 148211号公報  Patent Document 3: JP-A-8-148211
特許文献 4:特開平 9-312176号公報  Patent Document 4: JP-A-9-312176
特許文献 5:特開平 10- 273629号公報  Patent Document 5: JP-A-10-273629
特許文献 6:特開平 11 87415号公報  Patent Document 6: JP-A-11 87415
特許文献 7:特開 2000-178511号公報  Patent Document 7: JP-A-2000-178511
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0008] 本発明は上記従来技術の不都合を解決するために創作されたものであり、その目 的は、信頼性の高 ヽ電気装置を製造可能な接着フィルムを提供するものである。 課題を解決するための手段 [0008] The present invention has been made to solve the above-mentioned disadvantages of the conventional technology, and an object thereof is to provide an adhesive film capable of manufacturing a highly reliable electric device. Means for solving the problem
[0009] 上記課題を解決するために本発明は、第一の榭脂層と、前記第一の榭脂層上に 配置された第二の榭脂層と、前記第一の榭脂層の前記第二の榭脂層とは反対側の 面に配置された第三の榭脂層とを有し、前記第一の榭脂層は絶縁性のバインダーと 、前記バインダー中に分散された導電性粒子とを有し、前記絶縁性のバインダーは 第一の熱硬化性榭脂と、加熱により前記第一の熱硬化性榭脂と反応し、前記第一の 熱硬化性榭脂を硬化させる第一の硬化剤を有し、前記第二の榭脂層は絶縁性の第 二の熱硬化性榭脂と、加熱により前記第二の熱硬化性榭脂と反応し、前記第二の熱 硬化性榭脂を硬化させる第二の硬化剤を有し、前記第三の榭脂層は第三の熱硬化 性榭脂と、加熱により前記第三の熱硬化性榭脂と反応し、前記第三の熱硬化性榭脂 を硬化させる第三の硬化剤とを有し、第一の接続端子を有する第一の被着体と、第 二の接続端子を有する第二の被着体との間に配置された状態で加熱押圧され、前 記第一一第三の榭脂層が所定の接続温度以上に昇温すると、前記第一、第二の接 続端子の間に前記導電性粒子が挟まれた状態で前記第一一第三の熱硬化性榭脂 が前記第一一第三の硬化剤とそれぞれ反応して硬化し、前記第一、第二の被着体 が接続されるように構成された接着フィルムであって、前記第一の榭脂層は、前記接 続温度よりも低い温度範囲での最低粘度が lOOOPa' s以上 lOOOOOOPa' s以下にさ れ、前記第二の榭脂層は前記接続温度よりも低い温度範囲での最低粘度が、前記 第一の榭脂層の前記接続温度よりも低い温度範囲での最低粘度よりも低くされ、前 記第二の榭脂層の膜厚は、前記第一、第三の榭脂層の膜厚よりも大きくされた接着 フィルムである。 [0009] In order to solve the above problems, the present invention provides a first resin layer, a second resin layer disposed on the first resin layer, and a first resin layer. A third resin layer disposed on a surface opposite to the second resin layer, wherein the first resin layer has an insulating binder and a conductive resin dispersed in the binder. The insulating binder reacts with the first thermosetting resin by heating and the first thermosetting resin to cure the first thermosetting resin. A first curing agent, wherein the second resin layer reacts with the insulating second thermosetting resin by heating and the second thermosetting resin to form the second thermosetting resin; A second curing agent for curing the curable resin, wherein the third resin layer reacts with the third thermosetting resin by heating and the third thermosetting resin, Third thermosetting resin And a third curing agent that cures the first and second attachment terminals having a first connection terminal and a second attachment terminal having a second connection terminal. When the first and third resin layers are heated and pressed to a predetermined connection temperature or higher, the conductive particles are sandwiched between the first and second connection terminals. An adhesive film configured such that the first, second, and third thermosetting resins react with the first, second, and third curing agents, respectively, and are cured to connect the first, second adherends. Wherein the first resin layer is The minimum viscosity in a temperature range lower than the continuation temperature is set to be lOOOPa's or more and lOOOOOOPa's or less, and the second resin layer has a minimum viscosity in a temperature range lower than the connection temperature that is equal to the first viscosity. The viscosity of the resin layer is lower than the minimum viscosity in a temperature range lower than the connection temperature, and the film thickness of the second resin layer is larger than the film thickness of the first and third resin layers. This is the adhesive film that was obtained.
本発明は接着フィルムであって、前記第二の榭脂層は、前記接続温度よりも低い温 度範囲での最低粘度が、前記第一の榭脂層の前記接続温度よりも低!、温度範囲で の最低粘度の lZio以下にされた接着フィルムである。  The present invention is an adhesive film, wherein the second resin layer has a minimum viscosity in a temperature range lower than the connection temperature, which is lower than the connection temperature of the first resin layer. Adhesive film with a minimum viscosity of less than lZio in the range.
本発明は接着フィルムであって、前記第一の榭脂層の膜厚は、前記導電性粒子の 平均粒径の 1Z2倍以上 2倍以下にされた接着フィルムである。  The present invention is an adhesive film, wherein the film thickness of the first resin layer is 1Z2 times or more and 2 times or less the average particle size of the conductive particles.
本発明は接着フィルムであって、前記第一の榭脂層の導電性粒子密度は、前記第 二の榭脂層の導電性粒子密度よりも大きくされた接着フィルムである。  The present invention is an adhesive film, wherein the conductive resin density of the first resin layer is higher than the conductive particle density of the second resin layer.
本発明は接着フィルムであって、前記第二の榭脂層の膜厚は、前記第一、第二の 被着体のうち、前記第二の榭脂層側に密着して接続される被着体の、前記接続端子 の膜厚よりも大きくされた接着フィルムである。  The present invention is an adhesive film, wherein the film thickness of the second resin layer is one of the first and second adherends which is in close contact with the second resin layer side. This is an adhesive film having a thickness larger than the thickness of the connection terminal of the body.
本発明は接着フィルムであって、前記第三の榭脂層の前記接続温度よりも低い温 度範囲での最低粘度は、前記第一の榭脂層の前記接続温度よりも低!、温度範囲で の最低粘度よりも低くされた接着フィルムである。  The present invention is an adhesive film, wherein the minimum viscosity of the third resin layer in a temperature range lower than the connection temperature is lower than the connection temperature of the first resin layer! This is an adhesive film whose viscosity is lower than the minimum viscosity in.
本発明は接着フィルムであって、前記第三の榭脂層は、前記接続温度よりも低い温 度範囲での最低粘度が、前記第一の榭脂層の前記接続温度よりも低!、温度範囲で の最低粘度の lZio以下にされた接着フィルムである。  The present invention is an adhesive film, wherein the third resin layer has a lowest viscosity in a temperature range lower than the connection temperature, lower than the connection temperature of the first resin layer. Adhesive film with a minimum viscosity of less than lZio in the range.
本発明は接着フィルムであって、前記第三の榭脂層の膜厚は、前記第一の榭脂層 の膜厚よりも薄くされた接着フィルムである。  The present invention is an adhesive film, wherein the film thickness of the third resin layer is smaller than the film thickness of the first resin layer.
本発明は、少なくとも片面に剥離フィルムが貼付された接着フィルムを製造する接 着フィルムの製造方法であって、第一の剥離フィルムと、前記第一の剥離フィルムの 表面に配置された第一の榭脂層と、前記第一の榭脂層の表面に配置された第二の 榭脂層と、前記第二の榭脂層の表面に配置された第二の剥離フィルムとを有し、前 記第一の榭脂層の接続温度よりも低い温度範囲での最低粘度が、前記第二の榭脂 層の接続温度よりも低い温度範囲での最低粘度よりも大きくされた積層体の、前記第 一の剥離フィルムを前記第一の榭脂層から剥離して前記第一の榭脂層表面を露出 させ、露出した前記第一の榭脂層表面に、液状の接着剤を塗布、乾燥し、第三の榭 脂層を形成する接着フィルムの製造方法である。 The present invention is a method for producing an adhesive film for producing an adhesive film in which a release film is adhered on at least one surface, comprising: a first release film; and a first release film disposed on a surface of the first release film. A resin layer, a second resin layer disposed on the surface of the first resin layer, and a second release film disposed on the surface of the second resin layer; The minimum viscosity in a temperature range lower than the connection temperature of the first resin layer is the second resin. Exposing the first resin layer surface by peeling off the first release film from the first resin layer of the laminate having a viscosity higher than the minimum viscosity in a temperature range lower than the connection temperature of the layers; A method for producing an adhesive film in which a liquid adhesive is applied to the exposed first resin layer surface and dried to form a third resin layer.
本発明は接着フィルムの製造方法であって、前記積層体の作製は、前記第一の剥 離フィルム表面に液状の接着剤を塗布、乾燥して前記第一の榭脂層を形成し、前記 第一の榭脂層の表面に液状の接着剤を塗布、乾燥して前記第二の榭脂層を形成し た後、前記第二の榭脂層の表面に前記第二の剥離フィルムを貼付する接着フィルム の製造方法である。  The present invention is a method for producing an adhesive film, wherein the laminate is produced by applying a liquid adhesive on the surface of the first release film and drying to form the first resin layer. After applying a liquid adhesive to the surface of the first resin layer and drying to form the second resin layer, the second release film is attached to the surface of the second resin layer. This is a method for producing an adhesive film.
本発明は接着フィルムの製造方法であって、前記積層体の作製は、前記第一、第 二の剥離フィルムの表面に、それぞれ液状の接着剤を塗布、乾燥して前記第一、第 二の榭脂層を形成した後、前記第一の榭脂層の表面と前記第二の榭脂層の表面と を互 、に密着させる接着フィルムの製造方法である。  The present invention is a method for producing an adhesive film, wherein the production of the laminate is such that a liquid adhesive is applied to the surfaces of the first and second release films, respectively, and dried, and the first and second This is a method for producing an adhesive film in which after forming a resin layer, the surface of the first resin layer and the surface of the second resin layer are brought into close contact with each other.
[0010] 図 7は熱硬化性榭脂と硬化剤とを有する榭脂層を加熱し、出発温度 Tから設定さ  [0010] FIG. 7 shows a case where the resin layer having the thermosetting resin and the curing agent is heated and set from the starting temperature T.
0 れた接続温度 τまで昇温させた場合の、粘度変化と温度との関係を模式的に示す  0 schematically shows the relationship between the viscosity change and the temperature when the connection temperature is increased to τ
2  2
グラフであり、図 7の縦軸は粘度を、横軸は温度を示している。  FIG. 7 is a graph, in which the vertical axis represents viscosity and the horizontal axis represents temperature.
[0011] 加熱によって榭脂層が室温(出発温度 T )から昇温し始めると、榭脂層中の榭脂成 [0011] When the resin layer starts to be heated from room temperature (starting temperature T) by heating, the resin layer in the resin layer is heated.
0  0
分軟化し、榭脂層の粘度が下がり始める。榭脂層が昇温するときには、榭脂成分の 軟化と一緒に熱硬化性榭脂の重合反応も進行するので、その粘度が榭脂層の組成 やその配合割合によつて決まる温度 τで最低値となった後、重合の進行によって、  It softens and the viscosity of the resin layer begins to decrease. When the temperature of the resin layer rises, the polymerization reaction of the thermosetting resin progresses along with the softening of the resin component.Therefore, its viscosity is the lowest at the temperature τ determined by the composition of the resin layer and its mixing ratio. After reaching the value, depending on the progress of polymerization,
1  1
粘度が上昇に転じる。  The viscosity starts to rise.
[0012] 榭脂層に導電性粒子を含有させた場合であっても、榭脂層の粘度は室温よりも高 い温度で最低粘度となるので、第一、第二の被着体の間に接着フィルムを挟みこみ 、加熱すると、室温以上のある温度に達したところで第一、第二の榭脂層が最低粘度 に達する。  [0012] Even when the resin layer contains conductive particles, the viscosity of the resin layer becomes minimum at a temperature higher than room temperature. When the adhesive film is sandwiched and heated, the first and second resin layers reach the minimum viscosity at a certain temperature above room temperature.
[0013] 第二の榭脂層は最低粘度付近で被着体の外側に向力つて流れ出すが、第一の榭 脂層は第二の榭脂層に比べて最低粘度が高 、ので流れ出さず、第一の榭脂層中の 導電性粒子は被着体の間に残り、第一、第二の接続端子に挟み込まれる導電性粒 子の数が大きくなる。 [0013] The second resin layer flows out toward the outside of the adherend in the vicinity of the minimum viscosity, but the first resin layer has a minimum viscosity higher than that of the second resin layer. The conductive particles in the first resin layer remain between the adherends, and the conductive particles sandwiched between the first and second connection terminals. The number of children increases.
[0014] 第一の榭脂層の最低粘度は、熱硬化性榭脂の種類や、硬化剤の種類及び、熱硬 化性榭脂と硬化剤の配合量を変えることによって、他の榭脂層よりも高くすることが可 能である。  [0014] The minimum viscosity of the first resin layer can be changed by changing the type of the thermosetting resin, the type of the curing agent, and the blending amount of the thermosetting resin and the curing agent. It can be higher than the layer.
[0015] 導電性粒子として、導電層の表面が絶縁被膜で覆われたものを用いれば、第二の 榭脂層に導電性粒子を含有させたとしても、導電性粒子の導電層が直接接続端子 に触れることがな 、ので、接続端子間の短絡を防止することができる。  [0015] If the conductive particles whose surface is covered with an insulating coating are used as the conductive particles, the conductive layer of the conductive particles is directly connected even if the second resin layer contains the conductive particles. Since the terminals are not touched, a short circuit between the connection terminals can be prevented.
[0016] 絶縁被膜は一般に絶縁性榭脂で構成されており、導電性粒子が第一、第二の接 続端子間に挟まれると容易に破れるので、導電層が第一、第二の接続端子に直接 接触し、第一、第二の接続端子が導電性粒子によって電気的に接続される。  [0016] The insulating coating is generally composed of an insulating resin, and is easily broken when the conductive particles are sandwiched between the first and second connection terminals. The first and second connection terminals are in direct contact with the terminals, and are electrically connected by the conductive particles.
[0017] 第一の榭脂層の膜厚は、本発明の接着フィルム 4の導電性粒子数を決定するので 、高い膜厚精度が要求されるが、第二の榭脂層を第二の剥離フィルム上に形成する 場合でも、第二の榭脂層を第一の榭脂層表面に直接形成するでも、いずれにしろ第 一の榭脂層は剥離フィルム表面に形成されるので、第一の榭脂層を膜厚精度良く形 成することができる。  [0017] Since the thickness of the first resin layer determines the number of conductive particles of the adhesive film 4 of the present invention, high film thickness accuracy is required. Regardless of whether the first resin layer is formed on the release film surface or the second resin layer is formed directly on the surface of the first resin layer, the first resin layer is formed on the release film surface anyway. This resin layer can be formed with high film thickness accuracy.
発明の効果  The invention's effect
[0018] 本発明の接着フィルムを用いれば、加熱押圧の工程で導電性粒子が流れ出さず、 第一、第二の接続端子の間に残るので、第一、第二の接続端子に挟み込まれる導 電性粒子の数が多くなる。また、互いに隣接する接続端子の間は、導電性粒子密度 力 、さい第二の榭脂層で充填されるので、同じ被着体の接続端子同士が短絡し難 い。従って本発明の本発明の接着フィルムを用いれば、接続信頼性の高い電気装 置を得ることができる。  With the use of the adhesive film of the present invention, the conductive particles do not flow out in the step of heating and pressing and remain between the first and second connection terminals, so that they are sandwiched between the first and second connection terminals. The number of conductive particles increases. In addition, since the conductive particles are filled with the second resin layer between the connection terminals adjacent to each other, the connection terminals of the same adherend are not easily short-circuited. Therefore, by using the adhesive film of the present invention, an electric device having high connection reliability can be obtained.
図面の簡単な説明  Brief Description of Drawings
[0019] [図 1]図 1 (a)— (e)は本発明の剥離フィルム付き接着フィルムの製造方法の第一例 の前半を説明する断面図である。  [FIG. 1] FIGS. 1 (a) to 1 (e) are cross-sectional views illustrating the first half of a first example of the method for producing an adhesive film with a release film of the present invention.
[図 2]図 2 (f)は本発明の剥離フィルム付き接着フィルムの製造方法の第一例の後半 を説明する断面図である。  FIG. 2 (f) is a cross-sectional view for explaining the latter half of the first example of the method for producing an adhesive film with a release film of the present invention.
[図 3]図 3は本発明に用いる第一の被着体の一例を説明する断面図である。 [図 4]図 4は本発明に用いる第二の被着体の一例を説明する断面図である。 FIG. 3 is a cross-sectional view illustrating an example of a first adherend used in the present invention. FIG. 4 is a cross-sectional view illustrating an example of a second adherend used in the present invention.
[図 5]図 5 (a)一 (d)は本発明の接着フィルムを用いて電気装置を製造する工程を説 明する断面図である。  FIG. 5 (a)-(d) is a cross-sectional view illustrating a step of manufacturing an electric device using the adhesive film of the present invention.
[図 6]図 6 (a)、 (b)は本発明の剥離フィルム付き接着フィルムの製造方法の第二例を 説明する断面図である。  FIGS. 6 (a) and 6 (b) are cross-sectional views illustrating a second example of the method for producing an adhesive film with a release film according to the present invention.
[図 7]図 7は榭脂層を加熱した場合の粘度と温度との関係を示すグラフである。  FIG. 7 is a graph showing the relationship between viscosity and temperature when a resin layer is heated.
符号の説明  Explanation of symbols
[0020] 各図中符号 1は電気装置を示し、符号 3は積層体を示し、符号 4は接着フィルムを 示し、符号 10は第一の榭脂層を示し、符号 11はバインダーを示し、符号 12は導電 性粒子を示し、符号 20は第二の榭脂層を示し、符号 25は第三の榭脂層を示し、符 号 31は第一の剥離フィルムを示し、符号 32は第二の剥離フィルムを示し、符号 40は 第一の被着体(回路基板)を示し、符号 42は第一の接続端子を示し、符号 50は第二 の被着体 (半導体素子)を示し、符号 52は第二の接続端子を示す。  [0020] In each figure, reference numeral 1 indicates an electric device, reference numeral 3 indicates a laminate, reference numeral 4 indicates an adhesive film, reference numeral 10 indicates a first resin layer, reference numeral 11 indicates a binder, and reference numeral. Reference numeral 12 denotes conductive particles, reference numeral 20 denotes a second resin layer, reference numeral 25 denotes a third resin layer, reference numeral 31 denotes a first release film, and reference numeral 32 denotes a second release layer. Reference numeral 40 denotes a first adherend (circuit board), reference numeral 42 denotes a first connection terminal, reference numeral 50 denotes a second adherend (semiconductor element), reference numeral 52 denotes a release film. Indicates a second connection terminal.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0021] 以下に本発明により接着フィルムを製造する工程の一例を説明する。絶縁性の第 一の熱硬化性榭脂と、第一の熱硬化性榭脂を加熱により重合させる第一の硬化剤と を有機溶媒中に分散し、バインダー溶液を作製し、更にそのバインダー溶液に導電 性粒子を分散し、液状の第一の接着剤を作製する。  Hereinafter, an example of a process for producing an adhesive film according to the present invention will be described. An insulating first thermosetting resin and a first curing agent for polymerizing the first thermosetting resin by heating are dispersed in an organic solvent, and a binder solution is prepared. The conductive particles are dispersed in the mixture to prepare a liquid first adhesive.
[0022] これとは別に、絶縁性の第二、第三の熱硬化性榭脂を、第二、第三の硬化剤と一 緒に有機溶媒中に別々に分散し、液状であって、導電性粒子を含有しない第二、第 三の接着剤を作製する。  [0022] Separately, the insulating second and third thermosetting resins are separately dispersed in an organic solvent together with the second and third curing agents to form a liquid, A second and a third adhesive containing no conductive particles are prepared.
[0023] 図 1 (a)の符号 31は第一の剥離フィルムを示して!/、る。第一の剥離フィルム 31は細 長であって、その片面には表面処理が予めされており、その表面処理された剥離面 に、乾燥した後の膜厚が導電性粒子の平均粒径の 1Z2倍以上 2倍以下になるよう 第一の接着剤を塗布し、図 1 (a)に示すように熱硬化性榭脂と硬化剤とを有するバイ ンダー 11中に導電性粒子 12が分散された第一の榭脂層 10を形成する。  The reference numeral 31 in FIG. 1 (a) indicates the first release film! The first release film 31 is elongate, and one surface thereof is preliminarily subjected to a surface treatment, and the dried film thickness on the surface-treated release surface is 1Z2, which is the average particle size of the conductive particles. The first adhesive was applied so as to be twice or more and twice or less, and the conductive particles 12 were dispersed in a binder 11 having a thermosetting resin and a curing agent as shown in FIG. The first resin layer 10 is formed.
[0024] 次に、第二の接着剤を、乾燥後の膜厚が第一の榭脂層 10よりも大きぐかつ、後述 する第二の接続端子の高さよりも厚くなるように、第一の榭脂層 10表面に塗布、乾燥 し、第二の接着剤から余分な有機溶媒を蒸発させ、導電性粒子を含有しない第二の 榭脂層 20を形成する(図 1 (b) )。 Next, the second adhesive is applied to the first resin layer 10 such that the film thickness after drying is larger than the first resin layer 10 and larger than the height of a second connection terminal described later. Resin layer applied to 10 surfaces and dried Then, excess organic solvent is evaporated from the second adhesive to form a second resin layer 20 containing no conductive particles (FIG. 1 (b)).
