SG119304A1 - Lithographic apparatus an apparatus comprising an illumination system an apparatus comprising a projection system an optical element for a lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus an apparatus comprising an illumination system an apparatus comprising a projection system an optical element for a lithographic apparatus and device manufacturing method

Info

Publication number
SG119304A1
SG119304A1 SG200504355A SG200504355A SG119304A1 SG 119304 A1 SG119304 A1 SG 119304A1 SG 200504355 A SG200504355 A SG 200504355A SG 200504355 A SG200504355 A SG 200504355A SG 119304 A1 SG119304 A1 SG 119304A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
lithographic
optical element
device manufacturing
projection system
Prior art date
Application number
SG200504355A
Other languages
English (en)
Inventor
Josephus Box Wilhelmus
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG119304A1 publication Critical patent/SG119304A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200504355A 2004-08-04 2005-07-11 Lithographic apparatus an apparatus comprising an illumination system an apparatus comprising a projection system an optical element for a lithographic apparatus and device manufacturing method SG119304A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/910,792 US7375794B2 (en) 2004-08-04 2004-08-04 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG119304A1 true SG119304A1 (en) 2006-02-28

Family

ID=35355401

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200504355A SG119304A1 (en) 2004-08-04 2005-07-11 Lithographic apparatus an apparatus comprising an illumination system an apparatus comprising a projection system an optical element for a lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US7375794B2 (ko)
EP (1) EP1624342B1 (ko)
JP (2) JP4495046B2 (ko)
KR (1) KR100697297B1 (ko)
CN (1) CN1734354A (ko)
SG (1) SG119304A1 (ko)
TW (1) TWI284359B (ko)

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DE102006021797A1 (de) * 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
US20080049202A1 (en) * 2006-08-22 2008-02-28 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography
IL181500A0 (en) * 2007-02-22 2007-07-04 Belkin Lev Scale inhibiting heating device
US8064151B2 (en) * 2007-08-14 2011-11-22 Asml Netherlands B.V. Lithographic apparatus and thermal optical manipulator control method
JP5524067B2 (ja) * 2007-10-09 2014-06-18 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子の温度制御装置
US7960701B2 (en) * 2007-12-20 2011-06-14 Cymer, Inc. EUV light source components and methods for producing, using and refurbishing same
NL2003341A (en) * 2008-08-22 2010-03-10 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US7641349B1 (en) 2008-09-22 2010-01-05 Cymer, Inc. Systems and methods for collector mirror temperature control using direct contact heat transfer
WO2010091907A1 (en) 2009-02-13 2010-08-19 Asml Netherlands B.V. Multilayer mirror and lithographic apparatus
CN101609262B (zh) * 2009-07-14 2011-08-10 上海微电子装备有限公司 光刻机投影物镜的温度控制装置
NL2005449A (en) * 2009-11-16 2012-04-05 Asml Netherlands Bv Lithographic method and apparatus.
CN102375344B (zh) * 2010-08-18 2013-09-11 上海微电子装备有限公司 控制透镜像质变化的方法
JP5739182B2 (ja) 2011-02-04 2015-06-24 インターナショナル・ビジネス・マシーンズ・コーポレーションＩｎｔｅｒｎａｔｉｏｎａｌ Ｂｕｓｉｎｅｓｓ Ｍａｃｈｉｎｅｓ Ｃｏｒｐｏｒａｔｉｏｎ 制御システム、方法およびプログラム
JP5731223B2 (ja) 2011-02-14 2015-06-10 インターナショナル・ビジネス・マシーンズ・コーポレーションＩｎｔｅｒｎａｔｉｏｎａｌ Ｂｕｓｉｎｅｓｓ Ｍａｃｈｉｎｅｓ Ｃｏｒｐｏｒａｔｉｏｎ 異常検知装置、監視制御システム、異常検知方法、プログラムおよび記録媒体
JP5689333B2 (ja) 2011-02-15 2015-03-25 インターナショナル・ビジネス・マシーンズ・コーポレーションＩｎｔｅｒｎａｔｉｏｎａｌ Ｂｕｓｉｎｅｓｓ Ｍａｃｈｉｎｅｓ Ｃｏｒｐｏｒａｔｉｏｎ 異常検知システム、異常検知装置、異常検知方法、プログラムおよび記録媒体
DE102011077784A1 (de) * 2011-06-20 2012-12-20 Carl Zeiss Smt Gmbh Projektionsanordnung
US9575415B2 (en) * 2014-05-22 2017-02-21 Taiwan Semiconductor Manufacturing Company, Ltd. Wafer stage temperature control
DE102014224822A1 (de) * 2014-12-04 2016-06-09 Carl Zeiss Smt Gmbh Spiegel für eine lithographieanlage, projektionssystem für eine lithographieanlage und lithographieanlage
NL2021342A (en) * 2017-09-04 2019-03-11 Asml Netherlands Bv Heating system
DE102021200788A1 (de) 2021-01-28 2022-07-28 Carl Zeiss Smt Gmbh Optisches System, sowie Verfahren zum Betreiben eines optischen Systems

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Also Published As

Publication number Publication date
CN1734354A (zh) 2006-02-15
EP1624342B1 (en) 2011-07-06
TW200619860A (en) 2006-06-16
KR20060049272A (ko) 2006-05-18
US7375794B2 (en) 2008-05-20
JP2006049909A (ja) 2006-02-16
EP1624342A3 (en) 2009-09-23
EP1624342A2 (en) 2006-02-08
JP4495046B2 (ja) 2010-06-30
US20060028627A1 (en) 2006-02-09
KR100697297B1 (ko) 2007-03-20
JP5155967B2 (ja) 2013-03-06
TWI284359B (en) 2007-07-21
JP2009272649A (ja) 2009-11-19

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