HK84494A - Pellicle - Google Patents
PellicleInfo
- Publication number
- HK84494A HK84494A HK84494A HK84494A HK84494A HK 84494 A HK84494 A HK 84494A HK 84494 A HK84494 A HK 84494A HK 84494 A HK84494 A HK 84494A HK 84494 A HK84494 A HK 84494A
- Authority
- HK
- Hong Kong
- Prior art keywords
- pellicle
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
- Y10T428/31544—Addition polymer is perhalogenated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/3188—Next to cellulosic
- Y10T428/31884—Regenerated or modified cellulose
- Y10T428/31888—Addition polymer of hydrocarbon[s] only
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27962787A JP2535971B2 (ja) | 1987-11-05 | 1987-11-05 | ペリクル |
SG48394A SG48394G (en) | 1987-11-05 | 1994-04-09 | Pellicle |
Publications (1)
Publication Number | Publication Date |
---|---|
HK84494A true HK84494A (en) | 1994-08-26 |
Family
ID=26553411
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK84494A HK84494A (en) | 1987-11-05 | 1994-08-18 | Pellicle |
Country Status (6)
Country | Link |
---|---|
US (1) | US4996106A (ja) |
EP (1) | EP0315450B1 (ja) |
JP (1) | JP2535971B2 (ja) |
DE (1) | DE3883707T2 (ja) |
HK (1) | HK84494A (ja) |
SG (1) | SG48394G (ja) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6156300A (en) * | 1985-02-05 | 2000-12-05 | Chiron Corporation | Point mutants of N∇2 CSF-1 and carboxy truncated fragments thereof |
US5573930A (en) * | 1985-02-05 | 1996-11-12 | Cetus Oncology Corporation | DNA encoding various forms of colony stimulating factor-1 |
US6117422A (en) * | 1985-02-05 | 2000-09-12 | Chiron Corporation | N∇2-CSF-1(long form) and carboxy truncated fragments thereof |
US5339197A (en) * | 1989-03-31 | 1994-08-16 | Yen Yung Tsai | Optical pellicle with controlled transmission peaking |
US4970099A (en) * | 1989-05-19 | 1990-11-13 | E. I. Du Pont De Nemours And Company | Perfluoropolymer coated pellicles |
JP2714450B2 (ja) * | 1989-08-10 | 1998-02-16 | ダイセル化学工業株式会社 | 防塵膜 |
CA2053518A1 (en) * | 1990-10-16 | 1992-04-17 | Tetsuya Miyazaki | Highly light-transmitting dust protective film, process for preparation thereof and dust protective member |
JP3037745B2 (ja) * | 1990-11-29 | 2000-05-08 | 三井化学株式会社 | ペリクル構造体 |
WO1992021066A1 (en) * | 1991-05-17 | 1992-11-26 | E.I. Du Pont De Nemours And Company | Pressure relieving pellicle |
JP2938636B2 (ja) * | 1991-09-26 | 1999-08-23 | 信越化学工業株式会社 | リソグラフィ−用ペリクル |
JP2945201B2 (ja) * | 1992-01-31 | 1999-09-06 | 信越化学工業株式会社 | ペリクル |
US5422704A (en) * | 1992-07-13 | 1995-06-06 | Intel Corporation | Pellicle frame |
KR970003593B1 (en) * | 1992-09-03 | 1997-03-20 | Samsung Electronics Co Ltd | Projection exposure method and device using mask |
JP3027073B2 (ja) * | 1993-07-28 | 2000-03-27 | 信越化学工業株式会社 | ペリクル |
US5741576A (en) * | 1995-09-06 | 1998-04-21 | Inko Industrial Corporation | Optical pellicle with controlled transmission peaks and anti-reflective coatings |
TW337002B (en) * | 1996-11-19 | 1998-07-21 | Mitsui Kagaku Kk | Pellicle |
JP4011687B2 (ja) * | 1997-10-01 | 2007-11-21 | キヤノン株式会社 | マスク構造体、該マスク構造体を用いた露光装置、該マスク構造体を用いた半導体デバイス製造方法 |
JP3434731B2 (ja) * | 1999-06-09 | 2003-08-11 | Necエレクトロニクス株式会社 | ペリクル及びそのケース |
US7351503B2 (en) * | 2001-01-22 | 2008-04-01 | Photronics, Inc. | Fused silica pellicle in intimate contact with the surface of a photomask |
US6524754B2 (en) | 2001-01-22 | 2003-02-25 | Photronics, Inc. | Fused silica pellicle |
KR20100049445A (ko) * | 2008-11-03 | 2010-05-12 | (주)엠에스티테크놀로지 | 리소그래피용 펠리클 |
EP2881792B1 (en) | 2012-08-02 | 2017-04-26 | Mitsui Chemicals, Inc. | Pellicle |
US11530306B2 (en) * | 2016-06-20 | 2022-12-20 | Solvay Sa | Fluoropolymer film |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4470508A (en) * | 1983-08-19 | 1984-09-11 | Micro Lithography, Inc. | Dustfree packaging container and method |
JPS6057841A (ja) * | 1983-09-09 | 1985-04-03 | Hitachi Ltd | 異物固定方法及び装置 |
JPS60237450A (ja) * | 1984-05-11 | 1985-11-26 | Asahi Chem Ind Co Ltd | 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法 |
US4833051A (en) * | 1984-08-20 | 1989-05-23 | Nippon Kogaku K.K. | Protective device for photographic masks |
EP0252574A2 (en) * | 1986-07-07 | 1988-01-13 | YEN, Yung-Tsai | Method and apparatus for reducing particulates on photomasks |
JP2642637B2 (ja) * | 1987-08-18 | 1997-08-20 | 三井石油化学工業 株式会社 | 防塵膜 |
-
1987
- 1987-11-05 JP JP27962787A patent/JP2535971B2/ja not_active Expired - Lifetime
-
1988
- 1988-11-03 EP EP88310357A patent/EP0315450B1/en not_active Expired - Lifetime
- 1988-11-03 DE DE88310357T patent/DE3883707T2/de not_active Expired - Fee Related
- 1988-11-04 US US07/267,380 patent/US4996106A/en not_active Expired - Fee Related
-
1994
- 1994-04-09 SG SG48394A patent/SG48394G/en unknown
- 1994-08-18 HK HK84494A patent/HK84494A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0315450A3 (en) | 1989-11-15 |
US4996106A (en) | 1991-02-26 |
JPH01120555A (ja) | 1989-05-12 |
SG48394G (en) | 1995-03-17 |
JP2535971B2 (ja) | 1996-09-18 |
DE3883707D1 (de) | 1993-10-07 |
EP0315450B1 (en) | 1993-09-01 |
EP0315450A2 (en) | 1989-05-10 |
DE3883707T2 (de) | 1993-12-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |