UA81616C2 - Плазменный ускоритель с закрытым дрейфом электронов - Google Patents
Плазменный ускоритель с закрытым дрейфом электроновInfo
- Publication number
- UA81616C2 UA81616C2 UA20040705520A UA20040705520A UA81616C2 UA 81616 C2 UA81616 C2 UA 81616C2 UA 20040705520 A UA20040705520 A UA 20040705520A UA 20040705520 A UA20040705520 A UA 20040705520A UA 81616 C2 UA81616 C2 UA 81616C2
- Authority
- UA
- Ukraine
- Prior art keywords
- ionization chamber
- anode
- magnetic field
- ring
- electrons
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H1/00—Using plasma to produce a reactive propulsive thrust
- F03H1/0037—Electrostatic ion thrusters
- F03H1/0062—Electrostatic ion thrusters grid-less with an applied magnetic field
- F03H1/0075—Electrostatic ion thrusters grid-less with an applied magnetic field with an annular channel; Hall-effect thrusters with closed electron drift
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/54—Plasma accelerators
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0308384A FR2857555B1 (fr) | 2003-07-09 | 2003-07-09 | Accelerateur a plasma a derive fermee d'electrons |
Publications (1)
Publication Number | Publication Date |
---|---|
UA81616C2 true UA81616C2 (ru) | 2008-01-25 |
Family
ID=33443254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
UA20040705520A UA81616C2 (ru) | 2003-07-09 | 2004-07-08 | Плазменный ускоритель с закрытым дрейфом электронов |
Country Status (7)
Country | Link |
---|---|
US (1) | US7180243B2 (ru) |
EP (1) | EP1496727B1 (ru) |
JP (1) | JP4916097B2 (ru) |
DE (1) | DE602004013401T2 (ru) |
FR (1) | FR2857555B1 (ru) |
RU (1) | RU2344577C2 (ru) |
UA (1) | UA81616C2 (ru) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7259378B2 (en) * | 2003-04-10 | 2007-08-21 | Applied Process Technologies, Inc. | Closed drift ion source |
KR100599094B1 (ko) * | 2004-11-29 | 2006-07-12 | 삼성전자주식회사 | 코일의 권선수 조절에 의한 전자기 유도 가속장치 |
US8460763B2 (en) * | 2007-03-01 | 2013-06-11 | Plasmatrix Materials Ab | Method for enhancing dynamic stiffness |
US7858949B2 (en) * | 2008-07-18 | 2010-12-28 | Brookhaven Science Associates, Llc | Multi-anode ionization chamber |
EP2316252B1 (en) | 2008-08-04 | 2018-10-31 | AGC Flat Glass North America, Inc. | Plasma source and method for depositing thin film coatings using plasma enhanced chemical vapor deposition and method thereof |
KR101064567B1 (ko) | 2008-10-16 | 2011-09-14 | 김용환 | 빔폭 제어 가능한 전자빔 제공 장치 |
WO2010044641A2 (ko) * | 2008-10-16 | 2010-04-22 | 주식회사 인포비온 | 빔폭 제어 가능한 전자빔 제공 장치 |
US8468794B1 (en) * | 2010-01-15 | 2013-06-25 | The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration | Electric propulsion apparatus |
RU2465749C2 (ru) * | 2010-04-02 | 2012-10-27 | Государственное образовательное учреждение высшего профессионального образования "Московский государственный технический университет имени Н.Э.Баумана" | Способ электромагнитной фокусировки ионного пучка в ускорителе плазмы с азимутальным дрейфом электронов |
US9449793B2 (en) * | 2010-08-06 | 2016-09-20 | Lam Research Corporation | Systems, methods and apparatus for choked flow element extraction |
RU2458249C1 (ru) * | 2011-03-31 | 2012-08-10 | Государственный научный центр Российской Федерации - федеральное государственное унитарное предприятие "Исследовательский Центр имени М.В. Келдыша" | Способ очистки рабочей части ускорительного канала стационарного плазменного двигателя от продуктов эрозии |
RU2474984C1 (ru) * | 2011-10-24 | 2013-02-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский авиационный институт (национальный исследовательский университет)" | Плазменный ускоритель с замкнутым дрейфом электронов |
EP2823501B1 (en) | 2012-03-03 | 2019-05-01 | The Board of Trustees of The Leland Stanford Junior University | Pluridirectional very high electron energy radiation therapy systems |
RU2540140C2 (ru) * | 2013-04-24 | 2015-02-10 | Мельников Юрий Константинович | Ускоритель плазмы |
WO2015102681A2 (en) | 2013-09-11 | 2015-07-09 | The Board Of Trustees Of The Leland Stanford Junior University | Methods and systems for rf power generation and distribution to facilitate rapid radiation therapies |
EP3043864A4 (en) | 2013-09-11 | 2017-07-26 | The Board of Trustees of The Leland Stanford Junior University | Methods and systems for beam intensity-modulation to facilitate rapid radiation therapies |
US9196449B1 (en) * | 2014-10-09 | 2015-11-24 | Far-Tech, Inc. | Floating grid electron source |
