SG11201608219WA - Polishing pads and systems and methods of making and using the same - Google Patents

Polishing pads and systems and methods of making and using the same

Info

Publication number
SG11201608219WA
SG11201608219WA SG11201608219WA SG11201608219WA SG11201608219WA SG 11201608219W A SG11201608219W A SG 11201608219WA SG 11201608219W A SG11201608219W A SG 11201608219WA SG 11201608219W A SG11201608219W A SG 11201608219WA SG 11201608219W A SG11201608219W A SG 11201608219WA
Authority
SG
Singapore
Prior art keywords
systems
making
methods
same
polishing pads
Prior art date
Application number
SG11201608219WA
Other languages
English (en)
Inventor
Duy K Lehuu
Kenneth A P Meyer
Moses M David
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of SG11201608219WA publication Critical patent/SG11201608219WA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/26Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/22Lapping pads for working plane surfaces characterised by a multi-layered structure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B24B37/245Pads with fixed abrasives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B24B7/241Methods

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
SG11201608219WA 2014-04-03 2015-03-31 Polishing pads and systems and methods of making and using the same SG11201608219WA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461974848P 2014-04-03 2014-04-03
US201462052729P 2014-09-19 2014-09-19
PCT/US2015/023572 WO2015153597A1 (en) 2014-04-03 2015-03-31 Polishing pads and systems and methods of making and using the same

Publications (1)

Publication Number Publication Date
SG11201608219WA true SG11201608219WA (en) 2016-10-28

Family

ID=52823890

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201608219WA SG11201608219WA (en) 2014-04-03 2015-03-31 Polishing pads and systems and methods of making and using the same
SG11201608134YA SG11201608134YA (en) 2014-04-03 2015-03-31 Polishing pads and systems and methods of making and using the same

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201608134YA SG11201608134YA (en) 2014-04-03 2015-03-31 Polishing pads and systems and methods of making and using the same

Country Status (8)

