TW200502049A - Liquid-applying device and method of cleaning a head - Google Patents

Liquid-applying device and method of cleaning a head

Info

Publication number
TW200502049A
TW200502049A TW093109932A TW93109932A TW200502049A TW 200502049 A TW200502049 A TW 200502049A TW 093109932 A TW093109932 A TW 093109932A TW 93109932 A TW93109932 A TW 93109932A TW 200502049 A TW200502049 A TW 200502049A
Authority
TW
Taiwan
Prior art keywords
liquid
head
applying
applying device
substrate
Prior art date
Application number
TW093109932A
Other languages
English (en)
Chinese (zh)
Inventor
Akihiro Shigeyama
Masahiko Kurosawa
Shinji Kajiwara
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Publication of TW200502049A publication Critical patent/TW200502049A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133784—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133738—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers for homogeneous alignment

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Coating Apparatus (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Ink Jet (AREA)
TW093109932A 2003-04-10 2004-04-09 Liquid-applying device and method of cleaning a head TW200502049A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003106561A JP4343573B2 (ja) 2003-04-10 2003-04-10 塗布装置およびヘッドのクリーニング方法

Publications (1)

Publication Number Publication Date
TW200502049A true TW200502049A (en) 2005-01-16

Family

ID=33468718

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093109932A TW200502049A (en) 2003-04-10 2004-04-09 Liquid-applying device and method of cleaning a head

Country Status (4)

Country Link
JP (1) JP4343573B2 (ko)
KR (2) KR100658109B1 (ko)
CN (1) CN100421941C (ko)
TW (1) TW200502049A (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI309990B (en) * 2007-01-26 2009-05-21 Au Optronics Corp Wiping structure of nozzle cleaner
KR101035986B1 (ko) * 2009-07-02 2011-05-23 세메스 주식회사 약액 세정 장치 및 이를 구비하는 약액 도포 장치
JP6112125B2 (ja) * 2010-02-15 2017-04-12 セイコーエプソン株式会社 液体噴射装置
JP5703679B2 (ja) 2010-02-15 2015-04-22 セイコーエプソン株式会社 液体噴射装置及び液体噴射装置のメンテナンス方法
KR101464203B1 (ko) * 2010-08-24 2014-11-25 세메스 주식회사 세정 유닛, 이를 가지는 처리액 토출 장치, 그리고 세정 방법
CN102826765B (zh) * 2012-08-24 2015-10-07 深圳市华星光电技术有限公司 液晶显示面板的聚酰亚胺涂布方法
US9144134B2 (en) 2012-08-24 2015-09-22 Shenzhen China Star Optoelectronics Technology Co., Ltd Method for coating polyimide on liquid crystal display panel
KR101696195B1 (ko) * 2013-12-31 2017-01-16 세메스 주식회사 헤드 세정 유닛 및 이를 포함하는 기판 처리 장치
JP6086339B1 (ja) * 2016-08-03 2017-03-01 ナカンテクノ株式会社 アニロックスロールの自動洗浄装置とその洗浄方法
CN109016845B (zh) * 2018-08-07 2019-11-15 杭州三晶工艺塑料有限公司 一种印花玻璃生产工艺
GB201819454D0 (en) * 2018-11-29 2019-01-16 Johnson Matthey Plc Apparatus and method for coating substrates with washcoats
CN111085367A (zh) * 2020-01-13 2020-05-01 郑肖 一种工业加工用的高效喷漆装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2962964B2 (ja) * 1992-06-26 1999-10-12 キヤノン株式会社 液体吐出装置及びそれを用いたプリント方法
JP3083409B2 (ja) * 1992-07-24 2000-09-04 キヤノン株式会社 インクジェット記録装置および該記録装置の回復方法
US5635965A (en) * 1995-01-31 1997-06-03 Hewlett-Packard Company Wet capping system for inkjet printheads
JP3597612B2 (ja) * 1995-11-07 2004-12-08 大日本スクリーン製造株式会社 基板への塗布液塗布装置
JP2878214B2 (ja) * 1996-11-20 1999-04-05 新潟日本電気株式会社 インクジェット記録装置
JP3679904B2 (ja) * 1997-08-29 2005-08-03 大日本スクリーン製造株式会社 ノズル洗浄装置および該ノズル洗浄装置を備えた塗布装置
US6446642B1 (en) * 1999-11-22 2002-09-10 Agilent Technologies, Inc. Method and apparatus to clean an inkjet reagent deposition device
KR100416248B1 (ko) * 2001-01-19 2004-01-31 삼성전자주식회사 와이퍼 크리너를 구비한 잉크젯 프린터의 와이핑 장치
JP2002273285A (ja) * 2001-03-21 2002-09-24 Seiko Epson Corp 液滴塗布装置のワイピング装置
JP3970567B2 (ja) * 2001-09-17 2007-09-05 アルプス電気株式会社 ウェット処理装置

Also Published As

Publication number Publication date
KR100925765B1 (ko) 2009-11-11
CN100421941C (zh) 2008-10-01
JP2004305988A (ja) 2004-11-04
CN1550330A (zh) 2004-12-01
KR20060113855A (ko) 2006-11-03
KR20040089493A (ko) 2004-10-21
KR100658109B1 (ko) 2006-12-14
JP4343573B2 (ja) 2009-10-14

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