SG76561A1 - Processing apparatus and method - Google Patents

Processing apparatus and method

Info

Publication number
SG76561A1
SG76561A1 SG1998003784A SG1998003784A SG76561A1 SG 76561 A1 SG76561 A1 SG 76561A1 SG 1998003784 A SG1998003784 A SG 1998003784A SG 1998003784 A SG1998003784 A SG 1998003784A SG 76561 A1 SG76561 A1 SG 76561A1
Authority
SG
Singapore
Prior art keywords
processing apparatus
processing
Prior art date
Application number
SG1998003784A
Other languages
English (en)
Inventor
Hidetami Yaegashi
Qi Fan
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of SG76561A1 publication Critical patent/SG76561A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D5/00—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
    • G03D5/06—Applicator pads, rollers or strips

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
SG1998003784A 1997-09-22 1998-09-21 Processing apparatus and method SG76561A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27330697 1997-09-22

Publications (1)

Publication Number Publication Date
SG76561A1 true SG76561A1 (en) 2000-11-21

Family

ID=17526038

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1998003784A SG76561A1 (en) 1997-09-22 1998-09-21 Processing apparatus and method

Country Status (3)

Country Link
US (1) US6287023B1 (ko)
KR (1) KR100503121B1 (ko)
SG (1) SG76561A1 (ko)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6539960B1 (en) * 2000-05-01 2003-04-01 United Microelectronics Corp. Cleaning system for cleaning ink in a semiconductor wafer
US6641648B2 (en) 2001-04-17 2003-11-04 Foster-Miller, Inc. Passive filtration system
US7092077B2 (en) * 2001-09-24 2006-08-15 Entegris, Inc. System and method for monitoring contamination
US20040023419A1 (en) * 2001-09-24 2004-02-05 Extraction Systems, Inc System and method for monitoring contamination
US6620630B2 (en) * 2001-09-24 2003-09-16 Extraction Systems, Inc. System and method for determining and controlling contamination
US7201036B2 (en) * 2004-02-27 2007-04-10 Hunter Manufacturing Co. Residual life indicating system
WO2006025302A1 (ja) * 2004-08-30 2006-03-09 Nikon Corporation 露光装置、動作決定方法、基板処理システム及びメンテナンス管理方法、並びにデバイス製造方法
US7592178B2 (en) * 2005-02-23 2009-09-22 Hunter Menufacturing Co. Filter integrity tester
FR2883412B1 (fr) * 2005-03-18 2007-05-04 Alcatel Sa Procede et dispositif pour le controle de la contamination des plaquettes de substrat
EP1806169A1 (en) * 2006-01-10 2007-07-11 Consultatie Implementatie Technisch Beheer B.V. System and method for measuring filter saturation
JP4994874B2 (ja) * 2007-02-07 2012-08-08 キヤノン株式会社 処理装置
JP5006122B2 (ja) 2007-06-29 2012-08-22 株式会社Ｓｏｋｕｄｏ 基板処理装置
JP5128918B2 (ja) * 2007-11-30 2013-01-23 株式会社Ｓｏｋｕｄｏ 基板処理装置
JP5179170B2 (ja) * 2007-12-28 2013-04-10 株式会社Ｓｏｋｕｄｏ 基板処理装置
JP5001828B2 (ja) 2007-12-28 2012-08-15 株式会社Ｓｏｋｕｄｏ 基板処理装置
US8205483B1 (en) 2008-03-06 2012-06-26 The United States Of America As Represented By The Secretary Of The Army Residual life indicator
JP5060517B2 (ja) * 2009-06-24 2012-10-31 東京エレクトロン株式会社 インプリントシステム
JP2011009362A (ja) * 2009-06-24 2011-01-13 Tokyo Electron Ltd インプリントシステム、インプリント方法、プログラム及びコンピュータ記憶媒体
JP5439097B2 (ja) * 2009-09-08 2014-03-12 東京応化工業株式会社 塗布装置及び塗布方法
JP5639816B2 (ja) * 2009-09-08 2014-12-10 東京応化工業株式会社 塗布方法及び塗布装置
JP5469966B2 (ja) * 2009-09-08 2014-04-16 東京応化工業株式会社 塗布装置及び塗布方法
JP5719546B2 (ja) * 2009-09-08 2015-05-20 東京応化工業株式会社 塗布装置及び塗布方法
FR2954583B1 (fr) * 2009-12-18 2017-11-24 Alcatel Lucent Procede et dispositif de pilotage de fabrication de semi conducteurs par mesure de contamination
US8409337B1 (en) 2010-06-08 2013-04-02 Aaf-Mcquay Inc. Air handling filtration equipment with adjustable media bed and method of use
FR2961946B1 (fr) 2010-06-29 2012-08-03 Alcatel Lucent Dispositif de traitement pour boites de transport et de stockage
US20120037005A1 (en) * 2010-08-13 2012-02-16 General Electric Company Filter integrity monitoring system
JP6403431B2 (ja) * 2013-06-28 2018-10-10 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、流量監視方法及び半導体装置の製造方法並びに流量監視プログラム
JP7258028B2 (ja) * 2018-08-08 2023-04-14 ギガフォトン株式会社 リソグラフィシステムのメインテナンス管理方法、メインテナンス管理装置、及びコンピュータ可読媒体

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5626820A (en) 1988-12-12 1997-05-06 Kinkead; Devon A. Clean room air filtering
KR100242530B1 (ko) 1993-05-18 2000-02-01 히가시 데쓰로 필터장치
JP2883912B2 (ja) 1993-06-30 1999-04-19 東京エレクトロン株式会社 レジスト処理装置
US5607647A (en) 1993-12-02 1997-03-04 Extraction Systems, Inc. Air filtering within clean environments
JPH08306599A (ja) 1995-04-27 1996-11-22 Nikon Corp 空気浄化装置及び露光装置
US5685895A (en) 1994-08-10 1997-11-11 Nikon Corporation Air cleaning apparatus used for an exposure apparatus
US5856198A (en) 1994-12-28 1999-01-05 Extraction Systems, Inc. Performance monitoring of gas-phase air filters
JP3048318B2 (ja) 1995-05-23 2000-06-05 東京エレクトロン株式会社 レジスト処理装置
JP3423144B2 (ja) 1996-03-15 2003-07-07 日本ピュアテック株式会社 エアダクト構造およびエアフィルタ装置
KR100542414B1 (ko) * 1996-03-27 2006-05-10 가부시키가이샤 니콘 노광장치및공조장치
EP0827186A3 (en) * 1996-08-29 1999-12-15 Tokyo Electron Limited Substrate treatment system
TW353777B (en) * 1996-11-08 1999-03-01 Tokyo Electron Ltd Treatment device

Also Published As

Publication number Publication date
KR19990030003A (ko) 1999-04-26
KR100503121B1 (ko) 2005-11-11
US6287023B1 (en) 2001-09-11

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