SG123749A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG123749A1
SG123749A1 SG200508312A SG200508312A SG123749A1 SG 123749 A1 SG123749 A1 SG 123749A1 SG 200508312 A SG200508312 A SG 200508312A SG 200508312 A SG200508312 A SG 200508312A SG 123749 A1 SG123749 A1 SG 123749A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200508312A
Other languages
English (en)
Inventor
Van Der Marc Wilhelmus M Wijst
Dominicus Jacobus Petr Franken
Erik Roelof Loopstra
Marius Ravensbergen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG123749A1 publication Critical patent/SG123749A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200508312A 2004-12-28 2005-12-22 Lithographic apparatus and device manufacturing method SG123749A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/022,936 US7436484B2 (en) 2004-12-28 2004-12-28 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG123749A1 true SG123749A1 (en) 2006-07-26

Family

ID=36128569

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200508312A SG123749A1 (en) 2004-12-28 2005-12-22 Lithographic apparatus and device manufacturing method

Country Status (8)

Country Link
US (2) US7436484B2 (fr)
EP (1) EP1677154B1 (fr)
JP (1) JP4264083B2 (fr)
KR (2) KR20060076750A (fr)
CN (1) CN1797206B (fr)
DE (1) DE602005010658D1 (fr)
SG (1) SG123749A1 (fr)
TW (1) TWI304160B (fr)

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US7756660B2 (en) * 2004-12-28 2010-07-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI454731B (zh) 2005-05-27 2014-10-01 Zeiss Carl Smt Gmbh 用於改進投影物鏡的成像性質之方法以及該投影物鏡
TWI439815B (zh) 2006-07-03 2014-06-01 Zeiss Carl Smt Gmbh 校正／修復微影投影曝光裝置中之投影物鏡的方法與此投影物鏡
US7675607B2 (en) * 2006-07-14 2010-03-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006034755A1 (de) * 2006-07-24 2008-01-31 Carl Zeiss Smt Ag Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung
NO326372B1 (no) 2006-09-21 2008-11-17 Polight As Polymerlinse
DE102006047666A1 (de) * 2006-09-28 2008-04-03 Carl Zeiss Smt Ag Projektionsobjektiv für eine Mikrolithographieanlage mit verbesserten Abbildungseigenschaften und Verfahren zum Verbessern der Abbildungseigenschaften des Projektionsobjektives
CN101600976B (zh) 2006-10-11 2011-11-09 珀莱特公司 紧凑型可调节透镜的设计
EP2074445B1 (fr) * 2006-10-11 2017-04-12 poLight AS Procédé de fabrication de lentille réglable
JP5154564B2 (ja) * 2006-12-01 2013-02-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 像収差を低減するための交換可能で操作可能な補正構成を有する光学システム
JP5362587B2 (ja) * 2007-02-12 2013-12-11 ポライト エイエス 焦点距離が可変の可撓性レンズ組立体
DE102007009867A1 (de) * 2007-02-28 2008-09-11 Carl Zeiss Smt Ag Abbildungsvorrichtung mit auswechselbaren Blenden sowie Verfahren hierzu
DE102008041287A1 (de) * 2007-08-24 2009-02-26 Carl Zeiss Smt Ag Kraftaktuator
NL1036701A1 (nl) * 2008-04-15 2009-10-19 Asml Holding Nv Apparatus for supporting an optical element, and method of making same.
JP2010021535A (ja) * 2008-06-11 2010-01-28 Canon Inc 変形機構、露光装置およびデバイス製造方法
CN106324728B (zh) * 2008-07-11 2018-09-04 珀莱特公司 用于减小紧凑可调光学透镜中的热效应的方法和装置
JP5511199B2 (ja) * 2009-02-25 2014-06-04 キヤノン株式会社 投影光学系、露光装置、およびデバイス製造方法
US20120089347A1 (en) * 2010-10-12 2012-04-12 Kellogg Brown & Root Llc Displacement Generator for Fatigue Analysis of Floating Prduction and Storage Unit Process and Utility Piping
EP2492928A3 (fr) * 2011-02-22 2017-08-30 ASML Netherlands BV Actionneur électromagnétique, appareil à platine et appareil lithographique
NL2010204A (en) * 2012-04-11 2013-10-15 Asml Netherlands Bv Rotatable frame, lithographic apparatus, projection system, method for focusing radiation and device manufacturing method.
CN103837979B (zh) * 2012-11-22 2016-03-30 上海丽恒光微电子科技有限公司 基于mems的焦距调整装置及其制备方法
WO2015173362A1 (fr) * 2014-05-14 2015-11-19 Carl Zeiss Smt Gmbh Agencement optimal de points d'actionnement et de détection sur un élément optique
CN104076616B (zh) * 2014-07-01 2016-03-02 中国科学院长春光学精密机械与物理研究所 一种三叶像差变形镜装置
CN104076617B (zh) * 2014-07-01 2016-04-27 中国科学院长春光学精密机械与物理研究所 一种像散变形镜装置
CN104076618B (zh) * 2014-07-01 2016-03-02 中国科学院长春光学精密机械与物理研究所 一种四叶像差变形镜装置
DE102014114478B3 (de) * 2014-10-06 2016-02-25 Leica Microsystems (Schweiz) Ag Digitales Mikroskop mit federgelagerter schwenkbarer Einheit
DE102014114479B3 (de) * 2014-10-06 2016-02-25 Leica Microsystems (Schweiz) Ag Digitales mikroskop mit klickstopp
DE102014114477B3 (de) * 2014-10-06 2016-02-25 Leica Microsystems (Schweiz) Ag Digitales Mikroskop mit einem Radialkolbenbremssystem
CN105259651B (zh) * 2015-10-30 2017-12-26 中国科学院长春光学精密机械与物理研究所 一种能够产生多种像差的变形镜装置
KR20180068228A (ko) 2016-12-13 2018-06-21 삼성전자주식회사 위치 조정 유닛 및 이를 포함하는 마스크리스 노광 장치
CN107357263A (zh) * 2017-06-20 2017-11-17 深圳市国匠数控科技有限公司 一种电子雕刻机控制系统及方法
DE102018207454A1 (de) * 2018-05-15 2019-05-29 Carl Zeiss Smt Gmbh Aktuatoranordnung, Projektionsbelichtungsanlage und Waferinspektionsanlage für die Halbleiterlithographie
CN114442302A (zh) * 2020-11-03 2022-05-06 上海奕太智能科技有限公司 基于可变形透镜的水下显微镜及控制方法

