CN100421941C - Coating device and blow head cleaning method - Google Patents
Coating device and blow head cleaning method Download PDFInfo
- Publication number
- CN100421941C CN100421941C CNB2004100334850A CN200410033485A CN100421941C CN 100421941 C CN100421941 C CN 100421941C CN B2004100334850 A CNB2004100334850 A CN B2004100334850A CN 200410033485 A CN200410033485 A CN 200410033485A CN 100421941 C CN100421941 C CN 100421941C
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- shower nozzle
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- 239000011248 coating agent Substances 0.000 title abstract description 7
- 238000000576 coating method Methods 0.000 title abstract description 7
- 238000004140 cleaning Methods 0.000 title description 7
- 238000000034 method Methods 0.000 title description 5
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 239000000243 solution Substances 0.000 claims description 88
- 239000007921 spray Substances 0.000 claims description 12
- 239000007789 gas Substances 0.000 claims description 10
- 239000011261 inert gas Substances 0.000 claims description 7
- 238000002347 injection Methods 0.000 claims description 6
- 239000007924 injection Substances 0.000 claims description 6
- 238000005507 spraying Methods 0.000 abstract description 4
- 239000010409 thin film Substances 0.000 abstract 1
- 239000007788 liquid Substances 0.000 description 13
- 238000011084 recovery Methods 0.000 description 13
- 239000012298 atmosphere Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000002791 soaking Methods 0.000 description 4
- 238000007711 solidification Methods 0.000 description 4
- 230000008023 solidification Effects 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000003223 protective agent Substances 0.000 description 2
- 238000007761 roller coating Methods 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133784—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133738—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers for homogeneous alignment
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Coating Apparatus (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Ink Jet (AREA)
Abstract
Provided is a coating apparatus of inkjet type capable of forming a functional thin film having a uniform thickness on the surface of a substrate. The coating apparatus for spray-coating a solution to the surface of the substrate W by using a nozzle 14 is provided with a head 7 on which a nozzle 14 is formed and an opposite plate 55 which is disposed opposite to a nozzle surface 57 of the head 7, receives the solution flowing down from the nozzle 14, and stops the solution between the nozzle surface 57 and the opposite plate 55, upon non-coating of the solution.
Description
Technical field
The present invention relates to the applying device of the spraying method of spray solution on substrate surface, relate in particular to the cleaning method of the shower nozzle of the solution that adheres on the nozzle face of cleaning shower nozzle.
Background technology
Generally, in the liquid crystal indicator manufacturing process, on glass baseplate surface, make functional films such as alignment films.Past, when on substrate surface, forming functional film, utilize the applying device of roller coating mode, promptly utilize the running roller of rubber system that the solution (forming the solution of functional film) as coating material is coated on the substrate surface.
But, the applying device of roller coating mode, the soln using rate is low, so manufacturing cost becomes serious problems when using the solution of high price.
Therefore, in recent years, adopted the applying device of spray regime, promptly the solution spraying that forms functional film to substrate surface.
This applying device has the estrade that transmits substrate, is arranged side by side a plurality of shower nozzles at the upside of platform, and makes each shower nozzle form staggered with respect to the substrate direction of transfer.Below each shower nozzle, be arranged side by side a plurality of nozzles, on the substrate that solution transmits from these nozzle ejection to the downside at shower nozzle.
But, as the polyimide solution of aligning film material with organic solvent diluting.Usually because this organic solvent has volatility, so when not applying the time remaining certain hour of solution, the polyimides concentration in the solution increases, and produces solidification in nozzle or on the nozzle face, cause 1. above-mentioned and 2. shown in injection bad.
1. the spray volume from the solution of each nozzle ejection produces difference, can not apply solution on the whole base plate surface equably.
2. nozzle stops up fully, can not spray solution from nozzle.
Therefore, after the solution coating finishes, utilize the wiper member of silicon rubber system to wipe the residual solution of adhering on the nozzle face of shower nozzle.
But, wiping under the situation of solution with wiper member, the solution that adheres on wiper member solidification along with the process of time, and can not wipe well attached to the solution on the nozzle face sometimes.
Summary of the invention
The scheme that the present invention In view of the foregoing proposes just, its 1st purpose are to provide the applying device of the spray regime of the functional film that can form uniform thickness on substrate surface.The 2nd purpose is to provide the cleaning method of the shower nozzle of the wiping action reduction that can prevent wiper member.
