SG46609A1 - Method of electrolytically treating in particular flat material and apparatus particularly for carrying out the method - Google Patents

Method of electrolytically treating in particular flat material and apparatus particularly for carrying out the method

Info

Publication number
SG46609A1
SG46609A1 SG1996006712A SG1996006712A SG46609A1 SG 46609 A1 SG46609 A1 SG 46609A1 SG 1996006712 A SG1996006712 A SG 1996006712A SG 1996006712 A SG1996006712 A SG 1996006712A SG 46609 A1 SG46609 A1 SG 46609A1
Authority
SG
Singapore
Prior art keywords
item
drillings
items
carrying
flat material
Prior art date
Application number
SG1996006712A
Other languages
English (en)
Inventor
Thomas Kosikowski
Reinhard Schneider
Rolf Schroder
Klaus Wolfer
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE4324330A external-priority patent/DE4324330C2/de
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of SG46609A1 publication Critical patent/SG46609A1/en

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0085Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
    • H05K3/0088Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor for treatment of holes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08Electroplating with moving electrolyte e.g. jet electroplating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0621In horizontal cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0257Brushing, e.g. cleaning the conductive pattern by brushing or wiping
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/08Treatments involving gases
    • H05K2203/082Suction, e.g. for holding solder balls or components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
SG1996006712A 1992-08-01 1993-08-02 Method of electrolytically treating in particular flat material and apparatus particularly for carrying out the method SG46609A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4225541 1992-08-01
DE4324330A DE4324330C2 (de) 1992-08-01 1993-07-20 Verfahren zum elektrolytischen Behandeln von insbesondere flachem Behandlungsgut, sowie Anordnung, insbesondere zur Durchführung dieses Verfahrens

Publications (1)

Publication Number Publication Date
SG46609A1 true SG46609A1 (en) 1998-02-20

Family

ID=25917128

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996006712A SG46609A1 (en) 1992-08-01 1993-08-02 Method of electrolytically treating in particular flat material and apparatus particularly for carrying out the method

Country Status (8)

Country Link
EP (1) EP0652982B1 (fr)
JP (1) JPH07509539A (fr)
AT (1) ATE143422T1 (fr)
CA (1) CA2141604C (fr)
ES (1) ES2093524T3 (fr)
HK (1) HK38697A (fr)
SG (1) SG46609A1 (fr)
WO (1) WO1994003655A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4418278C1 (de) * 1994-05-26 1995-04-20 Atotech Deutschland Gmbh Elektrolytisches Verfahren zur Leiterplattenbehandlung in horizontalen Durchlaufanlagen
DE102005024102A1 (de) 2005-05-25 2006-11-30 Atotech Deutschland Gmbh Verfahren, Klammer und Vorrichtung zum Transport eines Behandlungsgutes in einer Elektrolyseanlage
WO2010130445A1 (fr) 2009-05-13 2010-11-18 Atotech Deutschland Gmbh Procédé et dispositif de traitement de produits à traiter plats et dispositif d'enlèvement ou de retenue de liquide de traitement
DE102009032217A1 (de) * 2009-07-06 2011-01-13 Gebr. Schmid Gmbh & Co. Verfahren und Vorrichtung zur Behandlung von Substraten
JP5416005B2 (ja) * 2009-08-27 2014-02-12 丸仲工業株式会社 表面処理装置における板状被処理物の搬送装置、この搬送装置の挟持チャック
CN103813644B (zh) * 2012-10-31 2016-07-06 四川虹视显示技术有限公司 Oled柔性电路板真空吸附装置
US9765444B2 (en) * 2014-12-03 2017-09-19 Metal Industries Research & Development Centre Continuous electrochemical machining apparatus

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR667687A (fr) * 1928-01-30 1929-10-19 Perfectionnements à l'appareillage des cuves à métallisation galvanostégique
GB942595A (en) * 1960-07-28 1963-11-27 Steel Improvement & Forge Co Method and apparatus for electroplating
CH421654A (fr) * 1964-09-18 1966-09-30 Huguenin & Cie Installation pour le dépôt de couches métalliques par électrolyse
AT305719B (de) * 1969-11-24 1973-03-12 Norton Co Verfahren und Vorrichtung zum elektrolytischen von Metallniederschlägen
US3706650A (en) * 1971-03-26 1972-12-19 Norton Co Contour activating device
JPS57200591A (en) * 1981-06-02 1982-12-08 Electroplating Eng Of Japan Co Plating apparatus
GB2181743A (en) * 1985-07-16 1987-04-29 Kay Kazuo Metal plating of through holes in printed circuit boards
US4610772A (en) * 1985-07-22 1986-09-09 The Carolinch Company Electrolytic plating apparatus
JPS6274096A (ja) * 1985-09-27 1987-04-04 Kawasaki Steel Corp 高電流密度電解処理装置
US4875982A (en) * 1987-02-06 1989-10-24 Velie Circuits, Inc. Plating high aspect ratio holes in circuit boards
US5211826A (en) * 1991-09-26 1993-05-18 Siemens Aktiengesellschaft Electroplating means for perforated printed circuit boards to be treated in a horizontal pass

Also Published As

Publication number Publication date
CA2141604A1 (fr) 1994-02-17
CA2141604C (fr) 2005-05-24
ES2093524T3 (es) 1996-12-16
EP0652982B1 (fr) 1996-09-25
ATE143422T1 (de) 1996-10-15
JPH07509539A (ja) 1995-10-19
WO1994003655A1 (fr) 1994-02-17
EP0652982A1 (fr) 1995-05-17
HK38697A (en) 1997-04-04

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