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US6721104B2 (en) * 1995-05-12 2004-04-13 Pc Lens Corp System and method for focusing an elastically deformable lens
US5774274A (en) * 1995-05-12 1998-06-30 Schachar; Ronald A. Variable focus lens by small changes of the equatorial lens diameter
US7112772B2 (en) * 1998-05-29 2006-09-26 Carl Zeiss Smt Ag Catadioptric projection objective with adaptive mirror and projection exposure method
DE19827603A1 (de) * 1998-06-20 1999-12-23 Zeiss Carl Fa Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie
DE19827602A1 (de) * 1998-06-20 1999-12-23 Zeiss Carl Fa Verfahren zur Korrektur nicht-rotationssymmetrischer Bildfehler
DE19859634A1 (de) * 1998-12-23 2000-06-29 Zeiss Carl Fa Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie
US6847433B2 (en) * 2001-06-01 2005-01-25 Agere Systems, Inc. Holder, system, and process for improving overlay in lithography
DE10151919B4 (de) * 2001-10-20 2007-02-01 Carl Zeiss Smt Ag Belichtungsobjektiv in der Halbleiterlithographie
US6902281B2 (en) * 2002-01-23 2005-06-07 Bennett Optical Research, Inc. Adaptive optic mirror
DE10222331A1 (de) 2002-05-18 2003-11-27 Zeiss Carl Smt Ag Verfahren zur gezielten Deformation eines optischen Elements
US20030234918A1 (en) * 2002-06-20 2003-12-25 Nikon Corporation Adjustable soft mounts in kinematic lens mounting system
US6897940B2 (en) * 2002-06-21 2005-05-24 Nikon Corporation System for correcting aberrations and distortions in EUV lithography
WO2004036316A1 (fr) 2002-10-15 2004-04-29 Carl Zeiss Smt Ag Systeme optique et procede pour specifier et realiser une deformation d'une surface optique d'un element optique faisant partie de ce systeme optique
US7528931B2 (en) * 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
US20060139585A1 (en) 2006-06-29
JP2006191062A (ja) 2006-07-20
TWI304160B (en) 2008-12-11
CN1797206B (zh) 2010-09-29
US7999914B2 (en) 2011-08-16
EP1677154A3 (fr) 2006-12-27
US7436484B2 (en) 2008-10-14
JP4264083B2 (ja) 2009-05-13
KR20060076750A (ko) 2006-07-04
DE602005010658D1 (de) 2008-12-11
KR20080046143A (ko) 2008-05-26
EP1677154A2 (fr) 2006-07-05
TW200632581A (en) 2006-09-16
CN1797206A (zh) 2006-07-05
EP1677154B1 (fr) 2008-10-29
US20080218722A1 (en) 2008-09-11

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