[0025] 次に、細長の第二の剥離フィルム 32を第二の榭脂層 20の表面に貼付すると、細長 の積層体 3が得られる(図 1 (c) )。第二の榭脂層 20は接続温度よりも低い温度範囲 での最低粘度が、第一の榭脂層の最低粘度よりも低くなるような熱硬化性榭脂と硬化 剤とを有しており、最低粘度が低い榭脂層は、室温においてもその粘度が低ぐ接着 '性が高い。 Next, when an elongated second release film 32 is attached to the surface of the second resin layer 20, an elongated laminate 3 is obtained (FIG. 1 (c)). The second resin layer 20 has a thermosetting resin and a curing agent such that the minimum viscosity in a temperature range lower than the connection temperature is lower than the minimum viscosity of the first resin layer. A resin layer having a low minimum viscosity has a low viscosity even at room temperature, and has a high adhesiveness.
[0026] 従って、第一、第二の剥離フィルム 31、 32に同じものをそれぞれ用いた場合であつ ても、第一の榭脂層 10の第一の剥離フィルム 31に対する接着力は、第二の榭脂層 2 0の第二の剥離フィルム 32に対する接着力に比べて弱いので、第一、第二の剥離フ イルム 31、 32に相対的に引き剥がす力をカ卩えると、第一の剥離フィルム 31は第一の 榭脂層 10から剥がれるが、第二の剥離フィルム 32は第二の榭脂層 20から剥がれず に残る(図 l (d) )。  Therefore, even when the same one is used for the first and second release films 31 and 32, the adhesive force of the first resin layer 10 to the first release film 31 is the second. Since the adhesive strength of the resin layer 20 to the second release film 32 is weaker, when the force for peeling off the first and second release films 31 and 32 relatively is reduced, the first The release film 31 peels off from the first resin layer 10, but the second release film 32 remains without peeling from the second resin layer 20 (FIG. L (d)).
[0027] 次 、で、上述した第三の接着剤を、乾燥後の膜厚が第一の榭脂層 10の膜厚よりも 小さくなるように、第一の榭脂層 10の表面に塗布、乾燥すると、導電性粒子を含有し ない第三の榭脂層 25が形成され、細長の接着フィルム 4が得られる(図 1 (e) )。  Next, the above-mentioned third adhesive is applied to the surface of the first resin layer 10 so that the film thickness after drying is smaller than the film thickness of the first resin layer 10. After drying, a third resin layer 25 containing no conductive particles is formed, and an elongated adhesive film 4 is obtained (FIG. 1 (e)).
[0028] 次いで、表面処理によって剥離面と第三の榭脂層 25表面との間の接着力が、第二 の剥離フィルム 32の剥離面と第二の榭脂層 20表面との間の接着力よりも弱くされた 第三の剥離フィルム 33を用意し、この剥離フィルム 33を第三の榭脂層 25表面に貼 付すると、両面に剥離フィルム 32、 33が貼付された接着フィルム 4が得られる(図 2 (f ) )。その接着フィルム 4をロール状に巻き取ると、剥離フィルム 32、 33付き接着フィル ム 4のロールが得られる。  Next, the adhesive force between the release surface and the surface of the third resin layer 25 due to the surface treatment increases the adhesion between the release surface of the second release film 32 and the surface of the second resin layer 20. A third release film 33 weakened by force is prepared, and this release film 33 is attached to the surface of the third resin layer 25, whereby an adhesive film 4 having release films 32, 33 attached on both sides is obtained. (Fig. 2 (f)). When the adhesive film 4 is wound into a roll, a roll of the adhesive film 4 with the release films 32 and 33 is obtained.
[0029] 次にこの接着フィルム 4を用いて接続端子を有する被着体を接続する工程にっ ヽ て説明する。図 3の符号 40と、図 4の符号 50はそれぞれ第一、第二の被着体である 回路基板と、半導体素子を示している。  Next, a process of connecting an adherend having connection terminals using the adhesive film 4 will be described. Reference numeral 40 in FIG. 3 and reference numeral 50 in FIG. 4 indicate a circuit board and a semiconductor element as first and second adherends, respectively.
[0030] 回路基板 40はガラス基板 41と、ガラス基板 41の片面に形成された第一の接続端 子 42とを有しており、第一の接続端子 42はガラス基板 41上に形成された導電膜が パター-ングされて形成され、そのパター-ングの工程では同じ導電膜から第一の 接続端子 42同士を接続する幅狭の配線膜が形成されている。 The circuit board 40 has a glass substrate 41 and a first connection terminal 42 formed on one surface of the glass substrate 41, and the first connection terminal 42 is formed on the glass substrate 41. A conductive film is formed by patterning, and in the patterning process, a first conductive film is formed from the same conductive film. A narrow wiring film for connecting the connection terminals 42 is formed.
[0031] 半導体素子 50は素子本体 51と、素子本体 51の一面に配置された第二の接続端 子 52とを有しており、第二の接続端子 52はバンプ状であって、素子本体 51の不図 示の内部回路に電気的に接続されている。  The semiconductor element 50 has an element main body 51 and a second connection terminal 52 arranged on one surface of the element main body 51. The second connection terminal 52 has a bump shape, 51 are electrically connected to the internal circuit (not shown).
[0032] この回路基板 40に半導体素子 50を接続するには、接着フィルム 4のロール力も剥 離フィルム 32、 33付き接着フィルム 4を巻き出す。上述したように、第三の剥離フィル ム 33の剥離面と第三の榭脂層 25表面との間の接着力は、第二の剥離フィルム 32の 剥離面と第二の榭脂層 20表面との間の接着力よりも小さくなつており、第二、第三の 剥離フィルム 32、 33を静電吸着し、第二、第三の榭脂フィルム 32、 33に相対的に引 き剥がす力を加えると、第三の剥離フィルム 33が第三の榭脂層 25から剥がれ、第三 の榭脂層 25の第一の榭脂層 10と反対側の面が露出するが、第二の剥離フィルム 32 は第二の榭脂層 20から剥がれずに残る。  To connect the semiconductor element 50 to the circuit board 40, the adhesive film 4 with the peeling films 32 and 33 is also unwound with the roll force of the adhesive film 4. As described above, the adhesive force between the release surface of the third release film 33 and the surface of the third resin layer 25 is determined by the adhesive force between the release surface of the second release film 32 and the surface of the second resin layer 20. The adhesive force between the second and third release films 32 and 33 is electrostatically attracted, and the force to peel off the second and third resin films 32 and 33 relatively Is applied, the third release film 33 is peeled off from the third resin layer 25, and the surface of the third resin layer 25 opposite to the first resin layer 10 is exposed. The film 32 remains without peeling from the second resin layer 20.
[0033] 第三の剥離フィルム 33を剥離した後の接着フィルム 4を所定長さに切断し、その切 断片の第三の榭脂層 25の露出する表面を、上述した回路基板 40の第一の接続端 子 42が配置された側の面に密着させると、第三の榭脂層 25の表面が第一の接続端 子 42の表面に接着される(図 5 (a) )。  The adhesive film 4 from which the third release film 33 has been peeled off is cut into a predetermined length, and the exposed surface of the third resin layer 25 of the cut piece is placed on the first surface of the circuit board 40 described above. When the surface of the third resin layer 25 is adhered to the surface on the side where the connection terminal 42 is disposed, the surface of the third resin layer 25 is adhered to the surface of the first connection terminal 42 (FIG. 5A).
[0034] 第三の榭脂層 25は接続温度より低い温度範囲にある最低粘度が、第一の榭脂層 10に比べて低くなるような熱硬化性榭脂と硬化剤とを含有しており、最低粘度が低い 榭脂層は接着性が高いので、回路基板 40と第二の剥離フィルム 32とを静電吸着し、 相対的に引き剥がす力を加えると、第二の剥離フィルム 32が接着フィルム 4から剥が れ、接着フィルム 4が回路基板 40上に残る(図 5 (b) )。  [0034] The third resin layer 25 contains a thermosetting resin and a curing agent such that the lowest viscosity in a temperature range lower than the connection temperature is lower than that of the first resin layer 10. Since the resin layer has low adhesiveness and high adhesiveness, the circuit board 40 and the second release film 32 are electrostatically attracted to each other, and when a force for relatively peeling off is applied, the second release film 32 is formed. The adhesive film 4 is peeled off, and the adhesive film 4 remains on the circuit board 40 (FIG. 5B).
[0035] 半導体素子 50の第二の接続端子 52が配置された側の面を、回路基板 40の接着 フィルム 4が貼付された面に向けて配置し、第一、第二の接続端子 42、 52が互いに 対向するように位置合わせを行い、半導体素子 50を接着フィルム 4に載せ、半導体 素子 50を不図示の押圧器具で押圧する(図 5 (c) )。  [0035] The surface of the semiconductor element 50 on which the second connection terminal 52 is disposed faces the surface of the circuit board 40 to which the adhesive film 4 is attached, and the first and second connection terminals 42, The semiconductor elements 50 are positioned so that they face each other, the semiconductor element 50 is placed on the adhesive film 4, and the semiconductor element 50 is pressed by a pressing device (not shown) (FIG. 5 (c)).
[0036] 回路基板 40を載置する載置台と、半導体素子 50を押圧する押圧器具は予め所定 温度まで昇温されており、半導体素子 50が回路基板 40に対して押圧されると、熱伝 導によって半導体素子 50と回路基板 40と接着フィルム 4とが加熱開始温度 (室温)か ら昇温し、第一一第三の榭脂層 10、 20、 25の粘度が下がり始め、設定された接続温 度に昇温するまでに最低粘度に達する。 The mounting table on which the circuit board 40 is mounted and the pressing device that presses the semiconductor element 50 have been heated to a predetermined temperature in advance, and when the semiconductor element 50 is pressed against the circuit board 40, the heat transfer The semiconductor element 50, the circuit board 40, and the adhesive film 4 are heated to the starting temperature (room temperature). Then, the viscosity of the first, second and third resin layers 10, 20, 25 starts to decrease and reaches the minimum viscosity before the temperature rises to the set connection temperature.
[0037] 第二の榭脂層 20には接続温度よりも低い温度範囲での最低粘度が lOOPa ' s以下  [0037] The second resin layer 20 has a minimum viscosity of less than lOOPa's in a temperature range lower than the connection temperature.
(lOOOpoise以下)と小さくなるような種類の熱硬化性榭脂が用いられているので、第 二の榭脂層 20は接続温度に昇温するまでに半導体素子 50の外側に向かって流れ 出す力、第一の榭脂層 10には接続温度より低い温度範囲での最低粘度が lOOOPa •s以上 3000Pa ' s以下(lOOOOpoise以上 30000poise以下)と高くなるような種類の 熱硬化性榭脂が用いられているので、第一の榭脂層 10は半導体素子 50の外側に 向かって流れ出すことがなぐ第一の榭脂層 10中の導電性粒子 12は半導体素子 50 と回路基板 40との間に残る。  (less than 100OOpoise) is used, so that the second resin layer 20 is a force that flows toward the outside of the semiconductor element 50 before the temperature rises to the connection temperature. The first resin layer 10 is made of a thermosetting resin whose minimum viscosity in a temperature range lower than the connection temperature is as high as lOOOPa • s or more and 3000Pa's or less (lOOOOpoise or more and 30000poise or less). Since the first resin layer 10 does not flow toward the outside of the semiconductor element 50, the conductive particles 12 in the first resin layer 10 remain between the semiconductor element 50 and the circuit board 40. .