Country Link
US (2) US10071461B2 (zh)
EP (2) EP3126093B1 (zh)
JP (2) JP6656162B2 (zh)
KR (2) KR102350350B1 (zh)
CN (2) CN106132630B (zh)
SG (2) SG11201608219WA (zh)
TW (2) TWI652142B (zh)
WO (2) WO2015153601A1 (zh)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013178563A2 (de) * 2012-06-01 2013-12-05 Bayer Materialscience Ag Mehrschichtaufbau als reflektor
EP3050082B1 (en) * 2013-09-25 2021-05-05 3M Innovative Properties Company System for polishing a substrate
US10071461B2 (en) * 2014-04-03 2018-09-11 3M Innovative Properties Company Polishing pads and systems and methods of making and using the same
US9873180B2 (en) 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
KR102295988B1 (ko) 2014-10-17 2021-09-01 어플라이드 머티어리얼스, 인코포레이티드 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 cmp 패드 구성
US10399201B2 (en) 2014-10-17 2019-09-03 Applied Materials, Inc. Advanced polishing pads having compositional gradients by use of an additive manufacturing process
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
US10821573B2 (en) 2014-10-17 2020-11-03 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US10875145B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
TWI769988B (zh) 2015-10-07 2022-07-11 美商3M新設資產公司 拋光墊與系統及其製造與使用方法
US10618141B2 (en) 2015-10-30 2020-04-14 Applied Materials, Inc. Apparatus for forming a polishing article that has a desired zeta potential
US10593574B2 (en) 2015-11-06 2020-03-17 Applied Materials, Inc. Techniques for combining CMP process tracking data with 3D printed CMP consumables
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
TWI629297B (zh) * 2016-07-05 2018-07-11 智勝科技股份有限公司 研磨層及其製造方法以及研磨方法
JP6777475B2 (ja) * 2016-09-07 2020-10-28 富士紡ホールディングス株式会社 研磨パッド
TWI626117B (zh) * 2017-01-19 2018-06-11 智勝科技股份有限公司 研磨墊及研磨方法
TWI757410B (zh) * 2017-01-20 2022-03-11 美商應用材料股份有限公司 用於cmp應用的薄的塑膠拋光用具
JP7198801B2 (ja) * 2017-07-11 2023-01-04 スリーエム イノベイティブ プロパティズ カンパニー 適合性コーティングを含む研磨物品及びそれによる研磨システム
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
JP7165719B2 (ja) * 2017-08-04 2022-11-04 スリーエム イノベイティブ プロパティズ カンパニー 平坦性が向上された微細複製研磨表面
WO2019032286A1 (en) 2017-08-07 2019-02-14 Applied Materials, Inc. ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME
US20200171619A1 (en) * 2017-08-25 2020-06-04 3M Innovative Properties Company Surface projection polishing pad
US11685013B2 (en) * 2018-01-24 2023-06-27 Taiwan Semiconductor Manufacturing Company, Ltd. Polishing pad for chemical mechanical planarization
US11878388B2 (en) * 2018-06-15 2024-01-23 Taiwan Semiconductor Manufacturing Company, Ltd. Polishing pad, polishing apparatus and method of manufacturing semiconductor package using the same
JP7299970B2 (ja) 2018-09-04 2023-06-28 アプライド マテリアルズ インコーポレイテッド 改良型研磨パッドのための配合物
KR20200028097A (ko) * 2018-09-06 2020-03-16 에스케이실트론 주식회사 웨이퍼 연마 장치용 연마패드
US11331767B2 (en) 2019-02-01 2022-05-17 Micron Technology, Inc. Pads for chemical mechanical planarization tools, chemical mechanical planarization tools, and related methods
KR102222851B1 (ko) 2019-05-29 2021-03-08 한국생산기술연구원 그루브가 형성된 연마용 패드
KR102221514B1 (ko) 2019-05-29 2021-03-03 한국생산기술연구원 연마액의 유동 저항 구조를 갖는 연마용 패드
KR102440315B1 (ko) 2020-05-11 2022-09-06 한국생산기술연구원 패턴구조를 갖는 화학기계적 연마용 패드 및 이의 제조방법
KR102186895B1 (ko) 2019-05-29 2020-12-07 한국생산기술연구원 마이크로 패턴을 갖는 연마용 패드의 설계방법
JPWO2020255744A1 (zh) * 2019-06-19 2020-12-24
WO2021090122A1 (en) * 2019-11-04 2021-05-14 3M Innovative Properties Company Polishing article, polishing system and method of polishing
US11813712B2 (en) 2019-12-20 2023-11-14 Applied Materials, Inc. Polishing pads having selectively arranged porosity
US11833638B2 (en) * 2020-03-25 2023-12-05 Rohm and Haas Electronic Materials Holding, Inc. CMP polishing pad with polishing elements on supports
US11759909B2 (en) * 2020-06-19 2023-09-19 Sk Enpulse Co., Ltd. Polishing pad, preparation method thereof and method for preparing semiconductor device using same
US11806829B2 (en) 2020-06-19 2023-11-07 Applied Materials, Inc. Advanced polishing pads and related polishing pad manufacturing methods
US20210394334A1 (en) * 2020-06-19 2021-12-23 Skc Solmics Co., Ltd. Polishing pad, preparation method thereof and method for preparing semiconductor device using same
US20230211455A1 (en) * 2020-06-25 2023-07-06 3M Innovative Properties Company Polishing pads and systems for and methods of using same
CN114425743A (zh) * 2020-10-28 2022-05-03 中国科学院微电子研究所 一种抛光垫及化学机械抛光设备
US20230383048A1 (en) * 2020-11-02 2023-11-30 3M Innovative Properties Company Polyurethanes, Polishing Articles and Polishing Systems Therefrom and Method of Use Thereof
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ
CN117355554A (zh) * 2021-05-28 2024-01-05 3M创新有限公司 聚氨酯、由其制备的抛光制品和抛光系统及其使用方法
CN113246016A (zh) * 2021-06-09 2021-08-13 广东工业大学 一种多层多功能cmp抛光垫及其制备方法和应用
WO2024023618A1 (en) * 2022-07-29 2024-02-01 3M Innovative Properties Company Polyurethanes, polishing articles and polishing systems therefrom and method of use thereof

