SG116432A1 - Reflective layer or semi-transparent reflective layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording media. - Google Patents
Reflective layer or semi-transparent reflective layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording media.Info
- Publication number
- SG116432A1 SG116432A1 SG200106528A SG200106528A SG116432A1 SG 116432 A1 SG116432 A1 SG 116432A1 SG 200106528 A SG200106528 A SG 200106528A SG 200106528 A SG200106528 A SG 200106528A SG 116432 A1 SG116432 A1 SG 116432A1
- Authority
- SG
- Singapore
- Prior art keywords
- information recording
- recording media
- optical information
- reflective layer
- semi
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
- G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/06—Alloys based on silver
- C22C5/08—Alloys based on silver with copper as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
- G11B7/2595—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on gold
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/21—Circular sheet or circular blank
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000395894A JP3365762B2 (ja) | 2000-04-28 | 2000-12-26 | 光情報記録媒体用の反射層または半透明反射層、光情報記録媒体及び光情報記録媒体用スパッタリングターゲット |
Publications (1)
Publication Number | Publication Date |
---|---|
SG116432A1 true SG116432A1 (en) | 2005-11-28 |
Family
ID=18861274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200106528A SG116432A1 (en) | 2000-12-26 | 2001-10-22 | Reflective layer or semi-transparent reflective layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording media. |
Country Status (5)
Country | Link |
---|---|
US (1) | US6689444B2 (ko) |
KR (1) | KR100445083B1 (ko) |
CN (1) | CN1186772C (ko) |
DE (1) | DE10152889B4 (ko) |
SG (1) | SG116432A1 (ko) |
Families Citing this family (61)
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---|---|---|---|---|
US7045187B2 (en) * | 1998-06-22 | 2006-05-16 | Nee Han H | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US7314657B2 (en) * | 2000-07-21 | 2008-01-01 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US6790503B2 (en) * | 1998-06-22 | 2004-09-14 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US7384677B2 (en) * | 1998-06-22 | 2008-06-10 | Target Technology Company, Llc | Metal alloys for the reflective or semi-reflective layer of an optical storage medium |
US6905750B2 (en) * | 1998-06-22 | 2005-06-14 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US6852384B2 (en) * | 1998-06-22 | 2005-02-08 | Han H. Nee | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US6764735B2 (en) | 1998-06-22 | 2004-07-20 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US7314659B2 (en) * | 2000-07-21 | 2008-01-01 | Target Technology Company, Llc | Metal alloys for the reflective or semi-reflective layer of an optical storage medium |
US7018696B2 (en) * | 2003-04-18 | 2006-03-28 | Target Technology Company Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US7316837B2 (en) * | 2000-07-21 | 2008-01-08 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US7374805B2 (en) * | 2000-07-21 | 2008-05-20 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
AU2001292370A1 (en) * | 2000-10-11 | 2002-04-22 | Matsushita Electric Industrial Co., Ltd. | Optical record medium, optical information processing apparatus, and optical recording/reproducing method |
US7022384B2 (en) * | 2002-01-25 | 2006-04-04 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Reflective film, reflection type liquid crystal display, and sputtering target for forming the reflective film |
KR100506474B1 (ko) * | 2002-03-25 | 2005-08-03 | 히타치 긴조쿠 가부시키가이샤 | Ag 합금막 및 Ag 합금막 형성용 스퍼터링 타겟재 |
JP2003281780A (ja) * | 2002-03-26 | 2003-10-03 | Toshiba Corp | 光記録媒体 |
US20040238356A1 (en) * | 2002-06-24 | 2004-12-02 | Hitoshi Matsuzaki | Silver alloy sputtering target and process for producing the same |
EP1518235B9 (en) * | 2002-06-28 | 2006-08-30 | Williams Advanced Materials Inc. | Corrosion resistive silver metal alloys for optical data storage and recordable optical storage media containing same |
