SG131040A1 - Lithographic method - Google Patents

Lithographic method

Info

Publication number
SG131040A1
SG131040A1 SG200606087-5A SG2006060875A SG131040A1 SG 131040 A1 SG131040 A1 SG 131040A1 SG 2006060875 A SG2006060875 A SG 2006060875A SG 131040 A1 SG131040 A1 SG 131040A1
Authority
SG
Singapore
Prior art keywords
lithographic method
sets
overlay
data
meanders
Prior art date
Application number
SG200606087-5A
Other languages
English (en)
Inventor
Koen Jacobus Johannes Mar Zaal
Kort Antonius Johannes De
Jong Frederik Eduard De
Koen Goorman
Boris Menchtchikov
Hermen Folken Pen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/223,209 external-priority patent/US7426011B2/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG131040A1 publication Critical patent/SG131040A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/7045—Hybrid exposures, i.e. multiple exposures of the same area using different types of exposure apparatus, e.g. combining projection, proximity, direct write, interferometric, UV, x-ray or particle beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70458—Mix-and-match, i.e. multiple exposures of the same area using a similar type of exposure apparatus, e.g. multiple exposures using a UV apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200606087-5A 2005-09-06 2006-09-05 Lithographic method SG131040A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US21873605A 2005-09-06 2005-09-06
US11/223,209 US7426011B2 (en) 2005-09-12 2005-09-12 Method of calibrating a lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG131040A1 true SG131040A1 (en) 2007-04-26

Family

ID=37404592

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200606087-5A SG131040A1 (en) 2005-09-06 2006-09-05 Lithographic method

Country Status (7)

Country Link
US (1) US7423725B2 (ja)
EP (1) EP1760531A1 (ja)
JP (1) JP4685733B2 (ja)
KR (1) KR100824760B1 (ja)
CN (1) CN1936709B (ja)
SG (1) SG131040A1 (ja)
TW (1) TWI345685B (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010145951A2 (en) 2009-06-17 2010-12-23 Asml Netherlands B.V. Method of overlay measurement, lithographic apparatus, inspection apparatus, processing apparatus and lithographic processing cell
IL210832A (en) * 2010-02-19 2016-11-30 Asml Netherlands Bv Lithographic facility and method of manufacturing facility
NL2006336A (en) * 2010-04-29 2011-11-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US9465305B2 (en) * 2010-05-18 2016-10-11 Nikon Corporation Method for determining a commutation offset and for determining a compensation map for a stage
US9177219B2 (en) * 2010-07-09 2015-11-03 Asml Netherlands B.V. Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
EP2850635B1 (en) * 2012-05-14 2016-04-27 Mapper Lithography IP B.V. Charged particle multi-beamlet lithography system and cooling arrangement manufacturing method
NL2011683A (en) * 2012-12-13 2014-06-16 Asml Netherlands Bv Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product.
US9052595B2 (en) 2013-03-15 2015-06-09 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography process
NL2015049A (en) 2014-08-07 2016-07-08 Asml Netherlands Bv A lithography apparatus, a method of manufacturing a device and a control program.
US9733577B2 (en) * 2015-09-03 2017-08-15 Taiwan Semiconductor Manufacturing Co., Ltd. Intra-field process control for lithography
WO2017080735A1 (en) * 2015-11-13 2017-05-18 Asml Netherlands B.V. Method of predicting performance of a lithographic apparatus, calibration of lithographic apparatus, device manufacturing method
US10534271B2 (en) * 2017-01-26 2020-01-14 Asml Netherlands B.V. Lithography apparatus and a method of manufacturing a device
CN109388030B (zh) * 2017-08-11 2020-09-15 联华电子股份有限公司 一组测试键布局结构与其布局图形对位失准的测量方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
KR100500199B1 (ko) * 1995-05-29 2005-11-01 가부시키가이샤 니콘 마스크패턴을겹쳐서노광하는노광방법
JP3854640B2 (ja) * 1996-03-06 2006-12-06 株式会社 日立製作所 半導体素子製造方法
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP3626448B2 (ja) * 2001-11-28 2005-03-09 株式会社東芝 露光方法
US6875545B2 (en) * 2001-11-28 2005-04-05 Asml Masktools B.V. Method of removing assist features utilized to improve process latitude
US7804994B2 (en) * 2002-02-15 2010-09-28 Kla-Tencor Technologies Corporation Overlay metrology and control method
JP3913191B2 (ja) * 2002-03-25 2007-05-09 エーエスエムエル マスクツールズ ビー．ブイ． 空間周波数倍加技術を利用するマスクパターン形成方法および装置
SG135052A1 (en) 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121822A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1571697A4 (en) * 2002-12-10 2007-07-04 Nikon Corp EXPOSURE SYSTEM AND DEVICE PRODUCTION METHOD
JP4645027B2 (ja) * 2002-12-10 2011-03-09 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
JP4311713B2 (ja) * 2003-03-10 2009-08-12 キヤノン株式会社 露光装置
WO2006001416A1 (ja) * 2004-06-29 2006-01-05 Nikon Corporation 管理方法及び管理システム、並びにプログラム
US7304715B2 (en) * 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1879217A4 (en) * 2005-03-18 2010-06-09 Nikon Corp EXPOSURE METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE APPARATUS EVALUATION METHOD
JP2006302935A (ja) * 2005-04-15 2006-11-02 Nikon Corp 補正情報作成方法

Also Published As

Publication number Publication date
JP4685733B2 (ja) 2011-05-18
US7423725B2 (en) 2008-09-09
JP2007088455A (ja) 2007-04-05
CN1936709B (zh) 2011-04-20
CN1936709A (zh) 2007-03-28
EP1760531A1 (en) 2007-03-07
TW200715066A (en) 2007-04-16
KR100824760B1 (ko) 2008-04-24
US20070052940A1 (en) 2007-03-08
KR20070027461A (ko) 2007-03-09
TWI345685B (en) 2011-07-21

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