SG11201709473PA - Method For The Alignment Of Substrates Before Bonding - Google Patents
Method For The Alignment Of Substrates Before BondingInfo
- Publication number
- SG11201709473PA SG11201709473PA SG11201709473PA SG11201709473PA SG11201709473PA SG 11201709473P A SG11201709473P A SG 11201709473PA SG 11201709473P A SG11201709473P A SG 11201709473PA SG 11201709473P A SG11201709473P A SG 11201709473PA SG 11201709473P A SG11201709473P A SG 11201709473PA
- Authority
- SG
- Singapore
- Prior art keywords
- alignment
- before bonding
- substrates before
- substrates
- bonding
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/5442—Marks applied to semiconductor devices or parts comprising non digital, non alphanumeric information, e.g. symbols
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Pressure Welding/Diffusion-Bonding (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102015108901.7A DE102015108901A1 (de) | 2015-06-05 | 2015-06-05 | Verfahren zum Ausrichten von Substraten vor dem Bonden |
| PCT/EP2016/062360 WO2016193296A1 (de) | 2015-06-05 | 2016-06-01 | Verfahren zum ausrichten von substraten vor dem bonden |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201709473PA true SG11201709473PA (en) | 2017-12-28 |
Family
ID=56121047
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201709473PA SG11201709473PA (en) | 2015-06-05 | 2016-06-01 | Method For The Alignment Of Substrates Before Bonding |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10204812B2 (de) |
| EP (1) | EP3304583B1 (de) |
| JP (1) | JP6805180B2 (de) |
| KR (1) | KR102528681B1 (de) |
| CN (1) | CN107646139B (de) |
| DE (1) | DE102015108901A1 (de) |
| SG (1) | SG11201709473PA (de) |
| TW (1) | TWI730961B (de) |
| WO (1) | WO2016193296A1 (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10636688B2 (en) | 2018-06-22 | 2020-04-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for alignment, process tool and method for wafer-level alignment |
| CN111403324B (zh) * | 2018-10-23 | 2021-03-12 | 长江存储科技有限责任公司 | 半导体器件翻转装置 |
| CN110467151A (zh) * | 2019-09-04 | 2019-11-19 | 烟台睿创微纳技术股份有限公司 | 一种mems晶圆封装设备及方法 |
| CN110767590A (zh) * | 2019-10-31 | 2020-02-07 | 长春长光圆辰微电子技术有限公司 | 一种用硅片凹口对准键合两片硅片的方法 |
| CN113192930B (zh) * | 2021-04-27 | 2024-03-29 | 上海华虹宏力半导体制造有限公司 | 偏移检测结构及基板偏移的检测方法 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT405775B (de) | 1998-01-13 | 1999-11-25 | Thallner Erich | Verfahren und vorrichtung zum ausgerichteten zusammenführen von scheibenförmigen halbleitersubstraten |
| JP3991300B2 (ja) | 2000-04-28 | 2007-10-17 | 株式会社Ｓｕｍｃｏ | 張り合わせ誘電体分離ウェーハの製造方法 |
| US20060141744A1 (en) * | 2004-12-27 | 2006-06-29 | Asml Netherlands B.V. | System and method of forming a bonded substrate and a bonded substrate product |
| US7297972B2 (en) * | 2005-08-26 | 2007-11-20 | Electro Scientific Industries, Inc. | Methods and systems for positioning a laser beam spot relative to a semiconductor integrated circuit using a processing target as a metrology target |
| EP1832933B1 (de) * | 2006-03-08 | 2008-10-01 | Erich Thallner | Verfahren zur Herstellung eines Bauelements und Apparat zur Prozessierung eines Substrats, sowie Substratträger |