In order to address the above problem, achieve the above object, the cleaning method of applying device of the present invention and shower nozzle adopts following structure.
(1) a kind of applying device that utilizes nozzle spray solution on substrate surface is characterized in that,
Have: shower nozzle, have nozzle face, be formed with said nozzle on this nozzle face;
Opposed plate when not applying above-mentioned solution, is configured to separate predetermined distance with the nozzle face of above-mentioned shower nozzle and mutually opposed, has solution that reception flows down from the said nozzle ejection and it is filled to upper surface between this opposed plate and the said nozzle face;
And cylinder up and down, above-mentioned opposed plate is moved up and down.
(2) applying device described in (1) is characterized in that, has the gas injection nozzle, is used for inert gas is ejected into the solution that accumulates between said nozzle face and the opposed plate.
Description of drawings
Fig. 1 is the piping diagram of pipe arrangement of the applying device of expression the present invention the 1st embodiment.
Fig. 2 is the front view that has omitted pipe arrangement in the structure of applying device of this embodiment of expression.
Fig. 3 is the cutaway view of the nozzle structure of this embodiment of expression.
Fig. 4 is the vertical view of the nozzle structure of this embodiment of expression.
Fig. 5 is the schematic diagram of the gathering sill shape that forms at opposed plate upper surface of this embodiment of expression.
Fig. 6 is the schematic diagram of the solution that stops on the nozzle face of shower nozzle of this embodiment of expression.
Fig. 7 is the front view that has omitted pipe arrangement in the structure of applying device of the present invention's the 2nd embodiment.
Fig. 8 is the schematic diagram that adheres to the situation of residual solution on the nozzle face of shower nozzle of wiping of this embodiment.
Fig. 9 is the front view that has omitted pipe arrangement in the structure of applying device in the variation of this embodiment of expression.
Figure 10 is the side view that has omitted pipe arrangement in the structure of applying device in the variation of this embodiment of expression.
The specific embodiment
Following with reference to Fig. 1～Fig. 6, describe the 1st embodiment of the present invention in detail.
Fig. 1 relates to the piping diagram of pipe arrangement of the applying device of the present invention's the 1st embodiment;
Fig. 2 be the expression this embodiment applying device structure omission the front view of pipe arrangement.
As depicted in figs. 1 and 2, applying device of the present invention has pedestal 1.On pedestal 1, be provided with the pair of guide rails 2 of separating along the length direction of pedestal 1 by predetermined space.On guide rail 2, be provided with mobile workbench 3, move driving by drive source (not shown).On workbench 3, be provided with a plurality of fulcrum posts 4,4 supportings of these fulcrum posts are supplied to is used for the glass system substrate W of liquid crystal indicator etc.
At the substrate W upside that transmits by above-mentioned workbench 3; along roughly with the direction of transfer of substrate W mutually the direction of quadrature with staggered state configuration a plurality of shower nozzles 7; be 3 in the present embodiment, this shower nozzle 7 is used for going up the colored protective agent (colour resist) of spraying and applying or being used to form the solution of functional films such as alignment films to substrate W.
Fig. 3 is the cutaway view of structure that expression relates to the shower nozzle 7 of same embodiment.Fig. 4 is the vertical view of structure that expression relates to the shower nozzle 7 of same embodiment.
As shown in Figure 3 and Figure 4, shower nozzle 7 has nozzle body 8.Nozzle body 8 is made of cylinder, and its lower aperture is by 9 sealings of flexible plate.This flexible plate 9 covers with nozzle plate 11 again, forms liquid chamber 12 between nozzle plate 11 and flex plate 9.
In an end of Base body 8, formed the feed flow hole 13 that is connected with liquid chamber 12.In liquid chamber 12, supply with the solution that is used to form functional films such as alignment films and colored protective agent from this feed flow hole 13, till filling with.
At the central part of the width of nozzle plate 11, along with the substrate W direction of transfer direction of quadrature roughly, be provided with a plurality of nozzles 14 with staggered.On flex plate 9, fixed a plurality of piezoelectric vibrators 15 respectively, and made it mutually opposed with each nozzle 14.
On the other end of nozzle body 8, formed the recovery holes 17 that is connected with liquid chamber 12.The solution of supplying with in liquid chamber 12 from feed flow hole 13 is recovered from this recovery holes 17.
