SG11202004996XA - Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide - Google Patents

Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide

Info

Publication number
SG11202004996XA
SG11202004996XA SG11202004996XA SG11202004996XA SG11202004996XA SG 11202004996X A SG11202004996X A SG 11202004996XA SG 11202004996X A SG11202004996X A SG 11202004996XA SG 11202004996X A SG11202004996X A SG 11202004996XA SG 11202004996X A SG11202004996X A SG 11202004996XA
Authority
SG
Singapore
Prior art keywords
stabilization
compositions
quaternary trialkylalkanolamine
hydroxide
trialkylalkanolamine hydroxide
Prior art date
Application number
SG11202004996XA
Other languages
English (en)
Inventor
Michael Urschey
Tim Rudolph
Original Assignee
Kurita Water Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurita Water Ind Ltd filed Critical Kurita Water Ind Ltd
Publication of SG11202004996XA publication Critical patent/SG11202004996XA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C213/00—Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton
    • C07C213/10—Separation; Purification; Stabilisation; Use of additives
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
    • C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
    • C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
    • C02F5/12—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
    • C10G75/00—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general
    • C10G75/02—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general by addition of corrosion inhibitors
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
    • C10G75/00—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general
    • C10G75/04—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general by addition of antifouling agents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/14—Nitrogen-containing compounds
    • C23F11/141—Amines; Quaternary ammonium compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F14/00—Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes
    • C23F14/02—Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes by chemical means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/08—Corrosion inhibition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Physics & Mathematics (AREA)
  • Water Supply & Treatment (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
SG11202004996XA 2018-04-26 2018-04-26 Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide SG11202004996XA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2018/016949 WO2019207701A1 (en) 2018-04-26 2018-04-26 Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide

Publications (1)

Publication Number Publication Date
SG11202004996XA true SG11202004996XA (en) 2020-06-29

Family

ID=62218269

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202004996XA SG11202004996XA (en) 2018-04-26 2018-04-26 Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide

Country Status (9)

Country Link
US (1) US11643384B2 (de)
EP (1) EP3784817B1 (de)
JP (1) JP7036212B2 (de)
KR (1) KR102505843B1 (de)
CN (1) CN111712590B (de)
ES (1) ES2912801T3 (de)
PL (1) PL3784817T3 (de)
SG (1) SG11202004996XA (de)
WO (1) WO2019207701A1 (de)

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2667487A (en) * 1954-01-26 Condensation products of tri
US2778789A (en) * 1954-06-02 1957-01-22 Mcneill William Electrolytic protective coating for magnesium
NL6413362A (de) * 1963-11-18 1965-01-25
US5209858A (en) 1991-02-06 1993-05-11 E. I. Du Pont De Nemours And Company Stabilization of choline and its derivatives against discoloration
US6417112B1 (en) * 1998-07-06 2002-07-09 Ekc Technology, Inc. Post etch cleaning composition and process for dual damascene system
ATE293155T1 (de) 2001-09-27 2005-04-15 Kurita Europ Gmbh Verfahren zur verhütung von verschmutzung und korrosion durch ammoniumchlorid und ammoniumsulfat
JP2004067548A (ja) * 2002-08-02 2004-03-04 Japan Hydrazine Co Inc 第四級アルキルヒドロキシアルキルアンモニウムハイドロオキサイド水溶液の安定化方法
JP3962919B2 (ja) 2002-11-12 2007-08-22 栗田工業株式会社 金属防食剤、金属防食方法、原油常圧蒸留装置における塩化水素発生防止剤および塩化水素発生防止方法
US20050260420A1 (en) * 2003-04-01 2005-11-24 Collins Martha J Low dielectric materials and methods for making same
CN1757445B (zh) * 2004-03-02 2010-12-01 气体产品与化学公司 用于制备含溶剂的低介电材料的组合物
RU2007104939A (ru) 2004-07-09 2008-08-20 Акцо Нобель Н.В. (NL) Композиция, включающая гидроксид холина, и способ ее получения
KR20070031397A (ko) * 2004-07-09 2007-03-19 아크조 노벨 엔.브이. 콜린 수산화물을 포함하는 조성물 및 이를 제조하는 방법
JP6215511B2 (ja) * 2010-07-16 2017-10-18 栗田工業株式会社 ボイラ用防食剤
US20140329184A1 (en) 2011-11-22 2014-11-06 Taminco Stabilized choline solutions and methods for preparing the same
CN104024214A (zh) * 2011-11-22 2014-09-03 塔明克公司 稳定的胆碱溶液及其制备方法
WO2013098575A1 (en) 2011-12-29 2013-07-04 Taminco N.V. Process for the production of choline hydroxide
CN103874679A (zh) 2012-04-13 2014-06-18 亨斯迈石油化学有限责任公司 使用新颖的胺来稳定化季三烷基烷醇胺
EP2984068B1 (de) * 2013-04-11 2017-05-03 Taminco Verbessertes verfahren zur herstellung von cholinhydroxid
CN104427781B (zh) 2013-09-11 2019-05-17 花王株式会社 树脂掩模层用洗涤剂组合物及电路基板的制造方法
JP6250454B2 (ja) 2014-03-27 2017-12-20 株式会社フジミインコーポレーテッド シリコン材料研磨用組成物
CN117625325A (zh) 2015-01-13 2024-03-01 Cmc材料股份有限公司 用于在化学机械抛光后清洁半导体晶片的清洁组合物及方法
US20170306504A1 (en) * 2016-04-26 2017-10-26 Ecolab Usa Inc. Corrosion inhibitor compositions and methods of using same

Also Published As

Publication number Publication date
US20210061754A1 (en) 2021-03-04
US11643384B2 (en) 2023-05-09
PL3784817T3 (pl) 2022-08-16
WO2019207701A1 (en) 2019-10-31
JP2021520445A (ja) 2021-08-19
KR20210003080A (ko) 2021-01-11
EP3784817B1 (de) 2022-04-20
EP3784817A1 (de) 2021-03-03
JP7036212B2 (ja) 2022-03-15
ES2912801T3 (es) 2022-05-27
CN111712590B (zh) 2022-03-25
KR102505843B1 (ko) 2023-03-03
CN111712590A (zh) 2020-09-25

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