SG11201906177WA - Transparent film error correction pattern in wafer geometry system - Google Patents

Transparent film error correction pattern in wafer geometry system

Info

Publication number
SG11201906177WA
SG11201906177WA SG11201906177WA SG11201906177WA SG11201906177WA SG 11201906177W A SG11201906177W A SG 11201906177WA SG 11201906177W A SG11201906177W A SG 11201906177WA SG 11201906177W A SG11201906177W A SG 11201906177WA SG 11201906177W A SG11201906177W A SG 11201906177WA
Authority
SG
Singapore
Prior art keywords
international
wafer
transparent film
wafer geometry
geometry
Prior art date
Application number
SG11201906177WA
Other languages
English (en)
Inventor
Helen Liu
Andrew Zeng
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of SG11201906177WA publication Critical patent/SG11201906177WA/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G01B21/04—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
    • G01B21/045—Correction of measurements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/24—Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Pathology (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Seats For Vehicles (AREA)
SG11201906177WA 2017-01-09 2018-01-05 Transparent film error correction pattern in wafer geometry system SG11201906177WA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762443815P 2017-01-09 2017-01-09
US15/649,259 US10571248B2 (en) 2017-01-09 2017-07-13 Transparent film error correction pattern in wafer geometry system
PCT/US2018/012673 WO2018129385A1 (en) 2017-01-09 2018-01-05 Transparent film error correction pattern in wafer geometry system

Publications (1)

Publication Number Publication Date
SG11201906177WA true SG11201906177WA (en) 2019-08-27

Family

ID=62782771

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201906177WA SG11201906177WA (en) 2017-01-09 2018-01-05 Transparent film error correction pattern in wafer geometry system

Country Status (8)

Country Link
US (1) US10571248B2 (zh)
EP (1) EP3549159A4 (zh)
JP (1) JP6917462B2 (zh)
KR (1) KR102301560B1 (zh)
CN (1) CN110419098B (zh)
SG (1) SG11201906177WA (zh)
TW (1) TWI752146B (zh)
WO (1) WO2018129385A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10317198B2 (en) * 2016-09-30 2019-06-11 Kla-Tencor Corporation Three-dimensional mapping of a wafer
US11067902B2 (en) * 2017-08-07 2021-07-20 Asml Netherlands B.V. Computational metrology
EP3489619A1 (en) 2017-11-28 2019-05-29 Koh Young Technology Inc. Apparatus for inspecting substrate and method thereof
US10852125B2 (en) * 2017-11-28 2020-12-01 Koh Young Technology Inc. Apparatus for inspecting film on substrate by using optical interference and method thereof
US11112234B2 (en) * 2018-03-07 2021-09-07 Applejack 199 L.P. Multi-probe gauge for slab characterization
JP6402273B1 (ja) * 2018-05-18 2018-10-10 大塚電子株式会社 光学測定装置及び光学測定方法
US11049720B2 (en) 2018-10-19 2021-06-29 Kla Corporation Removable opaque coating for accurate optical topography measurements on top surfaces of transparent films
JP2022524926A (ja) * 2019-01-31 2022-05-11 キング・アブドゥッラー・ユニバーシティ・オブ・サイエンス・アンド・テクノロジー 多層ナノ素子に基づく光処理デバイス

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5042949A (en) 1989-03-17 1991-08-27 Greenberg Jeffrey S Optical profiler for films and substrates
US5129724A (en) * 1991-01-29 1992-07-14 Wyko Corporation Apparatus and method for simultaneous measurement of film thickness and surface height variation for film-substrate sample
US7324214B2 (en) 2003-03-06 2008-01-29 Zygo Corporation Interferometer and method for measuring characteristics of optically unresolved surface features
US6847458B2 (en) 2003-03-20 2005-01-25 Phase Shift Technology, Inc. Method and apparatus for measuring the shape and thickness variation of polished opaque plates
JP4192038B2 (ja) * 2003-06-04 2008-12-03 東レエンジニアリング株式会社 表面形状および／または膜厚測定方法及びその装置
US7298494B2 (en) * 2003-09-15 2007-11-20 Zygo Corporation Methods and systems for interferometric analysis of surfaces and related applications
EP1751492A4 (en) * 2004-03-11 2016-07-20 Icos Vision Systems Nv METHODS AND APPARATUS FOR HANDLING WAVE FRONTS AND IMPROVED 3D MEASUREMENTS
US7595891B2 (en) * 2005-07-09 2009-09-29 Kla-Tencor Corporation Measurement of the top surface of an object with/without transparent thin films in white light interferometry
GB0712605D0 (en) * 2007-06-28 2007-08-08 Microsharp Corp Ltd Optical film
JP2011504293A (ja) * 2007-11-02 2011-02-03 エージーシー フラット グラス ノース アメリカ，インコーポレイテッド 薄膜光起電性適用向けの透明導電性酸化膜、及びその製造方法
US8068234B2 (en) 2009-02-18 2011-11-29 Kla-Tencor Corporation Method and apparatus for measuring shape or thickness information of a substrate
US8395191B2 (en) * 2009-10-12 2013-03-12 Monolithic 3D Inc. Semiconductor device and structure
EP2470960A1 (en) 2009-08-24 2012-07-04 ASML Netherlands BV Metrology method and apparatus, lithographic apparatus, lithographic processing cell and substrate comprising metrology targets
WO2012012795A1 (en) 2010-07-23 2012-01-26 First Solar, Inc In-line metrology system and method
US20120089365A1 (en) * 2010-10-08 2012-04-12 Zygo Corporation Data interpolation methods for metrology of surfaces, films and underresolved structures
US8818754B2 (en) * 2011-04-22 2014-08-26 Nanometrics Incorporated Thin films and surface topography measurement using reduced library
US8552369B2 (en) * 2011-05-03 2013-10-08 International Business Machines Corporation Obtaining elemental concentration profile of sample
US9385058B1 (en) * 2012-12-29 2016-07-05 Monolithic 3D Inc. Semiconductor device and structure
US20140293291A1 (en) 2013-04-01 2014-10-02 Kla-Tencor Corporation Wafer Shape and Thickness Measurement System Utilizing Shearing Interferometers
US9189705B2 (en) * 2013-08-08 2015-11-17 JSMSW Technology LLC Phase-controlled model-based overlay measurement systems and methods
JP5871242B2 (ja) * 2013-10-30 2016-03-01 レーザーテック株式会社 膜厚測定装置及び膜厚測定方法
KR102046699B1 (ko) * 2015-03-24 2019-11-19 코니카 미놀타 가부시키가이샤 폴리이미드계 광학 필름, 그의 제조 방법 및 유기 일렉트로루미네센스 디스플레이
JP6321579B2 (ja) 2015-06-01 2018-05-09 株式会社日立国際電気 半導体装置の製造方法、基板処理システム、基板処理装置及びプログラム
EP3150959B1 (en) * 2015-10-02 2018-12-26 Soitec Method for measuring thickness variations in a layer of a multilayer semiconductor structure

Also Published As

Publication number Publication date
TW201839876A (zh) 2018-11-01
KR20190097281A (ko) 2019-08-20
EP3549159A1 (en) 2019-10-09
KR102301560B1 (ko) 2021-09-10
CN110419098A (zh) 2019-11-05
EP3549159A4 (en) 2020-09-09
JP2020503526A (ja) 2020-01-30
US20180195855A1 (en) 2018-07-12
TWI752146B (zh) 2022-01-11
CN110419098B (zh) 2021-02-02
US10571248B2 (en) 2020-02-25
WO2018129385A1 (en) 2018-07-12
JP6917462B2 (ja) 2021-08-11

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