As shown in Figure 1, in the feed flow hole 13 of each shower nozzle 7 (only shown in Figure 3), connected respectively from the supply branched pipe 22 of solution supply pipe 21 branches.And, on the recovery tube 17 (only shown in Figure 3) of each shower nozzle 7, connected from the recovery arm 24 of solution recovery tube 23 branches.On supply branched pipe 22, be provided with then and supply with switch valve 25, on recovery branched pipe 24, be provided with and reclaim switch valve 26.
The front end of the front end of solution supply pipe 21 and solution recovery tube 23 connects by communicating valve 27.And solution recovery tube 23 has main recovery valve 28 at the base end side that reclaims branched pipe 24.
The cardinal extremity of solution supply pipe 21 is connected to the bottom of the liquor box 31 of stock solution.And the cardinal extremity of solution recovery tube 23 is connected with the container 32 that is used for the solution that supplies to liquor box 31 is stored.
By supply valve 33, be connected to the bottom of liquor box 31 from branch's solution supply pipe 34 of the base end part branch of solution recovery tube 23.On the top of liquor box 31, connected atmosphere open tube 35 with the 1st switching control pilot 36.
When opening the 1st switching control pilot 36, be communicated with atmosphere in the liquor box 31, and, on atmosphere open tube 35, connected a kind for the treatment of apparatus (not shown), be used for handling the vaporized solvent that contains to the gas of airborne release from this atmosphere opening pipe 35.
On the top of liquor box 31, connected gas supply pipe 38 with the 2nd switching control pilot 37.And,, in liquor box 31, supply with inert gases such as nitrogen from gas supply source (not shown) by this gas supply pipe 38.
On gas supply pipe 38, connect filter 39 and the 3rd switching control pilot 40 successively at the upstream side of the 2nd switching control pilot 37.On the 3rd switching control pilot 40, be arranged in parallel choke valve 41, be used in liquor box 31, supplying with the inert gas of trace.
On the top of container 32, atmosphere opening pipe 44 with the 4th switching control pilot 43 and air supply pipe 46 have been connected with the 5th switching control pilot 45.Filter 47 and the 6th switching control pilot 48 on this air supply pipe 46, have been connected successively.On the 6th switching control pilot 48, be arranged in parallel choke valve 49.
Above-mentioned supply switch valve 25, recovery switch valve 26, main recovery valve 28, supply valve the 33, the 1st～the 6th switching control pilot 36,37,40,43,45,48 carry out switch control by control device (not shown).
Moreover the liquid level of the solution in the liquor box 31 is detected by liquid level sensor 50.When detecting liquid level, liquid level sensor 50 drops to the predetermined level position when following, according to this detection, from container 32 make-up solution in liquor box 31.That is to say that the inert gas that the soln using in the container 32 is supplied with by the 5th switching control pilot 45 pressurizes make-up solution in liquor box 31.
As shown in Figure 2, the installing component 51 that side view is the L font is set on an end face of workbench 3, one side on its vertical above-mentioned end face that is fixed on above-mentioned workbench 3.On the another side of the level of installing component 51, be provided with cylinder 52 up and down with making axis normal.
On the bar of cylinder 52 up and down, install and load plate 54.At this upper face side that loads plate 54, be provided with 3 blocks of opposed plates 55 by parts 56.Each opposed plate 55 is made of the sheet material with nozzle face 57 approximate same size of shower nozzle 7, in the above, has formed gathering sill 58 as shown in Figure 5, is used to guide the solution that flows down from nozzle 14.
Above-mentioned loading plate 54 is arranged on the inner bottom part of accumulator tank 61, in a side of this accumulator tank 61 guide plate 62 is set, and this guide plate 62 is provided with guiding parts 63.This guiding parts 63 is moved up and down by guide rail 64 guiding, and this guide rail is arranged on the end face of workbench 3 along the vertical direction.
Like this, if cylinder 52 is driven up and down, then guide plate 62 moves up and down along guide rail 64.So, load plate 54 and move up and down, not swing on fore-and-aft direction.
On above-mentioned accumulator tank 61, connected collection box shown in Figure 1 65.This collection box 65 reclaims the solution that flows in the accumulator tank 61 from nozzle 14.