| JP2008192840A (ja) * | 2007-02-05 | 2008-08-21 | Tokyo Electron Ltd | 真空処理装置及び真空処理方法並びに記憶媒体 |
| JP5239220B2 (ja) * | 2007-06-12 | 2013-07-17 | 株式会社ニコン | ウェハ位置決め装置と、これを有するウェハ貼り合わせ装置 |
| CN101779270B (zh) * | 2007-08-10 | 2013-06-12 | 株式会社尼康 | 基板贴合装置及基板贴合方法 |
| JP5200522B2 (ja) * | 2007-12-18 | 2013-06-05 | 株式会社ニコン | 基板張り合わせ方法 |
| JP5524550B2 (ja) * | 2009-09-15 | 2014-06-18 | 株式会社ニコン | 基板接合装置、基板接合方法およびデバイスの製造方法 |
| EP2299472B1 (de) * | 2009-09-22 | 2020-07-08 | EV Group E. Thallner GmbH | Vorrichtung zum Ausrichten zweier Substrate |
| JP5895332B2 (ja) * | 2010-04-01 | 2016-03-30 | 株式会社ニコン | 位置検出装置、重ね合わせ装置、位置検出方法およびデバイスの製造方法 |
| EP2463892B1 (de) * | 2010-12-13 | 2013-04-03 | EV Group E. Thallner GmbH | Einrichtung, Vorrichtung und Verfahren zur Ermittlung von Ausrichtungsfehlern |
| JP5886538B2 (ja) * | 2011-04-18 | 2016-03-16 | 株式会社ディスコ | ウェーハの加工方法 |
| JP5756429B2 (ja) * | 2011-10-21 | 2015-07-29 | 東京エレクトロン株式会社 | 貼り合わせ装置及び該貼り合わせ装置を用いた貼り合わせ位置調整方法 |
| TWI421972B (zh) * | 2011-12-08 | 2014-01-01 | Metal Ind Res & Dev Ct | 無標記異空間基板組裝對位方法及系統 |
| JP5752639B2 (ja) * | 2012-05-28 | 2015-07-22 | 東京エレクトロン株式会社 | 接合システム、接合方法、プログラム及びコンピュータ記憶媒体 |
| SG2014014070A (en) * | 2012-06-06 | 2014-06-27 | Ev Group E Thallner Gmbh | Device and method for determination of alignment errors |
| SG2014012942A (en) | 2012-06-12 | 2014-08-28 | Erich Thallner | Device and method for aligning substrates |
| JP6098148B2 (ja) * | 2012-12-11 | 2017-03-22 | 株式会社ニコン | アライメント装置、貼り合わせ装置および位置合わせ方法 |
| KR102092432B1 (ko) | 2013-03-27 | 2020-03-24 | 에베 그룹 에. 탈너 게엠베하 | 기판 스택을 취급하기 위한 장치 및 방법과 보유 장치 |
| JP6258479B2 (ja) | 2013-06-17 | 2018-01-10 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 複数の基板を位置合わせする装置及び方法 |
| KR101741384B1 (ko) | 2013-12-06 | 2017-05-29 | 에베 그룹 에. 탈너 게엠베하 | 기질들을 정렬하기 위한 장치 및 방법 |
| US10083854B2 (en) | 2014-06-24 | 2018-09-25 | Ev Group E. Thallner Gmbh | Method and device for surface treatment of substrates |
| KR102483237B1 (ko) * | 2014-12-10 | 2022-12-30 | 가부시키가이샤 니콘 | 기판 겹침 장치 및 기판 겹침 방법 |
-
2015
- 2015-06-05 DE DE102015108901.7A patent/DE102015108901A1/de not_active Ceased
-
2016
- 2016-05-23 TW TW105116009A patent/TWI730961B/zh active
- 2016-06-01 WO PCT/EP2016/062360 patent/WO2016193296A1/de active Application Filing
- 2016-06-01 CN CN201680031184.5A patent/CN107646139B/zh active Active
- 2016-06-01 JP JP2017561379A patent/JP6805180B2/ja active Active
- 2016-06-01 KR KR1020177034325A patent/KR102528681B1/ko active IP Right Grant
- 2016-06-01 EP EP16728875.2A patent/EP3304583B1/de active Active
- 2016-06-01 SG SG11201709473PA patent/SG11201709473PA/en unknown
- 2016-06-01 US US15/574,991 patent/US10204812B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2018523296A (ja) | 2018-08-16 |
| WO2016193296A1 (de) | 2016-12-08 |
| EP3304583B1 (de) | 2020-05-27 |
| KR102528681B1 (ko) | 2023-05-03 |
| CN107646139A (zh) | 2018-01-30 |
| CN107646139B (zh) | 2022-04-19 |
| KR20180015138A (ko) | 2018-02-12 |
| TWI730961B (zh) | 2021-06-21 |
| DE102015108901A1 (de) | 2016-12-08 |
| US20180144967A1 (en) | 2018-05-24 |
| TW201705349A (zh) | 2017-02-01 |
| JP6805180B2 (ja) | 2020-12-23 |
| US10204812B2 (en) | 2019-02-12 |
| EP3304583A1 (de) | 2018-04-11 |
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