TW200502542A - Method for analyzing impurities (color centers) of fluoride and process for producing material for growing single crystal - Google Patents

Method for analyzing impurities (color centers) of fluoride and process for producing material for growing single crystal

Info

Publication number
TW200502542A
TW200502542A TW093105355A TW93105355A TW200502542A TW 200502542 A TW200502542 A TW 200502542A TW 093105355 A TW093105355 A TW 093105355A TW 93105355 A TW93105355 A TW 93105355A TW 200502542 A TW200502542 A TW 200502542A
Authority
TW
Taiwan
Prior art keywords
fluoride
color centers
analyzing impurities
single crystal
growing single
Prior art date
Application number
TW093105355A
Other languages
English (en)
Inventor
Hirohisa Kikuyama
Tomohiko Satonaga
Tsuguo Fukuda
Kazuhiko Shogami
Original Assignee
Stella Chemifa Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stella Chemifa Kk filed Critical Stella Chemifa Kk
Publication of TW200502542A publication Critical patent/TW200502542A/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
    • G01N23/083—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the radiation being X-rays
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/59—Transmissivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
TW093105355A 2003-03-28 2004-03-02 Method for analyzing impurities (color centers) of fluoride and process for producing material for growing single crystal TW200502542A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003091763A JP4020313B2 (ja) 2003-03-28 2003-03-28 フッ化物中の不純物及び色中心分析方法及び単結晶育成用材料の製造方法

Publications (1)

Publication Number Publication Date
TW200502542A true TW200502542A (en) 2005-01-16

Family

ID=33127291

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093105355A TW200502542A (en) 2003-03-28 2004-03-02 Method for analyzing impurities (color centers) of fluoride and process for producing material for growing single crystal

Country Status (9)

Country Link
US (1) US20070034139A1 (zh)
EP (1) EP1612539A1 (zh)
JP (1) JP4020313B2 (zh)
KR (1) KR20060015480A (zh)
CN (1) CN1768259A (zh)
BR (1) BRPI0408728A (zh)
RU (1) RU2310829C2 (zh)
TW (1) TW200502542A (zh)
WO (1) WO2004088288A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060086901A1 (en) * 2004-10-22 2006-04-27 Price L S Methods and apparatus for improving the reliability and accuracy of identifying, analyzing and authenticating objects, including chemicals, using multiple spectroscopic techniques
JP6035584B2 (ja) * 2010-11-26 2016-11-30 日本結晶光学株式会社 蛍石結晶の製造方法
CN114941170B (zh) * 2022-05-11 2024-02-06 中国科学院上海硅酸盐研究所 一种提高氟化钙晶体193nm激光辐照硬度的方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6512921A (zh) * 1965-10-06 1967-04-07
US3769230A (en) * 1972-04-28 1973-10-30 Hughes Aircraft Co Calcium fluoride-rare earth fluoride fluorescent compound useful as alaser crystal
JPS60131900A (ja) * 1983-12-16 1985-07-13 Sumitomo Electric Ind Ltd 単結晶の製造方法
SU1795738A1 (ru) * 1990-02-27 1995-09-27 Научно-исследовательский институт прикладной физики при Иркутском государственном университете Люминесцентный способ определения концентрации центров свечения в кислород- и фторсодержащих кристаллах
US5589690A (en) * 1995-03-21 1996-12-31 National Institute Of Standards And Technology Apparatus and method for monitoring casting process
DE19548845B4 (de) * 1995-12-27 2008-04-10 Crystal Growing Systems Gmbh Vorrichtung und Verfahren zum Ziehen von Einkristallen nach dem Czochralski-Verfahren
US6055293A (en) * 1998-06-30 2000-04-25 Seh America, Inc. Method for identifying desired features in a crystal
US6350310B1 (en) * 1999-06-07 2002-02-26 Sandia Corporation Crystal growth and annealing for minimized residual stress
JP2001023884A (ja) * 1999-07-08 2001-01-26 Nikon Corp 真空紫外光リソグラフィー装置、その製造方法、及びフッ化物結晶材料の検査方法
US6504156B1 (en) * 1999-07-16 2003-01-07 Kabushiki Kaisha Toshiba Ceramic scintillator material and manufacturing method thereof, and radiation detector therewith and radiation inspection apparatus therewith
JP2002234795A (ja) * 2001-02-07 2002-08-23 Nec Tokin Corp フッ化リチウムカルシウムアルミニウム単結晶及びその製造方法
US6788389B2 (en) * 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system
US6760403B2 (en) * 2001-10-25 2004-07-06 Seh America, Inc. Method and apparatus for orienting a crystalline body during radiation diffractometry

Also Published As

Publication number Publication date
RU2310829C2 (ru) 2007-11-20
EP1612539A1 (en) 2006-01-04
RU2005133202A (ru) 2006-06-10
JP4020313B2 (ja) 2007-12-12
US20070034139A1 (en) 2007-02-15
CN1768259A (zh) 2006-05-03
BRPI0408728A (pt) 2006-03-07
KR20060015480A (ko) 2006-02-17
JP2004301532A (ja) 2004-10-28
WO2004088288A1 (ja) 2004-10-14

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