Family Cites Families (94)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5143528B2 (zh) 1972-12-02 1976-11-22
AT347283B (de) * 1975-03-07 1978-12-27 Collo Gmbh Schaumstoffkoerper fuer reinigungs-, scheuer- und/oder polierzwecke u. dgl.
US5348788A (en) * 1991-01-30 1994-09-20 Interpore Orthopaedics, Inc. Mesh sheet with microscopic projections and holes
US5152917B1 (en) 1991-02-06 1998-01-13 Minnesota Mining & Mfg Structured abrasive article
US5212910A (en) 1991-07-09 1993-05-25 Intel Corporation Composite polishing pad for semiconductor process
US5435816A (en) 1993-01-14 1995-07-25 Minnesota Mining And Manufacturing Company Method of making an abrasive article
US5441598A (en) * 1993-12-16 1995-08-15 Motorola, Inc. Polishing pad for chemical-mechanical polishing of a semiconductor substrate
US5489233A (en) 1994-04-08 1996-02-06 Rodel, Inc. Polishing pads and methods for their use
US6099954A (en) * 1995-04-24 2000-08-08 Rodel Holdings, Inc. Polishing material and method of polishing a surface
KR19990007929A (ko) 1995-04-26 1999-01-25 데이빗로스클리블랜드 다면 반복 노광 방법 및 장치
US5958794A (en) 1995-09-22 1999-09-28 Minnesota Mining And Manufacturing Company Method of modifying an exposed surface of a semiconductor wafer
JP3324643B2 (ja) 1995-10-25 2002-09-17 日本電気株式会社 研磨パッド
US5778481A (en) 1996-02-15 1998-07-14 International Business Machines Corporation Silicon wafer cleaning and polishing pads
US5876268A (en) * 1997-01-03 1999-03-02 Minnesota Mining And Manufacturing Company Method and article for the production of optical quality surfaces on glass
JPH10225864A (ja) 1997-02-17 1998-08-25 Sony Corp 研磨パッドとその製造方法並びにその研磨パッドを用いたウエハの研磨方法
US5882251A (en) * 1997-08-19 1999-03-16 Lsi Logic Corporation Chemical mechanical polishing pad slurry distribution grooves
US6139402A (en) * 1997-12-30 2000-10-31 Micron Technology, Inc. Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates
US6780095B1 (en) * 1997-12-30 2004-08-24 Micron Technology, Inc. Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates
JPH11267961A (ja) 1998-03-23 1999-10-05 Sony Corp 研磨パッド、研磨装置および研磨方法
US6218306B1 (en) * 1998-04-22 2001-04-17 Applied Materials, Inc. Method of chemical mechanical polishing a metal layer
US6372323B1 (en) 1998-10-05 2002-04-16 3M Innovative Properties Company Slip control article for wet and dry applications
US6206759B1 (en) 1998-11-30 2001-03-27 Micron Technology, Inc. Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines
JP2000158327A (ja) * 1998-12-02 2000-06-13 Rohm Co Ltd 化学的機械的研磨用研磨布およびそれを用いた化学的機械的研磨装置
CN1137013C (zh) * 1999-01-21 2004-02-04 罗德尔控股公司 改进的抛光垫及其抛光方法
JP2000301450A (ja) * 1999-04-19 2000-10-31 Rohm Co Ltd Cmp研磨パッドおよびそれを用いたcmp処理装置
US6234875B1 (en) 1999-06-09 2001-05-22 3M Innovative Properties Company Method of modifying a surface
US6364749B1 (en) 1999-09-02 2002-04-02 Micron Technology, Inc. CMP polishing pad with hydrophilic surfaces for enhanced wetting
US6443809B1 (en) * 1999-11-16 2002-09-03 Chartered Semiconductor Manufacturing, Ltd. Polishing apparatus and method for forming an integrated circuit
US6390891B1 (en) 2000-04-26 2002-05-21 Speedfam-Ipec Corporation Method and apparatus for improved stability chemical mechanical polishing
KR100770852B1 (ko) 2000-05-27 2007-10-26 롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스 인코포레이티드 화학 기계적 평탄화용 그루브형 연마 패드
JP3490431B2 (ja) * 2000-06-13 2004-01-26 東洋ゴム工業株式会社 ポリウレタン発泡体の製造方法、ポリウレタン発泡体及び研磨シート
US6852766B1 (en) 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
