SU128008A1 - The method of obtaining semiconductor films on dielectrics - Google Patents

The method of obtaining semiconductor films on dielectrics

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Publication number
SU128008A1
SU128008A1 SU633156A SU633156A SU128008A1 SU 128008 A1 SU128008 A1 SU 128008A1 SU 633156 A SU633156 A SU 633156A SU 633156 A SU633156 A SU 633156A SU 128008 A1 SU128008 A1 SU 128008A1
Authority
SU
USSR - Soviet Union
Prior art keywords
dielectrics
semiconductor films
obtaining semiconductor
spectrum
transparent
Prior art date
Application number
SU633156A
Other languages
Russian (ru)
Inventor
Б.П. Крыжановский
А.Я. Кузнецов
В.М. Троицкий
Original Assignee
Б.П. Крыжановский
А.Я. Кузнецов
В.М. Троицкий
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Б.П. Крыжановский, А.Я. Кузнецов, В.М. Троицкий filed Critical Б.П. Крыжановский
Priority to SU633156A priority Critical patent/SU128008A1/en
Application granted granted Critical
Publication of SU128008A1 publication Critical patent/SU128008A1/en

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  • Physical Vapour Deposition (AREA)

Description

Разработанные ранее полупроводниковые пленки из окислов некоторых металлов (олова, инди , кадми ) позвол ют превращать такие изол торы как стекло и керамику в электропровод щий материал. Эти пленки нашли широкое применение в промышленности дл  устранени  запотевани  стекол в оптических приборах и на транспорте дл  сн ти  электростатических зар дов в электронных приборах и дл  мдогих других целей.The previously developed semiconductor films of oxides of some metals (tin, indium, cadmium) allow insulators such as glass and ceramics to be converted into electrically conductive material. These films have found widespread use in industry for eliminating glass fogging in optical devices and in transport for removing electrostatic charges in electronic devices and for other purposes.

Однако все разработанные как в СССР, так н за границей полупроводниковые пленки прозрачны лишь в видимой части спектра. Полупроводниковых пленок, прозрачных в инфракрасной области спектра, до насто щего времени не было.However, all semiconductor films developed both in the USSR and abroad are transparent only in the visible part of the spectrum. Until now, there have been no semiconductor films that are transparent in the infrared region of the spectrum.

Быстро развивающа с  инфракрасна  техника примен ет в качестве оптических сред такие материалы как природные и искусственные монокристаллы,  вл ющиес  диэлектриками. В св зи с этим необходимы электропровод щие пленки, прозрачные в инфракрасной области спектра.The rapidly developing infrared technology uses as optical media materials such as natural and artificial single crystals, which are dielectrics. In this connection, electrically conductive films that are transparent in the infrared region of the spectrum are required.

Найден новый способ с применением трехокиси вольфрама дл  получени  на диэлектриках полупроводниковых пленок, прозрачных не только в видимой, но и в инфракрасной области спектра, путем термообработки в атмосфере водорода диэлектриков, например, оптических деталей, покрытых слоем шестихлористого вольфрама, нанесенного из раствора в сухом этиловом спирте, или непосредственно слоем трехокиси вольфрама испарением последнего в вакууме.A new method was found using tungsten trioxide to obtain semiconductor films on dielectrics that are transparent not only in the visible, but also in the infrared region of the spectrum, by heat treating dielectrics in hydrogen, for example, optical parts coated with a layer of tungsten hexahyl chloride deposited from a solution in dry ethyl alcohol, or directly with a layer of tungsten trioxide by evaporation of the latter in a vacuum.

Предлагаемые способы позвол ют получать электропровод щне пленки, прозрачные в инфракрасной области спектра и хорошо закрепл ющиес  на поверхности стекол и оптических кристаллов.The proposed methods make it possible to obtain electrically conductive films that are transparent in the infrared region of the spectrum and well attached to the surface of glasses and optical crystals.

Первый способ заключаетс  в том, что известным методом химического просветлени  нанос т тонкий слой диэлектрика из трехокиси вольфрама путем смачивани  поверхности горизонтально-вращающейс  детали некоторым количеством 5-25%-ного раствора шестнхлорисгоThe first method is that a thin layer of a tungsten trioxide dielectric is applied by a conventional chemical clarification method by wetting the surface of a horizontally rotating part with a certain amount of 5-25% solution of hexacid

SU633156A 1959-07-08 1959-07-08 The method of obtaining semiconductor films on dielectrics SU128008A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU633156A SU128008A1 (en) 1959-07-08 1959-07-08 The method of obtaining semiconductor films on dielectrics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU633156A SU128008A1 (en) 1959-07-08 1959-07-08 The method of obtaining semiconductor films on dielectrics

Publications (1)

Publication Number Publication Date
SU128008A1 true SU128008A1 (en) 1959-11-30

Family

ID=48399247

Family Applications (1)

Application Number Title Priority Date Filing Date
SU633156A SU128008A1 (en) 1959-07-08 1959-07-08 The method of obtaining semiconductor films on dielectrics

Country Status (1)

Country Link
SU (1) SU128008A1 (en)

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