SG11201811360UA - Pellicle film, pellicle frame body, pellicle, and method for producing the same - Google Patents

Pellicle film, pellicle frame body, pellicle, and method for producing the same

Info

Publication number
SG11201811360UA
SG11201811360UA SG11201811360UA SG11201811360UA SG11201811360UA SG 11201811360U A SG11201811360U A SG 11201811360UA SG 11201811360U A SG11201811360U A SG 11201811360UA SG 11201811360U A SG11201811360U A SG 11201811360UA SG 11201811360U A SG11201811360U A SG 11201811360UA
Authority
SG
Singapore
Prior art keywords
pellicle
producing
same
film
frame body
Prior art date
Application number
SG11201811360UA
Inventor
Atsushi Okubo
Yosuke Ono
Kazuo Kohmura
Yasuhisa Fujii
Wataru Yoshikawa
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Publication of SG11201811360UA publication Critical patent/SG11201811360UA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PELLICLE FILM, PELLICLE FRAME BODY, PELLICLE, AND METHOD FOR PRODUCING THE SAME 5 Provided is a pellicle film, a pellicle frame and a pellicle for EUV decreased in the amount of dust or the like attached thereto, and a method for producing the same. Provided is a method for producing a pellicle including forming a pellicle film (202) above a substrate (200); forming a metal mask (204) on a surface of the substrate opposite to a surface having the pellicle film formed 10 thereon; removing a part of the substrate from the side of the metal mask; and removing the metal mask. In an embodiment, the present invention provides a pellicle film, a pellicle frame and a pellicle for EUV decreased in the amount of dust or the like attached thereto, and a method for producing the same. 15 Fig. 2
SG11201811360UA 2016-06-28 2017-06-20 Pellicle film, pellicle frame body, pellicle, and method for producing the same SG11201811360UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016127535 2016-06-28
PCT/JP2017/022688 WO2018003603A1 (en) 2016-06-28 2017-06-20 Pellicle film, pellicle frame body, pellicle, and method for manufacturing pellicle

Publications (1)

Publication Number Publication Date
SG11201811360UA true SG11201811360UA (en) 2019-01-30

Family

ID=60785208

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201811360UA SG11201811360UA (en) 2016-06-28 2017-06-20 Pellicle film, pellicle frame body, pellicle, and method for producing the same

Country Status (8)

Country Link
US (1) US20190121229A1 (en)
EP (1) EP3477387A4 (en)
JP (1) JP6732019B2 (en)
KR (1) KR102189172B1 (en)
CN (1) CN109313385A (en)
SG (1) SG11201811360UA (en)
TW (1) TWI731995B (en)
WO (1) WO2018003603A1 (en)

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KR102482649B1 (en) 2020-07-09 2022-12-29 (주)에프에스티 Method for fabricating a pellicle for EUV(extreme ultraviolet) lithography
WO2022030498A1 (en) * 2020-08-05 2022-02-10 三井化学株式会社 Pellicle, original plate for light exposure, light exposure device, method for producing pellicle, and method for producing semiconductor device
KR102514745B1 (en) 2020-10-07 2023-03-29 주식회사 에프에스티 Pellicle for EUV(extreme ultraviolet) lithography and method for fabricating the same
KR102530226B1 (en) 2020-10-28 2023-05-09 주식회사 에프에스티 Pellicle frame for EUV(extreme ultraviolet) lithography and method for fabricating the same
KR102546968B1 (en) 2020-11-19 2023-06-23 주식회사 에프에스티 Method for Fabricating Pellicle for EUV(extreme ultraviolet) Lithography
KR102668456B1 (en) 2020-12-07 2024-05-23 주식회사 에프에스티 Pellicle Frame for EUV(extreme ultraviolet) Lithography
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KR102482650B1 (en) 2021-02-25 2022-12-29 (주)에프에스티 Pellicle film with BN nano structure layer for EUV(extreme ultraviolet) lithography and method for fabricating the same
KR102581086B1 (en) 2021-03-16 2023-09-21 주식회사 에프에스티 Pellicle for EUV(extreme ultraviolet) Lithography
KR102624936B1 (en) 2021-05-21 2024-01-15 주식회사 에프에스티 Pellicle Frame for EUV(extreme ultraviolet) Lithography and Sealing Material for Pellicle Frame for EUV(extreme ultraviolet) Lithography
KR102662986B1 (en) 2021-07-06 2024-05-07 주식회사 에프에스티 Method for Fabricating Pellicle for EUV(extreme ultraviolet) Lithography
KR20230039294A (en) 2021-09-14 2023-03-21 주식회사 에프에스티 Pellicle Frame for EUV(extreme ultraviolet) Lithography and Manufacturing Method of the Same
KR20230069757A (en) 2021-11-12 2023-05-19 주식회사 에프에스티 Pellicle film for extreme ultraviolet lithography comprising a multi-component silicon compound layer
KR20230073539A (en) 2021-11-19 2023-05-26 주식회사 에프에스티 Method for Fabricating Pellicle for EUV(extreme ultraviolet) Lithography
KR20230125966A (en) 2022-02-22 2023-08-29 주식회사 에프에스티 Method for Fabricating Pellicle for EUV(extreme ultraviolet) Lithography
KR102504698B1 (en) * 2022-04-04 2023-02-28 주식회사 그래핀랩 Method for manufacturing pelicle
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Also Published As

Publication number Publication date
TWI731995B (en) 2021-07-01
US20190121229A1 (en) 2019-04-25
TW201801147A (en) 2018-01-01
CN109313385A (en) 2019-02-05
JP6732019B2 (en) 2020-07-29
EP3477387A1 (en) 2019-05-01
KR102189172B1 (en) 2020-12-09
JPWO2018003603A1 (en) 2019-03-28
KR20190005911A (en) 2019-01-16
WO2018003603A1 (en) 2018-01-04
EP3477387A4 (en) 2020-03-11

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