US7514037B2 (en) * | 2002-08-08 | 2009-04-07 | Kobe Steel, Ltd. | AG base alloy thin film and sputtering target for forming AG base alloy thin film |
JP2004095034A (ja) * | 2002-08-30 | 2004-03-25 | Pioneer Electronic Corp | 情報記録媒体 |
JP4667721B2 (ja) * | 2003-02-06 | 2011-04-13 | ソニー株式会社 | 光記録媒体およびその製造方法 |
KR100753328B1 (ko) * | 2003-03-04 | 2007-08-29 | 닛코킨조쿠 가부시키가이샤 | 스퍼터링 타겟트, 광 정보기록 매체용 박막 및 그 제조방법 |
CN100446101C (zh) * | 2003-03-13 | 2008-12-24 | 三菱麻铁里亚尔株式会社 | 光记录介质的反射层形成用银合金溅射靶材 |
JP3993530B2 (ja) * | 2003-05-16 | 2007-10-17 | 株式会社神戸製鋼所 | Ag−Bi系合金スパッタリングターゲットおよびその製造方法 |
JP2005029849A (ja) * | 2003-07-07 | 2005-02-03 | Kobe Steel Ltd | リフレクター用Ag合金反射膜、及び、このAg合金反射膜を用いたリフレクター、並びに、このAg合金反射膜の形成用のAg合金スパッタリングターゲット |
US20050072668A1 (en) * | 2003-10-06 | 2005-04-07 | Heraeus, Inc. | Sputter target having modified surface texture |
US20050112019A1 (en) * | 2003-10-30 | 2005-05-26 | Kabushiki Kaisha Kobe Seiko Sho(Kobe Steel, Ltd.) | Aluminum-alloy reflection film for optical information-recording, optical information-recording medium, and aluminum-alloy sputtering target for formation of the aluminum-alloy reflection film for optical information-recording |
CN100334239C (zh) * | 2003-12-04 | 2007-08-29 | 株式会社神户制钢所 | 平板显示器用Ag基合金配线电极膜、Ag基合金溅射靶 |
WO2005056849A1 (ja) * | 2003-12-10 | 2005-06-23 | Tanaka Kikinzoku Kogyo K.K. | 反射率維持特性に優れた銀合金 |
US7575714B2 (en) * | 2003-12-10 | 2009-08-18 | Tanaka Kikinzoku Kogyo K.K. | Silver alloy excellent in reflectance maintenance property and method for producing an optical recording medium |
TWI325134B (en) * | 2004-04-21 | 2010-05-21 | Kobe Steel Ltd | Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target |
US20050236270A1 (en) * | 2004-04-23 | 2005-10-27 | Heraeus, Inc. | Controlled cooling of sputter targets |
US20050286401A1 (en) * | 2004-06-29 | 2005-12-29 | Tdk Corporation | ROM-type optical recording medium and stamper for manufacturing ROM-type optical recording medium |
DE602005003508T2 (de) * | 2004-06-29 | 2008-10-23 | Kabushiki Kaisha Kobe Seiko Sho, Kobe | Halbreflektierender Film und refkektierender Film für ein optisches Informationsaufzeichnungsmedium, optisches Informationsaufzeichnungsmedium und Sputtering-Target |
JP3907666B2 (ja) * | 2004-07-15 | 2007-04-18 | 株式会社神戸製鋼所 | レーザーマーキング用再生専用光情報記録媒体 |
DE102004059876B4 (de) * | 2004-12-10 | 2010-01-28 | W.C. Heraeus Gmbh | Verwendung eines Sputtertargets aus einer Silberlegierung sowie Glassubstrat mit Wärmedämmschicht |
JP2006240289A (ja) * | 2005-02-07 | 2006-09-14 | Kobe Steel Ltd | 光情報記録媒体用記録膜および光情報記録媒体ならびにスパッタリングターゲット |
JP4575211B2 (ja) * | 2005-03-31 | 2010-11-04 | 株式会社東芝 | 記憶媒体、再生方法及び記録方法 |
JP2006294195A (ja) * | 2005-04-14 | 2006-10-26 | Kobe Steel Ltd | 光情報記録用Ag合金反射膜、光情報記録媒体および光情報記録用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
US20070014963A1 (en) * | 2005-07-12 | 2007-01-18 | Nee Han H | Metal alloys for the reflective layer of an optical storage medium |
JP2007035104A (ja) * | 2005-07-22 | 2007-02-08 | Kobe Steel Ltd | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
JP4377861B2 (ja) * | 2005-07-22 | 2009-12-02 | 株式会社神戸製鋼所 | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
JP4527624B2 (ja) * | 2005-07-22 | 2010-08-18 | 株式会社神戸製鋼所 | Ag合金反射膜を有する光情報媒体 |
JP4377877B2 (ja) | 2005-12-21 | 2009-12-02 | ソニー株式会社 | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
US8815149B2 (en) | 2005-12-29 | 2014-08-26 | Mitsubishi Materials Corporation | Semi-reflective film and reflective film for optical recording medium, and Ag alloy sputtering target for forming semi-reflective film or reflective film for optical recording medium |
JP2007335061A (ja) * | 2006-05-16 | 2007-12-27 | Sony Corp | 光情報記録媒体とそのBCA(BurstCuttingArea)マーキング方法 |
WO2008026601A1 (fr) * | 2006-08-28 | 2008-03-06 | Kabushiki Kaisha Kobe Seiko Sho | FILM RÉFLÉCHISSANT EN ALLIAGE Ag POUR SUPPORT D'ENREGISTREMENT D'INFORMATIONS OPTIQUE, SUPPORT D'ENREGISTREMENT D'INFORMATIONS OPTIQUE ET CIBLE DE PULVÉRISATION POUR FILM RÉFLÉCHISSANT EN ALLIAGE Ag POUR FORMATION DE SUPPORT D'ENREGISTREMENT D'INFORMATIONS OPTIQUE |
