HK38697A - Process for the electrolytic processing especially of flat items and arrangement for implementing the process - Google Patents

Process for the electrolytic processing especially of flat items and arrangement for implementing the process

Info

Publication number
HK38697A
HK38697A HK38697A HK38697A HK38697A HK 38697 A HK38697 A HK 38697A HK 38697 A HK38697 A HK 38697A HK 38697 A HK38697 A HK 38697A HK 38697 A HK38697 A HK 38697A
Authority
HK
Hong Kong
Prior art keywords
item
items
implementing
arrangement
drillings
Prior art date
Application number
HK38697A
Other languages
English (en)
Inventor
Reinhard Schneider
Rolf Schroeder
Klaus Wolfer
Thomas Kosikowski
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE4324330A external-priority patent/DE4324330C2/de
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of HK38697A publication Critical patent/HK38697A/xx

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0085Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
    • H05K3/0088Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor for treatment of holes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08Electroplating with moving electrolyte e.g. jet electroplating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0621In horizontal cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0257Brushing, e.g. cleaning the conductive pattern by brushing or wiping
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/08Treatments involving gases
    • H05K2203/082Suction, e.g. for holding solder balls or components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
HK38697A 1992-08-01 1997-03-27 Process for the electrolytic processing especially of flat items and arrangement for implementing the process HK38697A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4225541 1992-08-01
DE4324330A DE4324330C2 (de) 1992-08-01 1993-07-20 Verfahren zum elektrolytischen Behandeln von insbesondere flachem Behandlungsgut, sowie Anordnung, insbesondere zur Durchführung dieses Verfahrens
PCT/DE1993/000684 WO1994003655A1 (fr) 1992-08-01 1993-08-02 Procede et dispositif de traitement electrolytique d'articles particulierement plats

Publications (1)

Publication Number Publication Date
HK38697A true HK38697A (en) 1997-04-04

Family

ID=25917128

Family Applications (1)

Application Number Title Priority Date Filing Date
HK38697A HK38697A (en) 1992-08-01 1997-03-27 Process for the electrolytic processing especially of flat items and arrangement for implementing the process

Country Status (8)

Country Link
EP (1) EP0652982B1 (fr)
JP (1) JPH07509539A (fr)
AT (1) ATE143422T1 (fr)
CA (1) CA2141604C (fr)
ES (1) ES2093524T3 (fr)
HK (1) HK38697A (fr)
SG (1) SG46609A1 (fr)
WO (1) WO1994003655A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4418278C1 (de) * 1994-05-26 1995-04-20 Atotech Deutschland Gmbh Elektrolytisches Verfahren zur Leiterplattenbehandlung in horizontalen Durchlaufanlagen
DE102005024102A1 (de) 2005-05-25 2006-11-30 Atotech Deutschland Gmbh Verfahren, Klammer und Vorrichtung zum Transport eines Behandlungsgutes in einer Elektrolyseanlage
JP5512799B2 (ja) 2009-05-13 2014-06-04 アトテック・ドイチュラント・ゲーエムベーハー 平面的な被処理材料を処理するための方法、処理ステーションおよびアセンブリ
DE102009032217A1 (de) * 2009-07-06 2011-01-13 Gebr. Schmid Gmbh & Co. Verfahren und Vorrichtung zur Behandlung von Substraten
JP5416005B2 (ja) * 2009-08-27 2014-02-12 丸仲工業株式会社 表面処理装置における板状被処理物の搬送装置、この搬送装置の挟持チャック
CN103813644B (zh) * 2012-10-31 2016-07-06 四川虹视显示技术有限公司 Oled柔性电路板真空吸附装置
US9765444B2 (en) * 2014-12-03 2017-09-19 Metal Industries Research & Development Centre Continuous electrochemical machining apparatus

