SG11201604777YA - Method allowing the creation of nanometric structures by self-assembly of block copolymers - Google Patents
Method allowing the creation of nanometric structures by self-assembly of block copolymersInfo
- Publication number
- SG11201604777YA SG11201604777YA SG11201604777YA SG11201604777YA SG11201604777YA SG 11201604777Y A SG11201604777Y A SG 11201604777YA SG 11201604777Y A SG11201604777Y A SG 11201604777YA SG 11201604777Y A SG11201604777Y A SG 11201604777YA SG 11201604777Y A SG11201604777Y A SG 11201604777YA
- Authority
- SG
- Singapore
- Prior art keywords
- creation
- self
- assembly
- block copolymers
- method allowing
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00388—Etch mask forming
- B81C1/00428—Etch mask forming processes not provided for in groups B81C1/00396 - B81C1/0042
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0147—Film patterning
- B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Graft Or Block Polymers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Liquid Crystal Substances (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1362597A FR3014888B1 (fr) | 2013-12-13 | 2013-12-13 | Procede permettant la creation de structures nanometriques par l'auto-assemblage de copolymeres a blocs |
PCT/FR2014/053279 WO2015087005A1 (fr) | 2013-12-13 | 2014-12-11 | Procédé permettant la création de structures nanométriques par l'auto-assemblage de copolymères a blocs |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201604777YA true SG11201604777YA (en) | 2016-07-28 |
Family
ID=50828979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201604777YA SG11201604777YA (en) | 2013-12-13 | 2014-12-11 | Method allowing the creation of nanometric structures by self-assembly of block copolymers |
Country Status (9)
Country | Link |
---|---|
US (1) | US20160333221A1 (zh) |
EP (1) | EP3080218A1 (zh) |
JP (1) | JP6404353B2 (zh) |
KR (1) | KR101990187B1 (zh) |
CN (1) | CN105980494A (zh) |
FR (1) | FR3014888B1 (zh) |
SG (1) | SG11201604777YA (zh) |
TW (1) | TWI547519B (zh) |
WO (1) | WO2015087005A1 (zh) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3078692B1 (en) | 2013-12-06 | 2021-01-27 | LG Chem, Ltd. | Block copolymer |
CN105980342B (zh) | 2013-12-06 | 2019-02-15 | 株式会社Lg化学 | 单体和嵌段共聚物 |
EP3078691B1 (en) | 2013-12-06 | 2018-04-18 | LG Chem, Ltd. | Block copolymer |
JP6521974B2 (ja) | 2013-12-06 | 2019-05-29 | エルジー・ケム・リミテッド | ブロック共重合体 |
WO2015084123A1 (ko) | 2013-12-06 | 2015-06-11 | 주식회사 엘지화학 | 블록 공중합체 |
EP3101043B1 (en) | 2013-12-06 | 2021-01-27 | LG Chem, Ltd. | Block copolymer |
US10087276B2 (en) | 2013-12-06 | 2018-10-02 | Lg Chem, Ltd. | Block copolymer |
WO2015084125A1 (ko) | 2013-12-06 | 2015-06-11 | 주식회사 엘지화학 | 블록 공중합체 |
CN105899556B (zh) | 2013-12-06 | 2019-04-19 | 株式会社Lg化学 | 嵌段共聚物 |
JP6496318B2 (ja) | 2013-12-06 | 2019-04-03 | エルジー・ケム・リミテッド | ブロック共重合体 |
JP6432846B2 (ja) | 2013-12-06 | 2018-12-05 | エルジー・ケム・リミテッド | ブロック共重合体 |
WO2015084131A1 (ko) | 2013-12-06 | 2015-06-11 | 주식회사 엘지화학 | 블록 공중합체 |
EP3078689B1 (en) * | 2013-12-06 | 2020-12-02 | LG Chem, Ltd. | Block copolymer |
EP3078690B1 (en) | 2013-12-06 | 2021-01-27 | LG Chem, Ltd. | Block copolymer |
JP6637495B2 (ja) | 2014-09-30 | 2020-01-29 | エルジー・ケム・リミテッド | パターン化基板の製造方法 |
US10287429B2 (en) | 2014-09-30 | 2019-05-14 | Lg Chem, Ltd. | Block copolymer |
EP3202802B1 (en) | 2014-09-30 | 2022-11-23 | LG Chem, Ltd. | Block copolymer |
US10377894B2 (en) | 2014-09-30 | 2019-08-13 | Lg Chem, Ltd. | Block copolymer |
US10295908B2 (en) | 2014-09-30 | 2019-05-21 | Lg Chem, Ltd. | Block copolymer |
