SG136912A1 - Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus - Google Patents
Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatusInfo
- Publication number
- SG136912A1 SG136912A1 SG200702865-7A SG2007028657A SG136912A1 SG 136912 A1 SG136912 A1 SG 136912A1 SG 2007028657 A SG2007028657 A SG 2007028657A SG 136912 A1 SG136912 A1 SG 136912A1
- Authority
- SG
- Singapore
- Prior art keywords
- cleaning
- clean
- device manufacturing
- methods
- lithographic apparatus
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000356 contaminant Substances 0.000 abstract 6
- 230000003287 optical effect Effects 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/003—Manipulation of charged particles by using radiation pressure, e.g. optical levitation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3046—Mechanical treatment, e.g. grinding, polishing, cutting using blasting, e.g. sand-blasting
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma & Fusion (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- High Energy & Nuclear Physics (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Cleaning In General (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/413,216 US7628865B2 (en) | 2006-04-28 | 2006-04-28 | Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
SG136912A1 true SG136912A1 (en) | 2007-11-29 |
Family
ID=38050292
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200702865-7A SG136912A1 (en) | 2006-04-28 | 2007-04-20 | Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus |
Country Status (7)
Country | Link |
---|---|
US (1) | US7628865B2 (zh) |
EP (1) | EP1850182A3 (zh) |
JP (1) | JP4727618B2 (zh) |
KR (1) | KR100874736B1 (zh) |
CN (1) | CN101063830B (zh) |
SG (1) | SG136912A1 (zh) |
TW (1) | TWI364630B (zh) |
Families Citing this family (96)
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CA2561575C (en) | 2004-03-31 | 2013-05-21 | Forskningscenter Riso | Generation of a desired three-dimensional electromagnetic field |
US20060077361A1 (en) | 2004-10-12 | 2006-04-13 | Michael Sogard | Means of removing particles from a membrane mask in a vacuum |
JP2006114650A (ja) * | 2004-10-14 | 2006-04-27 | Canon Inc | 露光装置、走査露光装置、デバイス製造方法、原版のクリーニング方法、および原版 |
JP4681849B2 (ja) | 2004-10-22 | 2011-05-11 | キヤノン株式会社 | 除去装置、当該除去装置を有する露光装置、デバイス製造方法 |
-
2006
- 2006-04-28 US US11/413,216 patent/US7628865B2/en not_active Expired - Fee Related
-
2007
- 2007-04-16 EP EP07106245A patent/EP1850182A3/en not_active Withdrawn
- 2007-04-16 TW TW096113363A patent/TWI364630B/zh not_active IP Right Cessation
- 2007-04-20 SG SG200702865-7A patent/SG136912A1/en unknown
- 2007-04-20 JP JP2007111141A patent/JP4727618B2/ja not_active Expired - Fee Related
- 2007-04-27 CN CN200710102969.XA patent/CN101063830B/zh not_active Expired - Fee Related
- 2007-04-27 KR KR1020070041363A patent/KR100874736B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US7628865B2 (en) | 2009-12-08 |
KR20070106448A (ko) | 2007-11-01 |
JP4727618B2 (ja) | 2011-07-20 |
TW200745782A (en) | 2007-12-16 |
US20070251543A1 (en) | 2007-11-01 |
KR100874736B1 (ko) | 2008-12-19 |
CN101063830A (zh) | 2007-10-31 |
JP2007300096A (ja) | 2007-11-15 |
EP1850182A2 (en) | 2007-10-31 |
EP1850182A3 (en) | 2009-07-15 |
TWI364630B (en) | 2012-05-21 |
CN101063830B (zh) | 2013-04-10 |
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