[0038] 従って、半導体素子 50の押圧によって第二の接続端子 52が接着フィルム 4を押し 退けると、第二の接続端子 52の先端が半導体素子 50と回路基板 40との間に残った 導電性粒子 12を回路基板 40側へ押し付ける。  Accordingly, when the second connection terminal 52 pushes away the adhesive film 4 by pressing the semiconductor element 50, the tip of the second connection terminal 52 becomes conductive between the semiconductor element 50 and the circuit board 40. The particles 12 are pressed against the circuit board 40.
[0039] 第三の榭脂層 25の膜厚は第一の榭脂層 10に比べて薄くなつているので、導電性 粒子 12が回路基板 40側へ押し付けられると、導電性粒子 12が第三の榭脂層 25を 突き破って第一の接続端子 42に押し付けられ、導電性粒子 12が第一、第二の接続 端子 42、 52で挟み込まれた状態になる。  Since the thickness of the third resin layer 25 is smaller than that of the first resin layer 10, when the conductive particles 12 are pressed against the circuit board 40, the conductive particles 12 The third resin layer 25 is pierced and pressed against the first connection terminal 42, so that the conductive particles 12 are sandwiched between the first and second connection terminals 42 and 52.
[0040] 第二の榭脂層 20の膜厚は半導体素子 50の接続端子 52の高さよりも数; z m (0. 5 μ m以上 10 m未満)厚くなつているので、第二の榭脂層 20が半導体素子 50の外 側へ押し出されても、残った第二の榭脂層 20が第二の接続端子 52間を充填し、第 二の接続端子 52の側面と、素子本体 51の第二の接続端子 52の間に露出する部分 に第二の榭脂層 20が密着する。  The thickness of the second resin layer 20 is larger than the height of the connection terminal 52 of the semiconductor element 50 by a number of zm (0.5 μm or more and less than 10 m). Even if the layer 20 is pushed out of the semiconductor element 50, the remaining second resin layer 20 fills the space between the second connection terminals 52, and the side surface of the second connection terminal 52 and the side of the element body 51. The second resin layer 20 is in close contact with a portion exposed between the second connection terminals 52.
[0041] 更に加熱押圧を続けると、第一一第三の熱硬化性榭脂の重合反応の進行によって 、第一一第三の榭脂層 10、 20、 25の粘度が上昇に転じ、設定された接続温度に昇 温するまで加熱をすると、第一一第三の熱硬化性榭脂の重合によって、接着フィル ム 4が硬化し、硬化した接着フィルム 4によって半導体素子 50が回路基板 40に固定 される。  When heating and pressing are further continued, the viscosity of the first, second and third resin layers 10, 20, and 25 starts to increase due to the progress of the polymerization reaction of the first and third thermosetting resins. When the heating is performed until the temperature reaches the set connection temperature, the adhesive film 4 is cured by the polymerization of the first to third thermosetting resins, and the semiconductor element 50 is bonded to the circuit board 40 by the cured adhesive film 4. Fixed.
[0042] 図 5 (d)の符号 1は半導体素子 50が回路基板 40に固定された状態の電気装置を 示している。この電気装置 1は硬化した接着フィルム 4によって回路基板 40と半導体 素子 50が機械的に接続されているだけではなぐ第一、第二の接続端子 42、 52間 に挟みこまれた導電性粒子 12によって電気的にも接続されている。 Reference numeral 1 in FIG. 5D indicates an electric device in which the semiconductor element 50 is fixed to the circuit board 40. Is shown. This electric device 1 is not only a circuit board 40 and a semiconductor element 50 mechanically connected by a cured adhesive film 4 but also conductive particles 12 sandwiched between first and second connection terminals 42 and 52. Are also electrically connected.
[0043] 上述したように、本発明の接着フィルム 4を用いると加熱押圧の工程で導電性粒子 12が半導体素子 50の外側へ流れ出さず、第一、第二の接続端子 42、 52の間に挟 み込まれる導電性粒子 12の数が多くなるので、導通信頼性が高くなる。  As described above, when the adhesive film 4 of the present invention is used, the conductive particles 12 do not flow out of the semiconductor element 50 in the step of heating and pressing, and the conductive particles 12 between the first and second connection terminals 42, 52 Since the number of the conductive particles 12 sandwiched between the metal layers increases, the conduction reliability increases.
[0044] また、互いに隣接する接続端子 52間は、導電性粒子を含有しない第二の榭脂層 2 0で充填されるので、同じ被着体の接続端子 52間が短絡することもない。このように、 本発明の接着フィルム 4を用いれば信頼性の高い電気装置 1を製造することができる  [0044] Further, the space between the connection terminals 52 adjacent to each other is filled with the second resin layer 20 containing no conductive particles, so that there is no short circuit between the connection terminals 52 of the same adherend. Thus, the use of the adhesive film 4 of the present invention makes it possible to manufacture a highly reliable electric device 1.
[0045] 以上は、第二の接着剤を第一の榭脂層 10上に形成する場合について説明したが 、本発明はこれに限定されるものではない。以下に本発明の接着フィルムの製造例 の他の例について説明する。 [0045] Although the case where the second adhesive is formed on the first resin layer 10 has been described above, the present invention is not limited to this. Hereinafter, other examples of the production example of the adhesive film of the present invention will be described.
[0046] 先ず、上述した工程で、第一、第二の接着剤を作製し、これら接着剤を細長の第一 、第二の剥離フィルム 31、 32の剥離面にそれぞれ別々に塗布、乾燥し、図 1 (a)に 示すように、第一の剥離フィルム 31表面に第一の榭脂層 10を形成し、図 6 (a)に示 すように第二の剥離フィルム 32表面に第二の榭脂層 20をそれぞれ形成する。  First, in the above-described steps, first and second adhesives are produced, and these adhesives are separately applied to the stripped surfaces of the elongated first and second stripped films 31 and 32, and dried. As shown in FIG. 1 (a), a first resin layer 10 is formed on the surface of the first release film 31, and as shown in FIG. 6 (a), the second resin film 10 is formed on the surface of the second release film 32. Each of the resin layers 20 is formed.
[0047] 次に、第一、第二の榭脂層 10、 20が形成された面を互いに対向させた状態で、各 剥離フィルム 31、 32の長手方向の端部を 2つの押圧ロールの間を通し、所定温度に 昇温させた押圧ロールで剥離フィルム 31、 32の第一、第二の榭脂層 10、 20が形成 された面とは反対側の面を押圧しながら、剥離フィルム 31、 32を長手方向に走行さ せると、剥離フィルム 31、 32が押圧ロールの間を通過するときに第一、第二の榭脂 層 10、 20が互いに密着された状態で加熱押圧されるので、第一、第二の榭脂層 10 、 20が貼り合わされ、図 6 (b)に示すような積層体 3が得られる。  Next, with the surfaces on which the first and second resin layers 10 and 20 are formed facing each other, the longitudinal ends of the release films 31 and 32 are placed between two pressing rolls. While pressing the surfaces of the release films 31, 32 opposite to the surfaces on which the first and second resin layers 10, 20 are formed with a pressing roll heated to a predetermined temperature. When the release films 31 and 32 are passed in the longitudinal direction, the first and second resin layers 10 and 20 are heated and pressed in a state where they are in close contact with each other when the release films 31 and 32 pass between the pressing rolls. Then, the first and second resin layers 10 and 20 are bonded to each other to obtain a laminate 3 as shown in FIG. 6 (b).
[0048] この積層体 3から第一の剥離フィルム 31を剥離し、上述した図 1 (c)一 (e)に示した のと同様の工程で第三の榭脂層 25を形成すれば、図 1 (e)に示した接着フィルム 4と 同様の構造であって、全体の形状が細長である剥離フィルム 32付き接着フィルム 4 が得られる。 [0049] 以上は、第一一第三の榭脂層 10、 20、 25に用いる熱硬化性榭脂と硬化剤の種類 を変えることで、第一の榭脂層 10の最低粘度を、第二、第三の榭脂層 20、 25の最 低粘度よりも高くする場合について説明したが、本発明はこれに限定されるものでは ない。 [0048] If the first release film 31 is peeled from the laminate 3, and the third resin layer 25 is formed in the same process as shown in Figs. 1 (c) and 1 (e), An adhesive film 4 with a release film 32 having a structure similar to that of the adhesive film 4 shown in FIG. 1 (e) and having an elongated overall shape is obtained. [0049] In the above, the minimum viscosity of the first resin layer 10 is reduced by changing the types of the thermosetting resin and the curing agent used for the first to third resin layers 10, 20, and 25. The case where the viscosity is higher than the minimum viscosity of the second and third resin layers 20 and 25 has been described, but the present invention is not limited to this.
[0050] 第一の榭脂層の粘度は榭脂以外の材料で調整することが可能であり、例えば、第 一の榭脂層に添加するフイラ一の種類、平均粒径、配合量及び、第一の榭脂層に添 加する導電性粒子の種類、平均粒径、配合量を変えることで、第一の榭脂層 10の最 低粘度を他の榭脂層より高くすることができる。  [0050] The viscosity of the first resin layer can be adjusted with a material other than the resin. For example, the type of filler added to the first resin layer, the average particle size, the amount of the filler, and The minimum viscosity of the first resin layer 10 can be made higher than the other resin layers by changing the type, average particle size, and amount of the conductive particles added to the first resin layer. .
実施例  Example
[0051] <実施例 1 >  <Example 1>
粒径 4. 0 μ mのべンゾグアナミン榭脂粒子の表面に、膜厚 0. 08 μ mのニッケル層 と、膜厚 0. 04 mの金層とを順次積層して導電性粒子 12を製造し、更にこの導電 性粒子 12の表面にアクリル Zスチレン/ジビニルベンゼンの共重合体榭脂からなり 、膜厚が 0. 1 111以上0. 5 /z m以下の絶縁性榭脂膜を形成し、絶縁被膜付き導電 性粒子 12を得た。  Conductive particles 12 are manufactured by sequentially laminating a 0.08 μm-thick nickel layer and a 0.04 m-thick gold layer on the surface of benzoguanamine resin particles with a particle size of 4.0 μm. Further, on the surface of the conductive particles 12, an insulating resin film made of an acrylic Z-styrene / divinylbenzene copolymer resin and having a film thickness of 0.1 111 to 0.5 / zm is formed. Thus, conductive particles 12 having an insulating film were obtained.