CN107615888B (zh) | 2014-12-05 | 2022-01-04 | 北美Agc平板玻璃公司 | 利用宏粒子减少涂层的等离子体源和将等离子体源用于沉积薄膜涂层和表面改性的方法 |
US10586685B2 (en) | 2014-12-05 | 2020-03-10 | Agc Glass Europe | Hollow cathode plasma source |
US9721765B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
US9721764B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Method of producing plasma by multiple-phase alternating or pulsed electrical current |
US10242846B2 (en) | 2015-12-18 | 2019-03-26 | Agc Flat Glass North America, Inc. | Hollow cathode ion source |
US10573499B2 (en) | 2015-12-18 | 2020-02-25 | Agc Flat Glass North America, Inc. | Method of extracting and accelerating ions |
IL256341A (en) * | 2017-12-14 | 2018-01-31 | Technion Res & Development Found Ltd | The god engine has a narrow channel |
WO2019125405A1 (en) * | 2017-12-19 | 2019-06-27 | Aerojet Rocketdyne, Inc. | Hall thruster with annular cathode |
CN108894939A (zh) * | 2018-04-23 | 2018-11-27 | 哈尔滨工业大学 | 大高径比霍尔推力器的磁场梯度调控方法 |
CN108953088A (zh) * | 2018-08-07 | 2018-12-07 | 金群英 | 一种新型霍尔推力器 |
CN109026580A (zh) * | 2018-08-07 | 2018-12-18 | 柳盼 | 一种霍尔推进器气体推进剂的输送方法 |
CN108953087A (zh) * | 2018-08-07 | 2018-12-07 | 金群英 | 一种包括多个储气室的霍尔推进器 |
US11530690B2 (en) | 2019-02-13 | 2022-12-20 | Technion Research & Development Foundation Ltd. | Ignition process for narrow channel hall thruster |
CN110617186B (zh) * | 2019-09-05 | 2020-10-09 | 上海空间推进研究所 | 一种放电室结构 |
FR3110641B1 (fr) | 2020-05-19 | 2023-05-26 | Inst Nat Polytechnique Toulouse | Circuit magnétique de création d'un champ magnétique dans un canal annulaire principal d'ionisation et d'accélération de propulseur plasmique à effet Hall. |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3935503A (en) * | 1973-11-26 | 1976-01-27 | The Kreidl Chemico Physical K.G. | Particle accelerator |
EP0463408A3 (en) * | 1990-06-22 | 1992-07-08 | Hauzer Techno Coating Europe Bv | Plasma accelerator with closed electron drift |
FR2693770B1 (fr) * | 1992-07-15 | 1994-10-14 | Europ Propulsion | Moteur à plasma à dérive fermée d'électrons. |
US5763989A (en) * | 1995-03-16 | 1998-06-09 | Front Range Fakel, Inc. | Closed drift ion source with improved magnetic field |
JPH09232097A (ja) * | 1996-02-21 | 1997-09-05 | Ulvac Japan Ltd | 磁気中性線放電型プラズマ利用装置 |
WO1997037517A2 (en) * | 1996-04-01 | 1997-10-09 | International Scientific Products | A hall effect plasma accelerator |
IL126414A0 (en) * | 1996-04-01 | 1999-05-09 | Int Scient Products | A hall effect plasma thruster |
US6273022B1 (en) * | 1998-03-14 | 2001-08-14 | Applied Materials, Inc. | Distributed inductively-coupled plasma source |
US6331701B1 (en) * | 1998-05-20 | 2001-12-18 | Lee Chen | RF-grounded sub-Debye neutralizer grid |
AU4818699A (en) * | 1998-06-05 | 1999-12-20 | Primex Aerospace Company | Magnetic flux shaping in ion accelerators with closed electron drift |
US6215124B1 (en) * | 1998-06-05 | 2001-04-10 | Primex Aerospace Company | Multistage ion accelerators with closed electron drift |
DE10130464B4 (de) * | 2001-06-23 | 2010-09-16 | Thales Electron Devices Gmbh | Plasmabeschleuniger-Anordnung |
JP3787079B2 (ja) * | 2001-09-11 | 2006-06-21 | 株式会社日立製作所 | プラズマ処理装置 |
WO2004027825A2 (en) * | 2002-09-19 | 2004-04-01 | Applied Process Technologies, Inc. | Beam plasma source |
US6903511B2 (en) * | 2003-05-06 | 2005-06-07 | Zond, Inc. | Generation of uniformly-distributed plasma |
-
2003
- 2003-07-09 FR FR0308384A patent/FR2857555B1/fr not_active Expired - Lifetime
-
2004
- 2004-06-28 EP EP04291618A patent/EP1496727B1/fr not_active Expired - Lifetime
- 2004-06-28 DE DE602004013401T patent/DE602004013401T2/de not_active Expired - Lifetime
- 2004-07-05 RU RU2004120251/06A patent/RU2344577C2/ru active
- 2004-07-08 UA UA20040705520A patent/UA81616C2/ru unknown
- 2004-07-08 US US10/887,236 patent/US7180243B2/en active Active
- 2004-07-09 JP JP2004202953A patent/JP4916097B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US20050035731A1 (en) | 2005-02-17 |
DE602004013401D1 (de) | 2008-06-12 |
EP1496727A1 (fr) | 2005-01-12 |
US7180243B2 (en) | 2007-02-20 |
FR2857555A1 (fr) | 2005-01-14 |
EP1496727B1 (fr) | 2008-04-30 |
FR2857555B1 (fr) | 2005-10-14 |
JP4916097B2 (ja) | 2012-04-11 |
DE602004013401T2 (de) | 2009-05-07 |
RU2004120251A (ru) | 2006-01-10 |
RU2344577C2 (ru) | 2009-01-20 |
JP2005032728A (ja) | 2005-02-03 |
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