CN107075052B (zh) | 2014-09-30 | 2020-05-29 | 株式会社Lg化学 | 嵌段共聚物 |
EP3202797B1 (en) | 2014-09-30 | 2021-07-07 | LG Chem, Ltd. | Block copolymer |
JP6524220B2 (ja) | 2014-09-30 | 2019-06-05 | エルジー・ケム・リミテッド | ブロック共重合体 |
WO2016053011A1 (ko) | 2014-09-30 | 2016-04-07 | 주식회사 엘지화학 | 블록 공중합체 |
US10370529B2 (en) | 2014-09-30 | 2019-08-06 | Lg Chem, Ltd. | Method of manufacturing patterned substrate |
FR3042794B1 (fr) * | 2015-10-23 | 2020-03-27 | Arkema France | Procede permettant la creation de structures nanometriques par l'auto-assemblage de copolymeres di-blocs |
FR3089981B1 (fr) * | 2018-12-12 | 2021-01-08 | Arkema France | Procédé de fabrication d’un copolymère à blocs contenant des ions métalliques |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6893705B2 (en) * | 2001-05-25 | 2005-05-17 | Massachusetts Institute Of Technology | Large area orientation of block copolymer microdomains in thin films |
JP3979470B2 (ja) * | 2002-09-11 | 2007-09-19 | 財団法人理工学振興会 | ブロック共重合体、及びミクロ相分離構造膜の製造方法 |
JP3926360B2 (ja) * | 2004-10-13 | 2007-06-06 | 株式会社東芝 | パターン形成方法およびそれを用いた構造体の加工方法 |
WO2007122998A1 (ja) * | 2006-04-19 | 2007-11-01 | Japan Science And Technology Agency | 表面に微小金属塊が整列した基板 |
US7553760B2 (en) * | 2006-10-19 | 2009-06-30 | International Business Machines Corporation | Sub-lithographic nano interconnect structures, and method for forming same |
JP5598970B2 (ja) * | 2010-06-18 | 2014-10-01 | 凸版印刷株式会社 | 微細構造体の製造方法、複合体 |
US8304493B2 (en) | 2010-08-20 | 2012-11-06 | Micron Technology, Inc. | Methods of forming block copolymers |
JP5652092B2 (ja) * | 2010-09-30 | 2015-01-14 | 凸版印刷株式会社 | ブロック共重合体及びそれを用いた太陽電池 |
CN103562245B (zh) * | 2011-04-22 | 2015-11-25 | Lg化学株式会社 | 新的二嵌段共聚物、其制备方法以及使用其形成纳米图案的方法 |
JP2012236866A (ja) * | 2011-05-09 | 2012-12-06 | Asahi Kasei E-Materials Corp | ブロック共重合体 |
US8939709B2 (en) * | 2011-07-18 | 2015-01-27 | General Electric Company | Clearance control for a turbine |
JP5988258B2 (ja) * | 2011-07-29 | 2016-09-07 | 凸版印刷株式会社 | 微細構造体の製造方法、複合体の製造方法 |
US10253187B2 (en) * | 2011-11-08 | 2019-04-09 | Samsung Electronics Co., Ltd. | Nano-structure of block copolymer and method of manufacturing the same |
US8513356B1 (en) * | 2012-02-10 | 2013-08-20 | Dow Global Technologies Llc | Diblock copolymer blend composition |
CN102627774A (zh) * | 2012-03-26 | 2012-08-08 | 复旦大学 | 一种聚烷基噻吩与聚氧化乙烯的嵌段共聚物及其制备方法 |
-
2013
- 2013-12-13 FR FR1362597A patent/FR3014888B1/fr not_active Expired - Fee Related
-
2014
- 2014-12-11 TW TW103143324A patent/TWI547519B/zh not_active IP Right Cessation
- 2014-12-11 CN CN201480068285.0A patent/CN105980494A/zh active Pending
- 2014-12-11 EP EP14827499.6A patent/EP3080218A1/fr not_active Withdrawn
- 2014-12-11 WO PCT/FR2014/053279 patent/WO2015087005A1/fr active Application Filing
- 2014-12-11 JP JP2016538584A patent/JP6404353B2/ja not_active Expired - Fee Related
- 2014-12-11 KR KR1020167018199A patent/KR101990187B1/ko active IP Right Grant
- 2014-12-11 US US15/103,740 patent/US20160333221A1/en not_active Abandoned
- 2014-12-11 SG SG11201604777YA patent/SG11201604777YA/en unknown
Also Published As
Publication number | Publication date |
---|---|
TWI547519B (zh) | 2016-09-01 |
FR3014888A1 (fr) | 2015-06-19 |
WO2015087005A1 (fr) | 2015-06-18 |
KR20160095125A (ko) | 2016-08-10 |
FR3014888B1 (fr) | 2017-05-26 |
JP6404353B2 (ja) | 2018-10-10 |
JP2017503043A (ja) | 2017-01-26 |
US20160333221A1 (en) | 2016-11-17 |
CN105980494A (zh) | 2016-09-28 |
TW201538605A (zh) | 2015-10-16 |
KR101990187B1 (ko) | 2019-06-17 |
EP3080218A1 (fr) | 2016-10-19 |
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