[0052] 第一の熱硬化性榭脂(商品名「ェピコート 1007」、ジャパンエポキシレジン (株)社 製) 80重量%と、イミダゾール系硬化剤(商品名「2E4MZ」、四国化成工業 (株)社 製) 20重量%とからなるバインダーに、トルエン Z酢酸ェチルを等量 (重量比率)混 合した混合溶媒に溶解し、バインダーを 30重量%含有するバインダー溶液を作製し 、このバインダー溶液に上述した絶縁被膜付き導電性粒子 12を所望の粒子密度に なるよう分散させ、絶縁被膜付き導電性粒子 12を含有する液状の第一の接着剤を作 製した。  [0052] The first thermosetting resin (trade name "Epicoat 1007", manufactured by Japan Epoxy Resin Co., Ltd.) 80% by weight, and an imidazole-based curing agent (trade name "2E4MZ", Shikoku Chemical Industry Co., Ltd.) A 20% by weight binder was dissolved in a mixed solvent of equal amounts (weight ratio) of toluene and ethyl acetate to prepare a binder solution containing 30% by weight of a binder. The conductive particles 12 with the insulating coating thus obtained were dispersed so as to have a desired particle density, thereby producing a liquid first adhesive containing the conductive particles 12 with the insulating coating.
[0053] この第一の接着剤を剥離フィルムに塗布、乾燥してフィルムを形成し、そのフィルム を用いて粘度測定装置 (ノ、ーケ社製のレオメータ RS 150)で、毎分 10°Cの昇温速度 で接続温度(180°C)まで加熱したときの粘度を測定し、接続温度より低 、温度範囲 で最低となる粘度を第一の榭脂層 10の最低粘度として求めたところ、その値は 2000 Pa' sであった。また、このフィルムの単位体積当たりの絶縁被膜付き導電性粒子 12 の密度を測定したところ、約 300万個 Zmm3であった。 [0054] 第二の熱硬化性榭脂(商品名「ェピコート 4007P」、ジャパンエポキシレジン (株)社 製) 80重量%と、イミダゾール系硬化剤 (商品名「2MZ」、四国化成工業 (株)社製) 2 0重量%とからなるバインダーを、第一の接着剤と同じ混合溶媒に分散し、バインダ 一を 30重量%含有し、導電性粒子を含有しない第二の接着剤を作製した。この第二 の接着剤を乾燥してフィルム化し、上記第一の接着剤と同じ条件で後述する第二、 第三の榭脂層 20、 25の最低粘度を求めたところ、その最低粘度は 85Pa' sであった [0053] The first adhesive is applied to a release film and dried to form a film, and the film is used to measure the viscosity of the film at 10 ° C / min with a viscometer (Rheometer RS 150 manufactured by Noke Corporation). The viscosity at the time of heating to the connection temperature (180 ° C) at the heating rate of was measured, and the viscosity that was lower than the connection temperature and became the lowest in the temperature range was determined as the minimum viscosity of the first resin layer 10. Its value was 2000 Pa's. The density of the conductive particles 12 with an insulating coating per unit volume of the film was measured to be about 3 million Zmm 3 . [0054] A second thermosetting resin (trade name "Epicoat 4007P", manufactured by Japan Epoxy Resin Co., Ltd.) 80% by weight, and an imidazole-based curing agent (trade name "2MZ", Shikoku Chemical Industry Co., Ltd.) 20% by weight of a binder was dispersed in the same mixed solvent as the first adhesive, to prepare a second adhesive containing 30% by weight of a binder and no conductive particles. The second adhesive was dried to form a film, and the minimum viscosity of the second and third resin layers 20 and 25 described below was determined under the same conditions as for the first adhesive. was s
[0055] これら第一、第二の接着剤を用いて上述した図 1 (a)—(e)、図 2 (f)に示した工程 で第一、第二の榭脂層 10、 20を形成した後、第三の接着剤として第二の接着剤と同 じものを用いて第三の榭脂層 25を形成して実施例 1の剥離フィルム付き接着フィル ム 4を作製した。尚、第一一第三の接着剤の塗布にはロールコータを用いた。 Using the first and second adhesives, the first and second resin layers 10 and 20 are formed in the steps shown in FIGS. 1 (a)-(e) and 2 (f) described above. After the formation, the third resin layer 25 was formed by using the same third adhesive as the second adhesive to produce the adhesive film 4 with the release film of Example 1. Note that a roll coater was used for applying the first to third adhesives.
[0056] 各榭脂層 10、 20、 25の最低粘度と、膜厚と、絶縁被膜付き導電性粒子の密度と、 絶縁被膜付き導電性粒子の粒径とを下記表 1に記載する。尚、導電性粒子の密度と は、榭脂層 lmm3当たりに含まれる導電性粒子の個数である。 Table 1 below shows the minimum viscosity, the film thickness, the density of the conductive particles with the insulating coating, and the particle size of the conductive particles with the insulating coating of each of the resin layers 10, 20, and 25. Here, the density of the conductive particles is the number of conductive particles contained per lmm 3 of the resin layer.
[0057] [表 1] [0057] [Table 1]
表 1 :接着フィルムの構成と、 評価試験結果 (実施例) Table 1: Composition of adhesive film and evaluation test results (Example)
Figure imgf000015_0001
2] 表 2 :接着フィルムの構成と、 評価試験結果 (比較例)
Figure imgf000015_0001
2] Table 2: Composition of adhesive film and evaluation test results (comparative example)
Figure imgf000016_0001
Figure imgf000016_0001
[0059] 尚、絶縁被膜付き導電性粒子の粒径は 4. 22 μ m以上 4. 62 μ m以下の範囲にあ るため、その平均粒径も 4. 22 m以上 4. 62 m以下の範囲にある。 [0059] Since the particle size of the conductive particles with an insulating film is in the range of 4.22 µm or more and 4.62 µm or less, the average particle size is 4.22 m or more and 4.62 m or less. In range.
[0060] <実施例 2 >  <Example 2>
熱硬化性榭脂(商品名「ェピコート 4007P」、ジャパンエポキシレジン (株)社製) 80 重量%と、イミダゾール系硬化剤(商品名「2MZ」、四国化成工業 (株)社製) 20重量 %とからなり、実施例 1の第一の接着剤よりも最低粘度の高い接着剤を、第一の接着 剤として用いた以外は実施例 1と同じ条件で実施例 2の接着フィルム 4を作製した。  80% by weight of thermosetting resin (trade name “Epicoat 4007P”, manufactured by Japan Epoxy Resin Co., Ltd.) and 20% by weight of imidazole-based curing agent (trade name “2MZ”, manufactured by Shikoku Chemical Industry Co., Ltd.) The adhesive film 4 of Example 2 was produced under the same conditions as in Example 1 except that an adhesive having a minimum viscosity higher than the first adhesive of Example 1 was used as the first adhesive. .
[0061] <実施例 3 >  <Example 3>
熱硬化性榭脂(商品名「ェピコート 4007」、ジャパンエポキシレジン (株)社製) 80 重量%と、イミダゾール系硬化剤(商品名「2E4MZ」、四国化成工業 (株)社製) 20 重量%とからなり、実施例 1の第一の接着剤よりも最低粘度の低い接着剤を、第一の 接着剤として用いた以外は実施例 1と同じ条件で実施例 3の接着フィルム 4を作製し た。 80% by weight of thermosetting resin (trade name "Epicoat 4007", manufactured by Japan Epoxy Resin Co., Ltd.) and 20% by weight of imidazole-based curing agent (trade name "2E4MZ", manufactured by Shikoku Chemicals Co., Ltd.) Consisting of an adhesive having a lower minimum viscosity than the first adhesive of Example 1, An adhesive film 4 of Example 3 was produced under the same conditions as in Example 1 except that the adhesive film was used as an adhesive.
[0062] <実施例 4>  <Example 4>
第一の榭脂層に分散させた絶縁被膜付き導電粒子の数を増やした以外は上記実 施例 1と同じ条件で実施例 4の接着フィルム 4を作製した。  An adhesive film 4 of Example 4 was produced under the same conditions as in Example 1 except that the number of conductive particles with an insulating film dispersed in the first resin layer was increased.
[0063] <実施例 5 > <Example 5>
第一の榭脂層に分散させた絶縁被膜付き導電粒子の数を減らした以外は上記実 施例 1と同じ条件で実施例 5の接着フィルム 4を作製した。  An adhesive film 4 of Example 5 was produced under the same conditions as in Example 1 except that the number of conductive particles with an insulating film dispersed in the first resin layer was reduced.
[0064] <実施例 6 > <Example 6>
第一の榭脂層に分散させた絶縁被膜付き導電粒子の数を、実施例 4よりも増やし た以外は上記実施例 4と同じ条件で実施例 6の接着フィルム 4を作製した。  An adhesive film 4 of Example 6 was produced under the same conditions as in Example 4 except that the number of conductive particles with an insulating film dispersed in the first resin layer was increased compared to Example 4.
[0065] <実施例 7> <Example 7>
第一の接着剤に絶縁性のフィラーであるニ酸ィ匕ケィ素粒子 (平均粒径 0. 5 m)を 添加し、該フイラ一を 40重量%含有する第一の榭脂層 10を形成した以外は実施例 1 と同じ条件で実施例 7の接着フィルム 4を作製した。  To the first adhesive is added silicon dioxide particles (average particle diameter 0.5 m) as an insulating filler to form a first resin layer 10 containing 40% by weight of the filler. An adhesive film 4 of Example 7 was produced under the same conditions as in Example 1 except for the above.
[0066] <実施例 8 > <Example 8>
熱硬化性榭脂(商品名「ェピコート 1007」、ジャパンエポキシレジン (株)社製) 80 重量%と、イミダゾール系硬化剤(商品名「2MZ」、四国化成工業 (株)社製) 20重量 %とからなり、実施例 2の第二、第三の接着剤よりも最低粘度の高い接着剤を、第二 、第三の接着剤として用いた以外は、実施例 2と同じ条件で実施例 8の接着フィルム 4を作製した。  80% by weight of thermosetting resin (trade name “Epicoat 1007”, manufactured by Japan Epoxy Resin Co., Ltd.) and 20% by weight of imidazole-based curing agent (trade name “2MZ”, manufactured by Shikoku Chemicals Co., Ltd.) Example 8 was performed under the same conditions as in Example 2 except that an adhesive having a minimum viscosity higher than the second and third adhesives of Example 2 was used as the second and third adhesives. The adhesive film 4 was produced.
[0067] <実施例 9 > <Example 9>
熱硬化性榭脂(商品名「ェピコート 4007P」、ジャパンエポキシレジン (株)社製) 80 重量%と、イミダゾール系硬化剤 (商品名「2MZ]、四国化成工業 (株)社製) 20重量 %とからなり、実施例 7の第二、第三の接着剤よりも最低粘度の高い接着剤を、第二 、第三の接着剤として用いた以外は、実施例 7と同じ条件で実施例 9の接着フィルム 4を作製した。  80% by weight of thermosetting resin (trade name "Epicoat 4007P", manufactured by Japan Epoxy Resin Co., Ltd.) and 20% by weight of imidazole-based curing agent (trade name "2MZ", manufactured by Shikoku Chemicals Co., Ltd.) Example 9 was carried out under the same conditions as in Example 7 except that an adhesive having the lowest viscosity higher than the second and third adhesives of Example 7 was used as the second and third adhesives. The adhesive film 4 was produced.