US6652764B1 (en) 2000-08-31 2003-11-25 Micron Technology, Inc. Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates
US6612916B2 (en) 2001-01-08 2003-09-02 3M Innovative Properties Company Article suitable for chemical mechanical planarization processes
US20020098789A1 (en) 2001-01-19 2002-07-25 Peter A. Burke Polishing pad and methods for improved pad surface and pad interior characteristics
JP2002246343A (ja) 2001-02-13 2002-08-30 Nikon Corp 研磨装置、この研磨装置を用いた半導体デバイス製造方法及びこの半導体デバイス製造方法により製造された半導体デバイス
JP3359629B1 (ja) * 2001-04-09 2002-12-24 東洋紡績株式会社 ポリウレタン組成物からなる研磨パッド
CN100592474C (zh) * 2001-11-13 2010-02-24 东洋橡胶工业株式会社 研磨垫及其制造方法
CN101130231A (zh) * 2001-11-13 2008-02-27 东洋橡胶工业株式会社 研磨垫及其制造方法
JP2003205451A (ja) 2002-01-07 2003-07-22 Hitachi Ltd 研磨パッド
US20030134581A1 (en) * 2002-01-11 2003-07-17 Wang Hsing Maw Device for chemical mechanical polishing
JP2003225855A (ja) 2002-01-30 2003-08-12 Hitachi Chem Co Ltd 研磨用パッド及びそれを用いた被研磨物の研磨方法
JP2003334753A (ja) 2002-05-15 2003-11-25 Rodel Nitta Co 研磨パッド
US7399516B2 (en) 2002-05-23 2008-07-15 Novellus Systems, Inc. Long-life workpiece surface influencing device structure and manufacturing method
KR100465649B1 (ko) 2002-09-17 2005-01-13 한국포리올 주식회사 일체형 연마 패드 및 그 제조 방법
JP2004140178A (ja) 2002-10-17 2004-05-13 Renesas Technology Corp 化学的機械研磨装置
AU2003285800A1 (en) 2002-12-28 2004-07-22 Skc Co., Ltd. Polishing pad having multi-windows
JP3910921B2 (ja) 2003-02-06 2007-04-25 株式会社東芝 研磨布および半導体装置の製造方法
JP4659338B2 (ja) 2003-02-12 2011-03-30 Hoya株式会社 情報記録媒体用ガラス基板の製造方法並びにそれに使用する研磨パッド
US20060189269A1 (en) * 2005-02-18 2006-08-24 Roy Pradip K Customized polishing pads for CMP and methods of fabrication and use thereof
WO2005000529A1 (en) * 2003-06-03 2005-01-06 Neopad Technologies Corporation Synthesis of a functionally graded pad for chemical mechanical planarization
JP4790973B2 (ja) * 2003-03-28 2011-10-12 Hoya株式会社 研磨パッドを使用した情報記録媒体用ガラス基板の製造方法及びその方法で得られた情報記録媒体用ガラス基板
US6893328B2 (en) * 2003-04-23 2005-05-17 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Conductive polishing pad with anode and cathode
KR20050012661A (ko) 2003-07-26 2005-02-02 매그나칩 반도체 유한회사 연마패드 형성방법및 연마패드 구조
US6942549B2 (en) 2003-10-29 2005-09-13 International Business Machines Corporation Two-sided chemical mechanical polishing pad for semiconductor processing
WO2005077602A1 (en) * 2004-02-17 2005-08-25 Skc Co., Ltd. Base pad polishing pad and multi-layer pad comprising the same
KR100545795B1 (ko) * 2004-02-17 2006-01-24 에스케이씨 주식회사 연마 패드의 기재 패드와 이를 이용한 다층 패드
JP2005342881A (ja) 2004-05-07 2005-12-15 Nitta Haas Inc 研磨パッド、研磨方法および研磨装置
US20050277376A1 (en) 2004-06-11 2005-12-15 Harvey Pinder Single component pad backer for polishing head of an orbital chemical mechanical polishing machine and method therefor
JP3769581B1 (ja) * 2005-05-18 2006-04-26 東洋ゴム工業株式会社 研磨パッドおよびその製造方法
EP1848569B1 (en) * 2005-02-18 2016-11-23 NexPlanar Corporation Customized polishing pads for cmp and method of using the same
TWI378844B (en) * 2005-08-18 2012-12-11 Rohm & Haas Elect Mat Polishing pad and method of manufacture
US7226345B1 (en) 2005-12-09 2007-06-05 The Regents Of The University Of California CMP pad with designed surface features
US7241206B1 (en) * 2006-02-17 2007-07-10 Chien-Min Sung Tools for polishing and associated methods
US20080003935A1 (en) 2006-07-03 2008-01-03 Chung-Chih Feng Polishing pad having surface texture
TWI409136B (zh) 2006-07-19 2013-09-21 Innopad Inc 表面具微溝槽之化學機械平坦化墊
US20080146129A1 (en) 2006-12-08 2008-06-19 Makoto Kouzuma Fast break-in polishing pad and a method of making the same
