SG85101A1 - Exchange coupling film, magnetoresistance effect device, magnetoresistance effective head and method for producing exchange coupling film - Google Patents
Exchange coupling film, magnetoresistance effect device, magnetoresistance effective head and method for producing exchange coupling filmInfo
- Publication number
- SG85101A1 SG85101A1 SG9900085A SG1999000085A SG85101A1 SG 85101 A1 SG85101 A1 SG 85101A1 SG 9900085 A SG9900085 A SG 9900085A SG 1999000085 A SG1999000085 A SG 1999000085A SG 85101 A1 SG85101 A1 SG 85101A1
- Authority
- SG
- Singapore
- Prior art keywords
- exchange coupling
- coupling film
- magnetoresistance
- effect device
- producing
- Prior art date
Links
- 230000008878 coupling Effects 0.000 title 2
- 238000010168 coupling process Methods 0.000 title 2
- 238000005859 coupling reaction Methods 0.000 title 2
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
- G11B5/3929—Disposition of magnetic thin films not used for directly coupling magnetic flux from the track to the MR film or for shielding
- G11B5/3932—Magnetic biasing films
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3967—Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/3218—Exchange coupling of magnetic films via an antiferromagnetic interface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
- H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
- H10N50/85—Magnetic active materials
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B2005/3996—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
- G11B5/3945—Heads comprising more than one sensitive element
- G11B5/3948—Heads comprising more than one sensitive element the sensitive elements being active read-out elements
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
- G11B5/3945—Heads comprising more than one sensitive element
- G11B5/3948—Heads comprising more than one sensitive element the sensitive elements being active read-out elements
- G11B5/3951—Heads comprising more than one sensitive element the sensitive elements being active read-out elements the active elements being arranged on several parallel planes
- G11B5/3954—Heads comprising more than one sensitive element the sensitive elements being active read-out elements the active elements being arranged on several parallel planes the active elements transducing on a single track
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3295—Spin-exchange coupled multilayers wherein the magnetic pinned or free layers are laminated without anti-parallel coupling within the pinned and free layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/11—Magnetic recording head
- Y10T428/1107—Magnetoresistive
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/11—Magnetic recording head
- Y10T428/1107—Magnetoresistive
- Y10T428/1121—Multilayer
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Hall/Mr Elements (AREA)
- Thin Magnetic Films (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP668298 | 1998-01-16 | ||
JP16488698 | 1998-06-12 | ||
JP25353898 | 1998-09-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG85101A1 true SG85101A1 (en) | 2001-12-19 |
Family
ID=27277287
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG9900085A SG85101A1 (en) | 1998-01-16 | 1999-01-14 | Exchange coupling film, magnetoresistance effect device, magnetoresistance effective head and method for producing exchange coupling film |
Country Status (8)
Country | Link |
---|---|
US (2) | US6258470B1 (id) |
EP (2) | EP0930624B1 (id) |
KR (2) | KR100327860B1 (id) |
CN (1) | CN1112675C (id) |
DE (1) | DE69912164T2 (id) |
ID (1) | ID21749A (id) |
MY (1) | MY132959A (id) |
SG (1) | SG85101A1 (id) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6567246B1 (en) * | 1999-03-02 | 2003-05-20 | Matsushita Electric Industrial Co., Ltd. | Magnetoresistance effect element and method for producing the same, and magnetoresistance effect type head, magnetic recording apparatus, and magnetoresistance effect memory element |
JP3807592B2 (ja) * | 1999-06-24 | 2006-08-09 | 松下電器産業株式会社 | 記録再生ヘッドおよびそれを備えた記録再生装置 |
JP3817399B2 (ja) * | 1999-12-24 | 2006-09-06 | 株式会社日立グローバルストレージテクノロジーズ | 磁気抵抗センサー |
JP2001237469A (ja) | 2000-02-22 | 2001-08-31 | Fujitsu Ltd | 磁気センサ及びその製造方法 |