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR667687A (fr) * 1928-01-30 1929-10-19 Perfectionnements à l'appareillage des cuves à métallisation galvanostégique
GB942595A (en) * 1960-07-28 1963-11-27 Steel Improvement & Forge Co Method and apparatus for electroplating
CH421654A (fr) * 1964-09-18 1966-09-30 Huguenin & Cie Installation pour le dépôt de couches métalliques par électrolyse
AT305719B (de) * 1969-11-24 1973-03-12 Norton Co Verfahren und Vorrichtung zum elektrolytischen von Metallniederschlägen
US3706650A (en) * 1971-03-26 1972-12-19 Norton Co Contour activating device
JPS57200591A (en) * 1981-06-02 1982-12-08 Electroplating Eng Of Japan Co Plating apparatus
GB2181743A (en) * 1985-07-16 1987-04-29 Kay Kazuo Metal plating of through holes in printed circuit boards
US4610772A (en) * 1985-07-22 1986-09-09 The Carolinch Company Electrolytic plating apparatus
JPS6274096A (ja) * 1985-09-27 1987-04-04 Kawasaki Steel Corp 高電流密度電解処理装置
US4875982A (en) * 1987-02-06 1989-10-24 Velie Circuits, Inc. Plating high aspect ratio holes in circuit boards
US5211826A (en) * 1991-09-26 1993-05-18 Siemens Aktiengesellschaft Electroplating means for perforated printed circuit boards to be treated in a horizontal pass

Also Published As

Publication number Publication date
ES2093524T3 (es) 1996-12-16
WO1994003655A1 (fr) 1994-02-17
ATE143422T1 (de) 1996-10-15
SG46609A1 (en) 1998-02-20
EP0652982B1 (fr) 1996-09-25
CA2141604C (fr) 2005-05-24
CA2141604A1 (fr) 1994-02-17
EP0652982A1 (fr) 1995-05-17
JPH07509539A (ja) 1995-10-19

Similar Documents

Publication Publication Date Title
DE3783090D1 (de) Anordnung zur elektrolytischen behandlung von plattenfoermigen gegenstaenden.
BR8607061A (pt) Processo e aparelho para eletrogalvanizacao de folha de cobre
AU600878B2 (en) Process for electroplating metals
KR970070247A (ko) 미세 패턴용 전해 구리 호일 및 그의 제조 방법
SG52609A1 (en) Method of electrolytic precipitation of metallic layers with predetermined physical properties and apparatus for carrying out the method
EP1026286A3 (fr) Procédé et dispositif pour le placage d'un substrat avec du cuivre
KR890002623B1 (en) Method for electroplating non-metallic surfaces
WO1999010568A3 (fr) Dispositif et procede pour egaliser l'epaisseur de couches metalliques au niveau des points de mise en contact electriques sur un produit a traiter
EP0261424A3 (en) Metal plating process
HK38697A (en) Process for the electrolytic processing especially of flat items and arrangement for implementing the process
GR3002354T3 (en) Apparatus for electrolytically treating selected areas of the surfaces of objects
CA2124082A1 (fr) Dispositif de revetement electrolytique de petites pieces
DK0431711T3 (da) Fremgangsmåde og indretning til anodisk eller katodisk elektrolakering af huldele, specielt af dåser
WO1998049375A3 (fr) Dispositif pour le traitement electrolytique d'articles sous forme de plaquettes, et procede de protection electrique de zones marginales de tels articles lors du traitement electrolytique
AU2013492A (en) Electrolysis cell for gas-emitting or gas-dissipating electrolytic processes and process for running the electrolysis cell
ZA875978B (en) Process for metallizing non-conductive substrates
ATE180622T1 (de) Verfahren und vorrichtung zum chemischen und elektrolytischen behandeln von leiterplatten und leiterfolien
ATE89614T1 (de) Galvanisiereinrichtung fuer plattenfoermige werkstuecke, insbesondere leiterplatten.
DE59202882D1 (de) Galvanisiereinrichtung für plattenförmige werkstücke, insbesondere leiterplatten.
EP0381873A3 (fr) Composition d'activation pour revêtir des substrats électriquement isolants et méthode pour revêtir ces substrats en utilisant ladite composition
SE8200728L (sv) Sett vid elektropletering
Blasing et al. Process and Apparatus for Conveying Plate-Like Articles(for Electroplating)
ES2012606A6 (es) Metodo de eliminar una configuracion denditrica durante la galvanoplastia de cinta metalica:
ATE86903T1 (de) Verfahren zum elektrochemischen bearbeiten von werkstuecken sowie vorrichtung zur durchfuehrung des verfahrens.
JPS63121692A (ja) Icリ−ドフレ−ム基材の活性化方法

Legal Events

Date Code Title Description
PF Patent in force
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20090802