JP5297096B2 (ja) * 2007-10-03 2013-09-25 富士紡ホールディングス株式会社 研磨布
JP5143528B2 (ja) 2007-10-25 2013-02-13 株式会社クラレ 研磨パッド
US8398462B2 (en) * 2008-02-21 2013-03-19 Chien-Min Sung CMP pads and method of creating voids in-situ therein
JP2009283538A (ja) 2008-05-20 2009-12-03 Jsr Corp 化学機械研磨パッドおよび化学機械研磨方法
EP2318180A1 (en) 2008-06-26 2011-05-11 3M Innovative Properties Company Polishing pad with porous elements and method of making and using the same
JP2010056184A (ja) 2008-08-27 2010-03-11 Jsr Corp 化学機械研磨パッドおよび化学機械研磨方法
WO2010032715A1 (ja) 2008-09-17 2010-03-25 株式会社クラレ 研磨パッド
WO2010078306A2 (en) 2008-12-30 2010-07-08 3M Innovative Properties Company Method for making nanostructured surfaces
US20100188751A1 (en) 2009-01-29 2010-07-29 3M Innovative Properties Company Optical films with internally conformable layers and method of making the films
KR101609128B1 (ko) 2009-08-13 2016-04-05 삼성전자주식회사 연마 패드 및 이를 갖는 화학 기계적 연마 장치
SG181678A1 (en) 2009-12-30 2012-07-30 3M Innovative Properties Co Polishing pads including phase-separated polymer blend and method of making and using the same
US20130102231A1 (en) * 2009-12-30 2013-04-25 3M Innovative Properties Company Organic particulate loaded polishing pads and method of making and using the same
EP2566681B1 (en) 2010-05-03 2018-09-26 3M Innovative Properties Company Method of making a nanostructure
US20120171935A1 (en) * 2010-12-20 2012-07-05 Diamond Innovations, Inc. CMP PAD Conditioning Tool
JP5711525B2 (ja) 2010-12-22 2015-04-30 富士紡ホールディングス株式会社 研磨パッドおよび研磨パッドの製造方法
US8808573B2 (en) * 2011-04-15 2014-08-19 Cabot Microelectronics Corporation Compositions and methods for selective polishing of silicon nitride materials
US20120302148A1 (en) * 2011-05-23 2012-11-29 Rajeev Bajaj Polishing pad with homogeneous body having discrete protrusions thereon
US20140342646A1 (en) 2011-09-16 2014-11-20 Toray Industries, Inc. Polishing pad
WO2013081665A2 (en) 2011-11-29 2013-06-06 Nexplanar Corporation Polishing pad with foundation layer and polishing surface layer
JP5917236B2 (ja) 2012-03-30 2016-05-11 富士紡ホールディングス株式会社 研磨パッド用シート及びその製造方法、研磨パッド及びその製造方法、並びに研磨方法
US9597769B2 (en) * 2012-06-04 2017-03-21 Nexplanar Corporation Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer
JP2014054719A (ja) 2012-09-14 2014-03-27 Toho Engineering Kk 研磨パッド再生加工装置
JP6228546B2 (ja) * 2012-09-28 2017-11-08 富士紡ホールディングス株式会社 研磨パッド
US10160092B2 (en) 2013-03-14 2018-12-25 Cabot Microelectronics Corporation Polishing pad having polishing surface with continuous protrusions having tapered sidewalls
JP6111797B2 (ja) 2013-03-29 2017-04-12 富士紡ホールディングス株式会社 研磨パッド及び研磨パッドの製造方法
JP6505693B2 (ja) 2013-07-26 2019-04-24 スリーエム イノベイティブ プロパティズ カンパニー ナノ構造及びナノ構造化物品の作製方法
US10071461B2 (en) 2014-04-03 2018-09-11 3M Innovative Properties Company Polishing pads and systems and methods of making and using the same

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CN106132630B (zh) 2019-11-26
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TWI655998B (zh) 2019-04-11
US10071461B2 (en) 2018-09-11
WO2015153601A1 (en) 2015-10-08
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US20170173758A1 (en) 2017-06-22
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CN106132630A (zh) 2016-11-16
TW201542318A (zh) 2015-11-16
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CN106163740A (zh) 2016-11-23
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KR102347711B1 (ko) 2022-01-06
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