US6686071B2 (en) * | 2000-06-06 | 2004-02-03 | Matsushita Electric Industrial Co., Ltd. | Magnetic recording medium and magnetic recording apparatus using the same |
US6661622B1 (en) * | 2000-07-17 | 2003-12-09 | International Business Machines Corporation | Method to achieve low and stable ferromagnetic coupling field |
US6853520B2 (en) * | 2000-09-05 | 2005-02-08 | Kabushiki Kaisha Toshiba | Magnetoresistance effect element |
JP3593320B2 (ja) * | 2001-04-20 | 2004-11-24 | アルプス電気株式会社 | 磁気検出素子及びその製造方法 |
US6775108B2 (en) | 2001-11-02 | 2004-08-10 | Seagate Technology Llc | Magnetic head having a read element shield and substrate with matching coefficients of thermal expansion |
EP1478936A1 (en) * | 2002-02-25 | 2004-11-24 | Fujitsu Limited | Magnetoresistive spin-valve sensor and magnetic storage apparatus |
JP2003263714A (ja) * | 2002-03-06 | 2003-09-19 | Fujitsu Ltd | 磁気記録媒体及び磁気記憶装置 |
US6930864B2 (en) | 2002-03-22 | 2005-08-16 | International Business Machines Corporation | Methods and apparatus for defining the track width of a magnetic head having a flat sensor profile |
WO2003092083A1 (fr) * | 2002-04-24 | 2003-11-06 | Matsushita Electric Industrial Co., Ltd. | Element magnetoresistant |
JP2003324225A (ja) * | 2002-04-26 | 2003-11-14 | Nec Corp | 積層フェリ型磁性薄膜並びにそれを使用した磁気抵抗効果素子及び強磁性トンネル素子 |
JP4573736B2 (ja) * | 2005-08-31 | 2010-11-04 | 三菱電機株式会社 | 磁界検出装置 |
US7645894B2 (en) * | 2006-04-22 | 2010-01-12 | Bernard Kanner | Direct process for making cyclic dimethylsiloxane oligomers |
JP2007299880A (ja) | 2006-04-28 | 2007-11-15 | Toshiba Corp | 磁気抵抗効果素子,および磁気抵抗効果素子の製造方法 |
JP4388093B2 (ja) * | 2007-03-27 | 2009-12-24 | 株式会社東芝 | 磁気抵抗効果素子、磁気ヘッド、磁気記録再生装置 |
US8780507B2 (en) * | 2007-12-28 | 2014-07-15 | HGST Netherlands B.V. | Read transducer and magnetic storage system implementing same |
JP5039006B2 (ja) | 2008-09-26 | 2012-10-03 | 株式会社東芝 | 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置 |
JP5032429B2 (ja) * | 2008-09-26 | 2012-09-26 | 株式会社東芝 | 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置 |
JP5032430B2 (ja) * | 2008-09-26 | 2012-09-26 | 株式会社東芝 | 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置 |
JP5039007B2 (ja) * | 2008-09-26 | 2012-10-03 | 株式会社東芝 | 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置 |
JP2012204432A (ja) * | 2011-03-24 | 2012-10-22 | Toshiba Corp | 磁気ランダムアクセスメモリ及びその製造方法 |
US8829901B2 (en) * | 2011-11-04 | 2014-09-09 | Honeywell International Inc. | Method of using a magnetoresistive sensor in second harmonic detection mode for sensing weak magnetic fields |
US9007818B2 (en) | 2012-03-22 | 2015-04-14 | Micron Technology, Inc. | Memory cells, semiconductor device structures, systems including such cells, and methods of fabrication |
US8923038B2 (en) | 2012-06-19 | 2014-12-30 | Micron Technology, Inc. | Memory cells, semiconductor device structures, memory systems, and methods of fabrication |
US9054030B2 (en) | 2012-06-19 | 2015-06-09 | Micron Technology, Inc. | Memory cells, semiconductor device structures, memory systems, and methods of fabrication |
US9379315B2 (en) | 2013-03-12 | 2016-06-28 | Micron Technology, Inc. | Memory cells, methods of fabrication, semiconductor device structures, and memory systems |
US20160128390A1 (en) * | 2013-06-24 | 2016-05-12 | Kimree Hi-Tech Inc. | Electronic cigarette heat-generating device and electronic cigarette |
US9368714B2 (en) | 2013-07-01 | 2016-06-14 | Micron Technology, Inc. | Memory cells, methods of operation and fabrication, semiconductor device structures, and memory systems |
US9466787B2 (en) | 2013-07-23 | 2016-10-11 | Micron Technology, Inc. | Memory cells, methods of fabrication, semiconductor device structures, memory systems, and electronic systems |
US9461242B2 (en) | 2013-09-13 | 2016-10-04 | Micron Technology, Inc. | Magnetic memory cells, methods of fabrication, semiconductor devices, memory systems, and electronic systems |
US9608197B2 (en) | 2013-09-18 | 2017-03-28 | Micron Technology, Inc. | Memory cells, methods of fabrication, and semiconductor devices |
US10454024B2 (en) | 2014-02-28 | 2019-10-22 | Micron Technology, Inc. | Memory cells, methods of fabrication, and memory devices |
