SG133405A1 - Vacuum arc evaporation apparatus - Google Patents

Vacuum arc evaporation apparatus

Info

Publication number
SG133405A1
SG133405A1 SG200407638-6A SG2004076386A SG133405A1 SG 133405 A1 SG133405 A1 SG 133405A1 SG 2004076386 A SG2004076386 A SG 2004076386A SG 133405 A1 SG133405 A1 SG 133405A1
Authority
SG
Singapore
Prior art keywords
anode
magnetic
vacuum arc
arc evaporation
evaporation apparatus
Prior art date
Application number
SG200407638-6A
Other languages
English (en)
Inventor
Takashi Mikami
Hiroshi Murakami
Koji Miyake
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Publication of SG133405A1 publication Critical patent/SG133405A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
SG200407638-6A 2000-09-18 2001-09-17 Vacuum arc evaporation apparatus SG133405A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000282012A JP4000764B2 (ja) 2000-09-18 2000-09-18 真空アーク蒸発装置

Publications (1)

Publication Number Publication Date
SG133405A1 true SG133405A1 (en) 2007-07-30

Family

ID=18766589

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200407638-6A SG133405A1 (en) 2000-09-18 2001-09-17 Vacuum arc evaporation apparatus
SG200105648A SG111029A1 (en) 2000-09-18 2001-09-17 Vacuum arc evaporator apparatus

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG200105648A SG111029A1 (en) 2000-09-18 2001-09-17 Vacuum arc evaporator apparatus

Country Status (4)

Country Link
EP (1) EP1189258A3 (zh)
JP (1) JP4000764B2 (zh)
SG (2) SG133405A1 (zh)
TW (1) TW520400B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10240337B4 (de) * 2002-08-27 2007-11-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zur Separation von Partikeln aus einem von einem Target zur Beschichtung eines Substrates erzeugten Plasma im Vakuum
JP2005029855A (ja) 2003-07-08 2005-02-03 Fuji Electric Device Technology Co Ltd 真空アーク蒸着装置、真空アーク蒸着法、および磁気記録媒体
US20100190036A1 (en) * 2009-01-27 2010-07-29 Kyriakos Komvopoulos Systems and Methods for Surface Modification by Filtered Cathodic Vacuum Arc
US10253407B2 (en) * 2010-06-22 2019-04-09 Oerlikon Surface Solutions Ag, Pfäffikon Arc deposition source having a defined electric field
EP2607517A1 (en) * 2011-12-22 2013-06-26 Oerlikon Trading AG, Trübbach Low temperature arc ion plating coating
WO2013099058A1 (ja) * 2011-12-28 2013-07-04 キヤノンアネルバ株式会社 成膜装置
DE102015204592B4 (de) * 2015-03-13 2016-12-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum Beeinflussen einer Ausbreitung eines bei einem Vakuumlichtbogenprozess gebildeten Plasmas
CN112226732B (zh) * 2020-10-16 2023-06-30 廖斌 一种薄膜沉积设备

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985003954A1 (en) * 1984-03-02 1985-09-12 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
JPH02232364A (ja) * 1989-03-02 1990-09-14 Kobe Steel Ltd 真空アーク蒸着装置
US5269898A (en) * 1991-03-20 1993-12-14 Vapor Technologies, Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
DE19546827C2 (de) * 1995-12-15 1999-03-25 Fraunhofer Ges Forschung Einrichtung zur Erzeugung dichter Plasmen in Vakuumprozessen
RU2113538C1 (ru) * 1996-07-09 1998-06-20 Научно-исследовательский институт ядерной физики при Томском политехническом университете Способ импульсно-периодической ионной и плазменной обработки изделия и устройство для его осуществления
WO1998045871A1 (en) * 1997-04-04 1998-10-15 Alexander Igorevich Dodonov Producing electric arc plasma in a curvilinear plasmaguide and substrate coating
DE19739527C2 (de) * 1997-09-09 2003-10-16 Rossendorf Forschzent Vakuumbogen-Plasmaquelle mit Magnet-Partikelfilter
JPH11335832A (ja) * 1998-05-20 1999-12-07 Mitsubishi Heavy Ind Ltd イオン注入方法及びイオン注入装置
TWI242049B (en) * 1999-01-14 2005-10-21 Kobe Steel Ltd Vacuum arc evaporation source and vacuum arc vapor deposition apparatus

Also Published As

Publication number Publication date
TW520400B (en) 2003-02-11
EP1189258A2 (en) 2002-03-20
JP4000764B2 (ja) 2007-10-31
SG111029A1 (en) 2005-05-30
EP1189258A3 (en) 2005-02-09
JP2002088466A (ja) 2002-03-27

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