SG119365A1 - Ultra high speed uniform plasma processing system - Google Patents

Ultra high speed uniform plasma processing system

Info

Publication number
SG119365A1
SG119365A1 SG200504851A SG200504851A SG119365A1 SG 119365 A1 SG119365 A1 SG 119365A1 SG 200504851 A SG200504851 A SG 200504851A SG 200504851 A SG200504851 A SG 200504851A SG 119365 A1 SG119365 A1 SG 119365A1
Authority
SG
Singapore
Prior art keywords
processing system
high speed
plasma processing
ultra high
uniform plasma
Prior art date
Application number
SG200504851A
Other languages
English (en)
Inventor
Robert S Condrashoff
James P Fazio
James D Getty
James S Tyler
Original Assignee
Nordson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nordson Corp filed Critical Nordson Corp
Publication of SG119365A1 publication Critical patent/SG119365A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32633—Baffles

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
SG200504851A 2004-07-13 2005-07-06 Ultra high speed uniform plasma processing system SG119365A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/710,457 US7845309B2 (en) 2004-07-13 2004-07-13 Ultra high speed uniform plasma processing system

Publications (1)

Publication Number Publication Date
SG119365A1 true SG119365A1 (en) 2006-02-28

Family

ID=35115691

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200717678-7A SG137851A1 (en) 2004-07-13 2005-07-06 Ultra high speed uniform plasma processing system
SG200504851A SG119365A1 (en) 2004-07-13 2005-07-06 Ultra high speed uniform plasma processing system

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG200717678-7A SG137851A1 (en) 2004-07-13 2005-07-06 Ultra high speed uniform plasma processing system

Country Status (6)

Country Link
US (1) US7845309B2 (ja)
EP (1) EP1617457B1 (ja)
JP (1) JP5054901B2 (ja)
CN (1) CN1728916B (ja)
SG (2) SG137851A1 (ja)
TW (1) TWI392402B (ja)

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Also Published As

Publication number Publication date
EP1617457A3 (en) 2006-10-18
EP1617457B1 (en) 2011-12-28
US20060011299A1 (en) 2006-01-19
EP1617457A2 (en) 2006-01-18
US7845309B2 (en) 2010-12-07
TW200616498A (en) 2006-05-16
JP5054901B2 (ja) 2012-10-24
JP2006032344A (ja) 2006-02-02
SG137851A1 (en) 2007-12-28
TWI392402B (zh) 2013-04-01
CN1728916A (zh) 2006-02-01
CN1728916B (zh) 2011-06-01

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