CS211450B1 - Method of planparalell evening the semiconductor plate in respect of the exposure mask and device for executing the same - Google Patents
Method of planparalell evening the semiconductor plate in respect of the exposure mask and device for executing the same Download PDFInfo
- Publication number
- CS211450B1 CS211450B1 CS6677A CS6677A CS211450B1 CS 211450 B1 CS211450 B1 CS 211450B1 CS 6677 A CS6677 A CS 6677A CS 6677 A CS6677 A CS 6677A CS 211450 B1 CS211450 B1 CS 211450B1
- Authority
- CS
- Czechoslovakia
- Prior art keywords
- clamping table
- outer ring
- mask
- semiconductor
- template
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD19086176A DD123848A1 (fr) | 1976-01-19 | 1976-01-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CS211450B1 true CS211450B1 (en) | 1982-02-26 |
Family
ID=5503310
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS6677A CS211450B1 (en) | 1976-01-19 | 1977-01-04 | Method of planparalell evening the semiconductor plate in respect of the exposure mask and device for executing the same |
Country Status (6)
| Country | Link |
|---|---|
| CS (1) | CS211450B1 (fr) |
| DD (1) | DD123848A1 (fr) |
| DE (1) | DE2701106A1 (fr) |
| FR (1) | FR2338509A1 (fr) |
| GB (1) | GB1536978A (fr) |
| SU (1) | SU750614A1 (fr) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DD151387A1 (de) | 1980-06-02 | 1981-10-14 | Erich Adler | Verfahren und vorrichtung zum automatischen transport und zur lageorientierung scheibenfoermiger objekte |
| CN109794427B (zh) * | 2019-02-03 | 2024-06-04 | 东莞市粤蒙电子科技有限公司 | 一种分选设备 |
-
1976
- 1976-01-19 DD DD19086176A patent/DD123848A1/xx unknown
-
1977
- 1977-01-04 CS CS6677A patent/CS211450B1/cs unknown
- 1977-01-12 SU SU772439404A patent/SU750614A1/ru active
- 1977-01-12 DE DE19772701106 patent/DE2701106A1/de not_active Withdrawn
- 1977-01-14 GB GB161577A patent/GB1536978A/en not_active Expired
- 1977-01-18 FR FR7701348A patent/FR2338509A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| FR2338509B3 (fr) | 1980-12-26 |
| FR2338509A1 (fr) | 1977-08-12 |
| DE2701106A1 (de) | 1977-07-28 |
| GB1536978A (en) | 1978-12-29 |
| DD123848A1 (fr) | 1977-01-19 |
| SU750614A1 (ru) | 1980-07-23 |
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