TW200502049A - Liquid-applying device and method of cleaning a head - Google Patents

Liquid-applying device and method of cleaning a head

Info

Publication number
TW200502049A
TW200502049A TW093109932A TW93109932A TW200502049A TW 200502049 A TW200502049 A TW 200502049A TW 093109932 A TW093109932 A TW 093109932A TW 93109932 A TW93109932 A TW 93109932A TW 200502049 A TW200502049 A TW 200502049A
Authority
TW
Taiwan
Prior art keywords
liquid
head
applying
applying device
substrate
Prior art date
Application number
TW093109932A
Other languages
Chinese (zh)
Inventor
Akihiro Shigeyama
Masahiko Kurosawa
Shinji Kajiwara
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Publication of TW200502049A publication Critical patent/TW200502049A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133784—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133738—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers for homogeneous alignment

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Coating Apparatus (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Ink Jet (AREA)

Abstract

This invention provides a liquid-applying device capable of applying a functional thin film of a uniform thickness on the surface of the substrate. The applying device uses nozzles to inject applying liquid to the substrate surface, and includes a head and an opposing substrate. The opposing substrate accepts the liquid injected from the nozzle at the time of not applying the liquid and opposes the nozzle of the head, while storing the fluid between the opposing substrate and the above nozzle surface.
TW093109932A 2003-04-10 2004-04-09 Liquid-applying device and method of cleaning a head TW200502049A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003106561A JP4343573B2 (en) 2003-04-10 2003-04-10 Coating device and head cleaning method

Publications (1)

Publication Number Publication Date
TW200502049A true TW200502049A (en) 2005-01-16

Family

ID=33468718

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093109932A TW200502049A (en) 2003-04-10 2004-04-09 Liquid-applying device and method of cleaning a head

Country Status (4)

Country Link
JP (1) JP4343573B2 (en)
KR (2) KR100658109B1 (en)
CN (1) CN100421941C (en)
TW (1) TW200502049A (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI309990B (en) * 2007-01-26 2009-05-21 Au Optronics Corp Wiping structure of nozzle cleaner
KR101035986B1 (en) * 2009-07-02 2011-05-23 세메스 주식회사 Chemical cleaning apparatus and chemical coating apparatus with it
JP6112125B2 (en) * 2010-02-15 2017-04-12 セイコーエプソン株式会社 Liquid ejector
JP5703679B2 (en) 2010-02-15 2015-04-22 セイコーエプソン株式会社 Liquid ejecting apparatus and maintenance method for liquid ejecting apparatus
KR101464203B1 (en) * 2010-08-24 2014-11-25 세메스 주식회사 Cleaning unit, treating fluid discharging apparatus with the unit, and cleaning method
US9144134B2 (en) 2012-08-24 2015-09-22 Shenzhen China Star Optoelectronics Technology Co., Ltd Method for coating polyimide on liquid crystal display panel
CN102826765B (en) * 2012-08-24 2015-10-07 深圳市华星光电技术有限公司 The polyimide coating method of display panels
KR101696195B1 (en) * 2013-12-31 2017-01-16 세메스 주식회사 Head cleaning unit and apparatus for treating substrate including the same
WO2018025292A1 (en) * 2016-08-03 2018-02-08 ナカンテクノ株式会社 Automatic washing device for anilox roll and washing method thereof
CN109016845B (en) * 2018-08-07 2019-11-15 杭州三晶工艺塑料有限公司 A kind of paint glass production technology
GB201819454D0 (en) * 2018-11-29 2019-01-16 Johnson Matthey Plc Apparatus and method for coating substrates with washcoats
CN111085367A (en) * 2020-01-13 2020-05-01 郑肖 High-efficient paint spraying apparatus of industrial processing usefulness

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2962964B2 (en) * 1992-06-26 1999-10-12 キヤノン株式会社 Liquid ejection device and printing method using the same
JP3083409B2 (en) * 1992-07-24 2000-09-04 キヤノン株式会社 Ink jet recording apparatus and recovery method for the recording apparatus
US5635965A (en) * 1995-01-31 1997-06-03 Hewlett-Packard Company Wet capping system for inkjet printheads
JP3597612B2 (en) * 1995-11-07 2004-12-08 大日本スクリーン製造株式会社 Applicator for coating liquid on substrate
JP2878214B2 (en) * 1996-11-20 1999-04-05 新潟日本電気株式会社 Ink jet recording device
JP3679904B2 (en) * 1997-08-29 2005-08-03 大日本スクリーン製造株式会社 NOZZLE CLEANING DEVICE AND COATING DEVICE HAVING THE NOZZLE CLEANING DEVICE
US6446642B1 (en) * 1999-11-22 2002-09-10 Agilent Technologies, Inc. Method and apparatus to clean an inkjet reagent deposition device
KR100416248B1 (en) * 2001-01-19 2004-01-31 삼성전자주식회사 Wiping apparatus having wiper claner for ink-jet printer
JP2002273285A (en) * 2001-03-21 2002-09-24 Seiko Epson Corp Wiping apparatus for liquid agent applying apparatus
JP3970567B2 (en) * 2001-09-17 2007-09-05 アルプス電気株式会社 Wet processing equipment

Also Published As

Publication number Publication date
CN1550330A (en) 2004-12-01
KR100925765B1 (en) 2009-11-11
JP2004305988A (en) 2004-11-04
KR20060113855A (en) 2006-11-03
CN100421941C (en) 2008-10-01
JP4343573B2 (en) 2009-10-14
KR100658109B1 (en) 2006-12-14
KR20040089493A (en) 2004-10-21

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