TW200509195A - Plasma processing method and apparatus - Google Patents
Plasma processing method and apparatusInfo
- Publication number
- TW200509195A TW200509195A TW093123736A TW93123736A TW200509195A TW 200509195 A TW200509195 A TW 200509195A TW 093123736 A TW093123736 A TW 093123736A TW 93123736 A TW93123736 A TW 93123736A TW 200509195 A TW200509195 A TW 200509195A
- Authority
- TW
- Taiwan
- Prior art keywords
- electrodes
- plasma processing
- electrode circuit
- frequency
- secondary coil
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2242/00—Auxiliary systems
- H05H2242/20—Power circuits
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003290623A JP2005063760A (ja) | 2003-08-08 | 2003-08-08 | プラズマ処理方法および処理装置 |
JP2004080168A JP4532948B2 (ja) | 2004-03-19 | 2004-03-19 | プラズマ処理方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200509195A true TW200509195A (en) | 2005-03-01 |
Family
ID=34137944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093123736A TW200509195A (en) | 2003-08-08 | 2004-08-06 | Plasma processing method and apparatus |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20060064047A (ja) |
TW (1) | TW200509195A (ja) |
WO (1) | WO2005015963A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3054750B1 (en) * | 2013-10-04 | 2019-05-01 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Power-supply device |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6170428B1 (en) * | 1996-07-15 | 2001-01-09 | Applied Materials, Inc. | Symmetric tunable inductively coupled HDP-CVD reactor |
JP3122618B2 (ja) * | 1996-08-23 | 2001-01-09 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP3840821B2 (ja) * | 1998-11-30 | 2006-11-01 | 株式会社日立製作所 | プラズマ処理装置 |
JP3719352B2 (ja) * | 1999-07-23 | 2005-11-24 | 三菱電機株式会社 | プラズマ発生用電源装置及びその製造方法 |
JP4178775B2 (ja) * | 2001-08-31 | 2008-11-12 | 株式会社日立国際電気 | プラズマリアクター |
DE10154229B4 (de) * | 2001-11-07 | 2004-08-05 | Applied Films Gmbh & Co. Kg | Einrichtung für die Regelung einer Plasmaimpedanz |
JP3977114B2 (ja) * | 2002-03-25 | 2007-09-19 | 株式会社ルネサステクノロジ | プラズマ処理装置 |
JP4123945B2 (ja) * | 2003-01-27 | 2008-07-23 | 三菱電機株式会社 | プラズマ処理装置およびプラズマ処理装置の高周波特性測定方法 |
-
2004
- 2004-08-04 WO PCT/JP2004/011151 patent/WO2005015963A1/ja active Application Filing
- 2004-08-04 KR KR1020067000580A patent/KR20060064047A/ko not_active Application Discontinuation
- 2004-08-06 TW TW093123736A patent/TW200509195A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR20060064047A (ko) | 2006-06-12 |
WO2005015963A1 (ja) | 2005-02-17 |
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