SG94791A1 - Illuminance measurement apparatus and exposure apparatus - Google Patents
Illuminance measurement apparatus and exposure apparatusInfo
- Publication number
- SG94791A1 SG94791A1 SG200101837A SG200101837A SG94791A1 SG 94791 A1 SG94791 A1 SG 94791A1 SG 200101837 A SG200101837 A SG 200101837A SG 200101837 A SG200101837 A SG 200101837A SG 94791 A1 SG94791 A1 SG 94791A1
- Authority
- SG
- Singapore
- Prior art keywords
- illuminance measurement
- exposure
- exposure apparatus
- measurement apparatus
- illuminance
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Computer Networks & Wireless Communication (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000083627 | 2000-03-24 | ||
JP2001023812A JP2001338868A (ja) | 2000-03-24 | 2001-01-31 | 照度計測装置及び露光装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG94791A1 true SG94791A1 (en) | 2003-03-18 |
Family
ID=26588238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200101837A SG94791A1 (en) | 2000-03-24 | 2001-03-23 | Illuminance measurement apparatus and exposure apparatus |
Country Status (6)
Country | Link |
---|---|
US (1) | US6690455B2 (ko) |
EP (1) | EP1139174A3 (ko) |
JP (1) | JP2001338868A (ko) |
KR (1) | KR20010090519A (ko) |
SG (1) | SG94791A1 (ko) |
TW (1) | TW516094B (ko) |
Families Citing this family (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100691570B1 (ko) * | 2000-10-05 | 2007-03-12 | 에이에스엠엘 유에스, 인크. | 탈착 가능한 센서 |
US6819402B2 (en) * | 2001-10-18 | 2004-11-16 | Asml Holding N.V. | System and method for laser beam expansion |
KR20040044554A (ko) * | 2001-10-25 | 2004-05-28 | 토레이 엔지니어링 컴퍼니, 리미티드 | 레이저빔에 의한 식별코드의 마킹 방법 및 장치 |
EP1316847A1 (en) * | 2001-11-30 | 2003-06-04 | Degraf s.r.l. | "Machine for the uv exposure of flexographic plates" |
US7289230B2 (en) * | 2002-02-06 | 2007-10-30 | Cyberoptics Semiconductors, Inc. | Wireless substrate-like sensor |
US20050224902A1 (en) * | 2002-02-06 | 2005-10-13 | Ramsey Craig C | Wireless substrate-like sensor |
US6828542B2 (en) * | 2002-06-07 | 2004-12-07 | Brion Technologies, Inc. | System and method for lithography process monitoring and control |
JP2004055933A (ja) * | 2002-07-22 | 2004-02-19 | Advantest Corp | 電子ビーム露光装置、及び電子ビーム計測モジュール |
US7053355B2 (en) | 2003-03-18 | 2006-05-30 | Brion Technologies, Inc. | System and method for lithography process monitoring and control |
KR101547077B1 (ko) | 2003-04-09 | 2015-08-25 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
TWI573175B (zh) | 2003-10-28 | 2017-03-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法 |
CN100461336C (zh) | 2003-10-31 | 2009-02-11 | 株式会社尼康 | 曝光装置以及器件制造方法 |
TW201809801A (zh) | 2003-11-20 | 2018-03-16 | 日商尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
TWI389174B (zh) | 2004-02-06 | 2013-03-11 | 尼康股份有限公司 | 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法 |
US7828929B2 (en) * | 2004-12-30 | 2010-11-09 | Research Electro-Optics, Inc. | Methods and devices for monitoring and controlling thin film processing |
JP2006260090A (ja) * | 2005-03-16 | 2006-09-28 | Fuji Xerox Co Ltd | シート、表示媒体ユニット、シート取付装置およびシート取外装置 |
KR101455551B1 (ko) | 2005-05-12 | 2014-10-27 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
US7924416B2 (en) | 2005-06-22 | 2011-04-12 | Nikon Corporation | Measurement apparatus, exposure apparatus, and device manufacturing method |
JP4580327B2 (ja) * | 2005-11-21 | 2010-11-10 | 東京エレクトロン株式会社 | 被処理体の取り出し方法及びプログラム記憶媒体並びに載置機構 |
US7893697B2 (en) | 2006-02-21 | 2011-02-22 | Cyberoptics Semiconductor, Inc. | Capacitive distance sensing in semiconductor processing tools |
US7804306B2 (en) | 2006-02-21 | 2010-09-28 | CyterOptics Semiconductor, Inc. | Capacitive distance sensing in semiconductor processing tools |
TWI454859B (zh) * | 2006-03-30 | 2014-10-01 | 尼康股份有限公司 | 移動體裝置、曝光裝置與曝光方法以及元件製造方法 |
EP2023378B1 (en) | 2006-05-10 | 2013-03-13 | Nikon Corporation | Exposure apparatus and device manufacturing method |
US20080055590A1 (en) * | 2006-08-31 | 2008-03-06 | Texas Instruments Incorporated | System and method for analyzing a light beam of an exposure tool or a reticle inspection tool |
US20080056557A1 (en) * | 2006-08-31 | 2008-03-06 | Texas Instruments Incorporated | System and method for analyzing a light beam of a wafer inspection tool or an exposure tool |
