SG144040A1 - Cleaning liquid and cleaning method for electronic material - Google Patents

Cleaning liquid and cleaning method for electronic material

Info

Publication number
SG144040A1
SG144040A1 SG200718144-9A SG2007181449A SG144040A1 SG 144040 A1 SG144040 A1 SG 144040A1 SG 2007181449 A SG2007181449 A SG 2007181449A SG 144040 A1 SG144040 A1 SG 144040A1
Authority
SG
Singapore
Prior art keywords
cleaning
cleaning liquid
electronic material
present
cleaning method
Prior art date
Application number
SG200718144-9A
Other languages
English (en)
Inventor
Teruo Haibara
Yoshihiro Mori
Takashi Mouri
Original Assignee
Siltronic Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007277936A external-priority patent/JP2008182188A/ja
Application filed by Siltronic Ag filed Critical Siltronic Ag
Publication of SG144040A1 publication Critical patent/SG144040A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/06—Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/40—Specific cleaning or washing processes
    • C11D2111/46—Specific cleaning or washing processes applying energy, e.g. irradiation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
SG200718144-9A 2006-12-27 2007-11-28 Cleaning liquid and cleaning method for electronic material SG144040A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006352730 2006-12-27
JP2007277936A JP2008182188A (ja) 2006-12-27 2007-10-25 電子材料用洗浄液および洗浄方法

Publications (1)

Publication Number Publication Date
SG144040A1 true SG144040A1 (en) 2008-07-29

Family

ID=39111341

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200718144-9A SG144040A1 (en) 2006-12-27 2007-11-28 Cleaning liquid and cleaning method for electronic material

Country Status (3)

Country Link
US (1) US8043435B2 (fr)
EP (1) EP1950792A1 (fr)
SG (1) SG144040A1 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010135525A (ja) 2008-12-04 2010-06-17 Siltronic Ag 半導体ウエハの洗浄方法
WO2010101036A1 (fr) * 2009-03-04 2010-09-10 日本碍子株式会社 Procédé de nettoyage par ultrasons et dispositif de nettoyage par ultrasons
CN102956450B (zh) * 2011-08-16 2015-03-11 中芯国际集成电路制造(北京)有限公司 一种制作半导体器件的方法
JP2013157443A (ja) * 2012-01-30 2013-08-15 Siltronic Ag 洗浄方法
CN103021841A (zh) * 2012-09-27 2013-04-03 奥特斯维能源（太仓）有限公司 一种去除SixNy残留物的处理方法
CN104117501A (zh) * 2014-06-26 2014-10-29 苏州一合光学有限公司 超声波清洗机的槽体布局结构
CN105032834A (zh) * 2015-07-16 2015-11-11 邢台晶龙电子材料有限公司 金刚石硅片专用碱洗液及金刚石硅片清洗工艺
JP6541492B2 (ja) * 2015-07-29 2019-07-10 東京エレクトロン株式会社 液処理方法および液処理装置
US10832917B2 (en) * 2017-06-09 2020-11-10 International Business Machines Corporation Low oxygen cleaning for CMP equipment
CN109755100B (zh) * 2017-11-01 2022-04-08 天津环鑫科技发展有限公司 一种干法打砂清洗工艺

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4012319A (en) * 1974-02-01 1977-03-15 Swift And Company Waste water treatment
FR2541130B1 (fr) * 1983-02-21 1988-07-29 Elf Aquitaine Procede et dispositif pour briser les emulsions stabilisees notamment les emulsions huile-eau
US4732661A (en) * 1985-10-24 1988-03-22 Mercer International, Inc. Electrolytic purification system
JP2743823B2 (ja) * 1994-03-25 1998-04-22 日本電気株式会社 半導体基板のウエット処理方法
JP3012189B2 (ja) * 1996-02-02 2000-02-21 スピードファムクリーンシステム株式会社 流水式洗浄装置
JP3590470B2 (ja) 1996-03-27 2004-11-17 アルプス電気株式会社 洗浄水生成方法および洗浄方法ならびに洗浄水生成装置および洗浄装置
CN1299333C (zh) 1996-08-20 2007-02-07 奥加诺株式会社 清洗电子元件或其制造设备的元件的方法和装置
US6927176B2 (en) * 2000-06-26 2005-08-09 Applied Materials, Inc. Cleaning method and solution for cleaning a wafer in a single wafer process
KR100389917B1 (ko) 2000-09-06 2003-07-04 삼성전자주식회사 산화성 물질을 포함하는 아노드 수 및/또는 환원성 물질을포함하는 캐소드 수를 사용하는 반도체 제조를 위한 습식공정 및 이 공정에 사용되는 아노드수 및/또는 캐소드수
JP2004121962A (ja) * 2002-10-01 2004-04-22 National Institute Of Advanced Industrial & Technology ナノバブルの利用方法及び装置
JP4505560B2 (ja) 2003-12-15 2010-07-21 宮崎県 単分散気泡の生成方法
KR100583430B1 (ko) * 2004-03-08 2006-05-24 양경숙 차륜 가변형 스쿠터
US7981286B2 (en) * 2004-09-15 2011-07-19 Dainippon Screen Mfg Co., Ltd. Substrate processing apparatus and method of removing particles
JP4502206B2 (ja) * 2004-12-28 2010-07-14 三洋化成工業株式会社 微小気泡発生用界面活性剤
TWI259110B (en) * 2005-09-22 2006-08-01 Delta Electronics Inc Ultrasonic cleaning system and method

Also Published As

Publication number Publication date
US8043435B2 (en) 2011-10-25
US20080156347A1 (en) 2008-07-03
EP1950792A1 (fr) 2008-07-30

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