US9281466B2 (en) | 2014-04-09 | 2016-03-08 | Micron Technology, Inc. | Memory cells, semiconductor structures, semiconductor devices, and methods of fabrication |
US9269888B2 (en) | 2014-04-18 | 2016-02-23 | Micron Technology, Inc. | Memory cells, methods of fabrication, and semiconductor devices |
US9349945B2 (en) | 2014-10-16 | 2016-05-24 | Micron Technology, Inc. | Memory cells, semiconductor devices, and methods of fabrication |
US9768377B2 (en) | 2014-12-02 | 2017-09-19 | Micron Technology, Inc. | Magnetic cell structures, and methods of fabrication |
US10439131B2 (en) | 2015-01-15 | 2019-10-08 | Micron Technology, Inc. | Methods of forming semiconductor devices including tunnel barrier materials |
WO2018179961A1 (ja) * | 2017-03-30 | 2018-10-04 | 国立研究開発法人産業技術総合研究所 | 磁気素子、磁気記憶装置及び磁気センサ |
Citations (3)
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US4310318A (en) * | 1980-09-17 | 1982-01-12 | Rivercross Learning Corp. | Electronic game |
EP0645831A1 (de) * | 1993-09-29 | 1995-03-29 | Siemens Aktiengesellschaft | Magnetoresistiver Sensor unter Verwendung eines Sensormaterials mit perowskitähnlicher Kristallstruktur |
EP0704917A1 (en) * | 1994-09-29 | 1996-04-03 | AT&T Corp. | Improved magnetoresistive oxide material and articles comprising the material |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5987616A (ja) | 1982-11-09 | 1984-05-21 | Sharp Corp | 薄膜磁気ヘツド |
US5872923A (en) | 1993-03-19 | 1999-02-16 | Ncr Corporation | Collaborative video conferencing system |
DE4310318C2 (de) | 1993-03-30 | 1998-12-03 | Siemens Ag | Verwendung eines Materials mit perowskitähnlicher Kristallstruktur und erhöhtem magnetoresistiven Effekt sowie Verfahren zur Herstellung des Materials |
US6001430A (en) * | 1994-09-08 | 1999-12-14 | Nec Corporation | Magnetoresistance effect film and production process thereof |
JPH08279117A (ja) * | 1995-04-03 | 1996-10-22 | Alps Electric Co Ltd | 巨大磁気抵抗効果材料膜およびその製造方法とそれを用いた磁気ヘッド |
JP3593761B2 (ja) * | 1995-10-26 | 2004-11-24 | 富士通株式会社 | 酸化物磁性体及びその製造方法 |
JP2856165B2 (ja) * | 1996-08-12 | 1999-02-10 | 日本電気株式会社 | 磁気抵抗効果素子及びその製造方法 |
US6074767A (en) * | 1998-03-12 | 2000-06-13 | International Business Machines Corporation | Spin valve magnetoresistive head with two sets of ferromagnetic/antiferromagnetic films having high blocking temperatures and fabrication method |
-
1999
- 1999-01-12 US US09/228,703 patent/US6258470B1/en not_active Expired - Lifetime
- 1999-01-13 EP EP99100579A patent/EP0930624B1/en not_active Expired - Lifetime
- 1999-01-13 DE DE69912164T patent/DE69912164T2/de not_active Expired - Lifetime
- 1999-01-13 EP EP01109403A patent/EP1122749A3/en not_active Withdrawn
- 1999-01-14 SG SG9900085A patent/SG85101A1/en unknown
- 1999-01-15 ID IDP990034D patent/ID21749A/id unknown
- 1999-01-15 KR KR1019990001039A patent/KR100327860B1/ko not_active IP Right Cessation
- 1999-01-15 MY MYPI99000184A patent/MY132959A/en unknown
- 1999-01-18 CN CN99100206A patent/CN1112675C/zh not_active Expired - Lifetime
-
2001
- 2001-04-13 US US09/834,716 patent/US6562486B2/en not_active Expired - Lifetime
- 2001-04-30 KR KR10-2001-0023380A patent/KR100361245B1/ko not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4310318A (en) * | 1980-09-17 | 1982-01-12 | Rivercross Learning Corp. | Electronic game |
EP0645831A1 (de) * | 1993-09-29 | 1995-03-29 | Siemens Aktiengesellschaft | Magnetoresistiver Sensor unter Verwendung eines Sensormaterials mit perowskitähnlicher Kristallstruktur |
EP0704917A1 (en) * | 1994-09-29 | 1996-04-03 | AT&T Corp. | Improved magnetoresistive oxide material and articles comprising the material |
Also Published As
Publication number | Publication date |
---|---|
EP1122749A2 (en) | 2001-08-08 |
CN1112675C (zh) | 2003-06-25 |
EP1122749A3 (en) | 2001-08-16 |
US6258470B1 (en) | 2001-07-10 |
CN1230744A (zh) | 1999-10-06 |
KR20010073225A (ko) | 2001-07-31 |
EP0930624B1 (en) | 2003-10-22 |
US6562486B2 (en) | 2003-05-13 |
DE69912164T2 (de) | 2004-04-22 |
KR100361245B1 (ko) | 2003-01-24 |
EP0930624A1 (en) | 1999-07-21 |
KR100327860B1 (ko) | 2002-03-09 |
US20020006529A1 (en) | 2002-01-17 |
MY132959A (en) | 2007-10-31 |
DE69912164D1 (de) | 2003-11-27 |
ID21749A (id) | 1999-07-22 |
KR19990067921A (ko) | 1999-08-25 |
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