Near opposed plate 55, disposed with loading a plurality of gas injection nozzles 59 that plate 54 is driven up and down.This gas injection nozzle 59 is when opposed plate 55 rises, N
2Be ejected into part between shower nozzle 7 and the opposed plate 55 Deng inert gas.
The below effect of the applying device of explanation said structure.
The substrate W that is installed in above the workbench 3 transmits along predetermined direction with workbench 3.And when the substrate W that is transmitted arrives the downside of shower nozzle 7, add driving voltage, utilize stretching of piezoelectric vibrator 15 to make flex plate 9 vibrations to piezoelectric vibrator 15.
Like this, the solution pressurization in the molten chamber 12 makes solution be ejected on the substrate W from nozzle 14.And,, and behind spray solution on the whole surface of substrate W, stop to drive piezoelectric vibrator 15 and workbench 3 at the downside of substrate W by shower nozzle 7.
Afterwards, cylinder 52 rises opposed plate 55 about utilizing, and the distance between the nozzle face 57 of the top and shower nozzle 7 of opposed plate 55 is set at predefined value.Then, make to keep in the liquor box 31, make solution from nozzle 14 ejections than about atmospheric pressure high by 0.01 " Mpa ".
From the solution of nozzle 14 ejection flow to opposed plate 55 above, be filled between arbitrary nozzle face 57 and the opposed plate 55.The solution that is filled between nozzle face 57 and the opposed plate 55 is led by the gathering sills 58 that are formed on above the opposed plate 55, flow in the accumulator tank 61 from the periphery of opposed plate 55.
Like this, the nozzle face 57 of shower nozzle 7 is utilized the solution that is filled between nozzle face 57 and the opposed plate 55, keeps soaking state.
That is to say, when not applying solution, also can make the surface of nozzle face 57 keep soaking state.So can prevent solution in nozzle 14 internal solidsization and plug nozzle 14, or stick to firmly on the nozzle face 57.
Like this, each nozzle 14 always sprays the solution of equivalent, so, can on substrate W surface, form the functional film of uniform thickness.
And when not applying solution, the solution that is full of between nozzle face 57 and opposed plate 55 from gas injection nozzle 59 sprays N
2Deng inert gas.
Like this, the solution between nozzle face 57 and the opposed plate 55 is difficult for ingress of air, can suppress solution oxide and absorb airborne moisture, so can suppress solution solidsization.
And, in the present embodiment, opposed plate 55 is configured to mutually opposed with the nozzle face 57 of shower nozzle 7, the solution that flows out is deposited between this nozzle face 57 and the opposed plate 55, the total surface that makes nozzle face 57 is to keep soaking state.
But the present invention is not limited to this.That is to say, also can not use opposed plate 55, but the pressure in the regulator solution case 31, from supply with branched pipe 22 to liquid chamber 12 in supply with solution on one side, on one side from reclaiming the solution that branched pipe 24 reclaims in the liquid chamber 12.
Like this, when making solution circulation time in liquid chamber 12, the solution in the liquid chamber 12 flows out a little to the face side of nozzle face 57, as shown in Figure 6, rests on because of surface tension on the surface of nozzle face 57.
Therefore,, also can make nozzle face 57 always keep soaking state even when not applying solution, so, can prevent solution solidsization and stick to firmly on the inside or nozzle face 57 of nozzle 14.
Following with reference to Fig. 7 and Fig. 8, describe the present invention's the 2nd embodiment in detail.And at this, for the part mark identical mark identical with the 1st embodiment, its explanation is omitted.
Fig. 7 is the front view that has omitted pipe arrangement in the structure of applying device of expression the present invention the 2nd embodiment.
As shown in Figure 7, in the present embodiment, on the inner bottom surface of accumulator tank 61, be provided with 3 wiper members 71 that constitute by elasticity materials such as silicon rubber by holding member 74.Each wiper member 71 keeps its length and shower nozzle 7 corresponding foliaceous, and its bottom utilizes holding member 74 to keep.
Therefore, as shown in Figure 8, when coating solution on substrate W, wiper member 71 be set in can with the nozzle face 57 contacted height of shower nozzle 7, like this, when substrate W when the downside of shower nozzle 7 moves back and forth, can wipe and adhere to the solution that remains on the applying device face 57.