[0068] <比較例 1 > 第一の榭脂層の膜厚を 10 m、第二の榭脂層の膜厚を 10 mとした以外は実施 例 1と同じ条件で比較例 1の接着フィルムを作製した。 <Comparative Example 1> An adhesive film of Comparative Example 1 was produced under the same conditions as in Example 1 except that the thickness of the first resin layer was 10 m and the thickness of the second resin layer was 10 m.
[0069] <比較例 2> <Comparative Example 2>
第二の榭脂層の膜厚を 10 m、第三の榭脂層の膜厚を 10 mとした以外は、実 施例 1と同じ条件で比較例 2の接着フィルムを作製した。  An adhesive film of Comparative Example 2 was produced under the same conditions as in Example 1 except that the thickness of the second resin layer was 10 m and the thickness of the third resin layer was 10 m.
[0070] <比較例 3 > <Comparative Example 3>
第二の榭脂層の膜厚を 5 μ m、第三の榭脂層の膜厚を 15 mとした以外は実施例 1と同じ条件で比較例 3の接着フィルムを作製した。  An adhesive film of Comparative Example 3 was produced under the same conditions as in Example 1 except that the thickness of the second resin layer was 5 μm and the thickness of the third resin layer was 15 m.
[0071] <比較例 4> <Comparative Example 4>
第一の接着剤を、実施例 1で用いた第二の接着剤に変えた以外は、実施例 8と同 じ条件で比較例 4の接着フィルムを作製した。  An adhesive film of Comparative Example 4 was produced under the same conditions as in Example 8, except that the first adhesive was changed to the second adhesive used in Example 1.
[0072] <比較例 5 > <Comparative Example 5>
第一の榭脂層に分散させた絶縁被膜付き導電粒子の数を、比較例 4より増やした 以外は、比較例 4と同じ条件で比較例 5の接着フィルムを作製した。  An adhesive film of Comparative Example 5 was produced under the same conditions as in Comparative Example 4, except that the number of conductive particles with an insulating coating dispersed in the first resin layer was increased from that of Comparative Example 4.
[0073] <比較例 6 > <Comparative Example 6>
第一の接着剤カゝら硬化剤を抜いた以外は、実施例 1と同じ条件で比較例 6の接着 フィルムを作製した。  An adhesive film of Comparative Example 6 was produced under the same conditions as in Example 1 except that the first adhesive resin curing agent was omitted.
[0074] これら実施例 2— 9、比較例 1一 6の接着フィルム 4における各榭脂層 10、 20、 25の 最低粘度と、膜厚と、絶縁被膜付き導電性粒子の密度と、絶縁被膜付き導電性粒子 の粒径とを上記表 1、 2に記載した。  [0074] The minimum viscosity, the film thickness, the density of the conductive particles with the insulating film, the density of the resin particles 10, 20, and 25 in the adhesive film 4 of Examples 2-9 and Comparative Examples 1 to 6, The particle diameters of the attached conductive particles are shown in Tables 1 and 2 above.
[0075] 尚、各榭脂層の最低粘度は、榭脂層の構成材料 (例えば熱硬化性榭脂)単独の粘 度を測定したのではなぐ出来上がった榭脂層の粘度を測定したのであって、例えば 熱硬化性榭脂だけではなぐ硬化剤が添加された場合は、硬化剤が添加された状態 の榭脂層の粘度を測定し、更に導電性粒子ゃフイラ一が添加された場合には、それ ら導電性粒子ゃフイラ一が添加された状態での榭脂層の粘度を測定した。  [0075] The minimum viscosity of each resin layer was determined by measuring the viscosity of the completed resin layer, not by measuring the viscosity of the constituent material of the resin layer (for example, thermosetting resin) alone. Therefore, for example, when a hardening agent that is not only a thermosetting resin is added, the viscosity of the resin layer with the hardening agent added is measured, and when the conductive particles and the filler are further added, Measured the viscosity of the resin layer with the conductive particles (filament) added thereto.
[0076] 上述した実施例 1一 9、比較例 1一 6の接着フィルム 4を用い、接続温度 190°C、押 圧荷重 1960kPa、加熱押圧時間 10秒間の条件で半導体素子 50と回路基板 40とを 接続し、実施例 1一 9、比較例 1一 6の電気装置 1を得た。 [0077] ここでは、半導体素子 50として横 1. 8mm、長さ 20mm、高さ 0. 4mmの半導体素 子 50の片面に、バンプ接合面積 45 m X 30 m、高さ 15 mの金バンプ (接続端 子 52)が 40 m間隔で形成されたものを用い、回路基板 40としてガラス基板 41上に 膜厚 0. 7 mの酸化インジウム膜からなる接続端子 42が形成されたものを用いた。 Using the adhesive films 4 of Examples 1 to 9 and Comparative Examples 1 to 6 described above, the semiconductor element 50 and the circuit board 40 were connected at a connection temperature of 190 ° C., a pressing load of 1960 kPa, and a heating and pressing time of 10 seconds. Were connected to obtain an electric device 1 of Example 1-19 and Comparative Example 1-6. Here, as one of the semiconductor elements 50, a gold bump having a bump bonding area of 45 m × 30 m and a height of 15 m is formed on one surface of the semiconductor element 50 having a width of 1.8 mm, a length of 20 mm, and a height of 0.4 mm. A connection terminal 52) formed at intervals of 40 m was used, and a circuit substrate 40 in which a connection terminal 42 made of a 0.7 m-thick indium oxide film was formed on a glass substrate 41 was used.
[0078] これら実施例 1一 9、比較例 1一 6の電気装置 1について下記に示す評価試験を行 つた o  [0078] The following evaluation tests were carried out on the electric devices 1 of Examples 1 to 9 and Comparative Examples 1 to 6.
[0079] [導電性粒子の数]  [Number of conductive particles]
各電気装置 1の 200箇所のバンプを回路基板 40側力も光学顕微鏡 (倍率 340倍) を用いて観察し、バンプに捕捉された導電性粒子 12の数を数えた。 200箇所のバン プのうち、導電性粒子の補足数が最も少ない箇所の数を上記表 1、 2に記載した。  The 200-sided bumps of each electric device 1 were also observed by using an optical microscope (magnification: 340 times) on the circuit board 40, and the number of the conductive particles 12 captured by the bumps was counted. Tables 1 and 2 show the number of locations where the number of conductive particles supplemented is the smallest among the 200 bumps.
[0080] [導通信頼性] [0080] [Conduction Reliability]
各電気装置 1につ 、て、プレッシャータッカーテスター(タバイエスペック (株)社製 の商品名「EHS— 411」)を用いて、互いに対向する第一、第二の接続端子 42、 52 間の導通抵抗を測定した。導通抵抗が 30 Ω以下の場合を「〇」、 30 Ωを超える場合 を「X」として評価した。  Using a pressure tucker tester (trade name “EHS-411” manufactured by Tabai Espec Co., Ltd.) for each electric device 1, conduction between the first and second connection terminals 42 and 52 facing each other is performed. The resistance was measured. The case where the conduction resistance was 30 Ω or less was evaluated as “〇”, and the case where the conduction resistance exceeded 30 Ω was evaluated as “X”.
[0081] [絶縁信頼性] [0081] [Insulation reliability]
各電気装置 1について、同じ被着体の互いに隣接する接続端子 52間の絶縁抵抗 を測定した。絶縁抵抗が 1 Χ 108 Ω以上の場合を「〇」、 1 1080未満の場合を「 」 として評価した。 For each of the electric devices 1, the insulation resistance between the adjacent connection terminals 52 of the same adherend was measured. Insulation resistance is "〇" the case of more than 1 Χ 10 8 Ω, was evaluated in the case of less than 1 10 8 0 as "".
[0082] これら評価試験の結果を上記表 1に記載した。上記表 1から明らかなように、第一の 榭脂層の最低粘度が lOOOPa · s以上 300000Pa · s以下であり、第二の榭脂層の膜 厚が第一、第三の榭脂層の膜厚よりも大き力つた実施例 1一 9の電気装置 1では導電 性粒子がバンプに補足される数が多ぐ導通信頼性、絶縁信頼性共に高い評価結 果が得られた。  [0082] The results of these evaluation tests are shown in Table 1 above. As is clear from Table 1 above, the minimum viscosity of the first resin layer is lOOOPa · s or more and 300,000 Pa · s or less, and the film thickness of the second resin layer is equal to that of the first and third resin layers. In the electric device 1 of Example 19, which had a greater force than the film thickness, the number of conductive particles caught on the bumps was large, and high evaluation results were obtained in both conduction reliability and insulation reliability.
[0083] これに対し、第一、第二の榭脂層の膜厚が同じであった比較例 1では、導通信頼性 には優れていたが、絶縁信頼性が低ぐまた、第三の榭脂層の膜厚が第二の榭脂層 と同じ、又はそれ以上であった比較例 2、 3では、導通信頼性が低くかった。従って、 第一の榭脂層の膜厚が第二の榭脂層の膜厚未満である場合には電気装置の導通 信頼性が高くなり、第三の榭脂層の膜厚が第二の榭脂層未満である場合には電気 装置の絶縁信頼性が高くなることがわかる。 On the other hand, in Comparative Example 1 in which the thicknesses of the first and second resin layers were the same, the conduction reliability was excellent, but the insulation reliability was low. In Comparative Examples 2 and 3, in which the thickness of the resin layer was equal to or larger than that of the second resin layer, the conduction reliability was low. Therefore, when the thickness of the first resin layer is smaller than the thickness of the second resin layer, the conduction of the electric device is prevented. It can be seen that the reliability is increased and the insulation reliability of the electric device is increased when the thickness of the third resin layer is smaller than the second resin layer.
[0084] また、比較例 4から明らかなように、第一の榭脂層の最低粘度が 150Pa ' sと小さぐ 第二、第三の榭脂層の最低粘度が第一の榭脂層よりも大きかった場合には、導通信 頼性が低ぐ比較例 5のように導電性粒子の密度を高くしても、導通信頼性は改善さ れなかった。  [0084] Further, as is apparent from Comparative Example 4, the minimum viscosity of the first resin layer is as small as 150 Pa's. The minimum viscosity of the second and third resin layers is smaller than that of the first resin layer. When the conductive particle density was also large, the conduction reliability was not improved even if the density of the conductive particles was increased as in Comparative Example 5 where the communication reliability was low.