US8823933B2 (en) | 2006-09-29 | 2014-09-02 | Cyberoptics Corporation | Substrate-like particle sensor |
US7778793B2 (en) | 2007-03-12 | 2010-08-17 | Cyberoptics Semiconductor, Inc. | Wireless sensor for semiconductor processing systems |
JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
TWI385905B (zh) * | 2008-05-08 | 2013-02-11 | Univ Nat Taiwan Science Tech | 太陽能電池模擬裝置 |
JP5253000B2 (ja) * | 2008-06-03 | 2013-07-31 | オリンパス株式会社 | 撮像装置 |
TWI402174B (zh) * | 2009-09-03 | 2013-07-21 | Univ Nat Cheng Kung | 無縫式壓印滾輪模仁製作方法與設備 |
DE102011076297A1 (de) | 2011-05-23 | 2012-11-29 | Carl Zeiss Smt Gmbh | Blende |
JP2012253055A (ja) * | 2011-05-31 | 2012-12-20 | Nuflare Technology Inc | 荷電粒子ビーム描画装置及び描画方法 |
JP5950538B2 (ja) * | 2011-10-26 | 2016-07-13 | キヤノン株式会社 | 被検体情報取得装置 |
JP6069706B2 (ja) * | 2013-05-27 | 2017-02-01 | 富士通株式会社 | 光電池 |
TWI499760B (zh) * | 2014-10-21 | 2015-09-11 | Ind Tech Res Inst | 照度量測系統 |
JP6570966B2 (ja) * | 2015-10-27 | 2019-09-04 | 株式会社ニューフレアテクノロジー | 温度測定マスクおよび温度測定方法 |
KR102082050B1 (ko) | 2018-07-16 | 2020-02-27 | 국민대학교산학협력단 | 일주기 조도 측정 장치 |
KR102166726B1 (ko) | 2019-01-18 | 2020-10-16 | 국민대학교산학협력단 | 일주기 보정 계수 측정 모듈 및 이를 포함하는 바이오 조도 측정 장치 |
KR102135627B1 (ko) | 2019-01-23 | 2020-07-21 | 국민대학교산학협력단 | 일주기 리듬 관리 장치 및 시스템 |
KR102155085B1 (ko) | 2019-01-23 | 2020-09-11 | 국민대학교산학협력단 | 바이오 조도 측정 장치 |
KR20200123669A (ko) | 2019-04-22 | 2020-10-30 | 국민대학교산학협력단 | 귓속형 심부 체온계 및 이를 포함하는 일주기 리듬 측정 장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0217626A (ja) * | 1988-07-05 | 1990-01-22 | Mitsubishi Electric Corp | 縮小投影露光装置 |
JPH1062833A (ja) * | 1996-08-22 | 1998-03-06 | Kyocera Corp | 自動露出カメラ |
US5905569A (en) * | 1996-03-29 | 1999-05-18 | Canon Kabushiki Kaisha | Illuminance measuring method, an exposure apparatus using the method, and a device manufacturing method |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62102526A (ja) * | 1985-10-29 | 1987-05-13 | Canon Inc | 露光装置 |
JPS63303355A (ja) * | 1987-06-03 | 1988-12-09 | Mitsubishi Electric Corp | フオトマスク防塵装置 |
JPH03240218A (ja) * | 1990-02-17 | 1991-10-25 | Canon Inc | 露光装置 |
JPH04128619A (ja) * | 1990-09-19 | 1992-04-30 | Suga Shikenki Kk | 放射照度計 |
US5444637A (en) * | 1993-09-28 | 1995-08-22 | Advanced Micro Devices, Inc. | Programmable semiconductor wafer for sensing, recording and retrieving fabrication process conditions to which the wafer is exposed |
JPH1092722A (ja) * | 1996-09-18 | 1998-04-10 | Nikon Corp | 露光装置 |
JP3177830B2 (ja) * | 1997-05-22 | 2001-06-18 | 株式会社オーク製作所 | コードレス紫外線計測装置 |
JP3968862B2 (ja) * | 1998-03-09 | 2007-08-29 | 株式会社ニコン | 照度計、照度計測方法及び露光装置 |
US6005659A (en) * | 1998-05-07 | 1999-12-21 | Sony Corporation | Mini-disc laser power meter and method of making the same |
JP2001165768A (ja) * | 1999-09-28 | 2001-06-22 | Nikon Corp | 照度計、照度計測方法、露光装置、露光方法、デバイス製造方法及び基板ホルダ |
US6549277B1 (en) * | 1999-09-28 | 2003-04-15 | Nikon Corporation | Illuminance meter, illuminance measuring method and exposure apparatus |
-
2001
- 2001-01-31 JP JP2001023812A patent/JP2001338868A/ja active Pending
- 2001-03-22 TW TW090106710A patent/TW516094B/zh not_active IP Right Cessation
- 2001-03-22 US US09/813,857 patent/US6690455B2/en not_active Expired - Fee Related
- 2001-03-23 SG SG200101837A patent/SG94791A1/en unknown
- 2001-03-23 KR KR1020010015102A patent/KR20010090519A/ko not_active Application Discontinuation
- 2001-03-23 EP EP01107270A patent/EP1139174A3/en not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0217626A (ja) * | 1988-07-05 | 1990-01-22 | Mitsubishi Electric Corp | 縮小投影露光装置 |
US5905569A (en) * | 1996-03-29 | 1999-05-18 | Canon Kabushiki Kaisha | Illuminance measuring method, an exposure apparatus using the method, and a device manufacturing method |
JPH1062833A (ja) * | 1996-08-22 | 1998-03-06 | Kyocera Corp | 自動露出カメラ |
Also Published As
Publication number | Publication date |
---|---|
US6690455B2 (en) | 2004-02-10 |
JP2001338868A (ja) | 2001-12-07 |
EP1139174A3 (en) | 2005-02-09 |
KR20010090519A (ko) | 2001-10-18 |
EP1139174A2 (en) | 2001-10-04 |
TW516094B (en) | 2003-01-01 |
US20010050769A1 (en) | 2001-12-13 |
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