JP2008117470A (ja) * | 2006-11-02 | 2008-05-22 | Sony Corp | 光情報記録媒体および光情報記録媒体の製造方法、BCA(BurstCuttingArea)マーキング方法 |
JP4540687B2 (ja) * | 2007-04-13 | 2010-09-08 | 株式会社ソニー・ディスクアンドデジタルソリューションズ | 読み出し専用の光情報記録媒体 |
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JP4833942B2 (ja) * | 2007-08-29 | 2011-12-07 | 株式会社コベルコ科研 | Ag基合金スパッタリングターゲット |
JP2009076129A (ja) * | 2007-09-19 | 2009-04-09 | Kobe Steel Ltd | 読み出し専用の光情報記録媒体 |
JP5046890B2 (ja) * | 2007-11-29 | 2012-10-10 | 株式会社コベルコ科研 | Ag系スパッタリングターゲット |
EP2293344A4 (en) * | 2008-06-17 | 2013-03-06 | Ulvac Inc | PHOTOVOLTAIC CELL AND METHOD FOR MANUFACTURING THE SAME |
US8130438B2 (en) * | 2008-07-03 | 2012-03-06 | Ajjer Llc | Metal coatings, conductive nanoparticles and applications of the same |
JP5331420B2 (ja) | 2008-09-11 | 2013-10-30 | 株式会社神戸製鋼所 | 読み出し専用の光情報記録媒体および該光情報記録媒体の半透過反射膜形成用スパッタリングターゲット |
JP4678062B2 (ja) * | 2008-09-22 | 2011-04-27 | Tdk株式会社 | 光メディア、およびその製造方法 |
JP2010225572A (ja) * | 2008-11-10 | 2010-10-07 | Kobe Steel Ltd | 有機elディスプレイ用の反射アノード電極および配線膜 |
JP4735734B2 (ja) * | 2009-04-02 | 2011-07-27 | Tdk株式会社 | 光メディア用スパッタリングターゲット、その製造方法、ならびに、光メディア、およびその製造方法 |
US8530023B2 (en) | 2009-04-14 | 2013-09-10 | Kobe Steel, Ltd. | Optical information recording medium and sputtering target for forming reflective film for optical information recording medium |
CN106536783A (zh) * | 2014-08-07 | 2017-03-22 | 3M创新有限公司 | 反射片及其制造方法 |
CN106947879B (zh) * | 2017-04-11 | 2019-02-19 | 东北大学 | 用于真空磁控溅射银基合金靶材坯料及其制备方法和应用 |
Citations (3)
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---|---|---|---|---|
US4743526A (en) * | 1984-12-03 | 1988-05-10 | Hitachi, Ltd. | Alloy having variable spectral reflectance and information recording material making use of the same |
CA2401389A1 (en) * | 2000-12-28 | 2002-07-11 | Sony Corporation | Optical recording medium |
WO2004003903A1 (en) * | 2002-06-28 | 2004-01-08 | Williams Advanced Materials, Inc. | Corrosion resistive silver metal alloys for optical data storage and recordable storage media containing same |
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JPS63191340A (ja) * | 1987-02-04 | 1988-08-08 | Seiko Instr & Electronics Ltd | 光磁気記録媒体 |
KR880011732A (ko) * | 1987-03-16 | 1988-10-31 | 이기동 | 자기 기록매체 |
JPS6417244A (en) * | 1987-07-10 | 1989-01-20 | Seiko Epson Corp | Magneto-optical recording medium |
DE19612823C2 (de) * | 1995-03-31 | 2001-03-01 | Mitsubishi Chem Corp | Optisches Aufzeichnungsverfahren |
WO1999043005A2 (en) | 1998-02-02 | 1999-08-26 | Lockheed Martin Idaho Technologies Company | Advanced neutron absorber materials |
KR100359086B1 (ko) * | 1998-07-15 | 2002-12-18 | 삼성전자 주식회사 | 상변화광디스크 |
US6806030B2 (en) * | 2000-03-30 | 2004-10-19 | Hitachi, Ltd. | Information recording medium and method for manufacturing information recording medium |
-
2001
- 2001-10-22 SG SG200106528A patent/SG116432A1/en unknown
- 2001-10-24 US US09/983,305 patent/US6689444B2/en not_active Expired - Lifetime
- 2001-10-25 CN CNB011366575A patent/CN1186772C/zh not_active Expired - Fee Related
- 2001-10-26 DE DE10152889A patent/DE10152889B4/de not_active Expired - Fee Related
- 2001-10-26 KR KR10-2001-0066187A patent/KR100445083B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US4743526A (en) * | 1984-12-03 | 1988-05-10 | Hitachi, Ltd. | Alloy having variable spectral reflectance and information recording material making use of the same |
CA2401389A1 (en) * | 2000-12-28 | 2002-07-11 | Sony Corporation | Optical recording medium |
WO2004003903A1 (en) * | 2002-06-28 | 2004-01-08 | Williams Advanced Materials, Inc. | Corrosion resistive silver metal alloys for optical data storage and recordable storage media containing same |
Also Published As
Publication number | Publication date |
---|---|
DE10152889A1 (de) | 2002-07-04 |
CN1361525A (zh) | 2002-07-31 |
KR100445083B1 (ko) | 2004-08-21 |
US20020150772A1 (en) | 2002-10-17 |
US6689444B2 (en) | 2004-02-10 |
CN1186772C (zh) | 2005-01-26 |
DE10152889B4 (de) | 2004-07-22 |
KR20020052927A (ko) | 2002-07-04 |
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