SG135085A1 - Ruthenium alloy magnetic media and sputter targets - Google Patents

Ruthenium alloy magnetic media and sputter targets

Info

Publication number
SG135085A1
SG135085A1 SG200604128-9A SG2006041289A SG135085A1 SG 135085 A1 SG135085 A1 SG 135085A1 SG 2006041289 A SG2006041289 A SG 2006041289A SG 135085 A1 SG135085 A1 SG 135085A1
Authority
SG
Singapore
Prior art keywords
solubility
alloying element
ruthenium
magnetic media
grain size
Prior art date
Application number
SG200604128-9A
Other languages
English (en)
Inventor
Anirban Das
Michael Gene Racine
Original Assignee
Heraeus Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Inc filed Critical Heraeus Inc
Publication of SG135085A1 publication Critical patent/SG135085A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C28/00—Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7369—Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
    • G11B5/737—Physical structure of underlayer, e.g. texture
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
SG200604128-9A 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets SG135085A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/353,141 US20070190364A1 (en) 2006-02-14 2006-02-14 Ruthenium alloy magnetic media and sputter targets

Publications (1)

Publication Number Publication Date
SG135085A1 true SG135085A1 (en) 2007-09-28

Family

ID=36910806

Family Applications (6)

Application Number Title Priority Date Filing Date
SG200706572-5A SG136128A1 (en) 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets
SG200706575-8A SG136131A1 (en) 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets
SG200706571-7A SG136127A1 (en) 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets
SG200706573-3A SG136129A1 (en) 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets
SG200708817-2A SG136142A1 (en) 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets
SG200604128-9A SG135085A1 (en) 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets

Family Applications Before (5)

Application Number Title Priority Date Filing Date
SG200706572-5A SG136128A1 (en) 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets
SG200706575-8A SG136131A1 (en) 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets
SG200706571-7A SG136127A1 (en) 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets
SG200706573-3A SG136129A1 (en) 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets
SG200708817-2A SG136142A1 (en) 2006-02-14 2006-06-16 Ruthenium alloy magnetic media and sputter targets

Country Status (8)

Country Link
US (1) US20070190364A1 (cs)
EP (1) EP1818917A1 (cs)
JP (1) JP2007220267A (cs)
KR (1) KR20070082005A (cs)
CN (1) CN101022014A (cs)
CZ (1) CZ2006383A3 (cs)
SG (6) SG136128A1 (cs)
TW (1) TW200731300A (cs)

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WO2009051090A1 (ja) * 2007-10-15 2009-04-23 Hoya Corporation 垂直磁気記録媒体
BR112013001540A2 (pt) 2010-07-29 2016-05-10 Federal Mogul Ignition Co vela de ignição e material de eletrodo
US8471451B2 (en) 2011-01-05 2013-06-25 Federal-Mogul Ignition Company Ruthenium-based electrode material for a spark plug
DE112012000600B4 (de) 2011-01-27 2018-12-13 Federal-Mogul Ignition Company Zündkerzenelektrode für eine Zündkerze, Zündkerze und Verfahren zum Herstellen einer Zündkerzenelektrode
US8760044B2 (en) 2011-02-22 2014-06-24 Federal-Mogul Ignition Company Electrode material for a spark plug
JP5699016B2 (ja) * 2011-03-30 2015-04-08 田中貴金属工業株式会社 Ｒｕ−Ｐｄ系スパッタリングターゲット及びその製造方法
DE112012002699B4 (de) 2011-06-28 2018-12-13 Federal-Mogul Ignition Company Zündkerze und Verfahren zum Herstellen einer Elektrode einer Zündkerze
US10044172B2 (en) 2012-04-27 2018-08-07 Federal-Mogul Ignition Company Electrode for spark plug comprising ruthenium-based material
WO2013177031A1 (en) 2012-05-22 2013-11-28 Federal-Mogul Ignition Company Method of making ruthenium-based material for spark plug electrode
US8979606B2 (en) 2012-06-26 2015-03-17 Federal-Mogul Ignition Company Method of manufacturing a ruthenium-based spark plug electrode material into a desired form and a ruthenium-based material for use in a spark plug
CN104032270B (zh) * 2014-06-12 2016-05-04 贵研铂业股份有限公司 一种大尺寸钌基合金溅射靶材及其制备方法
US20160125903A1 (en) * 2014-10-31 2016-05-05 HGST Netherlands B.V. Perpendicular magnetic recording medium having an oxide seed layer and ru alloy intermediate layer
JP7258275B2 (ja) 2019-05-09 2023-04-17 株式会社レゾナック 磁気記録媒体および磁気記録再生装置
TWI834072B (zh) * 2021-10-22 2024-03-01 光洋應用材料科技股份有限公司 釕鋁合金靶材及其製法

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Also Published As

Publication number Publication date
CZ2006383A3 (cs) 2007-09-05
TW200731300A (en) 2007-08-16
KR20070082005A (ko) 2007-08-20
US20070190364A1 (en) 2007-08-16
SG136131A1 (en) 2007-10-29
SG136128A1 (en) 2007-10-29
JP2007220267A (ja) 2007-08-30
SG136129A1 (en) 2007-10-29
EP1818917A1 (en) 2007-08-15
SG136127A1 (en) 2007-10-29
CN101022014A (zh) 2007-08-22
SG136142A1 (en) 2007-10-29

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