SG48394G - Pellicle - Google Patents

Pellicle

Info

Publication number
SG48394G
SG48394G SG48394A SG48394A SG48394G SG 48394 G SG48394 G SG 48394G SG 48394 A SG48394 A SG 48394A SG 48394 A SG48394 A SG 48394A SG 48394 G SG48394 G SG 48394G
Authority
SG
Singapore
Prior art keywords
pellicle
Prior art date
Application number
SG48394A
Other languages
English (en)
Inventor
Hiroaki Nakagawa
Hitomi Matsuzaki
Original Assignee
Mitsui Petrochemical Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP27962787A priority Critical patent/JP2535971B2/ja
Priority to DE88310357T priority patent/DE3883707T2/de
Priority to EP88310357A priority patent/EP0315450B1/en
Priority to US07/267,380 priority patent/US4996106A/en
Application filed by Mitsui Petrochemical Ind filed Critical Mitsui Petrochemical Ind
Priority to SG48394A priority patent/SG48394G/en
Priority to HK84494A priority patent/HK84494A/xx
Publication of SG48394G publication Critical patent/SG48394G/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544—Addition polymer is perhalogenated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/3188—Next to cellulosic
    • Y10T428/31884—Regenerated or modified cellulose
    • Y10T428/31888—Addition polymer of hydrocarbon[s] only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
SG48394A 1987-11-05 1994-04-09 Pellicle SG48394G (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP27962787A JP2535971B2 (ja) 1987-11-05 1987-11-05 ペリクル
DE88310357T DE3883707T2 (de) 1987-11-05 1988-11-03 Membranabdeckung.
EP88310357A EP0315450B1 (en) 1987-11-05 1988-11-03 Pellicle
US07/267,380 US4996106A (en) 1987-11-05 1988-11-04 Pellicle
SG48394A SG48394G (en) 1987-11-05 1994-04-09 Pellicle
HK84494A HK84494A (en) 1987-11-05 1994-08-18 Pellicle

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP27962787A JP2535971B2 (ja) 1987-11-05 1987-11-05 ペリクル
SG48394A SG48394G (en) 1987-11-05 1994-04-09 Pellicle

Publications (1)

Publication Number Publication Date
SG48394G true SG48394G (en) 1995-03-17

Family

ID=26553411

Family Applications (1)

Application Number Title Priority Date Filing Date
SG48394A SG48394G (en) 1987-11-05 1994-04-09 Pellicle

Country Status (6)

Country Link
US (1) US4996106A (ja)
EP (1) EP0315450B1 (ja)
JP (1) JP2535971B2 (ja)
DE (1) DE3883707T2 (ja)
HK (1) HK84494A (ja)
SG (1) SG48394G (ja)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6156300A (en) * 1985-02-05 2000-12-05 Chiron Corporation Point mutants of N∇2 CSF-1 and carboxy truncated fragments thereof
US6146851A (en) * 1985-02-05 2000-11-14 Chiron Corporation DNA encoding NV2 (long form) and carboxy truncated fragments thereof
US5573930A (en) * 1985-02-05 1996-11-12 Cetus Oncology Corporation DNA encoding various forms of colony stimulating factor-1
US5339197A (en) * 1989-03-31 1994-08-16 Yen Yung Tsai Optical pellicle with controlled transmission peaking
US4970099A (en) * 1989-05-19 1990-11-13 E. I. Du Pont De Nemours And Company Perfluoropolymer coated pellicles
JP2714450B2 (ja) * 1989-08-10 1998-02-16 ダイセル化学工業株式会社 防塵膜
EP0482821B1 (en) * 1990-10-16 1998-09-30 Mitsui Chemicals, Inc. Use of a highly light-transmitting dust protective film, process for preparation thereof and dust protective member
JP3037745B2 (ja) * 1990-11-29 2000-05-08 三井化学株式会社 ペリクル構造体
JP2992585B2 (ja) * 1991-05-17 1999-12-20 デュポン・フォトマスクス・イン・コーポレイテッド 圧力解放性ペリクル
JP2938636B2 (ja) * 1991-09-26 1999-08-23 信越化学工業株式会社 リソグラフィ−用ペリクル
JP2945201B2 (ja) * 1992-01-31 1999-09-06 信越化学工業株式会社 ペリクル
US5422704A (en) * 1992-07-13 1995-06-06 Intel Corporation Pellicle frame
US5446587A (en) * 1992-09-03 1995-08-29 Samsung Electronics Co., Ltd. Projection method and projection system and mask therefor
JP3027073B2 (ja) * 1993-07-28 2000-03-27 信越化学工業株式会社 ペリクル
US5741576A (en) * 1995-09-06 1998-04-21 Inko Industrial Corporation Optical pellicle with controlled transmission peaks and anti-reflective coatings
TW337002B (en) * 1996-11-19 1998-07-21 Mitsui Kagaku Kk Pellicle
JP4011687B2 (ja) * 1997-10-01 2007-11-21 キヤノン株式会社 マスク構造体、該マスク構造体を用いた露光装置、該マスク構造体を用いた半導体デバイス製造方法
JP3434731B2 (ja) * 1999-06-09 2003-08-11 Ｎｅｃエレクトロニクス株式会社 ペリクル及びそのケース
US6524754B2 (en) 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
US7351503B2 (en) * 2001-01-22 2008-04-01 Photronics, Inc. Fused silica pellicle in intimate contact with the surface of a photomask
KR20100049445A (ko) * 2008-11-03 2010-05-12 (주)엠에스티테크놀로지 리소그래피용 펠리클
JP6030136B2 (ja) * 2012-08-02 2016-11-24 三井化学株式会社 ペリクル
US11530306B2 (en) * 2016-06-20 2022-12-20 Solvay Sa Fluoropolymer film

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4470508A (en) * 1983-08-19 1984-09-11 Micro Lithography, Inc. Dustfree packaging container and method
JPS6057841A (ja) * 1983-09-09 1985-04-03 Hitachi Ltd 異物固定方法及び装置
JPS60237450A (ja) * 1984-05-11 1985-11-26 Asahi Chem Ind Co Ltd 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法
US4833051A (en) * 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
EP0252574A2 (en) * 1986-07-07 1988-01-13 YEN, Yung-Tsai Method and apparatus for reducing particulates on photomasks
JP2642637B2 (ja) * 1987-08-18 1997-08-20 三井石油化学工業 株式会社 防塵膜

Also Published As

Publication number Publication date
JPH01120555A (ja) 1989-05-12
US4996106A (en) 1991-02-26
DE3883707D1 (de) 1993-10-07
DE3883707T2 (de) 1993-12-16
EP0315450B1 (en) 1993-09-01
HK84494A (en) 1994-08-26
EP0315450A3 (en) 1989-11-15
JP2535971B2 (ja) 1996-09-18
EP0315450A2 (en) 1989-05-10

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