The solution of being wiped by wiper member 71 flow in the accumulator tank 61 along wiper member 71 surfaces, is recovered case 65 and reclaims.
In wiper member 71 both sides a plurality of washer jets 72 are set.Each washer jet 72 sprays NMP (N-methyl pyrrolidone) or gamma-butyrolacton to wiper member 71, and (equal solvent of γ-butyrolactone) is to washing attached to wiper member 71 lip-deep solution.And the part of the solution that flushes out flow in the above-mentioned accumulator tank 61, discharges from discharge pipe (not shown).
To attached to the solution ejection of solvent on the wiper member 71, this solution can be wiped before wiper member 71 surperficial solidifications like this.So, can often keep wiper member 71 cleaning surfaces.
So, when wiping the solution that adheres on the nozzle face 57 that remains in shower nozzle 7 next time, can be thoroughly remove attachment removal and remain in solution on the nozzle face 57.
And, in the present embodiment, utilize the solution that sprays from washer jet 72 to wash, but the present invention is not limited to this attached to the solution on the wiper member 71.
That is to say, also can have the rinse bath 73 of above-mentioned solution, the wiper member 71 that has adhered to solution is impregnated in the interior solvent of said washing groove 73 in wiper member 71 downsides configurations as modified embodiment of the present embodiment.The structure of applying device at this moment is shown in Fig. 9 and Figure 10.
As Fig. 9 and shown in Figure 10, on installing component 51, be provided with the said washing groove 73 of storing above-mentioned solvent.In rinse bath 73 both sides, generally perpendicularly erect guide rail 75 respectively, be used to support the bar 76 of having fixed shower nozzle 7, it can be moved up at upper and lower, and can rotate around axial line.
By wiping the solution that adheres on the nozzle face 57 that remains in shower nozzle 7, if on wiper member 71, adhere to solution, then utilize above-mentioned CD-ROM drive motor to make the wiper member that made progress originally downward, utilize above-mentioned cylinder up and down that wiper member 71 is impregnated in the rinse bath 73 of each holding member 74 downsides configuration.
Like this, can be to before solidification, washing attached to the solution on the wiper member 71, so, can make wiper member 71 surfaces remain cleaning, therefore, when wiping the solution that adheres on the nozzle face 57 that remains in shower nozzle 7 next time, can be thoroughly remove attachment removal and remain in solution on the nozzle face 57.
And the present invention is not limited to this, the implementation phase, in the scope that does not break away from its main contents, can change structural element.And, disclosed a plurality of structural elements in the above-mentioned embodiment are suitably made up, can form various inventions.For example also can from the entire infrastructure key element shown in the embodiment, remove several structural elements.
The invention effect
According to the present invention, then can form on the substrate surface functional film of uniform thickness. And, The scrubbing action that can prevent wiper member reduces.
Claims (2)
1. applying device that utilizes nozzle spray solution on substrate surface is characterized in that having: shower nozzle, have nozzle face, and be formed with said nozzle on this nozzle face; Opposed plate when not applying above-mentioned solution, is configured to separate predetermined distance with the nozzle face of above-mentioned shower nozzle and mutually opposed, has solution that reception flows down from the said nozzle ejection and it is filled to upper surface between this opposed plate and the said nozzle face; And cylinder up and down, above-mentioned opposed plate is moved up and down.