[0085] これら比較例 4、 5の結果から、導通信頼性の高!、電気装置を得るためには、第一 の榭脂層の粘度が第二、第三の榭脂層の最低粘度よりも大きぐかつ、その値を 100 OPa ' sよりも大きくする必要があることがわかる。また、硬化剤を含有しない第一の接 着剤を用いて第一の榭脂層を形成した比較例 6では、導通信頼性の評価結果が悪 かった。  From the results of Comparative Examples 4 and 5, in order to obtain a high conduction reliability and an electric device, the viscosity of the first resin layer is set to be lower than the minimum viscosity of the second and third resin layers. It is also found that the value needs to be larger than 100 OPa's. In Comparative Example 6, in which the first resin layer was formed using the first adhesive containing no curing agent, the evaluation result of the conduction reliability was poor.
[0086] 第一の榭脂層と第二の榭脂層、第一の榭脂層と第三の榭脂層のように、互いに隣 接する榭脂層の最低粘度の差が大きい場合には、加熱押圧の際に榭脂層同士が混 ざり難ぐ硬化した後の接着フィルムが連続した硬化物とならない。従って比較例 6で は、硬化した接着フィルムの電気部品同士を引き付ける応力が非常に小さぐ導通信 頼性が低くなつたと推測される。  [0086] When the difference between the minimum viscosities of resin layers adjacent to each other is large, as in the case of the first resin layer and the second resin layer, and the case of the first resin layer and the third resin layer, On the other hand, the adhesive film after being cured so that the resin layers are hardly mixed with each other at the time of heating and pressing does not become a continuous cured product. Therefore, in Comparative Example 6, it is presumed that the stress for attracting the electric parts of the cured adhesive film to each other was very small, and the communication conductivity was low.
[0087] これに対し、上記実施例 1一 9のように、第一の榭脂層に熱硬化性榭脂を硬化させ る硬化剤が添加されている場合には、導電性粒子の周囲で第一の接着剤が加熱の 際に硬化収縮する。即ち、電気部品の接続端子に挟み込まれる導電性粒子の周囲 で硬化収縮が起こることで、電気部品同士を引き付ける応力が発生することになるの で、互いに隣接する榭脂層の最低粘度の差が大きくても、導通信頼性が高くなつたと 推測される。  [0087] On the other hand, when a curing agent for curing the thermosetting resin is added to the first resin layer as in Example 119 above, the conductive resin particles around the conductive particles are The first adhesive cures and shrinks when heated. In other words, since the curing shrinkage occurs around the conductive particles sandwiched between the connection terminals of the electric component, a stress that attracts the electric components is generated, so that the difference in minimum viscosity between the resin layers adjacent to each other is reduced. Even if it is large, it is assumed that the conduction reliability has increased.
[0088] 以上は第二、第三の榭脂層 20、 25が導電性粒子を含有させない場合について説 明したが、本発明はこれに限定されるものではなぐ第一の榭脂層 10の導電性粒子 密度よりも導電性粒子密度が小さいのであれば、第二、第三の榭脂層 20、 25に導 電性粒子を含有させることもできる。  Although the case where the second and third resin layers 20 and 25 do not contain conductive particles has been described above, the present invention is not limited to this. If the density of the conductive particles is lower than the density of the conductive particles, the second and third resin layers 20 and 25 may contain conductive particles.
[0089] また、第一の榭脂層 10の膜厚を、導電性粒子 12の平均粒径の 1Z2倍以上 2倍以 下と薄くした場合には、第一の榭脂層 10の表面力も導電性粒子 12の一部が突き出 し、第二、第三の榭脂層 20、 25にめり込むことがあるが、第二、第三の榭脂層 20、 2 5に導電性粒子を含有させなければ、第二、第三の榭脂層 20、 25の導電性粒子密 度を第一の榭脂層 10の導電性粒子密度よりも小さくすることができる。 When the thickness of the first resin layer 10 is reduced to 1Z2 times or more and 2 times or less the average particle diameter of the conductive particles 12, the surface force of the first resin layer 10 is also reduced. Part of conductive particles 12 protrude The second and third resin layers 20 and 25 may sink into the second and third resin layers 20 and 25, however, unless the second and third resin layers 20 and 25 contain conductive particles. The conductive particle density of the resin layers 20 and 25 can be smaller than the conductive particle density of the first resin layer 10.
[0090] 第一、第二の被着体は回路基板 40や半導体素子 50に限定されるものではなぐ 被着体としては、榭脂フィルム上に配線膜が形成されたフレキシブル配線板や、抵抗 素子、液晶表示素子等種々のものを用いることができる。  The first and second adherends are not limited to the circuit board 40 and the semiconductor element 50. Examples of the adherend include a flexible wiring board in which a wiring film is formed on a resin film, and a resistor. Various elements such as an element and a liquid crystal display element can be used.
[0091] 第一一第三の熱硬化性榭脂の種類は特に限定されず、エポキシ榭脂、メラミン榭 脂、アクリル榭脂、フエノール榭脂、尿素樹脂等種々のものを用いることができる。  [0091] The types of the first to third thermosetting resins are not particularly limited, and various types such as epoxy resins, melamine resins, acrylic resins, phenol resins, and urea resins can be used.
[0092] 第一一第三の硬化剤の種類も特に限定されず、第一一第三の熱硬化性榭脂の種 類に応じて種々のものを用いることができる。例えば、熱硬化性榭脂としてエポキシ 榭脂を用いる場合には、イミダゾール系硬化剤、ポリアミン系硬化剤、酸無水物、イソ シァネート系硬化剤、有機酸、三級アミン等を用いることができる。接着フィルムの保 存性を考慮すると、硬化剤は、室温では熱硬化性榭脂を硬化させないが、加熱によ つて硬化反応を促進させる潜在性硬化剤を用いることが好ましヽ。潜在性硬化剤とし ては、上記硬ィ匕剤をカプセルィ匕したものや、ブロックイソシァネートを用いることができ る。  [0092] The type of the first to third curing agents is not particularly limited, and various types can be used according to the types of the first to third thermosetting resins. For example, when an epoxy resin is used as the thermosetting resin, an imidazole-based curing agent, a polyamine-based curing agent, an acid anhydride, an isocyanate-based curing agent, an organic acid, a tertiary amine, or the like can be used. Considering the preservability of the adhesive film, it is preferable to use a latent curing agent which does not cure the thermosetting resin at room temperature but accelerates the curing reaction by heating. As the latent curing agent, those obtained by encapsulating the above-mentioned hardener and block isocyanate can be used.
[0093] 以上は第一の榭脂層 10だけにフィラーを添加する場合について説明したが、本発 明はこれに限定されず、第二、第三の榭脂層 20、 25にフイラ一を添加することも可能 であり、第二、第三の榭脂層 20、 30に用いるフィラーの種類、平均粒径、配合量を 変えれば、第二、第三の榭脂層 20、 25の最低粘度を第一の榭脂層 10の最低粘度 よりち低くすることがでさる。  [0093] The case where the filler is added only to the first resin layer 10 has been described above. However, the present invention is not limited to this, and the second and third resin layers 20 and 25 may be provided with a filler. It is also possible to add them, and by changing the type, average particle diameter and blending amount of the filler used for the second and third resin layers 20 and 30, the minimum of the second and third resin layers 20 and 25 can be added. The viscosity can be made lower than the minimum viscosity of the first resin layer 10.
[0094] 第一一第三の榭脂層に添加するフイラ一としては、絶縁性のものを用いることが好 ましい。フィラーの種類は特に限定されるものではなぐ二酸ィ匕ケィ素以外にもタルク 、酸化チタン、炭酸カルシウム、酸化マグネシウム、酸ィ匕亜鉛等の無機フィラー、榭脂 粒子等の有機フイラ一等種々のものを用いることができる。フィラーの平均粒径は、導 電性粒子の平均粒径以下、より好ましくは 1 μ m以下であれば、接続端子間の導通 信頼性が高くなる。また、各榭脂層にはフイラ一以外にも、老化防止剤、着色剤、シラ ンカップリング剤等の添加剤を添加することもできる。 [0095] 導電性粒子は、上述したように、榭脂粒子の表面を導電層で覆ったもの以外にも、 ニッケル粒子、銀紛のような金属粒子や、カーボン粒子等種々のものを用いることが できる。また、 2種類以上の導電性粒子の混合物を用いることもできる。 [0094] As the filler to be added to the first to third resin layers, it is preferable to use an insulating one. The type of the filler is not particularly limited. In addition to diacid silicate, inorganic fillers such as talc, titanium oxide, calcium carbonate, magnesium oxide, oxidized zinc, etc., and organic fillers such as resin particles, etc. Can be used. When the average particle size of the filler is equal to or less than the average particle size of the conductive particles, and more preferably 1 μm or less, the conduction reliability between the connection terminals increases. Further, besides the filler, additives such as an antioxidant, a coloring agent, and a silane coupling agent can be added to each resin layer. [0095] As described above, in addition to the resin particles whose surfaces are covered with the conductive layer, various kinds of conductive particles such as nickel particles, silver powder, and carbon particles may be used. Can be done. Also, a mixture of two or more types of conductive particles can be used.
[0096] また、本発明によれば、導電性粒子が接続端子 52間に流れ込み難いので、絶縁 被覆を有しな 、導電性粒子を用いても接続信頼性の高 、電気装置 1を得ることがで きる。  [0096] Further, according to the present invention, since the conductive particles are unlikely to flow between the connection terminals 52, it is possible to obtain the electric device 1 having no insulating coating and having high connection reliability even if conductive particles are used. I can do it.
[0097] 以上は、第三の榭脂層 25を第一の榭脂層 10表面に直接形成する場合について 説明したが、本発明はこれに限定されるものではなぐ第三の榭脂層 25を別の剥離 フィルム上に形成した後、第三の榭脂層 25と第一の榭脂層 10を貼り合わせることも できる。  [0097] Although the case where the third resin layer 25 is formed directly on the surface of the first resin layer 10 has been described above, the present invention is not limited to this. After forming the second resin layer on another release film, the third resin layer 25 and the first resin layer 10 can be bonded together.
[0098] 以上は、第一の榭脂層 10の表面に、先ず、第一の榭脂層 10よりも膜厚が厚い榭 脂層 (第二の榭脂層 20)を形成する場合について説明したが、本発明はこれに限定 されず、第一の榭脂層 10表面に第一の榭脂層 10よりも膜厚の薄い榭脂層 (第三の 榭脂層 25)を形成した後、第一の榭脂層 10から第一の剥離フィルム 31を剥離し、第 一の榭脂層 10の露出した表面に、第一の榭脂層 10よりも膜厚の大きい榭脂層 (第 二の榭脂層 20)を形成してもよい。  [0098] The case where a resin layer (second resin layer 20) thicker than the first resin layer 10 is formed on the surface of the first resin layer 10 is described above. However, the present invention is not limited to this. After forming a resin layer (third resin layer 25) thinner than the first resin layer 10 on the surface of the first resin layer 10, Then, the first release film 31 is peeled off from the first resin layer 10, and the exposed surface of the first resin layer 10 is coated with a resin layer having a thickness larger than that of the first resin layer 10 (the second resin layer). A second resin layer 20) may be formed.
