SG11202004996XA - Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide - Google Patents
Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxideInfo
- Publication number
- SG11202004996XA SG11202004996XA SG11202004996XA SG11202004996XA SG11202004996XA SG 11202004996X A SG11202004996X A SG 11202004996XA SG 11202004996X A SG11202004996X A SG 11202004996XA SG 11202004996X A SG11202004996X A SG 11202004996XA SG 11202004996X A SG11202004996X A SG 11202004996XA
- Authority
- SG
- Singapore
- Prior art keywords
- stabilization
- compositions
- quaternary trialkylalkanolamine
- hydroxide
- trialkylalkanolamine hydroxide
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C213/00—Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton
- C07C213/10—Separation; Purification; Stabilisation; Use of additives
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
- C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
- C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
- C02F5/12—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
- C10G75/00—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general
- C10G75/02—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general by addition of corrosion inhibitors
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
- C10G75/00—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general
- C10G75/04—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general by addition of antifouling agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/141—Amines; Quaternary ammonium compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F14/00—Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes
- C23F14/02—Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes by chemical means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/08—Corrosion inhibition
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2018/016949 WO2019207701A1 (en) | 2018-04-26 | 2018-04-26 | Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202004996XA true SG11202004996XA (en) | 2020-06-29 |
Family
ID=62218269
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202004996XA SG11202004996XA (en) | 2018-04-26 | 2018-04-26 | Stabilization of compositions comprising quaternary trialkylalkanolamine hydroxide |
Country Status (9)
Country | Link |
---|---|
US (1) | US11643384B2 (en) |
EP (1) | EP3784817B1 (en) |
JP (1) | JP7036212B2 (en) |
KR (1) | KR102505843B1 (en) |
CN (1) | CN111712590B (en) |
ES (1) | ES2912801T3 (en) |
PL (1) | PL3784817T3 (en) |
SG (1) | SG11202004996XA (en) |
WO (1) | WO2019207701A1 (en) |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2667487A (en) * | 1954-01-26 | Condensation products of tri | ||
US2778789A (en) * | 1954-06-02 | 1957-01-22 | Mcneill William | Electrolytic protective coating for magnesium |
BE655880A (en) * | 1963-11-18 | 1965-05-17 | ||
US5209858A (en) | 1991-02-06 | 1993-05-11 | E. I. Du Pont De Nemours And Company | Stabilization of choline and its derivatives against discoloration |
US6417112B1 (en) * | 1998-07-06 | 2002-07-09 | Ekc Technology, Inc. | Post etch cleaning composition and process for dual damascene system |
PT1298185E (en) | 2001-09-27 | 2005-08-31 | Kurita Europ Gmbh | METHOD TO PREVENT INCRUSTACTIONS AND CORROSION CAUSED BY AMMONIUM CHLORIDE |
JP2004067548A (en) | 2002-08-02 | 2004-03-04 | Japan Hydrazine Co Inc | Method for stabilizing quaternary alkylhydroxyalkylammonium hydroxide aqueous solution |
JP3962919B2 (en) | 2002-11-12 | 2007-08-22 | 栗田工業株式会社 | Metal anticorrosive, metal anticorrosion method, hydrogen chloride generation inhibitor and method for preventing hydrogen chloride generation in crude oil atmospheric distillation equipment |
US20050260420A1 (en) * | 2003-04-01 | 2005-11-24 | Collins Martha J | Low dielectric materials and methods for making same |
CN101252030A (en) * | 2004-03-02 | 2008-08-27 | 气体产品与化学公司 | Compositions for preparing low dielectric materials containing solvents |
CA2573213A1 (en) * | 2004-07-09 | 2006-01-19 | Akzo Nobel N.V. | Composition comprising choline hydroxide and process for preparing the same |
KR20070031397A (en) * | 2004-07-09 | 2007-03-19 | 아크조 노벨 엔.브이. | Composition comprising choline hydroxide and process for preparing the same |
JP6215511B2 (en) * | 2010-07-16 | 2017-10-18 | 栗田工業株式会社 | Anticorrosive for boiler |
US20140329184A1 (en) | 2011-11-22 | 2014-11-06 | Taminco | Stabilized choline solutions and methods for preparing the same |
CA2855935A1 (en) * | 2011-11-22 | 2013-05-30 | Taminco N.V. | Stabilized choline solutions and methods for preparing the same |
HUE026975T2 (en) | 2011-12-29 | 2016-08-29 | Taminco Bvba | Process for the production of choline hydroxide |
AU2013246183B2 (en) * | 2012-04-13 | 2017-03-16 | Huntsman Petrochemical Llc | Using novel amines to stabilize quaternary trialkylalkanolamines |
EP2984068B1 (en) * | 2013-04-11 | 2017-05-03 | Taminco | Improved process for preparing choline hydroxide |
JP6412377B2 (en) | 2013-09-11 | 2018-10-24 | 花王株式会社 | Cleaning composition for resin mask layer and method for producing circuit board |
JP6250454B2 (en) | 2014-03-27 | 2017-12-20 | 株式会社フジミインコーポレーテッド | Silicone material polishing composition |
EP3245668B1 (en) | 2015-01-13 | 2021-06-30 | CMC Materials, Inc. | Cleaning composition and method for cleaning semiconductor wafers after cmp |
WO2017189528A1 (en) * | 2016-04-26 | 2017-11-02 | Ecolab USA, Inc. | Corrosion inhibitor compositions and methods of using same |
-
2018
- 2018-04-26 WO PCT/JP2018/016949 patent/WO2019207701A1/en active Application Filing
- 2018-04-26 KR KR1020207018992A patent/KR102505843B1/en active IP Right Grant
- 2018-04-26 SG SG11202004996XA patent/SG11202004996XA/en unknown
- 2018-04-26 PL PL18726240.7T patent/PL3784817T3/en unknown
- 2018-04-26 ES ES18726240T patent/ES2912801T3/en active Active
- 2018-04-26 CN CN201880089515.XA patent/CN111712590B/en active Active
- 2018-04-26 US US16/961,231 patent/US11643384B2/en active Active
- 2018-04-26 EP EP18726240.7A patent/EP3784817B1/en active Active
- 2018-04-26 JP JP2020528486A patent/JP7036212B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP3784817B1 (en) | 2022-04-20 |
JP7036212B2 (en) | 2022-03-15 |
WO2019207701A1 (en) | 2019-10-31 |
US20210061754A1 (en) | 2021-03-04 |
PL3784817T3 (en) | 2022-08-16 |
EP3784817A1 (en) | 2021-03-03 |
CN111712590A (en) | 2020-09-25 |
KR20210003080A (en) | 2021-01-11 |
CN111712590B (en) | 2022-03-25 |
KR102505843B1 (en) | 2023-03-03 |
JP2021520445A (en) | 2021-08-19 |
US11643384B2 (en) | 2023-05-09 |
ES2912801T3 (en) | 2022-05-27 |
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