2. applying device as claimed in claim 1 is characterized in that, has the gas injection nozzle, is used for inert gas is ejected into the solution that accumulates between said nozzle face and the opposed plate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP106561/2003 | 2003-04-10 | ||
| JP2003106561A JP4343573B2 (en) | 2003-04-10 | 2003-04-10 | Coating device and head cleaning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1550330A CN1550330A (en) | 2004-12-01 |
| CN100421941C true CN100421941C (en) | 2008-10-01 |
Family
ID=33468718
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100334850A Expired - Fee Related CN100421941C (en) | 2003-04-10 | 2004-04-09 | Coating device and blow head cleaning method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4343573B2 (en) |
| KR (2) | KR100658109B1 (en) |
| CN (1) | CN100421941C (en) |
| TW (1) | TW200502049A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014029147A1 (en) * | 2012-08-24 | 2014-02-27 | 深圳市华星光电技术有限公司 | Method for coating polyimide on liquid crystal display panel |
| US9144134B2 (en) | 2012-08-24 | 2015-09-22 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Method for coating polyimide on liquid crystal display panel |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI309990B (en) * | 2007-01-26 | 2009-05-21 | Au Optronics Corp | Wiping structure of nozzle cleaner |
| KR101035986B1 (en) * | 2009-07-02 | 2011-05-23 | 세메스 주식회사 | Chemical cleaning apparatus and chemical coating apparatus with it |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1081145A (en) * | 1992-06-26 | 1994-01-26 | 佳能株式会社 | Liquid discharge device and the method for utilizing this device to print |
| CN1136501A (en) * | 1995-01-31 | 1996-11-27 | 惠普公司 | Wet convering system of ink-jet printer |
| US5670997A (en) * | 1992-07-24 | 1997-09-23 | Canon Kabushiki Kaisha | Recording means for enhancing removal of ink deposited on an ejection side surface thereof, ink jet recording apparatus having said recording means, and recovery method |
| US6068364A (en) * | 1996-11-20 | 2000-05-30 | Nec Corporation | Cap for service station for ink-jet printheads |
| JP2002273285A (en) * | 2001-03-21 | 2002-09-24 | Seiko Epson Corp | Wiping apparatus for liquid agent applying apparatus |
| US20030011656A1 (en) * | 1999-11-22 | 2003-01-16 | Caren Michael P. | Method and apparatus to clean an inkjet reagent deposition device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3597612B2 (en) * | 1995-11-07 | 2004-12-08 | 大日本スクリーン製造株式会社 | Applicator for coating liquid on substrate |
| JP3679904B2 (en) * | 1997-08-29 | 2005-08-03 | 大日本スクリーン製造株式会社 | NOZZLE CLEANING DEVICE AND COATING DEVICE HAVING THE NOZZLE CLEANING DEVICE |
| KR100416248B1 (en) * | 2001-01-19 | 2004-01-31 | 삼성전자주식회사 | Wiping apparatus having wiper claner for ink-jet printer |
| JP3970567B2 (en) * | 2001-09-17 | 2007-09-05 | アルプス電気株式会社 | Wet processing equipment |
-
2003
- 2003-04-10 JP JP2003106561A patent/JP4343573B2/en not_active Expired - Fee Related
-
2004
- 2004-04-06 KR KR1020040023401A patent/KR100658109B1/en active IP Right Grant
- 2004-04-09 TW TW093109932A patent/TW200502049A/en unknown
- 2004-04-09 CN CNB2004100334850A patent/CN100421941C/en not_active Expired - Fee Related
-
2006
- 2006-10-09 KR KR1020060098073A patent/KR100925765B1/en active IP Right Grant
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1081145A (en) * | 1992-06-26 | 1994-01-26 | 佳能株式会社 | Liquid discharge device and the method for utilizing this device to print |
| US5670997A (en) * | 1992-07-24 | 1997-09-23 | Canon Kabushiki Kaisha | Recording means for enhancing removal of ink deposited on an ejection side surface thereof, ink jet recording apparatus having said recording means, and recovery method |
| CN1136501A (en) * | 1995-01-31 | 1996-11-27 | 惠普公司 | Wet convering system of ink-jet printer |
| US6068364A (en) * | 1996-11-20 | 2000-05-30 | Nec Corporation | Cap for service station for ink-jet printheads |
| US20030011656A1 (en) * | 1999-11-22 | 2003-01-16 | Caren Michael P. | Method and apparatus to clean an inkjet reagent deposition device |
| JP2002273285A (en) * | 2001-03-21 | 2002-09-24 | Seiko Epson Corp | Wiping apparatus for liquid agent applying apparatus |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014029147A1 (en) * | 2012-08-24 | 2014-02-27 | 深圳市华星光电技术有限公司 | Method for coating polyimide on liquid crystal display panel |
| US9144134B2 (en) | 2012-08-24 | 2015-09-22 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Method for coating polyimide on liquid crystal display panel |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004305988A (en) | 2004-11-04 |
| JP4343573B2 (en) | 2009-10-14 |
| KR20060113855A (en) | 2006-11-03 |
| KR20040089493A (en) | 2004-10-21 |
| KR100925765B1 (en) | 2009-11-11 |
| TW200502049A (en) | 2005-01-16 |
| CN1550330A (en) | 2004-12-01 |
| KR100658109B1 (en) | 2006-12-14 |
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