SU750614A1 - Способ подготовки к контактному экспонированию и устройство дл его осуществлени - Google Patents

Способ подготовки к контактному экспонированию и устройство дл его осуществлени Download PDF

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Publication number
SU750614A1
SU750614A1 SU772439404A SU2439404A SU750614A1 SU 750614 A1 SU750614 A1 SU 750614A1 SU 772439404 A SU772439404 A SU 772439404A SU 2439404 A SU2439404 A SU 2439404A SU 750614 A1 SU750614 A1 SU 750614A1
Authority
SU
USSR - Soviet Union
Prior art keywords
substrate
photomask
template
vacuum
slice
Prior art date
Application number
SU772439404A
Other languages
English (en)
Russian (ru)
Inventor
Ульрих Детлеф
Вестфаль Петер
Эскольд Дитер
Штельценмюллер Хельмут
Original Assignee
Феб Электромат (Инопредприятие)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Феб Электромат (Инопредприятие) filed Critical Феб Электромат (Инопредприятие)
Application granted granted Critical
Publication of SU750614A1 publication Critical patent/SU750614A1/ru

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SU772439404A 1976-01-19 1977-01-12 Способ подготовки к контактному экспонированию и устройство дл его осуществлени SU750614A1 (ru)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD19086176A DD123848A1 (fr) 1976-01-19 1976-01-19

Publications (1)

Publication Number Publication Date
SU750614A1 true SU750614A1 (ru) 1980-07-23

Family

ID=5503310

Family Applications (1)

Application Number Title Priority Date Filing Date
SU772439404A SU750614A1 (ru) 1976-01-19 1977-01-12 Способ подготовки к контактному экспонированию и устройство дл его осуществлени

Country Status (6)

Country Link
CS (1) CS211450B1 (fr)
DD (1) DD123848A1 (fr)
DE (1) DE2701106A1 (fr)
FR (1) FR2338509A1 (fr)
GB (1) GB1536978A (fr)
SU (1) SU750614A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD151387A1 (de) 1980-06-02 1981-10-14 Erich Adler Verfahren und vorrichtung zum automatischen transport und zur lageorientierung scheibenfoermiger objekte
CN109794427B (zh) * 2019-02-03 2024-06-04 东莞市粤蒙电子科技有限公司 一种分选设备

Also Published As

Publication number Publication date
CS211450B1 (en) 1982-02-26
DD123848A1 (fr) 1977-01-19
GB1536978A (en) 1978-12-29
FR2338509A1 (fr) 1977-08-12
DE2701106A1 (de) 1977-07-28
FR2338509B3 (fr) 1980-12-26

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