[0099] 第一一第三の剥離フィルム 31— 33としては、榭脂フィルムの表面 (剥離面)を表面 処理したものを用いることが好ましい。表面処理方法としては、例えば榭脂フィルムの 表面に接着性の低い他の榭脂膜を形成する方法がある。  [0099] As the first to third release films 31 to 33, it is preferable to use a resin film whose surface (release surface) is surface-treated. As a surface treatment method, for example, there is a method of forming another resin film having low adhesiveness on the surface of the resin film.
[0100] 第一一第三の接着剤の塗布方法もロールコータを用いる場合に限定されるもので はなぐディップコーティング法、ナイフコータ法、オフセット印刷等種々の方法を用い ることがでさる。  [0100] The method of applying the first to third adhesives is not limited to the case of using a roll coater, and various methods such as a dip coating method, a knife coater method, and offset printing can be used.
[0101] 以上は、接着フィルム 4の両面に剥離フィルムがそれぞれ貼付された剥離フィルム 付き接着フィルムについて説明した力 本発明はこれに限定されるものではない。例 えば、第二の剥離フィルム 21の第二の榭脂層 20が配置される側の面とは反対側の 面に表面処理を施し、剥離面を形成しておけば、第三の剥離フィルムを貼付せずに 接着フィルム 4を巻き取っても、第三の榭脂層 25が第二の剥離フィルム 32に接着す ることがない。  [0101] The above is the description of the adhesive film with the release film in which the release films are attached to both surfaces of the adhesive film 4, respectively. The present invention is not limited to this. For example, if the surface of the second release film 21 opposite to the surface on which the second resin layer 20 is disposed is subjected to surface treatment to form a release surface, the third release film 21 Even if the adhesive film 4 is wound up without sticking, the third resin layer 25 does not adhere to the second release film 32.

Claims

請求の範囲 The scope of the claims
[1] 第一の榭脂層と、前記第一の榭脂層上に配置された第二の榭脂層と、  [1] a first resin layer, a second resin layer disposed on the first resin layer,
前記第一の榭脂層の前記第二の榭脂層とは反対側の面に配置された第三の榭脂 層とを有し、  A third resin layer disposed on a surface of the first resin layer opposite to the second resin layer,
前記第一の榭脂層は絶縁性のバインダーと、前記バインダー中に分散された導電 性粒子とを有し、  The first resin layer has an insulating binder and conductive particles dispersed in the binder,
前記絶縁性のバインダーは第一の熱硬化性榭脂と、加熱により前記第一の熱硬化 性榭脂と反応し、前記第一の熱硬化性榭脂を硬化させる第一の硬化剤を有し、 前記第二の榭脂層は絶縁性の第二の熱硬化性榭脂と、加熱により前記第二の熱 硬化性榭脂と反応し、前記第二の熱硬化性榭脂を硬化させる第二の硬化剤を有し、 前記第三の榭脂層は第三の熱硬化性榭脂と、加熱により前記第三の熱硬化性榭 脂と反応し、前記第三の熱硬化性榭脂を硬化させる第三の硬化剤とを有し、 第一の接続端子を有する第一の被着体と、第二の接続端子を有する第二の被着 体との間に配置された状態で加熱押圧され、前記第一一第三の榭脂層が所定の接 続温度以上に昇温すると、前記第一、第二の接続端子の間に前記導電性粒子が挟 まれた状態で前記第一一第三の熱硬化性榭脂が前記第一一第三の硬化剤とそれ ぞれ反応して硬化し、前記第一、第二の被着体が接続されるように構成された接着 フィルムであって、  The insulating binder has a first thermosetting resin and a first curing agent that reacts with the first thermosetting resin by heating to cure the first thermosetting resin. Then, the second resin layer reacts with the insulating second thermosetting resin and the second thermosetting resin by heating to cure the second thermosetting resin. A second curing agent, wherein the third resin layer reacts with the third thermosetting resin by heating and reacts with the third thermosetting resin to form the third thermosetting resin. A third curing agent for curing the fat, disposed between a first adherend having a first connection terminal and a second adherend having a second connection terminal When the first and third resin layers are heated to a predetermined connection temperature or higher, the conductive particles are sandwiched between the first and second connection terminals. First An adhesive film configured such that the third thermosetting resin reacts with the first and third curing agents, respectively, to be cured, and the first and second adherends are connected; hand,
前記第一の榭脂層は、前記接続温度よりも低い温度範囲での最低粘度が lOOOPa • s以上 lOOOOOOPa · s以下にされ、  The first resin layer has a minimum viscosity of lOOOPa • s or more and lOOOOOOPa · s or less in a temperature range lower than the connection temperature,
前記第二の榭脂層は前記接続温度よりも低い温度範囲での最低粘度が、前記第 一の榭脂層の前記接続温度よりも低い温度範囲での最低粘度よりも低くされ、 前記第二の榭脂層の膜厚は、前記第一、第三の榭脂層の膜厚よりも大きくされた 接着フィルム。  The second resin layer has a minimum viscosity in a temperature range lower than the connection temperature lower than a minimum viscosity of the first resin layer in a temperature range lower than the connection temperature; The adhesive film, wherein the thickness of the resin layer is larger than the thicknesses of the first and third resin layers.
[2] 前記第二の榭脂層は、前記接続温度よりも低い温度範囲での最低粘度が、前記第 一の榭脂層の前記接続温度よりも低い温度範囲での最低粘度の 1Z10以下にされ た請求項 1記載の接着フィルム。  [2] The second resin layer has a minimum viscosity in a temperature range lower than the connection temperature of 1Z10 or less of a minimum viscosity of the first resin layer in a temperature range lower than the connection temperature. The adhesive film according to claim 1, wherein
[3] 前記第一の榭脂層の膜厚は、前記導電性粒子の平均粒径の 1Z2倍以上 2倍以下 にされた請求項 1又は請求項 2のいずれか 1項記載の接着フィルム。 [3] The thickness of the first resin layer is 1Z2 times or more and 2 times or less the average particle size of the conductive particles. 3. The adhesive film according to claim 1, wherein
[4] 前記第一の榭脂層の導電性粒子密度は、前記第二の榭脂層の導電性粒子密度よ りも大きくされた請求項 1乃至請求項 3のいずれか 1項記載の接着フィルム。 4. The adhesive according to claim 1, wherein the conductive resin density of the first resin layer is higher than the conductive particle density of the second resin layer. the film.
[5] 前記第二の榭脂層の膜厚は、前記第一、第二の被着体のうち、前記第二の榭脂層 側に密着して接続される被着体の、前記接続端子の膜厚よりも大きくされた請求項 1 乃至請求項 4の 、ずれか 1項記載の接着フィルム。 [5] The thickness of the second resin layer may be set to be equal to or smaller than the thickness of the first and second adherends. 5. The adhesive film according to claim 1, wherein the thickness of the adhesive film is larger than the thickness of the terminal.
[6] 前記第三の榭脂層の前記接続温度よりも低!、温度範囲での最低粘度は、前記第 一の榭脂層の前記接続温度よりも低い温度範囲での最低粘度よりも低くされた請求 項 1乃至請求項 5のいずれか 1項記載の接着フィルム。 [6] The third resin layer has a lower viscosity in the temperature range than the connection temperature! The lowest viscosity in the temperature range is lower than the minimum viscosity in the temperature range lower than the connection temperature of the first resin layer. The adhesive film according to any one of claims 1 to 5, which is provided.
[7] 前記第三の榭脂層は、前記接続温度よりも低い温度範囲での最低粘度が、前記第 一の榭脂層の前記接続温度よりも低い温度範囲での最低粘度の lZio以下にされ た請求項 6記載の接着フィルム。 [7] The third resin layer has a minimum viscosity in a temperature range lower than the connection temperature of 1Zio or less of a minimum viscosity of the first resin layer in a temperature range lower than the connection temperature. 7. The adhesive film according to claim 6, wherein:
[8] 前記第三の榭脂層の膜厚は、前記第一の榭脂層の膜厚よりも薄くされた請求項 1 乃至請求項 7の 、ずれか 1項記載の接着フィルム。 8. The adhesive film according to claim 1, wherein the thickness of the third resin layer is smaller than the thickness of the first resin layer.
[9] 少なくとも片面に剥離フィルムが貼付された接着フィルムを製造する接着フィルムの 製造方法であって、 [9] A method for producing an adhesive film for producing an adhesive film having a release film attached to at least one surface thereof,
第一の剥離フィルムと、  A first release film,
前記第一の剥離フィルムの表面に配置された第一の榭脂層と、  A first resin layer disposed on the surface of the first release film,
前記第一の榭脂層の表面に配置された第二の榭脂層と、  A second resin layer disposed on the surface of the first resin layer,
前記第二の榭脂層の表面に配置された第二の剥離フィルムとを有し、  Having a second release film disposed on the surface of the second resin layer,
前記第一の榭脂層の接続温度よりも低い温度範囲での最低粘度が、前記第二の 榭脂層の接続温度よりも低い温度範囲での最低粘度よりも大きくされた積層体の、 前記第一の剥離フィルムを前記第一の榭脂層から剥離して前記第一の榭脂層表 面を露出させ、  The laminated body, wherein the minimum viscosity in a temperature range lower than the connection temperature of the first resin layer is set higher than the minimum viscosity in a temperature range lower than the connection temperature of the second resin layer, Peeling a first release film from the first resin layer to expose a surface of the first resin layer,
露出した前記第一の榭脂層表面に、液状の接着剤を塗布、乾燥し、第三の榭脂層 を形成する接着フィルムの製造方法。  A method for producing an adhesive film, wherein a liquid adhesive is applied to the exposed surface of the first resin layer and dried to form a third resin layer.
[10] 前記積層体の作製は、前記第一の剥離フィルム表面に液状の接着剤を塗布、乾 燥して前記第一の榭脂層を形成し、 前記第一の榭脂層の表面に液状の接着剤を塗布、乾燥して前記第二の榭脂層を 形成した後、前記第二の榭脂層の表面に前記第二の剥離フィルムを貼付する請求 項 9記載の接着フィルムの製造方法。 [10] In the production of the laminate, a liquid adhesive is applied to the surface of the first release film and dried to form the first resin layer, After applying a liquid adhesive on the surface of the first resin layer and drying to form the second resin layer, the second release film is attached to the surface of the second resin layer. The method for producing an adhesive film according to claim 9.
前記積層体の作製は、前記第一、第二の剥離フィルムの表面に、それぞれ液状の 接着剤を塗布、乾燥して前記第一、第二の樹脂層を形成した後、前記第一の樹脂 層の表面と前記第二の榭脂層の表面とを互いに密着させる請求項 9記載の接着フィ ルムの製造方法。  The production of the laminate is performed by applying a liquid adhesive on the surfaces of the first and second release films and drying the first and second resin layers to form the first and second resin layers. 10. The method for producing an adhesive film according to claim 9, wherein the surface of the layer and the surface of the second resin layer are adhered to each other.
PCT/JP2004/019527 2004-01-15 2004-12-27 Adhesive film and method for producing the same WO2005068573A1 (en)

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